Production of alignment light

Industry

CPC
G03F9/7065

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7065Production of alignment light

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Substrate measuring device and a method of using the same
- Patent number 12,007,691
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Min-Cheng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer alignment using form birefringence of targets or product
- Patent number 11,971,665
- Issue date Apr 30, 2024
- ASML Holding N.V.
- Joshua Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Broad spectrum radiation by supercontinuum generation using a taper...
- Patent number 11,835,752
- Issue date Dec 5, 2023
- ASML Holding N.V.
- King Pui Leung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection apparatus, lithography apparatus, article manufacturing m...
- Patent number 11,829,083
- Issue date Nov 28, 2023
- Canon Kabushiki Kaisha
- Tomokazu Taki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer edge exposure apparatus, wafer edge exposure method and photo...
- Patent number 11,822,261
- Issue date Nov 21, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xueyu Liang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for enhancing alignment performance of lithograph...
- Patent number 11,796,927
- Issue date Oct 24, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Zhao Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hollow-core photonic crystal fiber based optical component for broa...
- Patent number 11,774,671
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Alignment method
- Patent number 11,762,305
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Sergei Sokolov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,733,617
- Issue date Aug 22, 2023
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imprint apparatus
- Patent number 11,709,421
- Issue date Jul 25, 2023
- Canon Kabushiki Kaisha
- Ken-ichiro Shinoda
- G02 - OPTICS
Information Patent Grant
Apparatus and method for measuring a position of a mark
- Patent number 11,650,513
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, metrology apparatus, optical system and method
- Patent number 11,537,055
- Issue date Dec 27, 2022
- ASML Holding N.V.
- Stanislav Smirnov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus, lithography apparatus, and method of manufac...
- Patent number 11,537,056
- Issue date Dec 27, 2022
- Canon Kabushiki Kaisha
- Takamitsu Komaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation system
- Patent number 11,467,507
- Issue date Oct 11, 2022
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G02 - OPTICS
Information Patent Grant
Substrate measuring device and a method of using the same
- Patent number 11,409,200
- Issue date Aug 9, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Min-Cheng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate measuring device and a method of using the same
- Patent number 11,409,201
- Issue date Aug 9, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Min-Cheng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bandwidth calculation system and method for determining a desired w...
- Patent number 11,360,403
- Issue date Jun 14, 2022
- ASML Netherlands B.V.
- Jia Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scan signal characterization diagnostics
- Patent number 11,347,152
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Cornelis Melchior Brouwer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination source for an inspection apparatus, inspection apparat...
- Patent number 11,347,155
- Issue date May 31, 2022
- ASML Netherlands B.V.
- David O Dwyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position sensor
- Patent number 11,333,985
- Issue date May 17, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Frequency broadening apparatus and method
- Patent number 11,262,665
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation source
- Patent number 11,237,486
- Issue date Feb 1, 2022
- ASML Netherlands B.V.
- Patrick Sebastian Uebel
- G02 - OPTICS
Information Patent Grant
High stability collimator assembly, lithographic apparatus, and method
- Patent number 11,204,559
- Issue date Dec 21, 2021
- ASML Holdings N.V.
- David Taub
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment apparatus, alignment method, lithography apparatus, and m...
- Patent number 11,188,001
- Issue date Nov 30, 2021
- Canon Kabushiki Kaisha
- Takashi Shibayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 11,181,835
- Issue date Nov 23, 2021
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G01 - MEASURING TESTING
Information Patent Grant
Measurement apparatus, exposure apparatus, and method of manufactur...
- Patent number 11,169,452
- Issue date Nov 9, 2021
- Canon Kabushiki Kaisha
- Hironori Maeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate measuring device and a method of using the same
- Patent number 11,092,892
- Issue date Aug 17, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Min-Cheng Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Spectroscopic overlay metrology
- Patent number 10,983,005
- Issue date Apr 20, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kai Wu
- G01 - MEASURING TESTING
Information Patent Grant
Light-spot distribution structure, surface shape measurement method...
- Patent number 10,915,030
- Issue date Feb 9, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Zhenhui Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coaxial mask alignment device, photolithography apparatus and align...
- Patent number 10,901,331
- Issue date Jan 26, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Chengshuang Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SCALABLE NANOIMPRINT MANUFACTURING OF FUNCTIONAL MULTI-LAYER METASU...
- Publication number 20240369738
- Publication date Nov 7, 2024
- Arizona Board of Regents on behalf of Arizona State University
- Chao WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK
- Publication number 20240263941
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Rui CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240203796
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Byeong Seon PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR IDENTIFYING POSITIONS OF A SPATIAL LIGHT M...
- Publication number 20240192612
- Publication date Jun 13, 2024
- Canon Kabushiki Kaisha
- Mehul N. Patel
- G02 - OPTICS
Information Patent Application
ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT
- Publication number 20240168397
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Joshua ADAMS
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
- Publication number 20240036485
- Publication date Feb 1, 2024
- ASML Netheriands B. V.
- Arjan Johannes Anton BEUKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROA...
- Publication number 20240004127
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Patrick Sebastian UEBEL
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
METHODS AND APPARATUS FOR PROVIDING A BROADBAND LIGHT SOURCE
- Publication number 20240004319
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Patrick Sebastian UEBEL
- G02 - OPTICS
Information Patent Application
ALIGNMENT SYSTEM AND METHOD FOR ALIGNING AN OBJECT HAVING AN ALIGNM...
- Publication number 20240004321
- Publication date Jan 4, 2024
- Nearfield Instruments B.V.
- Hamed SADEGHIAN MARNANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR
- Publication number 20230266681
- Publication date Aug 24, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILL...
- Publication number 20230236519
- Publication date Jul 27, 2023
- ASML Holding N.V.
- Yuli Vladimirsky
- G02 - OPTICS
Information Patent Application
ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...
- Publication number 20230229094
- Publication date Jul 20, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G02 - OPTICS
Information Patent Application
ALIGNMENT METHOD
- Publication number 20220382175
- Publication date Dec 1, 2022
- ASML NETHERLANDS B.V.
- Sergei SOKOLOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE MEASURING DEVICE AND A METHOD OF USING THE SAME
- Publication number 20220334490
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Min-Cheng WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER EDGE EXPOSURE APPARATUS, WAFER EDGE EXPOSURE METHOD AND PHOTO...
- Publication number 20220308469
- Publication date Sep 29, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Xueyu LIANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR ENHANCING ALIGNMENT PERFORMANCE OF LITHOGRAPH...
- Publication number 20220308470
- Publication date Sep 29, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Zhao CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY APPARATUS, OPTICAL SYSTEM AND METHOD
- Publication number 20220179330
- Publication date Jun 9, 2022
- ASML Holding N.V.
- Stanislav SMIRNOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER ALIGNMENT USING FORM BIREFRINGENCE OF TARGETS OR PRODUCT
- Publication number 20220137523
- Publication date May 5, 2022
- ASML Holding N.V.
- Joshua ADAMS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREQUENCY BROADENING APPARATUS AND METHOD
- Publication number 20220128912
- Publication date Apr 28, 2022
- ASML NETHERLANDS B.V.
- Patrick Sebastian UEBEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SOURCE
- Publication number 20220128910
- Publication date Apr 28, 2022
- ASML NETHERLANDS B.V.
- Patrick Sebastian UEBEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR MEASURING A POSITION OF A MARK
- Publication number 20210382403
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION SYSTEM
- Publication number 20210356871
- Publication date Nov 18, 2021
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G02 - OPTICS
Information Patent Application
SUBSTRATE MEASURING DEVICE AND A METHOD OF USING THE SAME
- Publication number 20210341841
- Publication date Nov 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Min-Cheng WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE MEASURING DEVICE AND A METHOD OF USING THE SAME
- Publication number 20210341842
- Publication date Nov 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Min-Cheng WU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bandwidth Calculation System and Method for Determining a Desired W...
- Publication number 20210208519
- Publication date Jul 8, 2021
- ASML NETHERLANDS B.V.
- Jia WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Sensor, Lithographic Apparatus and Method for Manufacturi...
- Publication number 20210157248
- Publication date May 27, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROA...
- Publication number 20210124112
- Publication date Apr 29, 2021
- ASML NETHERLANDS B.V.
- Patrick Sebastian UEBEL
- G02 - OPTICS
Information Patent Application
POSITION SENSOR
- Publication number 20210124276
- Publication date Apr 29, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OVERLAY METROLOGY TOOL AND METHODS OF PERFORMING OVERLAY MEASUREMENTS
- Publication number 20210116819
- Publication date Apr 22, 2021
- Taiwan Semiconductor Manufacturing company Ltd.
- Hung-Chih Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High Stability Collimator Assembly, Lithographic Apparatus, and Method
- Publication number 20210072654
- Publication date Mar 11, 2021
- ASML Holding N.V.
- David TAUB
- G02 - OPTICS

Production of alignment light

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate measuring device and a method of using the same

Wafer alignment using form birefringence of targets or product

Broad spectrum radiation by supercontinuum generation using a taper...

Detection apparatus, lithography apparatus, article manufacturing m...

Wafer edge exposure apparatus, wafer edge exposure method and photo...

Method and device for enhancing alignment performance of lithograph...

Hollow-core photonic crystal fiber based optical component for broa...

Alignment method

Frequency broadening apparatus and method

Imprint apparatus

Apparatus and method for measuring a position of a mark

Lithographic apparatus, metrology apparatus, optical system and method

Measurement apparatus, lithography apparatus, and method of manufac...

Radiation system

Substrate measuring device and a method of using the same

Substrate measuring device and a method of using the same

Bandwidth calculation system and method for determining a desired w...

Scan signal characterization diagnostics

Illumination source for an inspection apparatus, inspection apparat...

Position sensor

Frequency broadening apparatus and method

Radiation source

High stability collimator assembly, lithographic apparatus, and method

Alignment apparatus, alignment method, lithography apparatus, and m...

Metrology sensor, lithographic apparatus and method for manufacturi...

Measurement apparatus, exposure apparatus, and method of manufactur...

Substrate measuring device and a method of using the same

Spectroscopic overlay metrology

Light-spot distribution structure, surface shape measurement method...

Coaxial mask alignment device, photolithography apparatus and align...

Patents Applicationslast 30 patents

SCALABLE NANOIMPRINT MANUFACTURING OF FUNCTIONAL MULTI-LAYER METASU...

INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHOD AND APPARATUS FOR IDENTIFYING POSITIONS OF A SPATIAL LIGHT M...

ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF

HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROA...

METHODS AND APPARATUS FOR PROVIDING A BROADBAND LIGHT SOURCE

ALIGNMENT SYSTEM AND METHOD FOR ALIGNING AN OBJECT HAVING AN ALIGNM...

SELF-REFERENCING INTEGRATED ALIGNMENT SENSOR

LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILL...

ILLUMINATION APPARATUS AND ASSOCIATED METROLOGY AND LITHOGRAPHIC AP...

ALIGNMENT METHOD

SUBSTRATE MEASURING DEVICE AND A METHOD OF USING THE SAME

WAFER EDGE EXPOSURE APPARATUS, WAFER EDGE EXPOSURE METHOD AND PHOTO...

METHOD AND DEVICE FOR ENHANCING ALIGNMENT PERFORMANCE OF LITHOGRAPH...

LITHOGRAPHIC APPARATUS, METROLOGY APPARATUS, OPTICAL SYSTEM AND METHOD

WAFER ALIGNMENT USING FORM BIREFRINGENCE OF TARGETS OR PRODUCT

FREQUENCY BROADENING APPARATUS AND METHOD

RADIATION SOURCE

APPARATUS AND METHOD FOR MEASURING A POSITION OF A MARK

RADIATION SYSTEM

SUBSTRATE MEASURING DEVICE AND A METHOD OF USING THE SAME

SUBSTRATE MEASURING DEVICE AND A METHOD OF USING THE SAME

Bandwidth Calculation System and Method for Determining a Desired W...

Metrology Sensor, Lithographic Apparatus and Method for Manufacturi...

HOLLOW-CORE PHOTONIC CRYSTAL FIBER BASED OPTICAL COMPONENT FOR BROA...

POSITION SENSOR

OVERLAY METROLOGY TOOL AND METHODS OF PERFORMING OVERLAY MEASUREMENTS

High Stability Collimator Assembly, Lithographic Apparatus, and Method