Projection methods

Industry

CPC
H01J37/3175

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3175Projection methods

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems, devices, and methods for aligning a particle beam and perf...
- Patent number 12,020,897
- Issue date Jun 25, 2024
- PDF Solutions, Inc.
- Indranil De
- G01 - MEASURING TESTING
Information Patent Grant
Pattern formation method and template manufacturing method
- Patent number 11,862,430
- Issue date Jan 2, 2024
- Kioxia Corporation
- Ryota Seki
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Proximity effect correcting method, master plate manufacturing meth...
- Patent number 11,742,179
- Issue date Aug 29, 2023
- Kioxia Corporation
- Yoshinori Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focused ion beam processing apparatus
- Patent number 11,721,517
- Issue date Aug 8, 2023
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam lithography system
- Patent number 11,610,758
- Issue date Mar 21, 2023
- KKT HOLDINGS SYNDICATE
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems, devices, and methods for aligning a particle beam and perf...
- Patent number 11,605,526
- Issue date Mar 14, 2023
- PDF Solutions, Inc.
- Indranil De
- G01 - MEASURING TESTING
Information Patent Grant
Method for irradiating a target using restricted placement grids
- Patent number 11,569,064
- Issue date Jan 31, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle source module
- Patent number 11,557,455
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Laura Dinu-Gurtler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam lithography method based on ion beam lithography system
- Patent number 11,538,653
- Issue date Dec 27, 2022
- Beijing Normal University
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Memory device with predetermined start-up value
- Patent number 11,501,952
- Issue date Nov 15, 2022
- ASML Netherlands B.V.
- Marcel Nicolaas Jacobus Van Kervinck
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for aligning a particle beam and performing a non-contact e...
- Patent number 11,328,899
- Issue date May 10, 2022
- PDF Solutions, Inc.
- Indranil De
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam apparatus
- Patent number 11,315,752
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Peter Paul Hempenius
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-charged particle beam writing apparatus and multi-charged par...
- Patent number 11,270,865
- Issue date Mar 8, 2022
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for forming a pattern on a surface using multi-...
- Patent number 11,264,206
- Issue date Mar 1, 2022
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Adapting the duration of exposure slots in multi-beam writers
- Patent number 11,099,482
- Issue date Aug 24, 2021
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular parallel electron lithography
- Patent number 10,937,630
- Issue date Mar 2, 2021
- John Bennett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for projecting a beam of particles onto a substrate with cor...
- Patent number 10,923,319
- Issue date Feb 16, 2021
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Christophe Constancias
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi charged particle beam writing apparatus and multi charged par...
- Patent number 10,867,774
- Issue date Dec 15, 2020
- NuFlare Technology, Inc.
- Osamu Iizuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
E-beam apparatus
- Patent number 10,867,770
- Issue date Dec 15, 2020
- ASML Netherlands B.V.
- Peter Paul Hempenius
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Data processing method, charged particle beam writing apparatus, an...
- Patent number 10,714,312
- Issue date Jul 14, 2020
- NuFlare Technology, Inc.
- Kenichi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deflection scan speed adjustment during charged particle exposure
- Patent number 10,692,696
- Issue date Jun 23, 2020
- ASML Netherlands B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron beam resist composition
- Patent number 10,613,441
- Issue date Apr 7, 2020
- The University of Manchester
- Scott Lewis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for the correction of electron proximity effects
- Patent number 10,553,394
- Issue date Feb 4, 2020
- Aselta Nanographics
- Nader Jedidi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron flood lithography
- Patent number 10,529,537
- Issue date Jan 7, 2020
- Facebook Technologies, LLC
- Christopher Percival
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing method and charged particle beam writ...
- Patent number 10,460,909
- Issue date Oct 29, 2019
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position correction method of stage mechanism and charged particle...
- Patent number 10,345,724
- Issue date Jul 9, 2019
- NUFLARE TECHNOLOGY, INC.
- Rieko Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle lithography system
- Patent number 10,297,420
- Issue date May 21, 2019
- Mapper Lithography IP B.V.
- Teunis Van De Peut
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming a pattern on a surface using multi-be...
- Patent number 10,290,467
- Issue date May 14, 2019
- D2S, Inc.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus and positional displacement correcting meth...
- Patent number 10,236,160
- Issue date Mar 19, 2019
- NuFlare Technology, Inc.
- Noriaki Nakayamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam resist composition
- Patent number 10,234,764
- Issue date Mar 19, 2019
- The University of Manchester
- Scott Lewis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20240304414
- Publication date Sep 12, 2024
- PDF Solutions, Inc.
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD
- Publication number 20240087845
- Publication date Mar 14, 2024
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20230282444
- Publication date Sep 7, 2023
- PDF Solutions, Inc.
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMITTER FOR EMITTING CHARGED PARTICLES
- Publication number 20230154725
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE MODULE
- Publication number 20230154719
- Publication date May 18, 2023
- ASML NETHERLANDS B.V.
- Laura DINU-GURTLER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMORY DEVICE WITH PREDETERMINED START-UP VALUE
- Publication number 20230048507
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Marcel Nicolaas Jacobus VAN KERVINCK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20220336187
- Publication date Oct 20, 2022
- PDF Solutions, Inc.
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...
- Publication number 20220238303
- Publication date Jul 28, 2022
- KIOXIA Corporation
- Yoshinori KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHOD
- Publication number 20220051871
- Publication date Feb 17, 2022
- KIOXIA Corporation
- Ryota SEKI
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MODULAR PARALLEL ELECTRON LITHOGRAPHY
- Publication number 20210335572
- Publication date Oct 28, 2021
- John Bennett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM PROCESSING APPARATUS
- Publication number 20210296080
- Publication date Sep 23, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM LITHOGRAPHY METHOD BASED ON ION BEAM LITHOGRAPHY SYSTEM
- Publication number 20210183616
- Publication date Jun 17, 2021
- BEIJING NORMAL UNIVERSITY
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
E-BEAM APPARATUS
- Publication number 20210151282
- Publication date May 20, 2021
- Peter Paul HEMPENIUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...
- Publication number 20210098229
- Publication date Apr 1, 2021
- Indranil DE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Adapting the Duration of Exposure Slots in Multi-Beam Writers
- Publication number 20200348597
- Publication date Nov 5, 2020
- IMS Nanofabrication GmbH
- Gottfried Hochleitner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged Particle Beam Lithography System
- Publication number 20200227235
- Publication date Jul 16, 2020
- Tzu-Yi Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMORY DEVICE WITH PREDETERMINED START-UP VALUE
- Publication number 20200203125
- Publication date Jun 25, 2020
- ASML NETHERLANDS B.V.
- Marcel Nicolaas Jacobus VAN KERVINCK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR FORMING A PATTERN ON A SURFACE USING MULTI-...
- Publication number 20200051781
- Publication date Feb 13, 2020
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE SOURCE MODULE
- Publication number 20200043693
- Publication date Feb 6, 2020
- ASML NETHERLANDS B.V.
- Laura DINU-GURTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
E-BEAM APPARATUS
- Publication number 20190341224
- Publication date Nov 7, 2019
- ASML Netherlands B.V.
- Peter Paul HEMPENIUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM RESIST COMPOSITION
- Publication number 20190324370
- Publication date Oct 24, 2019
- The University of Manchester
- Scott LEWIS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...
- Publication number 20190304747
- Publication date Oct 3, 2019
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Christophe CONSTANCIAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR FORMING A PATTERN ON A SURFACE USING MULTI-B...
- Publication number 20190237299
- Publication date Aug 1, 2019
- D2S, INC.
- Akira Fujimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Irradiating a Target Using Restricted Placement Grids
- Publication number 20190088448
- Publication date Mar 21, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20190035603
- Publication date Jan 31, 2019
- NuFlare Technology, Inc.
- Osamu IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA PROCESSING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AN...
- Publication number 20180366297
- Publication date Dec 20, 2018
- NuFlare Technology, Inc.
- Kenichi YASUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...
- Publication number 20180358203
- Publication date Dec 13, 2018
- NuFlare Technology, Inc.
- Hirofumi MORITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...
- Publication number 20180269034
- Publication date Sep 20, 2018
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM APPARATUS AND POSITIONAL DISPLACEMENT CORRECTING METH...
- Publication number 20180090298
- Publication date Mar 29, 2018
- NuFlare Technology, Inc.
- Noriaki NAKAYAMADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING PATTERNS BY ION IMPLANTATION
- Publication number 20170352522
- Publication date Dec 7, 2017
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Stefan LANDIS
- H01 - BASIC ELECTRIC ELEMENTS

Projection methods

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems, devices, and methods for aligning a particle beam and perf...

Pattern formation method and template manufacturing method

Proximity effect correcting method, master plate manufacturing meth...

Focused ion beam processing apparatus

Charged particle beam lithography system

Systems, devices, and methods for aligning a particle beam and perf...

Method for irradiating a target using restricted placement grids

Charged particle source module

Ion beam lithography method based on ion beam lithography system

Memory device with predetermined start-up value

Methods for aligning a particle beam and performing a non-contact e...

E-beam apparatus

Multi-charged particle beam writing apparatus and multi-charged par...

Methods and systems for forming a pattern on a surface using multi-...

Adapting the duration of exposure slots in multi-beam writers

Modular parallel electron lithography

Method for projecting a beam of particles onto a substrate with cor...

Multi charged particle beam writing apparatus and multi charged par...

E-beam apparatus

Data processing method, charged particle beam writing apparatus, an...

Deflection scan speed adjustment during charged particle exposure

Electron beam resist composition

Method for the correction of electron proximity effects

Electron flood lithography

Charged particle beam writing method and charged particle beam writ...

Position correction method of stage mechanism and charged particle...

Charged particle lithography system

Method and system for forming a pattern on a surface using multi-be...

Electron beam apparatus and positional displacement correcting meth...

Electron beam resist composition

Patents Applicationslast 30 patents

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

EMITTER FOR EMITTING CHARGED PARTICLES

CHARGED PARTICLE SOURCE MODULE

MEMORY DEVICE WITH PREDETERMINED START-UP VALUE

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...

PATTERN FORMATION METHOD AND TEMPLATE MANUFACTURING METHOD

MODULAR PARALLEL ELECTRON LITHOGRAPHY

FOCUSED ION BEAM PROCESSING APPARATUS

ION BEAM LITHOGRAPHY METHOD BASED ON ION BEAM LITHOGRAPHY SYSTEM

E-BEAM APPARATUS

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERF...

Adapting the Duration of Exposure Slots in Multi-Beam Writers

Charged Particle Beam Lithography System

MEMORY DEVICE WITH PREDETERMINED START-UP VALUE

METHODS AND SYSTEMS FOR FORMING A PATTERN ON A SURFACE USING MULTI-...

CHARGED PARTICLE SOURCE MODULE

E-BEAM APPARATUS

ELECTRON BEAM RESIST COMPOSITION

METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...

METHOD AND SYSTEM FOR FORMING A PATTERN ON A SURFACE USING MULTI-B...

Method for Irradiating a Target Using Restricted Placement Grids

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

DATA PROCESSING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AN...

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PAR...

CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRIT...

ELECTRON BEAM APPARATUS AND POSITIONAL DISPLACEMENT CORRECTING METH...

METHOD FOR PRODUCING PATTERNS BY ION IMPLANTATION