providing an etching agent upon exposure

Industry

CPC
G03F7/0041

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0041providing an etching agent upon exposure

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Metal circuit structure based on FPC and method of making the same
- Patent number 12,089,331
- Issue date Sep 10, 2024
- APLUS SEMICONDUCTOR TECHNOLOGIES CO., LTD.
- Cheng-Neng Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for manufacturing high-density neural probes having various...
- Patent number 11,846,882
- Issue date Dec 19, 2023
- Korea Institute of Science and Technology
- Maesoon Im
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Imprint apparatus and method of manufacturing article
- Patent number 11,740,554
- Issue date Aug 29, 2023
- Canon Kabushiki Kaisha
- Hiroshi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer composition, and method of forming patterns using...
- Patent number 11,698,587
- Issue date Jul 11, 2023
- Samsung SDI Co., Ltd.
- Shinhyo Bae
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Imprint apparatus and method of manufacturing article
- Patent number 11,650,496
- Issue date May 16, 2023
- Canon Kabushiki Kaisha
- Hiroshi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-resolution shadow masks
- Patent number 11,638,388
- Issue date Apr 25, 2023
- The Hong Kong University of Science and Technology
- Shoucheng Dong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Image differentiated multiplex assays
- Patent number 11,579,522
- Issue date Feb 14, 2023
- PLEXBIO CO., LTD.
- Dean Tsao
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Display substrate, method for preparing the same, and display device
- Patent number 11,327,401
- Issue date May 10, 2022
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Jian Tian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Hard-mask forming composition and method for manufacturing electron...
- Patent number 11,248,086
- Issue date Feb 15, 2022
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for figure correction of optical element by reactive ion etc...
- Patent number 11,163,237
- Issue date Nov 2, 2021
- The Institute of Optics and Electronics, The Chinese Academy of Science
- Zhiwei Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanoscale etching of light absorbing materials using light and an e...
- Patent number 11,073,764
- Issue date Jul 27, 2021
- Northeastern University
- Meni Wanunu
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Critical dimension uniformity
- Patent number 11,022,878
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Co. LTD
- Xi-Zong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for determining dimensional range of repairable d...
- Patent number 10,885,253
- Issue date Jan 5, 2021
- Coventor, Inc.
- Daniel Sobieski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photonically tuned etchant reactivity for wet etching
- Patent number 10,867,815
- Issue date Dec 15, 2020
- Tokyo Electron Limited
- Paul Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image differentiated multiplex assays
- Patent number 10,859,910
- Issue date Dec 8, 2020
- PLEXBIO CO., LTD.
- Dean Tsao
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method for forming a functionalised guide pattern for a graphoepita...
- Patent number 10,795,257
- Issue date Oct 6, 2020
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Raluca Tiron
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Critical dimension uniformity
- Patent number 10,495,970
- Issue date Dec 3, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Xi-Zong Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for providing lithography features on a substrate by self-a...
- Patent number 10,410,914
- Issue date Sep 10, 2019
- ASML Netherlands B.V.
- Sander Frederik Wuister
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Manufacturing method of metal component and manufacturing method of...
- Patent number 10,240,239
- Issue date Mar 26, 2019
- Seiko Epson Corporation
- Tomoyoshi Yamamura
- B32 - LAYERED PRODUCTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 10,217,635
- Issue date Feb 26, 2019
- Samsung Electronics Co., Ltd.
- Yong Seung Moon
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Touch sensor, manufacturing method thereof, and display device incl...
- Patent number 10,191,578
- Issue date Jan 29, 2019
- Samsung Display Co., Ltd.
- Young Do Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organic layer composition, organic layer, and method of forming pat...
- Patent number 10,066,057
- Issue date Sep 4, 2018
- Samsung SDI Co., Ltd.
- Yu-Shin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polarizer, method of manufacturing the polarizer and display panel...
- Patent number 10,048,418
- Issue date Aug 14, 2018
- Samsung Display Co., Ltd.
- Sung-Won Cho
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Test method for a redistribution layer
- Patent number 10,002,848
- Issue date Jun 19, 2018
- Powertech Technology Inc.
- Han-Wen Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for film formation, and pattern-forming method
- Patent number 9,958,781
- Issue date May 1, 2018
- JSR Corporation
- Yuushi Matsumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Main pole layer with at least two sacrificial layers and a gap layer
- Patent number 9,922,671
- Issue date Mar 20, 2018
- Seagate Technology LLC
- Wei Tian
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Wire grid polarizer and method of fabricating the same
- Patent number 9,903,991
- Issue date Feb 27, 2018
- Samsung Display Co., Ltd.
- Eun Ae Kwak
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Imprint template and methods thereof
- Patent number 9,905,259
- Issue date Feb 27, 2018
- Seagate Technology LLC
- Sundeep Chauhan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alcohol compound and method for producing same, method for producin...
- Patent number 9,823,563
- Issue date Nov 21, 2017
- Mitsubishi Chemical Corporation
- Satoshi Sakuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sequential infiltration synthesis for advanced lithography
- Patent number 9,786,511
- Issue date Oct 10, 2017
- UChicago Argonne, LLC
- Seth B. Darling
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Wafer Edge Protection Film Forming Method, Patterning Process, And...
- Publication number 20240087905
- Publication date Mar 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Resist Underlayer Film Material, Patterning Process, And Method For...
- Publication number 20230400770
- Publication date Dec 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTO...
- Publication number 20230384668
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATT...
- Publication number 20230305405
- Publication date Sep 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20230168585
- Publication date Jun 1, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DEVICES AND METHODS FOR MANUFACTURING THE OPTICAL DEVICES
- Publication number 20230152708
- Publication date May 18, 2023
- II-VI Delaware, Inc.
- Christoph M. GREINER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING A PATTERN
- Publication number 20230130385
- Publication date Apr 27, 2023
- TOKYO ELECTRON LIMITED
- Takahiro YONEZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR...
- Publication number 20230130025
- Publication date Apr 27, 2023
- Samsung SDI Co., Ltd.
- Cha Won KOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...
- Publication number 20230021469
- Publication date Jan 26, 2023
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTO...
- Publication number 20220365427
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metal Circuit Structure Based on FPC and Method of Making the Same
- Publication number 20220361336
- Publication date Nov 10, 2022
- Aplus Semiconductor Technologies Co., Ltd.
- Cheng-Neng Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND PATTERN FORMING METHOD
- Publication number 20220334489
- Publication date Oct 20, 2022
- Samsung SDI Co., Ltd.
- Jaebum LIM
- C07 - ORGANIC CHEMISTRY
Information Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
- Publication number 20220308449
- Publication date Sep 29, 2022
- FUJIFILM CORPORATION
- Toru TSUCHIHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron Beam Lithography With a Bilayer Resist
- Publication number 20220137510
- Publication date May 5, 2022
- The Boeing Company
- Antonio Mei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nanoscale Etching of Light Absorbing Materials using Light and an E...
- Publication number 20210405533
- Publication date Dec 30, 2021
- Meni Wanunu
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
HIGH-RESOLUTION SHADOW MASKS
- Publication number 20210359210
- Publication date Nov 18, 2021
- THE HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Shoucheng DONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Production of Three-Dimensional Structures by Means of Photoresists
- Publication number 20210341835
- Publication date Nov 4, 2021
- Laser Imaging Systems GmbH
- Jens THEIS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH-DENSITY NEURAL PROBES HAVING VARIOUS FORMS AND METHODS FOR MAN...
- Publication number 20210240076
- Publication date Aug 5, 2021
- Korea Institute of Science and Technology
- MaeSoon IM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND RESIST LAMINATE FOR ORGANIC SOLVENT DEVE...
- Publication number 20210200098
- Publication date Jul 1, 2021
- FUJIFILM CORPORATION
- Wataru NIHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20210109449
- Publication date Apr 15, 2021
- Samsung SDI Co., Ltd.
- Seunghyun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
- Publication number 20210047457
- Publication date Feb 18, 2021
- Mitsubishi Gas Chemical Company, Inc.
- Masatoshi ECHIGO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CURABLE COMPOSITION FOR IMPRINTING, RELEASE AGENT, CURED PRODUCT, P...
- Publication number 20210018833
- Publication date Jan 21, 2021
- FUJIFILM CORPORATION
- Yuichiro GOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR FIGURE CORRECTION OF OPTICAL ELEMENT BY REACTIVE ION ETC...
- Publication number 20200401051
- Publication date Dec 24, 2020
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Zhiwei LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...
- Publication number 20200356001
- Publication date Nov 12, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Tomas Marangoni
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR DETERMINING DIMENSIONAL RANGE OF REPAIRABLE D...
- Publication number 20200134117
- Publication date Apr 30, 2020
- Coventor, Inc.
- Daniel Sobieski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20200117084
- Publication date Apr 16, 2020
- Canon Kabushiki Kaisha
- Hiroshi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTONICALLY TUNED ETCHANT REACTIVITY FOR WET ETCHING
- Publication number 20200075358
- Publication date Mar 5, 2020
- TOKYO ELECTRON LIMITED
- Paul ABEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Display Substrate, Method for Preparing the Same, and Display Device
- Publication number 20200057374
- Publication date Feb 20, 2020
- HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD
- Jian Tian
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CRITICAL DIMENSION UNIFORMITY
- Publication number 20200050103
- Publication date Feb 13, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- XI-ZONG CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20190377262
- Publication date Dec 12, 2019
- Samsung SDI Co., Ltd.
- Shinhyo BAE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

providing an etching agent upon exposure

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metal circuit structure based on FPC and method of making the same

Methods for manufacturing high-density neural probes having various...

Imprint apparatus and method of manufacturing article

Resist underlayer composition, and method of forming patterns using...

Imprint apparatus and method of manufacturing article

High-resolution shadow masks

Image differentiated multiplex assays

Display substrate, method for preparing the same, and display device

Hard-mask forming composition and method for manufacturing electron...

Method for figure correction of optical element by reactive ion etc...

Nanoscale etching of light absorbing materials using light and an e...

Critical dimension uniformity

System and method for determining dimensional range of repairable d...

Photonically tuned etchant reactivity for wet etching

Image differentiated multiplex assays

Method for forming a functionalised guide pattern for a graphoepita...

Critical dimension uniformity

Methods for providing lithography features on a substrate by self-a...

Manufacturing method of metal component and manufacturing method of...

Method of manufacturing semiconductor device

Touch sensor, manufacturing method thereof, and display device incl...

Organic layer composition, organic layer, and method of forming pat...

Polarizer, method of manufacturing the polarizer and display panel...

Test method for a redistribution layer

Method for film formation, and pattern-forming method

Main pole layer with at least two sacrificial layers and a gap layer

Wire grid polarizer and method of fabricating the same

Imprint template and methods thereof

Alcohol compound and method for producing same, method for producin...

Sequential infiltration synthesis for advanced lithography

Patents Applicationslast 30 patents

Wafer Edge Protection Film Forming Method, Patterning Process, And...

Resist Underlayer Film Material, Patterning Process, And Method For...

PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTO...

COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATT...

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

OPTICAL DEVICES AND METHODS FOR MANUFACTURING THE OPTICAL DEVICES

METHOD FOR FORMING A PATTERN

PHOTORESIST COMPOSITIONS AND METHODS FOR FABRICATING SEMICONDUCTOR...

RESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING TH...

PHOTORESIST COMPOSITION AND METHOD FOR MANUFACTURING A SEMICONDUCTO...

Metal Circuit Structure Based on FPC and Method of Making the Same

HARDMASK COMPOSITION, HARDMASK LAYER, AND PATTERN FORMING METHOD

TREATMENT LIQUID AND PATTERN FORMING METHOD

Electron Beam Lithography With a Bilayer Resist

Nanoscale Etching of Light Absorbing Materials using Light and an E...

HIGH-RESOLUTION SHADOW MASKS

Production of Three-Dimensional Structures by Means of Photoresists

HIGH-DENSITY NEURAL PROBES HAVING VARIOUS FORMS AND METHODS FOR MAN...

PATTERN FORMING METHOD AND RESIST LAMINATE FOR ORGANIC SOLVENT DEVE...

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD

CURABLE COMPOSITION FOR IMPRINTING, RELEASE AGENT, CURED PRODUCT, P...

METHOD FOR FIGURE CORRECTION OF OPTICAL ELEMENT BY REACTIVE ION ETC...

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING RESIST PATTERNS WIT...

SYSTEM AND METHOD FOR DETERMINING DIMENSIONAL RANGE OF REPAIRABLE D...

IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE

PHOTONICALLY TUNED ETCHANT REACTIVITY FOR WET ETCHING

Display Substrate, Method for Preparing the Same, and Display Device

CRITICAL DIMENSION UNIFORMITY

RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...