Proximity effect correction

Industry

CPC
H01J2237/31769

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31769Proximity effect correction

Industries

Patents Grantslast 30 patents

Information Patent Grant
Proximity effect correction in electron beam lithography
- Patent number 11,899,373
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Proximity effect correcting method, master plate manufacturing meth...
- Patent number 11,742,179
- Issue date Aug 29, 2023
- Kioxia Corporation
- Yoshinori Kagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for irradiating a target using restricted placement grids
- Patent number 11,569,064
- Issue date Jan 31, 2023
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Proximity effect correction in electron beam lithography
- Patent number 11,556,058
- Issue date Jan 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 11,276,558
- Issue date Mar 15, 2022
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias correction for lithography
- Patent number 11,126,085
- Issue date Sep 21, 2021
- D2S, Inc.
- Harold Robert Zable
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing photomasks and method of manufacturing semi...
- Patent number 10,963,614
- Issue date Mar 30, 2021
- Samsung Electronics Co., Ltd.
- Jeonglim Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for projecting a beam of particles onto a substrate with cor...
- Patent number 10,923,319
- Issue date Feb 16, 2021
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Christophe Constancias
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of pattern data preparation and method of forming pattern in...
- Patent number 10,861,673
- Issue date Dec 8, 2020
- United Microelectronics Corp.
- Chien-Ying Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 10,811,225
- Issue date Oct 20, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,796,882
- Issue date Oct 6, 2020
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,747,115
- Issue date Aug 18, 2020
- Intel Corporation
- Yan A. Borodovsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bias correction for lithography
- Patent number 10,725,383
- Issue date Jul 28, 2020
- D25, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure apparatus and exposure method, lithography method, and dev...
- Patent number 10,658,157
- Issue date May 19, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G02 - OPTICS
Information Patent Grant
Calibration of elementary small patterns in variable-shaped-beam el...
- Patent number 10,573,492
- Issue date Feb 25, 2020
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Aurélien Fay
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of performing dose modulation, in particular for electron be...
- Patent number 10,522,328
- Issue date Dec 31, 2019
- Aselta Nanographics
- Mohamed Saib
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of creating writing data
- Patent number 10,503,860
- Issue date Dec 10, 2019
- NuFlare Technology, Inc.
- Shigehiro Hara
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for acquiring parameter for dose correction of charged parti...
- Patent number 10,488,760
- Issue date Nov 26, 2019
- NuFlare Technology, Inc.
- Haruyuki Nomura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number RE47707
- Issue date Nov 5, 2019
- NuFlare Technology, Inc.
- Yasuo Kato
Information Patent Grant
Bias correction for lithography
- Patent number 10,444,629
- Issue date Oct 15, 2019
- D2S, Inc.
- Harold Robert Zable
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 10,431,423
- Issue date Oct 1, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,381,194
- Issue date Aug 13, 2019
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Advanced dose-level quantization of multibeam-writers
- Patent number 10,325,757
- Issue date Jun 18, 2019
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining the parameters of an IC manufacturing proces...
- Patent number 10,295,912
- Issue date May 21, 2019
- Aselta Nanographics
- Mohamed Saib
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,199,200
- Issue date Feb 5, 2019
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross scan proximity correction with ebeam universal cutter
- Patent number 10,191,376
- Issue date Jan 29, 2019
- Intel Corporation
- Yan A. Borodovsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating an integrated circuit with a pattern density-...
- Patent number 10,170,276
- Issue date Jan 1, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography method with combined optimization of the radiated energ...
- Patent number 10,157,728
- Issue date Dec 18, 2018
- Aselta Nanographics
- Charles Tiphine
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and system for forming a pattern on a reticle using charged...
- Patent number 10,101,648
- Issue date Oct 16, 2018
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi charged particle beam writing method, and multi charged parti...
- Patent number 10,020,165
- Issue date Jul 10, 2018
- NuFlare Technology, Inc.
- Hiroshi Matsumoto
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
- Publication number 20230375941
- Publication date Nov 23, 2023
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Wen Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...
- Publication number 20230290608
- Publication date Sep 14, 2023
- NuFlare Technology, Inc.
- Haruyuki NOMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
- Publication number 20230168589
- Publication date Jun 1, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...
- Publication number 20220238303
- Publication date Jul 28, 2022
- KIOXIA Corporation
- Yoshinori KAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING PHOTOMASKS AND METHOD OF MANUFACTURING SEMI...
- Publication number 20210019466
- Publication date Jan 21, 2021
- Samsung Electronics Co., Ltd.
- JEONGLIM KIM
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BIAS CORRECTION FOR LITHOGRAPHY
- Publication number 20200341380
- Publication date Oct 29, 2020
- D2S, INC.
- Harold Robert Zable
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND EXPOSURE METHOD, LITHOGRAPHY METHOD, AND DEV...
- Publication number 20200251306
- Publication date Aug 6, 2020
- Nikon Corporation
- Yuichi Shibazaki
- G02 - OPTICS
Information Patent Application
PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
- Publication number 20200133139
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen LO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...
- Publication number 20200027699
- Publication date Jan 23, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...
- Publication number 20190304747
- Publication date Oct 3, 2019
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Christophe CONSTANCIAS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190304748
- Publication date Oct 3, 2019
- NuFlare Technology, Inc.
- Ryoichi Yoshikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...
- Publication number 20190214227
- Publication date Jul 11, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jyuh-Fuh LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190122857
- Publication date Apr 25, 2019
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER
- Publication number 20190121236
- Publication date Apr 25, 2019
- Intel Corporation
- YAN A. BORODOVSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Advanced Dose-Level Quantization for Multibeam-Writers
- Publication number 20180218879
- Publication date Aug 2, 2018
- IMS Nanofabrication GmbH
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PERFORMING DOSE MODULATION, IN PARTICULAR FOR ELECTRON BE...
- Publication number 20180204707
- Publication date Jul 19, 2018
- ASELTA NANOGRAPHICS
- Mohamed SAIB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20180061614
- Publication date Mar 1, 2018
- NuFlare Technology, Inc.
- Yasuo Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and System for Forming a Pattern on a Reticle Using Charged...
- Publication number 20170322485
- Publication date Nov 9, 2017
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCES...
- Publication number 20170168401
- Publication date Jun 15, 2017
- ASELTA NANOGRAPHICS
- Mohamed SAIB
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY...
- Publication number 20140180462
- Publication date Jun 26, 2014
- ASELTA NANOGRAPHICS
- Jerome BELLEDENT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM D...
- Publication number 20140138527
- Publication date May 22, 2014
- NuFlare Technology, Inc.
- Yasuo KATO
- B82 - NANO-TECHNOLOGY
Information Patent Application
MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...
- Publication number 20140114634
- Publication date Apr 24, 2014
- Synopsys, Inc.
- Hua Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Smart Subfield Method For E-Beam Lithographny
- Publication number 20140099582
- Publication date Apr 10, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROVIDING ELECRON BEAM PROXIMITY EFFECT CORRECTION BY SIMULATING WR...
- Publication number 20140033144
- Publication date Jan 30, 2014
- Hung-Chun Wang
- B82 - NANO-TECHNOLOGY
Information Patent Application
Data Process for E-Beam Lithography
- Publication number 20140023972
- Publication date Jan 23, 2014
- Cheng-Hung Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SMART SUBFIELD METHOD FOR E-BEAM LITHOGRAPHY
- Publication number 20130323648
- Publication date Dec 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Shiang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and System for Forming Non-Manhattan Patterns Using Variable...
- Publication number 20130306884
- Publication date Nov 21, 2013
- D2S, INC.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20130288181
- Publication date Oct 31, 2013
- Canon Kabushiki Kaisha
- Yusuke Sugiyama
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF CORRECTING ELECTRON PROXIMITY EFFECTS USING VOIGT TYPE SC...
- Publication number 20130275098
- Publication date Oct 17, 2013
- Jean-Herve TORTAI
- B82 - NANO-TECHNOLOGY
Information Patent Application
CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS, INSPECTION APPARATUS A...
- Publication number 20130264478
- Publication date Oct 10, 2013
- NuFlare Technology, Inc.
- Shigehiro HARA
- G01 - MEASURING TESTING

Proximity effect correction

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Proximity effect correction in electron beam lithography

Proximity effect correcting method, master plate manufacturing meth...

Method for irradiating a target using restricted placement grids

Proximity effect correction in electron beam lithography

Exposure apparatus and exposure method, lithography method, and dev...

Bias correction for lithography

Method of manufacturing photomasks and method of manufacturing semi...

Method for projecting a beam of particles onto a substrate with cor...

Method of pattern data preparation and method of forming pattern in...

Method of fabricating an integrated circuit with a pattern density-...

Charged particle beam writing apparatus and charged particle beam w...

Cross scan proximity correction with ebeam universal cutter

Bias correction for lithography

Exposure apparatus and exposure method, lithography method, and dev...

Calibration of elementary small patterns in variable-shaped-beam el...

Method of performing dose modulation, in particular for electron be...

Method of creating writing data

Method for acquiring parameter for dose correction of charged parti...

Charged particle beam writing apparatus and charged particle beam w...

Bias correction for lithography

Method of fabricating an integrated circuit with a pattern density-...

Charged particle beam writing apparatus and charged particle beam w...

Advanced dose-level quantization of multibeam-writers

Method for determining the parameters of an IC manufacturing proces...

Charged particle beam writing apparatus and charged particle beam w...

Cross scan proximity correction with ebeam universal cutter

Method of fabricating an integrated circuit with a pattern density-...

Lithography method with combined optimization of the radiated energ...

Method and system for forming a pattern on a reticle using charged...

Multi charged particle beam writing method, and multi charged parti...

Patents Applicationslast 30 patents

PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY

CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING...

PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY

PROXIMITY EFFECT CORRECTING METHOD, MASTER PLATE MANUFACTURING METH...

METHOD OF MANUFACTURING PHOTOMASKS AND METHOD OF MANUFACTURING SEMI...

BIAS CORRECTION FOR LITHOGRAPHY

EXPOSURE APPARATUS AND EXPOSURE METHOD, LITHOGRAPHY METHOD, AND DEV...

PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY

METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...

METHOD FOR PROJECTING A BEAM OF PARTICLES ONTO A SUBSTRATE WITH COR...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

METHOD OF FABRICATING AN INTEGRATED CIRCUIT WITH A PATTERN DENSITY-...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CROSS SCAN PROXIMITY CORRECTION WITH EBEAM UNIVERSAL CUTTER

Advanced Dose-Level Quantization for Multibeam-Writers

METHOD OF PERFORMING DOSE MODULATION, IN PARTICULAR FOR ELECTRON BE...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

Method and System for Forming a Pattern on a Reticle Using Charged...

METHOD FOR DETERMINING THE PARAMETERS OF AN IC MANUFACTURING PROCES...

METHOD FOR ESTIMATING PATTERNS TO BE PRINTED ON A PLATE OR MASK BY...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM D...

MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...

Smart Subfield Method For E-Beam Lithographny

PROVIDING ELECRON BEAM PROXIMITY EFFECT CORRECTION BY SIMULATING WR...

Data Process for E-Beam Lithography

SMART SUBFIELD METHOD FOR E-BEAM LITHOGRAPHY

Method and System for Forming Non-Manhattan Patterns Using Variable...

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

METHOD OF CORRECTING ELECTRON PROXIMITY EFFECTS USING VOIGT TYPE SC...

CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS, INSPECTION APPARATUS A...