Radio frequency generated discharge

Industry

CPC
H01J37/32082

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32082Radio frequency generated discharge

Industries

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Patents Grantslast 30 patents

Information Patent Grant
RF sputtering apparatus for controlling atomic layer of thin film
- Patent number 12,180,578
- Issue date Dec 31, 2024
- Pusan National University Industry-University Cooperation Foundation
- Se Young Jeong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,552
- Issue date Dec 31, 2024
- KELK Ltd.
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer treatment system and method of treating wafer
- Patent number 12,183,550
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Po Hsun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber and methods of treating a substrate after exposure to radia...
- Patent number 12,181,801
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activa...
- Patent number 12,180,586
- Issue date Dec 31, 2024
- NanoMaster, Inc.
- Birol Kuyel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas transport system
- Patent number 12,173,736
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jheng-Syun Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for advanced ion control for etching processes
- Patent number 12,165,872
- Issue date Dec 10, 2024
- Lam Research Corporation
- Zhongkui Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for plasma processing apparatus and plasma processing app...
- Patent number 12,165,850
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Takaki Kobune
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method
- Patent number 12,154,792
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Takayuki Katsunuma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for releasing sample
- Patent number 12,148,633
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric plasma source to generate pie-shaped treatment
- Patent number 12,142,458
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Anantha K. Subramani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck with seal surface
- Patent number 12,142,509
- Issue date Nov 12, 2024
- Lam Research Corporation
- Patrick G. Breiling
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chuck for plasma processing chamber
- Patent number 12,131,890
- Issue date Oct 29, 2024
- Lam Research Corporation
- Ann Erickson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated epitaxy and preclean system
- Patent number 12,125,698
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Lara Hawrylchak
- B08 - CLEANING
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 12,125,672
- Issue date Oct 22, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for toroidal plasma generation
- Patent number 12,125,689
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,119,211
- Issue date Oct 15, 2024
- ASM IP Holding B.V.
- ChangMin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support device
- Patent number 12,119,212
- Issue date Oct 15, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Switching circuit
- Patent number 12,119,206
- Issue date Oct 15, 2024
- ASM AMERICA, INC.
- Anton Mavretic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,112,925
- Issue date Oct 8, 2024
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of using dual frequency RF power in a process chamber
- Patent number 12,106,958
- Issue date Oct 1, 2024
- Applied Materials, Inc.
- Anup Kumar Singh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Liner, reaction chamber and semiconductor processing equipment
- Patent number 12,106,934
- Issue date Oct 1, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Jinrong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chucking process
- Patent number 12,100,609
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Sarah Michelle Bobek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High power ion beam generator systems and methods
- Patent number 12,101,870
- Issue date Sep 24, 2024
- SHINE Technologies, LLC
- Arne Kobernik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 12,100,578
- Issue date Sep 24, 2024
- Tokyo Electron Limited
- Sho Kumakura
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 12,094,752
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,094,687
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Masayuki Shiina
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of three-dimensional semiconductor device
- Patent number 12,094,781
- Issue date Sep 17, 2024
- HITACHI HIGH-TECH CORPORATION
- Makoto Miura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for disinfection of healthcare personal protectiv...
- Patent number 12,090,240
- Issue date Sep 17, 2024
- MagPlasma, Inc.
- Martin E. Toomajian
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20240429088
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY
- Publication number 20240404834
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CLEANING PLASMA CHAMBERS
- Publication number 20240395513
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Adrien LAVOIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER TREATMENT SYSTEM AND METHOD OF TREATING WAFER
- Publication number 20240387146
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Po Hsun CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF MANUFACTURING INTERCONNECT STRUCTURES
- Publication number 20240384408
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Ting TSAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DRY ETCHER UNIFORMITY CONTROL BY TUNING EDGE ZONE PLASMA SHEATH
- Publication number 20240387152
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Lung HUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION
- Publication number 20240387148
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Che Wei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING CAPACITOR STRUCTURE
- Publication number 20240387606
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Qinghui ZHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS OF SUBSTRATE PROCESSING AND METHODS OF MANUFACTURING SEMICO...
- Publication number 20240376600
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Cheng WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240379328
- Publication date Nov 14, 2024
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSI...
- Publication number 20240371613
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Muhannad Mustafa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM ETCH SYSTEM AND METHOD
- Publication number 20240355597
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Chih-Yang CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH POWER ION BEAM GENERATOR SYSTEMS AND METHODS
- Publication number 20240357728
- Publication date Oct 24, 2024
- SHINE Technologies, LLC
- Arne KOBERNIK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PREFIXING OF SUBSTRATES
- Publication number 20240355582
- Publication date Oct 24, 2024
- EV GROUP E. THALLNER GMBH
- Friedrich Paul Lindner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
- Publication number 20240355663
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240355584
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck and Method of Operation for Plasma Processing
- Publication number 20240355593
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Melvin Verbaas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240347327
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUS,...
- Publication number 20240339307
- Publication date Oct 10, 2024
- TOKYO ELECTRON LIMITED
- Yuya MINOURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20240321557
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Jiye KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240321550
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL A...
- Publication number 20240318312
- Publication date Sep 26, 2024
- LAM RESEARCH CORPORATION
- Rachel E. BATZER
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES
- Publication number 20240304495
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Tsung-Han Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM
- Publication number 20240304426
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Sheng-chun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING AN ETCH LAYER
- Publication number 20240297050
- Publication date Sep 5, 2024
- LAM RESEARCH CORPORATION
- Nikhil Dole
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN-CHAMBER LOW-PROFILE SENSOR ASSEMBLY
- Publication number 20240290640
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Chuang-Chia Lin
- G01 - MEASURING TESTING
Information Patent Application
Gas Distribution Plate with Enhanced Gas Hole Consistency and Exten...
- Publication number 20240290580
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Sam KIM
- H01 - BASIC ELECTRIC ELEMENTS

Radio frequency generated discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

RF sputtering apparatus for controlling atomic layer of thin film

Substrate processing apparatus

Wafer treatment system and method of treating wafer

Chamber and methods of treating a substrate after exposure to radia...

Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activa...

Gas transport system

Methods and systems for advanced ion control for etching processes

Plasma processing method for manufacturing semiconductor structure

Electrode for plasma processing apparatus and plasma processing app...

Plasma etching method

Plasma processing apparatus and method for releasing sample

Symmetric plasma source to generate pie-shaped treatment

Electrostatic chuck with seal surface

Chuck for plasma processing chamber

Integrated epitaxy and preclean system

Plasma processing method and plasma processing apparatus

Methods and apparatus for toroidal plasma generation

Substrate processing apparatus

Wafer support device

Switching circuit

Plasma processing apparatus

Method of using dual frequency RF power in a process chamber

Liner, reaction chamber and semiconductor processing equipment

Electrostatic chucking process

High power ion beam generator systems and methods

Substrate processing method

Wafer edge ring lifting solution

Plasma processing apparatus and plasma processing method

Manufacturing method of three-dimensional semiconductor device

Method and device for disinfection of healthcare personal protectiv...

Patents Applicationslast 30 patents

WAFER SUPPORT DEVICE

WAFER EDGE RING LIFTING SOLUTION

METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM

APPARATUS FOR CLEANING PLASMA CHAMBERS

WAFER TREATMENT SYSTEM AND METHOD OF TREATING WAFER

APPARATUS AND METHOD OF MANUFACTURING INTERCONNECT STRUCTURES

DRY ETCHER UNIFORMITY CONTROL BY TUNING EDGE ZONE PLASMA SHEATH

TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION

METHOD FOR MANUFACTURING CAPACITOR STRUCTURE

METHODS OF SUBSTRATE PROCESSING AND METHODS OF MANUFACTURING SEMICO...

PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS

HIGH-THROUGHPUT PLASMA LID FOR SEMICONDUCTOR MANUFACTURING PROCESSI...

Concentrated Solar Irradiation of Targets in Plasmas

ION BEAM ETCH SYSTEM AND METHOD

HIGH POWER ION BEAM GENERATOR SYSTEMS AND METHODS

METHOD FOR PREFIXING OF SUBSTRATES

ETCHING APPARATUS AND METHODS OF CLEANING THEREOF

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Electrostatic Chuck and Method of Operation for Plasma Processing

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

METHOD OF PERFORMING MAINTENANCE ON SUBSTRATE PROCESSING APPARATUS,...

APPARATUS FOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

PLASMA PROCESSING APPARATUS

INTEGRATED SHOWERHEAD WITH THERMAL CONTROL FOR DELIVERING RADICAL A...

HYDROGEN PLASMA TREATMENT FOR FORMING LOGIC DEVICES

RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM

METHOD FOR ETCHING AN ETCH LAYER

IN-CHAMBER LOW-PROFILE SENSOR ASSEMBLY

Gas Distribution Plate with Enhanced Gas Hole Consistency and Exten...