Radio frequency generated discharge

Industry

CPC
H01J37/32082

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32082Radio frequency generated discharge

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of performing maintenance on substrate processing apparatus
- Patent number 12,315,709
- Issue date May 27, 2025
- Tokyo Electron Limited
- Yuya Minoura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Core insertion type spiral tube and making method for the same
- Patent number 12,308,213
- Issue date May 20, 2025
- Hyun Seok Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate
- Patent number 12,308,214
- Issue date May 20, 2025
- Tes Co., Ltd.
- Bong-Soo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus having edge impedance control circuit
- Patent number 12,300,470
- Issue date May 13, 2025
- Semes Co., Ltd.
- Daehyun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,293,903
- Issue date May 6, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertically adjustable plasma source
- Patent number 12,288,677
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-frequency grounding device and vacuum valve having high-freque...
- Patent number 12,283,469
- Issue date Apr 22, 2025
- VAT Holding AG
- Arthur Büchel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,272,526
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Tsukasa Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 12,266,511
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and cleaning method
- Patent number 12,261,024
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Wataru Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Protection system for switches in direct drive circuits of substrat...
- Patent number 12,261,029
- Issue date Mar 25, 2025
- Lam Research Corporation
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for plasma processing apparatus
- Patent number 12,261,073
- Issue date Mar 25, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nano-coating protection method for electrical devices
- Patent number 12,252,789
- Issue date Mar 18, 2025
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,255,049
- Issue date Mar 18, 2025
- Tokyo Electron Limited
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treating apparatus and substrate support unit
- Patent number 12,249,491
- Issue date Mar 11, 2025
- Semes Co., Ltd.
- Hyoungkyu Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,716
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature RF connection with integral thermal choke
- Patent number 12,243,725
- Issue date Mar 4, 2025
- Lam Research Corporation
- Timothy S. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,243,723
- Issue date Mar 4, 2025
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanosecond pulser ADC system
- Patent number 12,230,477
- Issue date Feb 18, 2025
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching method and plasma etching apparatus
- Patent number 12,230,504
- Issue date Feb 18, 2025
- Kioxia Corporation
- Junji Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conditioning of a processing chamber
- Patent number 12,221,694
- Issue date Feb 11, 2025
- Applied Materials, Inc.
- Pramit Manna
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of etching film and plasma processing apparatus
- Patent number 12,217,973
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Kosuke Ogasawara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for etching features using a targeted deposition for selecti...
- Patent number 12,217,955
- Issue date Feb 4, 2025
- Lam Research Corporation
- Wenchi Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, and substrate treatme...
- Patent number 12,217,946
- Issue date Feb 4, 2025
- ASM IP Holding B.V.
- Taku Omori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shutter disc for a semiconductor processing tool
- Patent number 12,215,414
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Lin Wang
- B08 - CLEANING
Information Patent Grant
Semiconductor processing chamber to accommodate parasitic plasma fo...
- Patent number 12,205,845
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Khokan Chandra Paul
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activa...
- Patent number 12,195,850
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and processes for producing fixed-nitrogen compounds
- Patent number 12,186,728
- Issue date Jan 7, 2025
- Nitricity Inc.
- Joshua Michael McEnaney
- C05 - FERTILISERS MANUFACTURE THEREOF
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,124
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,552
- Issue date Dec 31, 2024
- KELK Ltd.
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONDITIONING OF A PROCESSING CHAMBER
- Publication number 20250179629
- Publication date Jun 5, 2025
- Applied Materials, Inc.
- Pramit MANNA
- B08 - CLEANING
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT
- Publication number 20250166977
- Publication date May 22, 2025
- SEMES CO., LTD.
- HYOUNGKYU SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...
- Publication number 20250149330
- Publication date May 8, 2025
- LAM RESEARCH CORPORATION
- Wenchi LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL
- Publication number 20250137114
- Publication date May 1, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Lin WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE TREATME...
- Publication number 20250132140
- Publication date Apr 24, 2025
- ASM IP HOLDING B.V.
- Taku OMORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250132136
- Publication date Apr 24, 2025
- TOKYO ELECTRON LIMITED
- Hajime TAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PROCESSING SUBSTRATE
- Publication number 20250122611
- Publication date Apr 17, 2025
- TES CO., LTD.
- Sungwoo LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20250104967
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- CHANGBAE PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Source and Plasma Processing Apparatus
- Publication number 20250104977
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Taro IKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS TRANSPORT SYSTEM
- Publication number 20250092892
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jheng-Syun LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT TABLE AND RF ROD
- Publication number 20250079235
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Tomohiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250069860
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lun KE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING SUBSTRATE
- Publication number 20250069856
- Publication date Feb 27, 2025
- Jusung Engineering Co., Ltd.
- Chul Joo HWANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK WITH SEAL SURFACE
- Publication number 20250062150
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Patrick Girard Breiling
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250062130
- Publication date Feb 20, 2025
- TOKYO ELECTRON LIMITED
- Yusuke TAKINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHOWERHEAD FACEPLATE CONFIGURATIONS
- Publication number 20250054734
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Bin LUO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...
- Publication number 20250054749
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Kent Zhao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA VESSEL CLEANING FOR ION BEAM SYSTEM
- Publication number 20250046586
- Publication date Feb 6, 2025
- VEECO INSTRUMENTS INC.
- Mohammad SAGHAYEZHIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20250037971
- Publication date Jan 30, 2025
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang NI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FILLING TRENCHES ON SUBSTRATE SURFACE
- Publication number 20250037994
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Yoshio Susa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION
- Publication number 20250029831
- Publication date Jan 23, 2025
- ASM IP HOLDING B.V.
- Tommi Tynell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE
- Publication number 20250014934
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA
- Publication number 20250014871
- Publication date Jan 9, 2025
- Samsung Electronics Co., Ltd.
- Sungwon CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250014863
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTU...
- Publication number 20250006488
- Publication date Jan 2, 2025
- NANYA TECHNOLOGY CORPORATION
- Chao-Hsiu LI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20240429088
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY
- Publication number 20240404834
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM
- Publication number 20240395502
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS

Radio frequency generated discharge

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method of performing maintenance on substrate processing apparatus

Core insertion type spiral tube and making method for the same

Method of processing substrate

Substrate treating apparatus having edge impedance control circuit

Substrate support and plasma processing apparatus

Vertically adjustable plasma source

High-frequency grounding device and vacuum valve having high-freque...

Substrate processing method and substrate processing apparatus

Substrate support and substrate processing apparatus

Plasma processing apparatus and cleaning method

Protection system for switches in direct drive circuits of substrat...

Electrostatic chuck assembly for plasma processing apparatus

Nano-coating protection method for electrical devices

Plasma processing apparatus and plasma processing method

Substrate treating apparatus and substrate support unit

Plasma processing apparatus

High temperature RF connection with integral thermal choke

Plasma processing apparatus

Nanosecond pulser ADC system

Plasma etching method and plasma etching apparatus

Conditioning of a processing chamber

Method of etching film and plasma processing apparatus

Method for etching features using a targeted deposition for selecti...

Method of manufacturing semiconductor device, and substrate treatme...

Shutter disc for a semiconductor processing tool

Semiconductor processing chamber to accommodate parasitic plasma fo...

Apparatus and methods for roll-to-roll (R2R) plasma enhanced/activa...

Systems and processes for producing fixed-nitrogen compounds

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Patents Applicationslast 30 patents

CONDITIONING OF A PROCESSING CHAMBER

SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT

METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...

SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE TREATME...

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

METHOD FOR PROCESSING SUBSTRATE

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

Plasma Source and Plasma Processing Apparatus

GAS TRANSPORT SYSTEM

WAFER SUPPORT TABLE AND RF ROD

PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

APPARATUS FOR PROCESSING SUBSTRATE

ELECTROSTATIC CHUCK WITH SEAL SURFACE

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

SHOWERHEAD FACEPLATE CONFIGURATIONS

RF PULSING ASSISTED LOW-K FILM DEPOSITION WITH HIGH MECHANICAL STRE...

PLASMA VESSEL CLEANING FOR ION BEAM SYSTEM

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

PLASMA PROCESSING DEVICE

METHODS OF FILLING TRENCHES ON SUBSTRATE SURFACE

PROCESS AND APPARATUS FOR RADICAL ENHANCED VAPOR DEPOSITION

BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE

SEMICONDUCTOR PROCESSING APPARATUS USING PLASMA

PLASMA PROCESSING APPARATUS

DEPOSITION DEVICE, SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTU...

WAFER SUPPORT DEVICE

WAFER EDGE RING LIFTING SOLUTION

METHODS AND SYSTEMS FOR IMPROVING PLASMA IGNITION STABILITY

FEEDBACK LOOP FOR CONTROLLING A PULSED VOLTAGE WAVEFORM