Reflection mask

Industry

CPC
H01J2237/31789

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31789Reflection mask

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for transferring pixel data for electron beam...
- Patent number 9,899,190
- Issue date Feb 20, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Linear Stage for reflective electron beam lithography
- Patent number 9,690,213
- Issue date Jun 27, 2017
- KLA-Tencor Corporation
- Upendra Ummethala
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror array in digital pattern generator (DPG)
- Patent number 9,690,208
- Issue date Jun 27, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Hsin Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dynamic pattern generator and method of toggling mirror cells of th...
- Patent number 9,679,747
- Issue date Jun 13, 2017
- Taiwan Semiconductor Manufacturing Company Ltd.
- Shao-Yu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bonding pad surface damage reduction in a formation of digital patt...
- Patent number 9,633,958
- Issue date Apr 25, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih Wei Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for aberration correction in electron beam ba...
- Patent number 9,607,802
- Issue date Mar 28, 2017
- KLA-Tencor Corporation
- Christopher F. Bevis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned dynamic pattern generator device and method of fabrica...
- Patent number 9,536,706
- Issue date Jan 3, 2017
- Corporation for National Research Initiatives
- Michael A. Huff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflection electron beam projection lithography using an ExB separator
- Patent number 9,355,818
- Issue date May 31, 2016
- KLA-Tencor Corporation
- Paul F. Petric
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Self-aligned dynamic pattern generator device and method of fabrica...
- Patent number 9,312,103
- Issue date Apr 12, 2016
- Corporation for National Research Initiatives
- Michael A. Huff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
E-beam lithography with alignment gating
- Patent number 9,269,537
- Issue date Feb 23, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Nan-Hsin Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for compressed data transmission in a maskless li...
- Patent number 9,245,714
- Issue date Jan 26, 2016
- KLA-Tencor Corporation
- Allen M. Carroll
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method and apparatus for electron beam lithography
- Patent number 9,245,708
- Issue date Jan 26, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Chi Che
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle lithography system with a long shape illumination...
- Patent number 9,202,662
- Issue date Dec 1, 2015
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jimmy Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for aberration correction in electron beam ba...
- Patent number 8,933,425
- Issue date Jan 13, 2015
- KLA-Tencor Corporation
- Christopher F. Bevis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Well-based dynamic pattern generator
- Patent number 8,253,119
- Issue date Aug 28, 2012
- KLA-Tencor Corporation
- Alan D. Brodie
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mirror monochromator for charged particle beam apparatus
- Patent number 8,183,526
- Issue date May 22, 2012
- Electron Optica
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron reflector with multiple reflective modes
- Patent number 8,089,051
- Issue date Jan 3, 2012
- KLA-Tencor Corporation
- Luca Grella
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Non-shot-noise-limited source for electron beam lithography or insp...
- Patent number 8,063,365
- Issue date Nov 22, 2011
- KLA-Tencor Corporation
- Keith Standiford
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Reflective electron patterning device and method of using same
- Patent number 7,816,655
- Issue date Oct 19, 2010
- KLA-Tencor Technologies Corporation
- Harald F. Hess
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High-fidelity reflection electron beam lithography
- Patent number 7,692,167
- Issue date Apr 6, 2010
- KLA-Tencor Technologies Corporation
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for surface potential reflection electron mask...
- Patent number 7,592,612
- Issue date Sep 22, 2009
- International Business Machiens Corporation
- Rudolf M. Tromp
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Method and apparatus for surface potential reflection electron mask...
- Patent number 7,432,514
- Issue date Oct 7, 2008
- International Business Machines Corporation
- Rudolf M. Tromp
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Maskless reflection electron beam projection lithography
- Patent number 6,870,172
- Issue date Mar 22, 2005
- KLA-Tencor Technologies Corporation
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflection mask and electrically charged beam exposing apparatus us...
- Patent number 5,254,417
- Issue date Oct 19, 1993
- Kabushiki Kaisha Toshiba
- Hirotsugu Wada
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
E-Beam Lithography with Alignment Gating
- Publication number 20140272712
- Publication date Sep 18, 2014
- Nan-Hsin Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...
- Publication number 20140268076
- Publication date Sep 18, 2014
- Corporation for National Research Initiatives
- Michael A. HUFF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pattern Generator for a Lithography System
- Publication number 20140220494
- Publication date Aug 7, 2014
- Chen-Hua Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Lithography System With a Long Shape Illumination...
- Publication number 20140212815
- Publication date Jul 31, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jimmy Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Compressed Data Transmission in a Maskless Li...
- Publication number 20140097362
- Publication date Apr 10, 2014
- KLA-Tencor Corporation
- Allen M. Carroll
- B82 - NANO-TECHNOLOGY
Information Patent Application
DEVICES AND METHODS FOR IMPROVED REFLECTIVE ELECTRON BEAM LITHOGRAPHY
- Publication number 20130320225
- Publication date Dec 5, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Hua Yu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Linear Stage for Reflective Electron Beam Lithography
- Publication number 20130293865
- Publication date Nov 7, 2013
- KLA-Tencor Corporation
- Upendra Ummethala
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflection Electron Beam Projection Lithography Using an ExB Separator
- Publication number 20110291021
- Publication date Dec 1, 2011
- Paul F. PETRIC
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron Reflector With Multiple Reflective Modes
- Publication number 20110204251
- Publication date Aug 25, 2011
- Luca GRELLA
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD AND APPARATUS FOR SURFACE POTENTIAL REFLECTION ELECTRON MASK...
- Publication number 20080128634
- Publication date Jun 5, 2008
- Rudolf M. Tromp
- B82 - NANO-TECHNOLOGY
Information Patent Application
Exposure method, mask fabrication method, fabrication method of sem...
- Publication number 20060008712
- Publication date Jan 12, 2006
- Sony Corporation
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method, mask fabrication method, fabrication method of sem...
- Publication number 20040029024
- Publication date Feb 12, 2004
- Hidetoshi Ohnuma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for surface potential reflection electron mask...
- Publication number 20030183781
- Publication date Oct 2, 2003
- International Busines Machiness Corporation
- Rudolf M. Tromp
- B82 - NANO-TECHNOLOGY

Reflection mask

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for transferring pixel data for electron beam...

Linear Stage for reflective electron beam lithography

Mirror array in digital pattern generator (DPG)

Dynamic pattern generator and method of toggling mirror cells of th...

Bonding pad surface damage reduction in a formation of digital patt...

Apparatus and methods for aberration correction in electron beam ba...

Self-aligned dynamic pattern generator device and method of fabrica...

Reflection electron beam projection lithography using an ExB separator

Self-aligned dynamic pattern generator device and method of fabrica...

E-beam lithography with alignment gating

System and method for compressed data transmission in a maskless li...

Method and apparatus for electron beam lithography

Charged particle lithography system with a long shape illumination...

Apparatus and methods for aberration correction in electron beam ba...

Well-based dynamic pattern generator

Mirror monochromator for charged particle beam apparatus

Electron reflector with multiple reflective modes

Non-shot-noise-limited source for electron beam lithography or insp...

Reflective electron patterning device and method of using same

High-fidelity reflection electron beam lithography

Method and apparatus for surface potential reflection electron mask...

Method and apparatus for surface potential reflection electron mask...

Maskless reflection electron beam projection lithography

Reflection mask and electrically charged beam exposing apparatus us...

Patents Applicationslast 30 patents

E-Beam Lithography with Alignment Gating

SELF-ALIGNED DYNAMIC PATTERN GENERATOR DEVICE AND METHOD OF FABRICA...

Pattern Generator for a Lithography System

Charged Particle Lithography System With a Long Shape Illumination...

System and Method for Compressed Data Transmission in a Maskless Li...

DEVICES AND METHODS FOR IMPROVED REFLECTIVE ELECTRON BEAM LITHOGRAPHY

Linear Stage for Reflective Electron Beam Lithography

Reflection Electron Beam Projection Lithography Using an ExB Separator

Electron Reflector With Multiple Reflective Modes

METHOD AND APPARATUS FOR SURFACE POTENTIAL REFLECTION ELECTRON MASK...

Exposure method, mask fabrication method, fabrication method of sem...

Exposure method, mask fabrication method, fabrication method of sem...

Method and apparatus for surface potential reflection electron mask...