Reflectors

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CPC
G03F1/52

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/52Reflectors

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 12,216,398
- Issue date Feb 4, 2025
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Glass substrate for EUVL, manufacturing method thereof, mask blank...
- Patent number 12,209,046
- Issue date Jan 28, 2025
- AGC Inc.
- Takuma Nara
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Extreme ultraviolet mask with reduced wafer neighboring effect
- Patent number 12,130,548
- Issue date Oct 29, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask and method of forming the same
- Patent number 12,066,757
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,134
- Issue date Jun 4, 2024
- AGC Inc.
- Yuya Nagata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protection layer on low thermal expansion material (LTEM) substrate...
- Patent number 12,001,132
- Issue date Jun 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
- Patent number 12,001,133
- Issue date Jun 4, 2024
- AGC Inc.
- Takuma Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank for EUV lithography
- Patent number 11,982,935
- Issue date May 14, 2024
- AGC Inc.
- Hirotomo Kawahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and method of fabricating a photomask
- Patent number 11,982,936
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,914,283
- Issue date Feb 27, 2024
- AGC Inc.
- Hiroyoshi Tanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography mask with a porous reflective multilayer structure
- Patent number 11,809,075
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for repairing defects of a photolithographic m...
- Patent number 11,774,848
- Issue date Oct 3, 2023
- Carl Zeiss SMT GmbH
- Hendrik Steigerwald
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Extreme ultraviolet mask blank with multilayer absorber and method...
- Patent number 11,754,917
- Issue date Sep 12, 2023
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing extreme ultraviolet mask with reduced wafer...
- Patent number 11,740,547
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Chang Hsueh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,703,751
- Issue date Jul 18, 2023
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method of forming the same
- Patent number 11,662,656
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chiang Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography method
- Patent number 11,644,745
- Issue date May 9, 2023
- Samsung Electronics Co., Ltd.
- Yongwook Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mirror for extreme ultraviolet light and extreme ultraviolet light...
- Patent number 11,614,572
- Issue date Mar 28, 2023
- Gigaphoton Inc.
- Osamu Wakabayashi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Photomask assembly with reflective photomask and method of manufact...
- Patent number 11,537,039
- Issue date Dec 27, 2022
- Advanced Mask Technology Center GmbH & Co. KG
- Thorsten Schedel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of fabricating a photomask
- Patent number 11,435,660
- Issue date Sep 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV mask blank, photomask manufactured by using the EUV mask blank,...
- Patent number 11,372,322
- Issue date Jun 28, 2022
- Samsung Electronics Co., Ltd.
- Ho Yeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phase-shift mask for extreme ultraviolet lithography
- Patent number 11,372,323
- Issue date Jun 28, 2022
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for treating a reflective optical element for the EUV wavele...
- Patent number 11,328,831
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Christian Grasse
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Exposure mask and manufacturing method of same
- Patent number 11,249,391
- Issue date Feb 15, 2022
- Kioxia Corporation
- Takashi Kamo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for generating an electromagnetic radiation
- Patent number 11,199,767
- Issue date Dec 14, 2021
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chung-Chieh Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective mask blank and reflective mask
- Patent number 11,150,550
- Issue date Oct 19, 2021
- AGC Inc.
- Hiroshi Hanekawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for forming the same
- Patent number 11,137,675
- Issue date Oct 5, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography system and method thereof
- Patent number 11,086,225
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wei-Shin Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography mask with a porous reflective multilayer structure
- Patent number 11,086,209
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for repairing defects of a photolithographic m...
- Patent number 11,079,673
- Issue date Aug 3, 2021
- Carl Zeiss SMT GmbH
- Hendrik Steigerwald
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK
- Publication number 20250102898
- Publication date Mar 27, 2025
- Shin-Etsu Chemical Co., Ltd.
- Keisuke SAKURAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD,...
- Publication number 20250036020
- Publication date Jan 30, 2025
- AGC Inc.
- Wataru NISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD TH...
- Publication number 20240427226
- Publication date Dec 26, 2024
- AGC Inc.
- Takeshi Okato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Mask With A Porous Reflective Multilayer Structure
- Publication number 20240377720
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20240377722
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240295807
- Publication date Sep 5, 2024
- AGC Inc.
- YUYA NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240280890
- Publication date Aug 22, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AR...
- Publication number 20240248387
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-Min WANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20240201576
- Publication date Jun 20, 2024
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20240176225
- Publication date May 30, 2024
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPLAY PANEL, METHOD OF MANUFACTURING DISPLAY PANEL, AND PHOTOMASK
- Publication number 20240152003
- Publication date May 9, 2024
- TCL China Star Optoelectronics Technology Co., Ltd.
- Ying Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240094622
- Publication date Mar 21, 2024
- AGC Inc.
- YUYA NAGATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
- Publication number 20240085779
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
- Publication number 20240045320
- Publication date Feb 8, 2024
- AGC Inc.
- Takuma KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Mask With A Porous Reflective Multilayer Structure
- Publication number 20230384663
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tsung Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20230375908
- Publication date Nov 23, 2023
- TOPPAN PHOTOMASK CO., LTD.
- Kazuaki MATSUI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT
- Publication number 20230367194
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wen-Chang HSUEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK AND METHOD OF FORMING THE SAME
- Publication number 20230259014
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chiang Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC METHOD BY USING A PHOTOMASK CONTAINED IN A TRANSPARENT...
- Publication number 20230176472
- Publication date Jun 8, 2023
- CHI-CHUNG CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK
- Publication number 20230148427
- Publication date May 11, 2023
- Shin-Etsu Chemical Co., Ltd.
- Naoki MATSUHASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER-REFLECTIVE-FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...
- Publication number 20230072220
- Publication date Mar 9, 2023
- HOYA CORPORATION
- Masanori NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...
- Publication number 20230076438
- Publication date Mar 9, 2023
- HOYA CORPORATION
- Ikuya FUKASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20220397817
- Publication date Dec 15, 2022
- TOPPAN PHOTOMASK CO., LTD.
- Hideaki NAKANO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTION LAYER ON LOW THERMAL EXPANSION MATERIAL (LTEM) SUBSTRATE...
- Publication number 20220365414
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20220350234
- Publication date Nov 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK
- Publication number 20220334462
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...
- Publication number 20220299862
- Publication date Sep 22, 2022
- AGC Inc.
- Daijiro AKAGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK AND REFLECTIVE MASK
- Publication number 20220236636
- Publication date Jul 28, 2022
- AGC Inc.
- Hiroyoshi TANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Ma...
- Publication number 20220163882
- Publication date May 26, 2022
- Applied Materials, Inc.
- Vibhu Jindal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY
- Publication number 20220075256
- Publication date Mar 10, 2022
- AGC Inc.
- Hirotomo KAWAHARA
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reflective mask blank and reflective mask

Glass substrate for EUVL, manufacturing method thereof, mask blank...

Extreme ultraviolet mask with reduced wafer neighboring effect

Mask and method of forming the same

Reflective mask blank, reflective mask, method of manufacturing ref...

Protection layer on low thermal expansion material (LTEM) substrate...

Reflective mask blank, reflective mask, method of manufacturing ref...

Reflective mask blank for EUV lithography

Photomask and method of fabricating a photomask

Reflective mask blank and reflective mask

EUV lithography mask with a porous reflective multilayer structure

Method and apparatus for repairing defects of a photolithographic m...

Extreme ultraviolet mask blank with multilayer absorber and method...

Method of manufacturing extreme ultraviolet mask with reduced wafer...

Reflective mask blank and reflective mask

Mask and method of forming the same

Photolithography method

Mirror for extreme ultraviolet light and extreme ultraviolet light...

Photomask assembly with reflective photomask and method of manufact...

Photomask and method of fabricating a photomask

EUV mask blank, photomask manufactured by using the EUV mask blank,...

Phase-shift mask for extreme ultraviolet lithography

Method for treating a reflective optical element for the EUV wavele...

Exposure mask and manufacturing method of same

Apparatus and method for generating an electromagnetic radiation

Reflective mask blank and reflective mask

Mask and method for forming the same

Lithography system and method thereof

EUV lithography mask with a porous reflective multilayer structure

Method and apparatus for repairing defects of a photolithographic m...

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK BLANK MANUFACTURING METHOD,...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND MANUFACTURING METHOD TH...

EUV Lithography Mask With A Porous Reflective Multilayer Structure

MASK AND METHOD OF FORMING THE SAME

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AR...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

DISPLAY PANEL, METHOD OF MANUFACTURING DISPLAY PANEL, AND PHOTOMASK

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY

REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...

EUV Lithography Mask With A Porous Reflective Multilayer Structure

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

EXTREME ULTRAVIOLET MASK WITH REDUCED WAFER NEIGHBORING EFFECT

MASK AND METHOD OF FORMING THE SAME

LITHOGRAPHIC METHOD BY USING A PHOTOMASK CONTAINED IN A TRANSPARENT...

PHOTOMASK BLANK, MANUFACTURING METHOD OF PHOTOMASK AND PHOTOMASK

MULTILAYER-REFLECTIVE-FILM-EQUIPPED SUBSTRATE, REFLECTIVE MASK BLAN...

REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD OF MANUFACTURING...

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

PROTECTION LAYER ON LOW THERMAL EXPANSION MATERIAL (LTEM) SUBSTRATE...

REFLECTIVE MASK BLANK AND METHOD FOR MANUFACTURING REFLECTIVE MASK

PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY, REFLECTIVE MASK FOR EUV...

REFLECTIVE MASK BLANK AND REFLECTIVE MASK

Extreme Ultraviolet Mask Blank With Alloy Absorber And Method Of Ma...

REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY