Relative arrangement or disposition of electrodes; moving means

Industry

CPC
H01J37/32568

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32568Relative arrangement or disposition of electrodes; moving means

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,972,925
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Bong seong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organic polymer film and manufacturing method thereof
- Patent number 11,969,752
- Issue date Apr 30, 2024
- Feng Chia University
- Ping-Yen Hsieh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Thin film manufacturing apparatus
- Patent number 11,967,492
- Issue date Apr 23, 2024
- AP SYSTEMS INC.
- Byoung Il Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and techniques for angled etching using multielectrode ex...
- Patent number 11,967,489
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device, substrate processing apparatus, and metho...
- Patent number 11,967,490
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Akihiro Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactors
- Patent number 11,961,717
- Issue date Apr 16, 2024
- OZONE 1 PTY LTD
- John Lionel Brauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,961,718
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shojiro Yahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,961,710
- Issue date Apr 16, 2024
- Canon Anelva Corporation
- Tadashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Control circuit, pulsed power supply system, and semiconductor proc...
- Patent number 11,955,313
- Issue date Apr 9, 2024
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Gang Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,955,314
- Issue date Apr 9, 2024
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for handling an implant
- Patent number 11,955,321
- Issue date Apr 9, 2024
- NOVA PLASMA LTD.
- Amnon Lam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Glow plasma gas measurement signal processing
- Patent number 11,948,774
- Issue date Apr 2, 2024
- Servomex Group Limited
- Bahram Alizadeh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Automatic electrostatic chuck bias compensation during plasma proce...
- Patent number 11,948,780
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Linying Cui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and system including high angle extraction optics
- Patent number 11,948,781
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Christopher Campbell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnet arrangement for a plasma source for performing plasma treatm...
- Patent number 11,942,311
- Issue date Mar 26, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
- Jörg Vetter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active gas generation apparatus
- Patent number 11,942,310
- Issue date Mar 26, 2024
- Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Ren Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatically clamped edge ring
- Patent number 11,935,776
- Issue date Mar 19, 2024
- Lam Research Corporation
- Christopher Kimball
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and lower stage
- Patent number 11,929,234
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generation device and plasma head cooling method
- Patent number 11,929,237
- Issue date Mar 12, 2024
- FUJI CORPORATION
- Shinji Takikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus having electrostatic chuck and subst...
- Patent number 11,929,251
- Issue date Mar 12, 2024
- ASM IP Holding B.V.
- Toshihisa Nozawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of adjusting the output power of a power supply supplying el...
- Patent number 11,929,233
- Issue date Mar 12, 2024
- TRUMPF Huettinger Sp. z o. o.
- Jakub Swiatnicki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and semiconductor device manufacturing...
- Patent number 11,929,239
- Issue date Mar 12, 2024
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,923,170
- Issue date Mar 5, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Paired dynamic parallel plate capacitively coupled plasmas
- Patent number 11,923,172
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for achieving peak ion energy enhancement with...
- Patent number 11,915,912
- Issue date Feb 27, 2024
- Lam Research Corporation
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,908,666
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for poling polymer thin films
- Patent number 11,910,715
- Issue date Feb 20, 2024
- CREESENSE MICROSYSTEMS INC.
- Albert Ting
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,908,663
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, and recording medium
- Patent number 11,905,596
- Issue date Feb 20, 2024
- Kokusai Electric Corporation
- Teruo Yoshino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20240153749
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSECOND PULSER ADC SYSTEM
- Publication number 20240136152
- Publication date Apr 25, 2024
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS
- Publication number 20240136161
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Karl Frederick LEESER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metallic Shield For Stable Tape-Frame Substrate Processing
- Publication number 20240136159
- Publication date Apr 25, 2024
- Harish Varma PENMETHSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS
- Publication number 20240136156
- Publication date Apr 25, 2024
- Evatec AG
- Stephan VOSER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CONTROL APPARATUS AND METHOD USING THE SAME
- Publication number 20240128054
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOLITHIC ANISOTROPIC SUBSTRATE SUPPORTS
- Publication number 20240128062
- Publication date Apr 18, 2024
- LAM RESEARCH CORPORATION
- Joel HOLLINGSWORTH
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA ETCHING APPARATUS AND OPERATING METHOD THEREOF
- Publication number 20240128056
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Hyeontae Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PLATE ELECTROSTATIC CHUCKS WITH CERAMIC BASEPLATES
- Publication number 20240112893
- Publication date Apr 4, 2024
- LAM RESEARCH CORPORATION
- Feng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE B...
- Publication number 20240105425
- Publication date Mar 28, 2024
- Samsung Electronics Co., Ltd.
- Seungwan Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR ETCHING WITH A PLASMA
- Publication number 20240096594
- Publication date Mar 21, 2024
- Adaptive Plasma Technology Corp.
- Woo Hyung CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...
- Publication number 20240096604
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Yukinori ABURATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240087843
- Publication date Mar 14, 2024
- PSK INC.
- JONG CHAN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240087854
- Publication date Mar 14, 2024
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240084455
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che Wei YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT
- Publication number 20240087857
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240087849
- Publication date Mar 14, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240079216
- Publication date Mar 7, 2024
- PSK INC.
- KWANG SUNG YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240079208
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PLASMA GENERATION
- Publication number 20240079209
- Publication date Mar 7, 2024
- MKS Instruments, Inc.
- Ron Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240079219
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Masanori ASAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY
- Publication number 20240077138
- Publication date Mar 7, 2024
- LAM RESEARCH CORPORATION
- David SCHAEFER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240071730
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20240071783
- Publication date Feb 29, 2024
- PSK INC.
- Kwang Sung YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20240071785
- Publication date Feb 29, 2024
- NEXTIN, INC.
- Seoung-Ju Na
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD
- Publication number 20240071734
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Naoki MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA ETCHING APPARATUS, AND INDUCTIVELY COUPL...
- Publication number 20240055226
- Publication date Feb 15, 2024
- KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SEJONG CAMPUS
- Kwang Ho KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONTROLLING PLASMA PROCESSING APPARATUS AND PLASMA PROCES...
- Publication number 20240055229
- Publication date Feb 15, 2024
- SEMES CO., LTD.
- Aixian Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...
- Publication number 20240055237
- Publication date Feb 15, 2024
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20240047182
- Publication date Feb 8, 2024
- TOKYO ELECTRON LIMITED
- Makoto KATO
- H01 - BASIC ELECTRIC ELEMENTS

Relative arrangement or disposition of electrodes; moving means

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Organic polymer film and manufacturing method thereof

Thin film manufacturing apparatus

Apparatus and techniques for angled etching using multielectrode ex...

Plasma generating device, substrate processing apparatus, and metho...

Plasma reactors

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Control circuit, pulsed power supply system, and semiconductor proc...

Plasma processing apparatus

Method for handling an implant

Glow plasma gas measurement signal processing

Automatic electrostatic chuck bias compensation during plasma proce...

Apparatus and system including high angle extraction optics

Magnet arrangement for a plasma source for performing plasma treatm...

Active gas generation apparatus

Symmetric VHF source for a plasma reactor

Electrostatically clamped edge ring

Plasma processing apparatus and lower stage

Plasma generation device and plasma head cooling method

Substrate processing apparatus having electrostatic chuck and subst...

Method of adjusting the output power of a power supply supplying el...

Plasma processing apparatus and semiconductor device manufacturing...

Plasma processing apparatus and plasma processing method

Paired dynamic parallel plate capacitively coupled plasmas

Systems and methods for achieving peak ion energy enhancement with...

Stage and plasma processing apparatus

Method and apparatus for poling polymer thin films

Plasma processing apparatus

Method of manufacturing semiconductor device, and recording medium

Patents Applicationslast 30 patents

STAGE AND PLASMA PROCESSING APPARATUS

NANOSECOND PULSER ADC SYSTEM

TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS

Metallic Shield For Stable Tape-Frame Substrate Processing

SPUTTERING APPARATUS FOR COATING OF 3D-OBJECTS

PLASMA CONTROL APPARATUS AND METHOD USING THE SAME

MONOLITHIC ANISOTROPIC SUBSTRATE SUPPORTS

PLASMA ETCHING APPARATUS AND OPERATING METHOD THEREOF

MULTI-PLATE ELECTROSTATIC CHUCKS WITH CERAMIC BASEPLATES

SUBSTRATE PROCESSING APPARATUS AND METHOD OF PROCESSING SUBSTRATE B...

SYSTEM FOR ETCHING WITH A PLASMA

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT

PLASMA PROCESSING APPARATUS

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR PLASMA GENERATION

SUBSTRATE PROCESSING APPARATUS

EDGE SEAL FOR LOWER ELECTRODE ASSEMBLY

PLASMA PROCESSING APPARATUS

APPARATUS FOR TREATING SUBSTRATE

SEMICONDUCTOR MANUFACTURING APPARATUS

LOWER ELECTRODE MECHANISM AND SUBSTRATE PROCESSING METHOD

INDUCTIVELY COUPLED PLASMA ETCHING APPARATUS, AND INDUCTIVELY COUPL...

METHOD OF CONTROLLING PLASMA PROCESSING APPARATUS AND PLASMA PROCES...

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATING APPARATUS, AND ME...

PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK