Repair or correction of mask defects

Industry

CPC
G03F1/72

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/72Repair or correction of mask defects

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Photomask repairing method and system thereof
- Patent number 12,140,858
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Use of adaptive replacement maps in digital lithography for local c...
- Patent number 12,141,517
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Aravind Inumpudi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Devices and methods for examining and/or processing an element for...
- Patent number 12,135,540
- Issue date Nov 5, 2024
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring photomasks
- Patent number 11,899,358
- Issue date Feb 13, 2024
- Carl Zeiss SMT GmbH
- Dmitry Simakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Stochastic optical proximity corrections
- Patent number 11,874,597
- Issue date Jan 16, 2024
- Synopsys, Inc.
- Zachary Levinson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of adaptive replacement maps in digital lithography for local c...
- Patent number 11,868,700
- Issue date Jan 9, 2024
- Applied Materials Inc.
- Aravind Inumpudi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask and method of repairing photomask
- Patent number 11,829,071
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask repairing method and system thereof
- Patent number 11,815,802
- Issue date Nov 14, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method of reticle pod having inspection window
- Patent number 11,796,909
- Issue date Oct 24, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wang Cheng Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for repairing defects of a photolithographic m...
- Patent number 11,774,848
- Issue date Oct 3, 2023
- Carl Zeiss SMT GmbH
- Hendrik Steigerwald
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask and method for forming the same
- Patent number 11,681,215
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hsuan-Wen Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and device for superimposing at least two images of a photol...
- Patent number 11,620,429
- Issue date Apr 4, 2023
- Carl Zeiss SMT GmbH
- Gilles Tabbone
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for detecting particles on the surface of an object, wafer,...
- Patent number 11,555,783
- Issue date Jan 17, 2023
- Carl Zeiss SMT GmbH
- Oliver Beyer
- G01 - MEASURING TESTING
Information Patent Grant
Photomask and method of repairing photomask
- Patent number 11,474,428
- Issue date Oct 18, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark and method of making semiconducto...
- Patent number 11,422,466
- Issue date Aug 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for determining positions of a plurality of pi...
- Patent number 11,366,383
- Issue date Jun 21, 2022
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method of reticle pod having inspection window
- Patent number 11,314,164
- Issue date Apr 26, 2022
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wang Cheng Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming photomask and photolithography method
- Patent number 11,307,492
- Issue date Apr 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and method for correcting mask defects using the system
- Patent number 11,249,294
- Issue date Feb 15, 2022
- Carl Zeiss SMT GmbH
- Markus Seesselberg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction pattern generation device, pattern defect correction sys...
- Patent number 11,187,975
- Issue date Nov 30, 2021
- TOSHIBA MEMORY CORPORATION
- Keiko Morishita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for analyzing a defective location of a photol...
- Patent number 11,150,552
- Issue date Oct 19, 2021
- Carl Zeiss SMT GmbH
- Michael Budach
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for reducing printable defects on extreme ultravi...
- Patent number 11,119,404
- Issue date Sep 14, 2021
- KLA Corporation
- Xiaochun Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection system with non-circular pupil
- Patent number 11,112,691
- Issue date Sep 7, 2021
- KLA Corporation
- Damon F. Kvamme
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of repairing photomask
- Patent number 11,099,477
- Issue date Aug 24, 2021
- Taiwan Semiconductor Manufacturing Company Ltd.
- Hao-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for ascertaining a repair shape for processing...
- Patent number 11,079,674
- Issue date Aug 3, 2021
- Carl Zeiss SMT GmbH
- Jens Oster
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for repairing defects of a photolithographic m...
- Patent number 11,079,673
- Issue date Aug 3, 2021
- Carl Zeiss SMT GmbH
- Hendrik Steigerwald
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask including fiducial mark, method of patterning the photoma...
- Patent number 11,042,084
- Issue date Jun 22, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithography plate and mask correction method
- Patent number 10,990,000
- Issue date Apr 27, 2021
- Semiconductor Manufacturing (Shanghai) International Corporation
- Jiancheng Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing control apparatus, recording medium, and metho...
- Patent number 10,955,753
- Issue date Mar 23, 2021
- TOSHIBA MEMORY CORPORATION
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ITERATIVE MASK OPTIMIZATION BIASED TOWARDS CRITICAL REGIONS OF LAYOUT
- Publication number 20250068058
- Publication date Feb 27, 2025
- D2S, INC.
- Donald Oriordan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MASK REPAIR
- Publication number 20240419065
- Publication date Dec 19, 2024
- Carl Zeisss SMT GmbH
- Christian Felix Hermanns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF
- Publication number 20240377721
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- HAO-MING CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOID...
- Publication number 20240280892
- Publication date Aug 22, 2024
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF REMOVING DEFECT OF MASK
- Publication number 20240219826
- Publication date Jul 4, 2024
- Samsung Electronics Co., Ltd.
- Yoonki HWANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OVERLAY CORRECTION FOR ADVANCED INTEGRATED-CIRCUIT DEVICES
- Publication number 20240219825
- Publication date Jul 4, 2024
- ONTO INNOVATION INC.
- Keith F. Best
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD, APPARATUS, AND SYSTEM WITH RESIST IMAGE ESTIMATION
- Publication number 20240168372
- Publication date May 23, 2024
- Samsung Electronics Co., Ltd.
- Deokyoung KANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND DEVICE FOR QUALIFYING A MASK OF A LITHOGRAPHY SYSTEM
- Publication number 20240103360
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Asad Rasool
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...
- Publication number 20240085778
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Byungje Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA
- Publication number 20240077799
- Publication date Mar 7, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Le Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CHARACTERIZATION OF A MICROLITHOGRAPHY MASK
- Publication number 20240061328
- Publication date Feb 22, 2024
- Carl Zeiss SMT GMBH
- Ulrich Matejka
- G01 - MEASURING TESTING
Information Patent Application
USE OF ADAPTIVE REPLACEMENT MAPS IN DIGITAL LITHOGRAPHY FOR LOCAL C...
- Publication number 20240012978
- Publication date Jan 11, 2024
- Applied Materials, Inc.
- Aravind INUMPUDI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR PROCESSING A SAMPLE
- Publication number 20230418153
- Publication date Dec 28, 2023
- Carl Zeiss SMT GMBH
- Christof Baur
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZING A DEFECT CORRECTION FOR AN OPTI...
- Publication number 20230408911
- Publication date Dec 21, 2023
- Carl Zeiss SMS Ltd.
- Vladimir Dmitriev
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGN CORRECTION METHOD
- Publication number 20230400759
- Publication date Dec 14, 2023
- United Microelectronics Corp.
- Min Cheng Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF
- Publication number 20230367198
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- HAO-MING CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW
- Publication number 20230367207
- Publication date Nov 16, 2023
- WANG CHENG SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM, METHOD AND PROGRAM PRODUCT FOR PHOTOMASK SURFACE TREATMENT
- Publication number 20230305385
- Publication date Sep 28, 2023
- PHOTRONICS, INC.
- Christopher Progler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR CORRECTING PHOTOMASK AND METHOD THEREOF
- Publication number 20230229074
- Publication date Jul 20, 2023
- SEMES CO., LTD.
- Hyo Won YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE
- Publication number 20230213876
- Publication date Jul 6, 2023
- SEMES CO., LTD.
- Hyo Won YANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20230205077
- Publication date Jun 29, 2023
- SEMES CO., LTD.
- TAE HEE KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
USE OF ADAPTIVE REPLACEMENT MAPS IN DIGITAL LITHOGRAPHY FOR LOCAL C...
- Publication number 20230169253
- Publication date Jun 1, 2023
- Applied Materials, Inc.
- Aravind INUMPUDI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LIGHT-EMITTING DEVICE
- Publication number 20230041654
- Publication date Feb 9, 2023
- FUJIFILM Business Innovation Corp.
- Takahiko KOBAYASHI
- B08 - CLEANING
Information Patent Application
METHOD FOR DETERMINING A REGISTRATION ERROR
- Publication number 20220365449
- Publication date Nov 17, 2022
- Carl Zeiss SMT GMBH
- Mario Laengle
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK AND METHOD OF REPAIRING PHOTOMASK
- Publication number 20220365425
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- HAO-MING CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW
- Publication number 20220260903
- Publication date Aug 18, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- WANG CHENG SHIH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORIGINAL PLATE MANUFACTURING METHOD, DRAWING DATA CREATION METHOD,...
- Publication number 20220035243
- Publication date Feb 3, 2022
- KIOXIA Corporation
- Ryoji YOSHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF REPAIRING PHOTOMASK
- Publication number 20210373435
- Publication date Dec 2, 2021
- Taiwan Semiconductor Manufacturing company Ltd.
- HAO-MING CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR REPAIRING DEFECTS OF A PHOTOLITHOGRAPHIC M...
- Publication number 20210325775
- Publication date Oct 21, 2021
- Carl Zeiss SMT GMBH
- Hendrik Steigerwald
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
STOCHASTIC OPTICAL PROXIMITY CORRECTIONS
- Publication number 20210263407
- Publication date Aug 26, 2021
- Synopsys, Inc.
- Zachary Levinson
- H01 - BASIC ELECTRIC ELEMENTS

Repair or correction of mask defects

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photomask repairing method and system thereof

Use of adaptive replacement maps in digital lithography for local c...

Devices and methods for examining and/or processing an element for...

Method for measuring photomasks

Stochastic optical proximity corrections

Use of adaptive replacement maps in digital lithography for local c...

Photomask including fiducial mark and method of making a semiconduc...

Photomask and method of repairing photomask

Photomask repairing method and system thereof

Structure and method of reticle pod having inspection window

Method and apparatus for repairing defects of a photolithographic m...

Photomask and method for forming the same

Method and device for superimposing at least two images of a photol...

Method for detecting particles on the surface of an object, wafer,...

Photomask and method of repairing photomask

Photomask including fiducial mark and method of making semiconducto...

Method and apparatus for determining positions of a plurality of pi...

Structure and method of reticle pod having inspection window

Method for forming photomask and photolithography method

Optical system and method for correcting mask defects using the system

Correction pattern generation device, pattern defect correction sys...

Method and apparatus for analyzing a defective location of a photol...

System and method for reducing printable defects on extreme ultravi...

Inspection system with non-circular pupil

Photomask and method of repairing photomask

Method and apparatus for ascertaining a repair shape for processing...

Method and apparatus for repairing defects of a photolithographic m...

Photomask including fiducial mark, method of patterning the photoma...

Photolithography plate and mask correction method

Substrate processing control apparatus, recording medium, and metho...

Patents Applicationslast 30 patents

ITERATIVE MASK OPTIMIZATION BIASED TOWARDS CRITICAL REGIONS OF LAYOUT

METHOD AND APPARATUS FOR MASK REPAIR

PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF

METHOD FOR CORRECTING ERRORS IN PHOTOLITHOGRAPHIC MASKS WHILE AVOID...

METHOD OF REMOVING DEFECT OF MASK

OVERLAY CORRECTION FOR ADVANCED INTEGRATED-CIRCUIT DEVICES

METHOD, APPARATUS, AND SYSTEM WITH RESIST IMAGE ESTIMATION

METHOD AND DEVICE FOR QUALIFYING A MASK OF A LITHOGRAPHY SYSTEM

PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...

METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA

METHOD AND APPARATUS FOR CHARACTERIZATION OF A MICROLITHOGRAPHY MASK

USE OF ADAPTIVE REPLACEMENT MAPS IN DIGITAL LITHOGRAPHY FOR LOCAL C...

METHOD AND APPARATUS FOR PROCESSING A SAMPLE

METHOD AND APPARATUS FOR OPTIMIZING A DEFECT CORRECTION FOR AN OPTI...

PHOTOMASK DESIGN CORRECTION METHOD

PHOTOMASK REPAIRING METHOD AND SYSTEM THEREOF

STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW

SYSTEM, METHOD AND PROGRAM PRODUCT FOR PHOTOMASK SURFACE TREATMENT

APPARATUS FOR CORRECTING PHOTOMASK AND METHOD THEREOF

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

APPARATUS AND METHOD FOR TREATING SUBSTRATE

USE OF ADAPTIVE REPLACEMENT MAPS IN DIGITAL LITHOGRAPHY FOR LOCAL C...

LIGHT-EMITTING DEVICE

METHOD FOR DETERMINING A REGISTRATION ERROR

PHOTOMASK AND METHOD OF REPAIRING PHOTOMASK

STRUCTURE AND METHOD OF RETICLE POD HAVING INSPECTION WINDOW

ORIGINAL PLATE MANUFACTURING METHOD, DRAWING DATA CREATION METHOD,...

PHOTOMASK AND METHOD OF REPAIRING PHOTOMASK

METHOD AND APPARATUS FOR REPAIRING DEFECTS OF A PHOTOLITHOGRAPHIC M...

STOCHASTIC OPTICAL PROXIMITY CORRECTIONS