Röntgenlithographic or X-ray lithographic processes

Industry

CPC
H01L21/0278

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/0278Röntgenlithographic or X-ray lithographic processes

Industries

Patents Grantslast 30 patents

Information Patent Grant
Compound semiconductor solar cell and method of manufacturing the same
- Patent number 10,566,473
- Issue date Feb 18, 2020
- LG Electronics Inc.
- Jinhee Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-sensitivity multilayer resist film and method of increasing ph...
- Patent number 9,703,197
- Issue date Jul 11, 2017
- National Institute for Materials Science
- Jin Kawakita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection patterning with exposure mask
- Patent number 9,570,301
- Issue date Feb 14, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuen-Yu Tsai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for proximity effect and dose correction for a pa...
- Patent number 7,902,528
- Issue date Mar 8, 2011
- Cadence Design Systems, Inc.
- Daisuke Hara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Pattern forming method and method for manufacturing semiconductor d...
- Patent number 7,026,099
- Issue date Apr 11, 2006
- Kabushiki Kaisha Toshiba
- Hirokazu Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a density multiplier for semiconductor device manu...
- Patent number 6,239,008
- Issue date May 29, 2001
- Advanced Micro Devices, Inc.
- Allen S. Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reflection type mask structure and exposure apparatus using the same
- Patent number 5,889,758
- Issue date Mar 30, 1999
- Canon Kabushiki Kaisha
- Hiroshi Maehara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask structure and method of making the same
- Patent number 5,861,603
- Issue date Jan 19, 1999
- Canon Kabushiki Kaisha
- Takeshi Miyachi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-resolution lithography and semiconductor device manufacturing...
- Patent number 5,350,485
- Issue date Sep 27, 1994
- Hitachi, Ltd.
- Hiroshi Shiraishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacture of semiconductor devices
- Patent number 5,168,512
- Issue date Dec 1, 1992
- Canon Kabushiki Kaisha
- Kazunori Iwamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication of particle beam masks
- Patent number 5,166,888
- Issue date Nov 24, 1992
- International Business Machines Corporation
- Helmut Engelke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor wafer for providing a plurality of semiconductor chip...
- Patent number 4,791,302
- Issue date Dec 13, 1988
- NEC Corporation
- Hiroshi Nozue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for making low barrier Schottky devices of the electron beam...
- Patent number 4,379,832
- Issue date Apr 12, 1983
- International Business Machines Corporation
- Hormazdyar M. Dalal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure process
- Patent number 4,267,259
- Issue date May 12, 1981
- International Business Machines Corporation
- Harald Bohlen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing solid-state devices in which planar dimensi...
- Patent number 4,256,829
- Issue date Mar 17, 1981
- U.S. Philips Corporation
- Peter J. Daniel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication of integrated circuits utilizing thick high-resolution...
- Patent number 4,244,799
- Issue date Jan 13, 1981
- Bell Telephone Laboratories, Incorporated
- David B. Fraser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for the production of electronic semiconductor components
- Patent number 4,238,685
- Issue date Dec 9, 1980
- Siemens Aktiengesellschaft
- Peter Tischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for forming a high aspect ratio structure by successive exp...
- Patent number 4,165,395
- Issue date Aug 21, 1979
- International Business Machines Corporation
- Tai Hon P. Chang
- B82 - NANO-TECHNOLOGY
Information Patent Grant
X-ray lithography mask
- Patent number 4,035,522
- Issue date Jul 12, 1977
- International Business Machines Corporation
- Michael Hatzakis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Mask for X-Ray Lithography and Metrology
- Publication number 20240112913
- Publication date Apr 4, 2024
- Anne Sakdinawat
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILVER PATTERNING AND INTERCONNECT PROCESSES
- Publication number 20210272799
- Publication date Sep 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- You-Hua CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Projection Patterning With Exposure Mask
- Publication number 20150348775
- Publication date Dec 3, 2015
- National Taiwan University
- Kuen-Yu Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for proximity effect and dose correction for a pa...
- Publication number 20080116398
- Publication date May 22, 2008
- Cadence Design Systems, Inc.
- Daisuke Hara
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of forming fine pattern
- Publication number 20040234899
- Publication date Nov 25, 2004
- Minoru Toriumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern forming method and method for manufacturing semiconductor d...
- Publication number 20030215749
- Publication date Nov 20, 2003
- Hirokazu Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Röntgenlithographic or X-ray lithographic processes

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Compound semiconductor solar cell and method of manufacturing the same

High-sensitivity multilayer resist film and method of increasing ph...

Projection patterning with exposure mask

Method and system for proximity effect and dose correction for a pa...

Pattern forming method and method for manufacturing semiconductor d...

Method of making a density multiplier for semiconductor device manu...

Reflection type mask structure and exposure apparatus using the same

Mask structure and method of making the same

High-resolution lithography and semiconductor device manufacturing...

Method of manufacture of semiconductor devices

Fabrication of particle beam masks

Semiconductor wafer for providing a plurality of semiconductor chip...

Method for making low barrier Schottky devices of the electron beam...

Exposure process

Method of manufacturing solid-state devices in which planar dimensi...

Fabrication of integrated circuits utilizing thick high-resolution...

Arrangement for the production of electronic semiconductor components

Process for forming a high aspect ratio structure by successive exp...

X-ray lithography mask

Patents Applicationslast 30 patents

Mask for X-Ray Lithography and Metrology

SILVER PATTERNING AND INTERCONNECT PROCESSES

Projection Patterning With Exposure Mask

Method and system for proximity effect and dose correction for a pa...

Method of forming fine pattern

Pattern forming method and method for manufacturing semiconductor d...