Secondary emission

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H01J2237/06358

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/06358Secondary emission

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Patents Grantslast 30 patents

Information Patent Grant
Electrode for plasma processing apparatus and plasma processing app...
- Patent number 12,165,850
- Issue date Dec 10, 2024
- Tokyo Electron Limited
- Takaki Kobune
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cold electron number amplifier
- Patent number 8,750,458
- Issue date Jun 10, 2014
- Moxtek, Inc.
- Dongbing Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam irradiation device
- Patent number 7,829,863
- Issue date Nov 9, 2010
- Kyoto University
- Kenjiro Kimura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Electron projection lithography apparatus using secondary electrons
- Patent number 6,784,438
- Issue date Aug 31, 2004
- Samsung Electronics Co., Ltd.
- In-kyeong Yoo
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ELECTRODE FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APP...
- Publication number 20220344127
- Publication date Oct 27, 2022
- TOKYO ELECTRON LIMITED
- Takaki KOBUNE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Beam Irradiation Device
- Publication number 20090127473
- Publication date May 21, 2009
- Kenjiro Kimura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Electron projection lithography apparatus using secondary electrons
- Publication number 20040084637
- Publication date May 6, 2004
- In-kyeong Yoo
- B82 - NANO-TECHNOLOGY