Secondary particle detectors

Industry

CPC
H01J2237/2448

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2448Secondary particle detectors

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam system and overlay misalignment measurement m...
- Patent number 12,183,541
- Issue date Dec 31, 2024
- HITACHI HIGH-TECH CORPORATION
- Takuma Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system of image-forming multi-electron beams
- Patent number 12,165,831
- Issue date Dec 10, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods of profiling charged-particle beams
- Patent number 12,165,836
- Issue date Dec 10, 2024
- ASML Netherlands B.V.
- Maikel Robert Goosen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and image acquiring method
- Patent number 12,148,594
- Issue date Nov 19, 2024
- Jeol Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,142,457
- Issue date Nov 12, 2024
- HITACHI HIGH-TECH CORPORATION
- Takahiro Nishihata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus with multiple detectors and methods...
- Patent number 12,142,455
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Xuedong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for ion energy analysis of plasma processes
- Patent number 12,136,542
- Issue date Nov 5, 2024
- IMPEDANS LTD
- Paul Scullin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Energy spectrometer with dynamic focus
- Patent number 12,100,585
- Issue date Sep 24, 2024
- FEI Company
- Arthur Reinout Hartong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross-talk cancellation in multiple charged-particle beam inspection
- Patent number 12,080,513
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Wei Fang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Charged particle beam system
- Patent number 12,068,128
- Issue date Aug 20, 2024
- HITACHI HIGH-TECH CORPORATION
- Yusuke Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and inspection method
- Patent number 12,057,288
- Issue date Aug 6, 2024
- HITACHI HIGH-TECH CORPORATION
- Momoyo Enyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,051,563
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Ryo Komatsuzaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple charged-particle beam apparatus with low crosstalk
- Patent number 12,033,830
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Weiming Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device and operation method therefor
- Patent number 11,961,701
- Issue date Apr 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Tomoharu Nagashima
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Transmission charged particle microscope with an electron energy lo...
- Patent number 11,955,310
- Issue date Apr 9, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulsed charged-particle beam system
- Patent number 11,942,302
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Arno Jan Bleeker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for detecting or monitoring for a chemical precursor in a...
- Patent number 11,939,673
- Issue date Mar 26, 2024
- ASM IP Holding B.V.
- John Kevin Shugrue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter and ion implantation method
- Patent number 11,923,167
- Issue date Mar 5, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Hiroshi Matsushita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope device and electron beam inspection ap...
- Patent number 11,908,657
- Issue date Feb 20, 2024
- Zhongke Jingyuan Electron Limited
- Qinglang Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for ion energy analysis of plasma processes
- Patent number 11,908,668
- Issue date Feb 20, 2024
- IMPEDANS LTD
- Paul Scullin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,869,745
- Issue date Jan 9, 2024
- HITACHI HIGH-TECH CORPORATION
- Minami Shouji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus of plural charged-particle beams
- Patent number RE49784
- Issue date Jan 2, 2024
- ASML Netherlands B.V.
- Weiming Ren
Information Patent Grant
Scintillator for charged particle beam apparatus and charged partic...
- Patent number 11,846,736
- Issue date Dec 19, 2023
- HITACHI HIGH-TECH CORPORATION
- Eri Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 11,823,861
- Issue date Nov 21, 2023
- HITACHI HIGH-TECH CORPORATION
- Yuta Imai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Primary charged particle beam current measurement
- Patent number 11,817,292
- Issue date Nov 14, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- John Breuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning electron microscope
- Patent number 11,756,763
- Issue date Sep 12, 2023
- HITACHI HIGH-TECH CORPORATION
- Teruo Kohashi
- G01 - MEASURING TESTING
Information Patent Grant
Bandpass charged particle energy filtering detector for charged par...
- Patent number 11,749,495
- Issue date Sep 5, 2023
- KLA Corp.
- Youfei Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus
- Patent number 11,749,494
- Issue date Sep 5, 2023
- HITACHI HIGH-TECH CORPORATION
- Takafumi Miwa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Verification plates with automated evaluation of melt performance
- Patent number 11,733,187
- Issue date Aug 22, 2023
- Arcam AB
- David Svensson
- B22 - CASTING POWDER METALLURGY

Patents Applicationslast 30 patents

Information Patent Application
CHARGED PARTICLE BEAM DEVICE
- Publication number 20250006454
- Publication date Jan 2, 2025
- HITACHI HIGH-TECH CORPORATION
- Yuta IMAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...
- Publication number 20250006459
- Publication date Jan 2, 2025
- Carl Zeiss MultiSEM GmbH
- Daniel Weiss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION
- Publication number 20250006456
- Publication date Jan 2, 2025
- ASML NETHERLANDS B.V.
- Wei FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR CONFIRMING AND FINDING AN IONIZATION EDGE WITHIN A MEASU...
- Publication number 20240379324
- Publication date Nov 14, 2024
- FEI Company
- Wouter Rene J. VAN DEN BROEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FOCUSED ION BEAM SYSTEM
- Publication number 20240371598
- Publication date Nov 7, 2024
- V TECHNOLOGY CO., LTD.
- Michinobu MIZUMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20240371601
- Publication date Nov 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Yusuke NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TECHNIQUES FOR ELECTRON ENERGY LOSS SPECTROSCOPY AT HIGH ENERGY
- Publication number 20240347314
- Publication date Oct 17, 2024
- FEI Company
- Peter Christiaan Tiemeijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...
- Publication number 20240282547
- Publication date Aug 22, 2024
- NuFlare Technology, Inc.
- Koichi ISHII
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LO...
- Publication number 20240258067
- Publication date Aug 1, 2024
- FEI Company
- Peter Christiaan TIEMEIJER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processor System Capable of Communicating with Multicharged Particl...
- Publication number 20240212973
- Publication date Jun 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Kaoru SAKAI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR MULTI-BEAM ELECTRON MICROSCOPY USING A DETECT...
- Publication number 20240194440
- Publication date Jun 13, 2024
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam System
- Publication number 20240177964
- Publication date May 30, 2024
- Hitachi High-Tech Corporation
- Heita KIMIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON MICROSCOPE, DEVICE FOR MEASURING ELECTRON-PHOTON CORRELATI...
- Publication number 20240153736
- Publication date May 9, 2024
- Japan Science and Technology Agency
- Takumi SANNOMIYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240128043
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Jurgen VAN SOEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample Inspection Apparatus, Inspection System, Thin Piece Sample F...
- Publication number 20240128047
- Publication date Apr 18, 2024
- Hitachi High-Tech Corporation
- Masahiro YOSHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS
- Publication number 20240096586
- Publication date Mar 21, 2024
- KLA Corporation
- Xinrong JIANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM
- Publication number 20240096587
- Publication date Mar 21, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Optical Emission Spectroscopy for Advanced Process Characterization
- Publication number 20240094056
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Sergey Voronin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inspection System
- Publication number 20240029994
- Publication date Jan 25, 2024
- Hitachi High-Tech Corporation
- Natsuki TSUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20240014002
- Publication date Jan 11, 2024
- HITACHI HIGH-TECH CORPORATION
- Takayasu IWATSUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM DEVICE AND IMAGING METHOD
- Publication number 20230420215
- Publication date Dec 28, 2023
- HITACHI HIGH-TECH CORPORATION
- Toshiyuki Yokosuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron Spectrometer and Analytical Method
- Publication number 20230411113
- Publication date Dec 21, 2023
- JEOL Ltd.
- Tatsuya Uchida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON SPECTROMETER CALIBRATION METHOD
- Publication number 20230402250
- Publication date Dec 14, 2023
- ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)
- Paolo CATTANEO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Creating Multiple Electron Beams with a Photocathode Film
- Publication number 20230395349
- Publication date Dec 7, 2023
- KLA Corporation
- Xinrong Jiang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Charged Particle Beam Device, Charged Particle Beam System, and Adj...
- Publication number 20230386781
- Publication date Nov 30, 2023
- HITACHI HIGH-TECH CORPORATION
- Zhao JINYU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Analysis System
- Publication number 20230377836
- Publication date Nov 23, 2023
- Hitachi High-Tech Corporation
- Azusa KONNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS
- Publication number 20230377837
- Publication date Nov 23, 2023
- HITACHI HIGH-TECH CORPORATION
- Yohei NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM APPARATUS AND PROCESSOR SYSTEM
- Publication number 20230335373
- Publication date Oct 19, 2023
- HITACHI HIGH-TECH CORPORATION
- Akio YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
- Publication number 20230324318
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A...
- Publication number 20230326706
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS

Secondary particle detectors

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Charged particle beam system and overlay misalignment measurement m...

Method and system of image-forming multi-electron beams

Systems and methods of profiling charged-particle beams

Ion beam device

Charged particle beam apparatus and image acquiring method

Charged particle beam device

Charged particle beam apparatus with multiple detectors and methods...

Apparatus for ion energy analysis of plasma processes

Energy spectrometer with dynamic focus

Cross-talk cancellation in multiple charged-particle beam inspection

Charged particle beam system

Charged particle beam device and inspection method

Charged particle beam device

Multiple charged-particle beam apparatus with low crosstalk

Charged particle beam device and operation method therefor

Transmission charged particle microscope with an electron energy lo...

Pulsed charged-particle beam system

Apparatus for detecting or monitoring for a chemical precursor in a...

Ion implanter and ion implantation method

Scanning electron microscope device and electron beam inspection ap...

Apparatus for ion energy analysis of plasma processes

Charged particle beam device

Apparatus of plural charged-particle beams

Scintillator for charged particle beam apparatus and charged partic...

Charged particle beam device

Primary charged particle beam current measurement

Scanning electron microscope

Bandpass charged particle energy filtering detector for charged par...

Charged particle beam apparatus

Verification plates with automated evaluation of melt performance

Patents Applicationslast 30 patents

CHARGED PARTICLE BEAM DEVICE

METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE...

CROSS-TALK CANCELLATION IN MULTIPLE CHARGED-PARTICLE BEAM INSPECTION

METHOD FOR CONFIRMING AND FINDING AN IONIZATION EDGE WITHIN A MEASU...

FOCUSED ION BEAM SYSTEM

Charged Particle Beam System

TECHNIQUES FOR ELECTRON ENERGY LOSS SPECTROSCOPY AT HIGH ENERGY

MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON...

TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH AN ELECTRON ENERGY LO...

Processor System Capable of Communicating with Multicharged Particl...

SYSTEM AND METHOD FOR MULTI-BEAM ELECTRON MICROSCOPY USING A DETECT...

Charged Particle Beam System

ELECTRON MICROSCOPE, DEVICE FOR MEASURING ELECTRON-PHOTON CORRELATI...

CHARGED PARTICLE APPARATUS AND METHOD

Sample Inspection Apparatus, Inspection System, Thin Piece Sample F...

METHOD AND SYSTEM OF IMAGE-FORMING MULTI-ELECTRON BEAMS

DISTORTION OPTIMIZED MULTI-BEAM SCANNING SYSTEM

Optical Emission Spectroscopy for Advanced Process Characterization

Inspection System

CHARGED PARTICLE BEAM APPARATUS

CHARGED PARTICLE BEAM DEVICE AND IMAGING METHOD

Electron Spectrometer and Analytical Method

ELECTRON SPECTROMETER CALIBRATION METHOD

Creating Multiple Electron Beams with a Photocathode Film

Charged Particle Beam Device, Charged Particle Beam System, and Adj...

Analysis System

CHARGED PARTICLE BEAM APPARATUS

CHARGED PARTICLE BEAM APPARATUS AND PROCESSOR SYSTEM

CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD

APPARATUS AND METHOD FOR DIRECTING CHARGED PARTICLE BEAM TOWARDS A...