Secondary particles mass or energy spectrometry

Industry

CPC
H01J2237/2516

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/2516Secondary particles mass or energy spectrometry

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and approaches for semiconductor metrology and surface anal...
- Patent number 11,430,647
- Issue date Aug 30, 2022
- NOVA MEASURING INSTRUMENTS, INC.
- David A. Reed
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic state calculation method, electronic state calculation d...
- Patent number 9,792,255
- Issue date Oct 17, 2017
- Osaka University
- Koichi Kusakabe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Background reduction system including louver
- Patent number 8,633,457
- Issue date Jan 21, 2014
- KLA-Tencor Corporation
- Mehran Nasser-Ghodsi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle analyser and method using electrostatic filter gri...
- Patent number 8,421,027
- Issue date Apr 16, 2013
- Oxford Instruments Nanotechnology Tools Limited
- Ian Richard Barkshire
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Determining dopant information
- Patent number 7,804,068
- Issue date Sep 28, 2010
- ALIS Corporation
- John A. Notte, IV
- G01 - MEASURING TESTING
Information Patent Grant
Focused ion beam system and a method of sample preparation and obse...
- Patent number 7,612,337
- Issue date Nov 3, 2009
- Hitachi High-Technologies Corporation
- Yuya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flood gun for charge neutralization
- Patent number 7,067,821
- Issue date Jun 27, 2006
- Thermo Electron Corporation
- Bryan Robert Barnard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Standard sample for transmission electron microscope (TEM) elementa...
- Patent number 7,053,372
- Issue date May 30, 2006
- Samsung Electronics Co., Ltd.
- Gyeong-su Park
- G01 - MEASURING TESTING
Information Patent Grant
Twisted-compensated low-energy electron microscope
- Patent number 6,943,360
- Issue date Sep 13, 2005
- KLA-Tencor Technologies Corporation
- Marian Mankos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positron trap beam source for positron microbeam production
- Patent number 6,630,666
- Issue date Oct 7, 2003
- Roderick G. Greaves
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Apparatus and method for analysis of surface impurities in a very s...
- Patent number 5,877,496
- Issue date Mar 2, 1999
- Advantest Corporation
- Kazuhiko Tabuse
- G01 - MEASURING TESTING
Information Patent Grant
Passband-adjustable photo-detector for inverse photoemission spectr...
- Patent number 5,554,844
- Issue date Sep 10, 1996
- Hiroshima University
- Hirofumi Namatame
- G01 - MEASURING TESTING
Information Patent Grant
Surface analyzing and processing apparatus
- Patent number 5,440,122
- Issue date Aug 8, 1995
- Seiko Instruments Inc.
- Masatoshi Yasutake
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Apparatus and method for inverse photoemission
- Patent number 5,120,965
- Issue date Jun 9, 1992
- Shimadzu Corporation
- Shigemasa Suga
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND APPROACHES FOR SEMICONDUCTOR METROLOGY AND SURFACE ANAL...
- Publication number 20230091625
- Publication date Mar 23, 2023
- NOVA MEASURING INSTRUMENTS INC.
- David A. REED
- G01 - MEASURING TESTING
Information Patent Application
BACKGROUND REDUCTION SYSTEM INCLUDING LOUVER
- Publication number 20130001417
- Publication date Jan 3, 2013
- KLA-Tencor Corporation
- Mehran Nasser-Ghodsi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE ANALYSER AND METHOD
- Publication number 20100163725
- Publication date Jul 1, 2010
- Ian Richard Barkshire
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINING DOPANT INFORMATION
- Publication number 20080111069
- Publication date May 15, 2008
- ALIS Corporation
- John A. Notte
- G01 - MEASURING TESTING
Information Patent Application
Focused ion beam system and a method of sample preparation and obse...
- Publication number 20070187597
- Publication date Aug 16, 2007
- Hitachi High-Technologies Corporation
- Yuya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flood gun for charge neutralization
- Publication number 20050205800
- Publication date Sep 22, 2005
- Thermo Electron Corporation
- Bryan Robert Barnard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Standard sample for transmission electron microscope (TEM) elementa...
- Publication number 20050184233
- Publication date Aug 25, 2005
- Samsung Electronics Co., Ltd.
- Gyeong-su Park
- G01 - MEASURING TESTING
Information Patent Application
Positron trap beam source for positron microbeam production
- Publication number 20020030160
- Publication date Mar 14, 2002
- Roderick G. Greaves
- G01 - MEASURING TESTING

Secondary particles mass or energy spectrometry

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and approaches for semiconductor metrology and surface anal...

Electronic state calculation method, electronic state calculation d...

Background reduction system including louver

Charged particle analyser and method using electrostatic filter gri...

Determining dopant information

Focused ion beam system and a method of sample preparation and obse...

Flood gun for charge neutralization

Standard sample for transmission electron microscope (TEM) elementa...

Twisted-compensated low-energy electron microscope

Positron trap beam source for positron microbeam production

Apparatus and method for analysis of surface impurities in a very s...

Passband-adjustable photo-detector for inverse photoemission spectr...

Surface analyzing and processing apparatus

Apparatus and method for inverse photoemission

Patents Applicationslast 30 patents

SYSTEMS AND APPROACHES FOR SEMICONDUCTOR METROLOGY AND SURFACE ANAL...

BACKGROUND REDUCTION SYSTEM INCLUDING LOUVER

CHARGED PARTICLE ANALYSER AND METHOD

DETERMINING DOPANT INFORMATION

Focused ion beam system and a method of sample preparation and obse...

Flood gun for charge neutralization

Standard sample for transmission electron microscope (TEM) elementa...

Positron trap beam source for positron microbeam production