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H01J37/32541

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

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H01J37/32541Shape

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,362,151
- Issue date Jul 15, 2025
- Tokyo Electron Limited
- Taro Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Active gas generation apparatus
- Patent number 12,354,845
- Issue date Jul 8, 2025
- TMEIC Corporation
- Kensuke Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method, method...
- Patent number 12,354,848
- Issue date Jul 8, 2025
- Kokusai Electric Corporation
- Yasunori Ejiri
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Tunable plasma exclusion zone in semiconductor fabrication
- Patent number 12,340,987
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Che Wei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,300,465
- Issue date May 13, 2025
- Tokyo Electron Limited
- Chishio Koshimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 12,272,528
- Issue date Apr 8, 2025
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma coating solid fuels and coated soli...
- Patent number 12,264,289
- Issue date Apr 1, 2025
- The United States of America as represented by the Secretary of the Army
- Shaun M. Debow
- B08 - CLEANING
Information Patent Grant
Hybrid plasma source array
- Patent number 12,266,503
- Issue date Apr 1, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,266,522
- Issue date Apr 1, 2025
- Kokusai Electric Corporation
- Kazuyuki Okuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing apparatus and dielectric window cleaning m...
- Patent number 12,257,608
- Issue date Mar 25, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Chunming Liu
- B08 - CLEANING
Information Patent Grant
Work processing apparatus
- Patent number 12,257,641
- Issue date Mar 25, 2025
- Toshiro DOI
- Hideo Aida
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Nano-coating protection method for electrical devices
- Patent number 12,252,789
- Issue date Mar 18, 2025
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrostatic chuck device
- Patent number 12,249,492
- Issue date Mar 11, 2025
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repellent electrode for electron repelling
- Patent number 12,243,707
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Heng Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma ion processing of substrates
- Patent number 12,237,150
- Issue date Feb 25, 2025
- LIFEHOUSE AUSTRALIA AS TRUSTEE FOR THE LIFEHOUSE AUSTRALIA TRUST
- David R. McKenzie
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Method of manufacturing electrode plate for plasma processing devic...
- Patent number 12,237,164
- Issue date Feb 25, 2025
- Mitsubishi Materials Corporation
- Koji Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support device
- Patent number 12,233,501
- Issue date Feb 25, 2025
- Tes Co., Ltd.
- Sang-Jean Jeon
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Nanosecond pulser ADC system
- Patent number 12,230,477
- Issue date Feb 18, 2025
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Catalytic nanofiber membrane assembly and reduced pressure plasma r...
- Patent number 12,224,162
- Issue date Feb 11, 2025
- The UAB Research Foundation
- Andrei V. Stanishevsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF tuning systems including tuning circuits having impedances for s...
- Patent number 12,217,939
- Issue date Feb 4, 2025
- Lam Research Corporation
- David French
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate support and plasma processing apparatus
- Patent number 12,198,906
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Hajime Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,191,124
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuo Matsudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for particle control in MRAM processing
- Patent number 12,176,192
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tsung-Han Kuo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vacuum deposition into trenches and vias and etch of trenches and via
- Patent number 12,170,185
- Issue date Dec 17, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for substrate transport in vacuum processing systems
- Patent number 12,142,463
- Issue date Nov 12, 2024
- VON ARDENNE Asset GmbH & Co. KG
- Falk Milde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device fabrication apparatus
- Patent number 12,136,539
- Issue date Nov 5, 2024
- SK ENPULSE CO., LTD.
- Jong Kyu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,119,211
- Issue date Oct 15, 2024
- ASM IP Holding B.V.
- ChangMin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support device
- Patent number 12,119,212
- Issue date Oct 15, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,080,526
- Issue date Sep 3, 2024
- Jusung Engineering Co., Ltd.
- Woong Kyo Oh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250232961
- Publication date Jul 17, 2025
- Hitachi High-Tech Corporation
- Kazuya TAJIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA
- Publication number 20250226187
- Publication date Jul 10, 2025
- Samsung Electronics Co., Ltd.
- Heewon MIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Treatment Device and Plasma Treatment Method
- Publication number 20250226180
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Hiroshi OTOMO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...
- Publication number 20250218739
- Publication date Jul 3, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ELECTRODE ASSEMBLY, SUBSTRATE PROCE...
- Publication number 20250218738
- Publication date Jul 3, 2025
- Kokusai Electric Corporation
- Tsuyoshi TAKEDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND CONTROL METHOD
- Publication number 20250210308
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Takamitsu TAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20250210324
- Publication date Jun 26, 2025
- NGK Insulators, Ltd.
- Tomohiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE AND NEUTRON CAPTURE THERAPY APPARATUS
- Publication number 20250210298
- Publication date Jun 26, 2025
- Sumitomo Heavy Industries, Ltd.
- Ryu MURASE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hybrid Plasma Source Array
- Publication number 20250201517
- Publication date Jun 19, 2025
- Beijing E-Town Semiconductor Technology Co., LTD
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD
- Publication number 20250201532
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Hachishiro IIZUKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250201551
- Publication date Jun 19, 2025
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20250191888
- Publication date Jun 12, 2025
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING A SUBSTRATE
- Publication number 20250174433
- Publication date May 29, 2025
- SAMSUNG ELECTRONICS CO,. LTD.
- Donghyeon NA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20250157793
- Publication date May 15, 2025
- DAIHEN Corporation
- Ryoji TAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250149370
- Publication date May 8, 2025
- NGK Insulators, Ltd.
- Hiroshi TAKEBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF TUNING SYSTEMS INCLUDING TUNING CIRCUITS HAVING IMPEDANCES FOR S...
- Publication number 20250118535
- Publication date Apr 10, 2025
- LAM RESEARCH CORPORATION
- David French
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR PARTICLE CONTROL IN MRAM PROCESSING
- Publication number 20250095975
- Publication date Mar 20, 2025
- Taiwan Semiconductor Manufacturing Co., LTD
- Tsung-Han KUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU PARTICLE DETECTION
- Publication number 20250060298
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Wei Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Processing Device
- Publication number 20250046575
- Publication date Feb 6, 2025
- TOKYO ELECTRON LIMITED
- Takahiro SHINDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE
- Publication number 20250014934
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE
- Publication number 20250006470
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404800
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...
- Publication number 20240387154
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Juan Carlos ROCHA-ALVAREZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION
- Publication number 20240387148
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Che Wei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240379328
- Publication date Nov 14, 2024
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE FABRICATION APPARATUS
- Publication number 20240363314
- Publication date Oct 31, 2024
- SK enpulse Co., Ltd.
- Jong Kyu LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240355583
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Naohiko OKUNISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...
- Publication number 20240339299
- Publication date Oct 10, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT INCLUDING MULTIPLE RADIO FREQUENCY (RF) ELECTRODES
- Publication number 20240321560
- Publication date Sep 26, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yulin PENG
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

Active gas generation apparatus

Substrate processing apparatus, substrate processing method, method...

Tunable plasma exclusion zone in semiconductor fabrication

Plasma processing apparatus

Stage and plasma processing apparatus

Apparatus and method for plasma coating solid fuels and coated soli...

Hybrid plasma source array

Substrate processing apparatus, method of manufacturing semiconduct...

Semiconductor processing apparatus and dielectric window cleaning m...

Work processing apparatus

Nano-coating protection method for electrical devices

Electrostatic chuck device

Repellent electrode for electron repelling

Plasma ion processing of substrates

Method of manufacturing electrode plate for plasma processing devic...

Substrate support device

Nanosecond pulser ADC system

Catalytic nanofiber membrane assembly and reduced pressure plasma r...

RF tuning systems including tuning circuits having impedances for s...

Substrate support and plasma processing apparatus

Plasma processing apparatus and plasma processing method

System and method for particle control in MRAM processing

Vacuum deposition into trenches and vias and etch of trenches and via

Device and method for substrate transport in vacuum processing systems

Semiconductor device fabrication apparatus

Substrate processing apparatus

Wafer support device

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS FOR ETCHING A SUBSTRATE BY USING PLASMA

Plasma Treatment Device and Plasma Treatment Method

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND MA...

SUBSTRATE PROCESSING APPARATUS, ELECTRODE ASSEMBLY, SUBSTRATE PROCE...

PLASMA PROCESSING APPARATUS AND CONTROL METHOD

WAFER PLACEMENT TABLE

ION SOURCE AND NEUTRON CAPTURE THERAPY APPARATUS

Hybrid Plasma Source Array

SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

PLASMA PROCESSING DEVICE

METHOD OF PROCESSING A SUBSTRATE

PLASMA PROCESSING APPARATUS

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

RF TUNING SYSTEMS INCLUDING TUNING CIRCUITS HAVING IMPEDANCES FOR S...

SYSTEM AND METHOD FOR PARTICLE CONTROL IN MRAM PROCESSING

IN-SITU PARTICLE DETECTION

Plasma Processing Device

BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE

EDGE CAPACITIVELY COUPLED PLASMA CHAMBER STRUCTURE

WAFER SUPPORT DEVICE

PLASMA TREATMENT APPARATUS

AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...

TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION

PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS

SEMICONDUCTOR DEVICE FABRICATION APPARATUS

PLASMA PROCESSING APPARATUS

MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...

SUBSTRATE SUPPORT INCLUDING MULTIPLE RADIO FREQUENCY (RF) ELECTRODES