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H01J37/32541

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32541Shape

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Vacuum deposition into trenches and vias and etch of trenches and via
- Patent number 12,170,185
- Issue date Dec 17, 2024
- Ascentool, Inc.
- George Xinsheng Guo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device and method for substrate transport in vacuum processing systems
- Patent number 12,142,463
- Issue date Nov 12, 2024
- VON ARDENNE Asset GmbH & Co. KG
- Falk Milde
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device fabrication apparatus
- Patent number 12,136,539
- Issue date Nov 5, 2024
- SK ENPULSE CO., LTD.
- Jong Kyu Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,119,211
- Issue date Oct 15, 2024
- ASM IP Holding B.V.
- ChangMin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support device
- Patent number 12,119,212
- Issue date Oct 15, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki Hirayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 12,080,526
- Issue date Sep 3, 2024
- Jusung Engineering Co., Ltd.
- Woong Kyo Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor having a variable coupling of low frequency RF power...
- Patent number 12,062,524
- Issue date Aug 13, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bipolar electrostatic chuck to limit DC discharge
- Patent number 12,057,339
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate, plasma processing apparatus and plasma processing method
- Patent number 12,051,564
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shower plate, lower dielectric member and plasma processing apparatus
- Patent number 12,046,455
- Issue date Jul 23, 2024
- Tokyo Electron Limited
- Satoru Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Free radical generation device and methods thereof
- Patent number 12,040,164
- Issue date Jul 16, 2024
- Somnio Global Holdings, LLC
- Pravansu S. Mohanty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing with broadband RF waveforms
- Patent number 12,020,902
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grounding cap module and gas injection device
- Patent number 12,020,906
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Li-Shi Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching method
- Patent number 12,020,942
- Issue date Jun 25, 2024
- ULVAC, Inc.
- Taichi Suzuki
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,020,909
- Issue date Jun 25, 2024
- Samsung Electronics Co., Ltd.
- Jang-Yeob Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for plasma-chemical gas/gas mixture conversion
- Patent number 11,996,272
- Issue date May 28, 2024
- Boris Vladlenovich Mislavskij
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus and techniques for angled etching using multielectrode ex...
- Patent number 11,967,489
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Peter F. Kurunczi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactors
- Patent number 11,961,717
- Issue date Apr 16, 2024
- OZONE 1 PTY LTD
- John Lionel Brauer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method and plasma processing apparatus
- Patent number 11,961,718
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shojiro Yahata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active gas generation apparatus
- Patent number 11,942,310
- Issue date Mar 26, 2024
- Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Ren Arita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and lower stage
- Patent number 11,929,234
- Issue date Mar 12, 2024
- Tokyo Electron Limited
- Taro Ikeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 11,915,927
- Issue date Feb 27, 2024
- Kokusai Electric Corporation
- Kazuyuki Okuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Stage and plasma processing apparatus
- Patent number 11,908,666
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Yasuharu Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and coating method
- Patent number 11,898,248
- Issue date Feb 13, 2024
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,881,380
- Issue date Jan 23, 2024
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Toshihiro Wada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Upper electrode and substrate processing apparatus including the same
- Patent number 11,869,751
- Issue date Jan 9, 2024
- Samsung Electronics Co., Ltd.
- Byungjo Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing equipment including electrostatic chuck fo...
- Patent number 11,862,440
- Issue date Jan 2, 2024
- Samsung Electronics Co., Ltd.
- Jeongil Mun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Repellent electrode for electron repelling
- Patent number 11,830,700
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Heng Yen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20240404800
- Publication date Dec 5, 2024
- Plasma Ion Assist Co., Ltd.
- Masanori WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...
- Publication number 20240387154
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- Juan Carlos ROCHA-ALVAREZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION
- Publication number 20240387148
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Che Wei Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
- Publication number 20240379328
- Publication date Nov 14, 2024
- Timothy M. Ziemba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE FABRICATION APPARATUS
- Publication number 20240363314
- Publication date Oct 31, 2024
- SK enpulse Co., Ltd.
- Jong Kyu LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240355583
- Publication date Oct 24, 2024
- Samsung Electronics Co., Ltd.
- Naohiko OKUNISHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...
- Publication number 20240339299
- Publication date Oct 10, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT INCLUDING MULTIPLE RADIO FREQUENCY (RF) ELECTRODES
- Publication number 20240321560
- Publication date Sep 26, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yulin PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240321550
- Publication date Sep 26, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS
- Publication number 20240312766
- Publication date Sep 19, 2024
- TOKYO ELECTRON LIMITED
- Jianping Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD
- Publication number 20240304453
- Publication date Sep 12, 2024
- Ulvac, Inc.
- Taichi SUZUKI
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM
- Publication number 20240304425
- Publication date Sep 12, 2024
- OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
- Othmar ZÜGER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240297024
- Publication date Sep 5, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Ren ARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...
- Publication number 20240282557
- Publication date Aug 22, 2024
- Samsung Electronics Co., Ltd.
- JINUK PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BUSH INSERT, BUSH ASSEMBLY INCLUDING THE SAME AND UPPER ELECTRODE A...
- Publication number 20240274328
- Publication date Aug 15, 2024
- Hana Materials Inc.
- Je Guen YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS
- Publication number 20240249924
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240242936
- Publication date Jul 18, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20240242943
- Publication date Jul 18, 2024
- NGK Insulators, Ltd.
- Tomohiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSECOND PULSER ADC SYSTEM
- Publication number 20240234090
- Publication date Jul 11, 2024
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS
- Publication number 20240234106
- Publication date Jul 11, 2024
- LAM RESEARCH CORPORATION
- Karl Frederick LEESER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20240212995
- Publication date Jun 27, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE MODIFICATION METHOD
- Publication number 20240162018
- Publication date May 16, 2024
- Sekisui Chemical Co., Ltd
- Eiji MIYAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STAGE AND PLASMA PROCESSING APPARATUS
- Publication number 20240153749
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yasuharu SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240153760
- Publication date May 9, 2024
- Kokusai Electric Corporation
- Kazuyuki OKUDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NANOSECOND PULSER ADC SYSTEM
- Publication number 20240136152
- Publication date Apr 25, 2024
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS
- Publication number 20240136161
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Karl Frederick LEESER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CATALYTIC NANOFIBER MEMBRANE ASSEMBLY AND REDUCED PRESSURE PLASMA R...
- Publication number 20240128059
- Publication date Apr 18, 2024
- The UAB Research Foundation
- Andrei V. Stanishevsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...
- Publication number 20240096604
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Yukinori ABURATANI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240084455
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che Wei YANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ACTIVE GAS GENERATION APPARATUS
- Publication number 20240062994
- Publication date Feb 22, 2024
- TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- Kensuke WATANABE
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Vacuum deposition into trenches and vias and etch of trenches and via

Device and method for substrate transport in vacuum processing systems

Semiconductor device fabrication apparatus

Substrate processing apparatus

Wafer support device

Plasma processing apparatus and plasma processing method

Substrate processing apparatus

Plasma reactor having a variable coupling of low frequency RF power...

Bipolar electrostatic chuck to limit DC discharge

Shower plate, plasma processing apparatus and plasma processing method

Shower plate, lower dielectric member and plasma processing apparatus

Free radical generation device and methods thereof

Plasma processing with broadband RF waveforms

Grounding cap module and gas injection device

Etching method

Plasma processing apparatus and plasma processing method

Method and device for plasma-chemical gas/gas mixture conversion

Apparatus and techniques for angled etching using multielectrode ex...

Plasma reactors

Plasma processing method and plasma processing apparatus

Active gas generation apparatus

Symmetric VHF source for a plasma reactor

Plasma processing apparatus and lower stage

Substrate processing apparatus, method of manufacturing semiconduct...

Stage and plasma processing apparatus

Coating apparatus and coating method

Plasma processing apparatus

Upper electrode and substrate processing apparatus including the same

Semiconductor processing equipment including electrostatic chuck fo...

Repellent electrode for electron repelling

Patents Applicationslast 30 patents

PLASMA TREATMENT APPARATUS

AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMI...

TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION

PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS

SEMICONDUCTOR DEVICE FABRICATION APPARATUS

PLASMA PROCESSING APPARATUS

MICROWAVE ANTENNA, AND POWER SUPPLYING DEVICE AND SUBSTRATE PROCESS...

SUBSTRATE SUPPORT INCLUDING MULTIPLE RADIO FREQUENCY (RF) ELECTRODES

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING WITH BROADBAND RF WAVEFORMS

ETCHING METHOD

ARC-BEAM SCANNING FOR SUPPRESSING ANODE OVERGROWTH IN PICVD SYSTEM

ACTIVE GAS GENERATION APPARATUS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USIN...

BUSH INSERT, BUSH ASSEMBLY INCLUDING THE SAME AND UPPER ELECTRODE A...

BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS

PLASMA PROCESSING APPARATUS

WAFER PLACEMENT TABLE

NANOSECOND PULSER ADC SYSTEM

TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS

APPARATUS FOR TREATING SUBSTRATE

SURFACE MODIFICATION METHOD

STAGE AND PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

NANOSECOND PULSER ADC SYSTEM

TRIPOLAR ELECTRODE ARRANGEMENT FOR ELECTROSTATIC CHUCKS

CATALYTIC NANOFIBER MEMBRANE ASSEMBLY AND REDUCED PRESSURE PLASMA R...

SUBSTRATE PROCESSING APPARATUS, PLASMA GENERATION APPARATUS, METHOD...

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

ACTIVE GAS GENERATION APPARATUS