Shields

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CPC
H01J2237/026

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/026Shields

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus and method for processing substrate
- Patent number 12,354,850
- Issue date Jul 8, 2025
- Eugene Technology Co., Ltd.
- Woo Duck Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 12,308,217
- Issue date May 20, 2025
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Enhanced deposition rate by thermal isolation cover for GIS manipul...
- Patent number 12,308,207
- Issue date May 20, 2025
- Applied Materials Israel Ltd.
- Sean Kashy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for detecting discharge site
- Patent number 12,288,669
- Issue date Apr 29, 2025
- NuFlare Technology, Inc.
- Toru Ariizumi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for forming a three-dimensional article
- Patent number 12,269,092
- Issue date Apr 8, 2025
- Arcam AB
- Safdar Ali
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Electron detection device and scanning electron microscope
- Patent number 12,261,016
- Issue date Mar 25, 2025
- CIQTEK CO., LTD.
- Da Yin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma apparatus and methods for processing materials usi...
- Patent number 12,261,023
- Issue date Mar 25, 2025
- 6K Inc.
- Richard K. Holman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas distribution ring for process chamber
- Patent number 12,243,719
- Issue date Mar 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Hsiang Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Member for semiconductor manufacturing apparatus and method for man...
- Patent number 12,243,729
- Issue date Mar 4, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 12,237,144
- Issue date Feb 25, 2025
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron detector
- Patent number 12,106,932
- Issue date Oct 1, 2024
- DECTRIS AG
- Radosav Pantelic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder, method for using sample holder, projection amount ad...
- Patent number 12,080,511
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Megumi Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier with vertical grid for supporting substrates in coater
- Patent number 12,068,142
- Issue date Aug 20, 2024
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, method of manufacturing semiconduct...
- Patent number 12,068,136
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Tsuyoshi Takeda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency screen for an ultraviolet lamp system
- Patent number 12,020,910
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated electrode and ground plane for a substrate support
- Patent number 12,020,912
- Issue date Jun 25, 2024
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus
- Patent number 11,996,263
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 11,990,320
- Issue date May 21, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetic-material shield around plasma chambers near pedestal
- Patent number 11,984,302
- Issue date May 14, 2024
- Applied Materials, Inc.
- Job George Konnoth Joseph
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,961,627
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Substrate processing apparatus and method of manufacturing semicond...
- Patent number 11,869,748
- Issue date Jan 9, 2024
- Kokusai Electric Corporation
- Takeshi Yasui
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Specimen machining device and information provision method
- Patent number 11,837,437
- Issue date Dec 5, 2023
- Jeol Ltd.
- Tatsuhito Kimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blanking aperture array unit
- Patent number 11,837,429
- Issue date Dec 5, 2023
- NuFlare Technology, Inc.
- Shuji Yoshino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus using multiple beams of charged particles
- Patent number 11,804,356
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Xuerang Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device and milling processing method using same
- Patent number 11,742,178
- Issue date Aug 29, 2023
- HITACHI HIGH-TECH CORPORATION
- Hitoshi Kamoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum chamber arrangement for charged particle beam generator
- Patent number 11,705,252
- Issue date Jul 18, 2023
- ASML Netherlands B.V.
- Alexander Hendrik Vincent Van Veen
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Stage apparatus
- Patent number 11,694,870
- Issue date Jul 4, 2023
- ASML Netherlands B.V.
- Jan-Gerard Cornelis Van Der Toorn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier with vertical grid for supporting substrates in coater
- Patent number 11,688,589
- Issue date Jun 27, 2023
- View, Inc.
- Bo Garrett Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency screen for an ultraviolet lamp system
- Patent number 11,670,491
- Issue date Jun 6, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-chun Yang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Shield for an Ion Implanter
- Publication number 20250232949
- Publication date Jul 17, 2025
- Applied Materials, Inc.
- Tseh-Jen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM
- Publication number 20250232941
- Publication date Jul 17, 2025
- ASML NETHERLANDS B.V.
- Zizhou GONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
A MULTI-MODE LOW-VOLTAGE ELECTRON MICROSCOPE
- Publication number 20250226173
- Publication date Jul 10, 2025
- DELONG INSTRUMENTS A.S.
- Tomas Bejdak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20250157783
- Publication date May 15, 2025
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES
- Publication number 20250104976
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Glen F. R. Gilchrist
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON-OPTICAL DEVICE
- Publication number 20250095950
- Publication date Mar 20, 2025
- ASML NETHERLANDS B.V.
- Paul IJmert SCHEFFERS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
In-Vacuum Rotatable RF Component
- Publication number 20250079116
- Publication date Mar 6, 2025
- Applied Materials, Inc.
- Michael Mason Carrell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SHIELDED DETECTOR FOR CHARGED PARTICLE MICROSCOPY
- Publication number 20250069844
- Publication date Feb 27, 2025
- FEI Company
- Petr Hlavenka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electronic Cleaning Device
- Publication number 20250037962
- Publication date Jan 30, 2025
- Hitachi High-Tech Corporation
- Yuto KUBONAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALL...
- Publication number 20250029807
- Publication date Jan 23, 2025
- INTEGRATED DYNAMICS ENGINEERING GMBH
- Steve Jackson DJEMPE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER
- Publication number 20250014873
- Publication date Jan 9, 2025
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20250014855
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Marco Jan-Jaco WIELAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION RING FOR PROCESS CHAMBER
- Publication number 20240379330
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Hsiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Concentrated Solar Irradiation of Targets in Plasmas
- Publication number 20240363308
- Publication date Oct 31, 2024
- National Technology & Engineering Solutions of Sandia, LLC
- Jeffrey Daniel ENGERER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING KIT SHIELD
- Publication number 20240352574
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Sundarapandian Ramaling Vijayalaskshmi REDDY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM
- Publication number 20240304426
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Sheng-chun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS
- Publication number 20240266152
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Michael Andrew STEARNS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER
- Publication number 20240258077
- Publication date Aug 1, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHARGED PARTICLE APPARATUS AND METHOD
- Publication number 20240242921
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Mans Johan Bertil OSTERBERG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240234105
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240186100
- Publication date Jun 6, 2024
- NuFlare Technology, Inc.
- Shuji YOSHINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240071730
- Publication date Feb 29, 2024
- TOKYO ELECTRON LIMITED
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES
- Publication number 20240071711
- Publication date Feb 29, 2024
- ASML NETHERLANDS B.V.
- Xuerang HU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED DEPOSITION RATE BY THERMAL ISOLATION COVER FOR GIS MANIPUL...
- Publication number 20240062990
- Publication date Feb 22, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Sean Kashy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...
- Publication number 20240029999
- Publication date Jan 25, 2024
- NuFlare Technology, Inc.
- Hiroshi Yamashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MICROSCOPE
- Publication number 20240006146
- Publication date Jan 4, 2024
- National University of Singapore
- Jeroen Anton VAN KAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS DISTRIBUTION RING FOR PROCESS CHAMBER
- Publication number 20230420222
- Publication date Dec 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Hsiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR
- Publication number 20230386696
- Publication date Nov 30, 2023
- ASML NETHERLANDS B.V.
- Alexander Hendrik Vincent VAN VEEN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Apparatus and method for processing substrate

Apparatus for preventing contamination of self-plasma chamber

Enhanced deposition rate by thermal isolation cover for GIS manipul...

Method and apparatus for detecting discharge site

Apparatus and method for forming a three-dimensional article

Electron detection device and scanning electron microscope

Microwave plasma apparatus and methods for processing materials usi...

Gas distribution ring for process chamber

Member for semiconductor manufacturing apparatus and method for man...

Apparatus using multiple beams of charged particles

To an inductively coupled plasma source

Electron detector

Sample holder, method for using sample holder, projection amount ad...

Carrier with vertical grid for supporting substrates in coater

Substrate processing apparatus, method of manufacturing semiconduct...

Radio frequency screen for an ultraviolet lamp system

Integrated electrode and ground plane for a substrate support

Stage apparatus

Apparatus for preventing contamination of self-plasma chamber

Magnetic-material shield around plasma chambers near pedestal

Vacuum chamber arrangement for charged particle beam generator

Substrate processing apparatus and method of manufacturing semicond...

Specimen machining device and information provision method

Blanking aperture array unit

Apparatus using multiple beams of charged particles

Ion milling device and milling processing method using same

Vacuum chamber arrangement for charged particle beam generator

Stage apparatus

Carrier with vertical grid for supporting substrates in coater

Radio frequency screen for an ultraviolet lamp system

Patents Applicationslast 30 patents

Shield for an Ion Implanter

WAFER EDGE INSPECTION OF CHARGED PARTICLE INSPECTION SYSTEM

A MULTI-MODE LOW-VOLTAGE ELECTRON MICROSCOPE

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

RECOMBINATION CHANNELS FOR ANGLE CONTROL OF NEUTRAL REACTIVE SPECIES

ELECTRON-OPTICAL DEVICE

In-Vacuum Rotatable RF Component

SHIELDED DETECTOR FOR CHARGED PARTICLE MICROSCOPY

Electronic Cleaning Device

APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALL...

CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER

CHARGED PARTICLE APPARATUS AND METHOD

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

GAS DISTRIBUTION RING FOR PROCESS CHAMBER

Concentrated Solar Irradiation of Targets in Plasmas

PROCESSING KIT SHIELD

RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM

PLASMA UNIFORMITY CONTROL SYSTEM AND METHODS

APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER

CHARGED PARTICLE APPARATUS AND METHOD

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

PLASMA PROCESSING APPARATUS

APPARATUS USING MULTIPLE BEAMS OF CHARGED PARTICLES

ENHANCED DEPOSITION RATE BY THERMAL ISOLATION COVER FOR GIS MANIPUL...

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRIT...

ION MICROSCOPE

GAS DISTRIBUTION RING FOR PROCESS CHAMBER

VACUUM CHAMBER ARRANGEMENT FOR CHARGED PARTICLE BEAM GENERATOR