Shields

Industry

CPC
H01J37/32651

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32651Shields

Industries

Patents Grantslast 30 patents

Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin-film-deposition equipment
- Patent number 12,198,904
- Issue date Jan 14, 2025
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,183,558
- Issue date Dec 31, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alignment mask, metal mask assembly, and preparation method therefor
- Patent number 12,183,617
- Issue date Dec 31, 2024
- Chengdu BOE Optoelectronics Technology Co., Ltd.
- Ju Mei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cover ring to mitigate carbon contamination in plasma doping chamber
- Patent number 12,165,852
- Issue date Dec 10, 2024
- Applied Materials, Inc.
- Vikram M. Bhosle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooled shield for ICP source
- Patent number 12,159,770
- Issue date Dec 3, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,159,771
- Issue date Dec 3, 2024
- Tokyo Electron Limited
- Yuki Kawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 12,154,767
- Issue date Nov 26, 2024
- Tokyo Electron Limited
- Naoki Kubota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for plasma processing
- Patent number 12,119,207
- Issue date Oct 15, 2024
- Tokyo Electron Limited
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation apparatus, film formation method, and method for fab...
- Patent number 12,112,955
- Issue date Oct 8, 2024
- Kioxia Corporation
- Yusuke Kondo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal oxide preclean chamber with improved selectivity and flow con...
- Patent number 12,100,576
- Issue date Sep 24, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam etching apparatus and method
- Patent number 12,087,558
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system including coil with RF powered faraday...
- Patent number 12,087,557
- Issue date Sep 10, 2024
- Lam Research Corporation
- Shen Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 12,077,848
- Issue date Sep 3, 2024
- Tokyo Electron Limited
- Kanto Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Preclean chamber upper shield with showerhead
- Patent number 12,080,522
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Sarath Babu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Carrier with vertical grid for supporting substrates in coater
- Patent number 12,068,142
- Issue date Aug 20, 2024
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,068,139
- Issue date Aug 20, 2024
- Tokyo Electron Limited
- Shin Matsuura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer processing method and plasma processing apparatus
- Patent number 12,051,574
- Issue date Jul 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature-controlled shield, material deposition apparatus and me...
- Patent number 12,049,691
- Issue date Jul 30, 2024
- Applied Materials, Inc.
- Andreas Lopp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition apparatus and deposition method using the same
- Patent number 12,051,569
- Issue date Jul 30, 2024
- Samsung Display Co., Ltd.
- Kwan Yong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Filter circuit and plasma processing apparatus
- Patent number 12,033,833
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Koji Yamagishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of driving relay member
- Patent number 12,027,346
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Nobutaka Sasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radio frequency screen for an ultraviolet lamp system
- Patent number 12,020,910
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Sheng-chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for preventing contamination of self-plasma chamber
- Patent number 11,990,320
- Issue date May 21, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 11,978,614
- Issue date May 7, 2024
- Tokyo Electron Limited
- Yusuke Hayasaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shielding device and thin-film-deposition equipment with the same
- Patent number 11,972,936
- Issue date Apr 30, 2024
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shielding device and thin-film-deposition equipment with the same
- Patent number 11,961,724
- Issue date Apr 16, 2024
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process kit having tall deposition ring for PVD chamber
- Patent number 11,961,723
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- David Gunther
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 11,955,315
- Issue date Apr 9, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS AND METHOD FOR PLASMA PROCESSING
- Publication number 20250037977
- Publication date Jan 30, 2025
- TOKYO ELECTRON LIMITED
- Barton Lane
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING
- Publication number 20250014865
- Publication date Jan 9, 2025
- TOKYO ELECTRON LIMITED
- Merritt Funk
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER
- Publication number 20250014873
- Publication date Jan 9, 2025
- View, Inc.
- Bo Neilan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shield Ring Mounting Using Compliant Hardware
- Publication number 20250014870
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Jordan B. Tye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240395508
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Hao Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD
- Publication number 20240387151
- Publication date Nov 21, 2024
- Applied Materials, Inc.
- BENJAMIN ALEXANDROVICH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF SUBSTRATE PROCESSING AND METHODS OF MANUFACTURING SEMICO...
- Publication number 20240376600
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Cheng WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ion Beam Etching Apparatus And Method
- Publication number 20240379333
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jung-Hao Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240371612
- Publication date Nov 7, 2024
- JUSUNG ENGINEERING CO., LTD.
- Young Rok KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240371609
- Publication date Nov 7, 2024
- TOKYO ELECTRON LIMITED
- Shin MATSUURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE-CONTROLLED SHIELD, MATERIAL DEPOSITION APPARATUS AND ME...
- Publication number 20240360546
- Publication date Oct 31, 2024
- Applied Materials, Inc.
- Andreas LOPP
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD
- Publication number 20240304456
- Publication date Sep 12, 2024
- Hitachi High-Tech Corporation
- Koichi TAKASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM
- Publication number 20240304426
- Publication date Sep 12, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- Sheng-chun YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...
- Publication number 20240301546
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Thomas Werner Zilbauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATMENT APPARATUS MEMBER
- Publication number 20240290582
- Publication date Aug 29, 2024
- KYOCERA CORPORATION
- Daiki WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER
- Publication number 20240258077
- Publication date Aug 1, 2024
- NANOTECH INC.
- Dong Ho Cha
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240249922
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Ryota SAKANE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER
- Publication number 20240242947
- Publication date Jul 18, 2024
- Applied Materials, Inc.
- David GUNTHER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240242942
- Publication date Jul 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Cheng WU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus with Plasma and Thermal Processing S...
- Publication number 20240212981
- Publication date Jun 27, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC FILTER AND PLASMA PROCESSING APPARATUS HAVING THE SAME
- Publication number 20240212993
- Publication date Jun 27, 2024
- FNS.INC.
- Kwankoo KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20240203704
- Publication date Jun 20, 2024
- SEMES CO., LTD.
- Yoon Seok CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...
- Publication number 20240186128
- Publication date Jun 6, 2024
- Applied Materials, Inc.
- Alan RITCHIE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metallic Shield For Stable Tape-Frame Substrate Processing
- Publication number 20240136159
- Publication date Apr 25, 2024
- Harish Varma PENMETHSA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE
- Publication number 20240096599
- Publication date Mar 21, 2024
- Hitachi High-Tech Corporation
- Koichi Takasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND SEMICOND...
- Publication number 20240087853
- Publication date Mar 14, 2024
- KIOXIA Corporation
- Kazuhiko NAKAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...
- Publication number 20240071754
- Publication date Feb 29, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Stephen E. Savas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus with Thermal Processing Systems
- Publication number 20240055242
- Publication date Feb 15, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING APPARATUS FOR GENERATING PLASMA
- Publication number 20240014016
- Publication date Jan 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Hsiang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature Control Using Temperature Control Element Coupled to Fa...
- Publication number 20230411125
- Publication date Dec 21, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Yorkman Ma
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

To an inductively coupled plasma source

Thin-film-deposition equipment

Workpiece processing apparatus with thermal processing systems

Alignment mask, metal mask assembly, and preparation method therefor

Cover ring to mitigate carbon contamination in plasma doping chamber

Cooled shield for ICP source

Plasma processing apparatus

Substrate processing apparatus and substrate processing method

Apparatus for plasma processing

Film formation apparatus, film formation method, and method for fab...

Metal oxide preclean chamber with improved selectivity and flow con...

Tin oxide films in semiconductor device manufacturing

Ion beam etching apparatus and method

Substrate processing system including coil with RF powered faraday...

Vacuum processing apparatus

Preclean chamber upper shield with showerhead

Carrier with vertical grid for supporting substrates in coater

Plasma processing apparatus

Wafer processing method and plasma processing apparatus

Temperature-controlled shield, material deposition apparatus and me...

Deposition apparatus and deposition method using the same

Filter circuit and plasma processing apparatus

Substrate processing apparatus and method of driving relay member

Radio frequency screen for an ultraviolet lamp system

Apparatus for preventing contamination of self-plasma chamber

Substrate processing apparatus

Shielding device and thin-film-deposition equipment with the same

Shielding device and thin-film-deposition equipment with the same

Process kit having tall deposition ring for PVD chamber

Workpiece processing apparatus with plasma and thermal processing s...

Patents Applicationslast 30 patents

APPARATUS AND METHOD FOR PLASMA PROCESSING

APPARATUS FOR PLASMA PROCESSING

CARRIER WITH VERTICAL GRID FOR SUPPORTING SUBSTRATES IN COATER

Shield Ring Mounting Using Compliant Hardware

PLASMA PROCESSING APPARATUS AND METHOD

INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD

METHODS OF SUBSTRATE PROCESSING AND METHODS OF MANUFACTURING SEMICO...

Ion Beam Etching Apparatus And Method

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

TEMPERATURE-CONTROLLED SHIELD, MATERIAL DEPOSITION APPARATUS AND ME...

PLASMA PROCESSING METHOD

RADIO FREQUENCY SCREEN FOR AN ULTRAVIOLET LAMP SYSTEM

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...

PLASMA TREATMENT APPARATUS MEMBER

APPARATUS FOR PREVENTING CONTAMINATION OF SELF-PLASMA CHAMBER

PLASMA PROCESSING APPARATUS

PROCESS KIT HAVING TALL DEPOSITION RING FOR PVD CHAMBER

APPARATUS AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Workpiece Processing Apparatus with Plasma and Thermal Processing S...

ELECTROMAGNETIC FILTER AND PLASMA PROCESSING APPARATUS HAVING THE SAME

APPARATUS FOR TREATING SUBSTRATE

METHODS AND APPARATUS FOR REDUCING SPUTTERING OF A GROUNDED SHIELD...

Metallic Shield For Stable Tape-Frame Substrate Processing

PLASMA PROCESSING DEVICE

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND SEMICOND...

Enhanced Ignition in Inductively Coupled Plasmas For Workpiece Proc...

Workpiece Processing Apparatus with Thermal Processing Systems

SEMICONDUCTOR PROCESSING APPARATUS FOR GENERATING PLASMA

Temperature Control Using Temperature Control Element Coupled to Fa...