Silicon-containing compounds

Industry

CPC
G03F7/075

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/075Silicon-containing compounds

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Methods for producing three-dimensional objects
- Patent number 12,172,382
- Issue date Dec 24, 2024
- Carbon, Inc.
- Jason P. Rolland
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Curable resin composition, thin film, and color conversion panel an...
- Patent number 12,122,879
- Issue date Oct 22, 2024
- Samsung SDI Co., Ltd.
- Seungeun Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Energy-sensitive composition, cured product, and forming method of...
- Patent number 12,099,297
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Kunihiro Noda
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Film-forming composition, silicon-containing film, and resist patte...
- Patent number 12,098,282
- Issue date Sep 24, 2024
- JSR Corporation
- Tomoaki Seko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aromatic underlayer
- Patent number 12,099,300
- Issue date Sep 24, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,085,856
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, laminate, and pattern forming pro...
- Patent number 12,055,853
- Issue date Aug 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Kumiko Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin patterning materials with ligands having silicon/germaniu...
- Patent number 12,032,291
- Issue date Jul 9, 2024
- Inpria Corporation
- Robert E. Jilek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photopolymer composition
- Patent number 12,001,141
- Issue date Jun 4, 2024
- LG Chem Ltd.
- Heon Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hologram medium
- Patent number 11,994,704
- Issue date May 28, 2024
- LG Chem, Ltd.
- Seokhoon Jang
- G02 - OPTICS
Information Patent Grant
Flow cells
- Patent number 11,988,957
- Issue date May 21, 2024
- Illumina, Inc.
- Jeffrey S. Fisher
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Low temperature cure photoimageable dielectric compositions and met...
- Patent number 11,988,963
- Issue date May 21, 2024
- Daniel J Nawrocki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive tone photoresist formulation using crosslinkable siloxane...
- Patent number 11,982,942
- Issue date May 14, 2024
- Merck Patent GmbH
- Karsten Koppe
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Dual cure compositions
- Patent number 11,976,172
- Issue date May 7, 2024
- Saint-Gobain Performance Plastics Corporation
- Qiaoxi Li
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Grant
Water-developable flexographic printing original plate
- Patent number 11,975,556
- Issue date May 7, 2024
- TOYOBO MC CORPORATION
- Kazuya Yoshimoto
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device production method employing silicon-containing...
- Patent number 11,966,164
- Issue date Apr 23, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru Shibayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, substrate for pattern formation, photodegradable coupling...
- Patent number 11,953,833
- Issue date Apr 9, 2024
- Nikon Corporation
- Yusuke Kawakami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Coating compositions and methods of forming electronic devices
- Patent number 11,940,732
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Sheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,934,100
- Issue date Mar 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist imaging and development for enhanced nozzle plate adhesion
- Patent number 11,926,157
- Issue date Mar 12, 2024
- Funai Electric Co., Ltd.
- Sean T. Weaver
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 11,914,300
- Issue date Feb 27, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Blocked silicone dual cure resins for additive manufacturing
- Patent number 11,905,423
- Issue date Feb 20, 2024
- Carbon, Inc.
- Jessica D. Drazba
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive siloxane composition and pattern forming method usin...
- Patent number 11,899,365
- Issue date Feb 13, 2024
- Merck Patent GmbH
- Naofumi Yoshida
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive resin composition, patterning process, method for fo...
- Patent number 11,892,773
- Issue date Feb 6, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hiroyuki Urano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acetal-protected silanol group-containing polysiloxane composition
- Patent number 11,884,839
- Issue date Jan 30, 2024
- NISSAN CHEMICAL CORPORATION
- Yuki Endo
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Adhesion promoter and photosensitive resin composition containing same
- Patent number 11,886,117
- Issue date Jan 30, 2024
- SHANDONG SHENGQUAN NEW MATERIALS CO LTD.
- Diyuan Tang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition, pattern-forming method, and compound-producing method
- Patent number 11,880,138
- Issue date Jan 23, 2024
- JSR Corporation
- Shin-ya Nakafuji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR PRODUCING DISPLAY DEVICE, AND DISPLAY DEVICE
- Publication number 20240431190
- Publication date Dec 26, 2024
- SHARP KABUSHIKI KAISHA
- Yukio TAKENAKA
- B82 - NANO-TECHNOLOGY
Information Patent Application
PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20240427245
- Publication date Dec 26, 2024
- TAKOMA TECHNOLOGY CO., LTD.
- Mi Sun Ryu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS
- Publication number 20240419076
- Publication date Dec 19, 2024
- The Aerospace Corporation
- Sean C. STUART
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...
- Publication number 20240419073
- Publication date Dec 19, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material For Forming Organic Film, Patterning Process, And Organic...
- Publication number 20240402605
- Publication date Dec 5, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN
- Publication number 20240385521
- Publication date Nov 21, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND...
- Publication number 20240384065
- Publication date Nov 21, 2024
- TORAY INDUSTRIES, INC.
- Eisuke Iizuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
STRUCTURE INCLUDING SILICON GERMANIUM OXIDE PHOTORESIST UNDERLAYER...
- Publication number 20240377751
- Publication date Nov 14, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING...
- Publication number 20240369925
- Publication date Nov 7, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takumi OKADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Material For Forming Organic Film, Substrate For Manufacturing Semi...
- Publication number 20240363335
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...
- Publication number 20240361695
- Publication date Oct 31, 2024
- ASM IP HOLDING B.V.
- João Ricardo Antunes Afonso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method For Forming Resist Underlayer Film And Patterning Process
- Publication number 20240345483
- Publication date Oct 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Naoki KOBAYASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH REFRACTIVE INDEX PHOTORESIST COMPOSITION
- Publication number 20240337943
- Publication date Oct 10, 2024
- Dow Silicones Corporation
- Peng-Fei Fu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANOTIN PATTERNING MATERIALS WITH LIGANDS HAVING SILICON/GERMANIU...
- Publication number 20240337941
- Publication date Oct 10, 2024
- INPRIA CORPORATION
- Robert E. Jilek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A Lithographic Printing Plate Precursor
- Publication number 20240337942
- Publication date Oct 10, 2024
- AGFA Offset BV
- Hubertus Van Aert
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLY...
- Publication number 20240329534
- Publication date Oct 3, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi Ibata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Device and Method of Manufacture
- Publication number 20240319590
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Hung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition For Forming Silicon-Containing Resist Underlayer Film A...
- Publication number 20240319598
- Publication date Sep 26, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takehiro SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION, UNDERLAYER FILM...
- Publication number 20240319600
- Publication date Sep 26, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE
- Publication number 20240321803
- Publication date Sep 26, 2024
- SUMITOMO BAKELITE CO., LTD.
- Akihiko Otoguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Material For Forming Adhesive Film, Patterning Process, And Method...
- Publication number 20240310731
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Mamoru WATABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...
- Publication number 20240302744
- Publication date Sep 12, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOW CELLS
- Publication number 20240302738
- Publication date Sep 12, 2024
- Illumina, Inc.
- Jeffrey S. Fisher
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20240295813
- Publication date Sep 5, 2024
- FUJIFILM CORPORATION
- Takahiro OKAWARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER
- Publication number 20240295814
- Publication date Sep 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION
- Publication number 20240295815
- Publication date Sep 5, 2024
- NISSAN CHEMICAL CORPORATION
- Wataru SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...
- Publication number 20240288772
- Publication date Aug 29, 2024
- Shin-Etsu Chemical Co., Ltd.
- Hitoshi Maruyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION
- Publication number 20240288773
- Publication date Aug 29, 2024
- JSR Corporation
- Masato DOBASHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE COMPOSITION COMPRISING INORGANIC PARTICLE
- Publication number 20240280904
- Publication date Aug 22, 2024
- DUK SAN NEOLUX CO., LTD.
- Changmin LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Silicon-containing compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods for producing three-dimensional objects

Curable resin composition, thin film, and color conversion panel an...

Energy-sensitive composition, cured product, and forming method of...

Film-forming composition, silicon-containing film, and resist patte...

Aromatic underlayer

Resist composition and method of forming resist pattern

Positive photosensitive resin composition, positive photosensitive...

Photosensitive resin composition, laminate, and pattern forming pro...

Organotin patterning materials with ligands having silicon/germaniu...

Photopolymer composition

Hologram medium

Flow cells

Low temperature cure photoimageable dielectric compositions and met...

Positive tone photoresist formulation using crosslinkable siloxane...

Dual cure compositions

Water-developable flexographic printing original plate

Semiconductor devices and methods of manufacturing

Semiconductor device production method employing silicon-containing...

Compound, substrate for pattern formation, photodegradable coupling...

Coating compositions and methods of forming electronic devices

Composition for forming silicon-containing resist underlayer film a...

Photoresist imaging and development for enhanced nozzle plate adhesion

Thermosetting iodine- and silicon-containing material, composition...

Manufacturing method of semiconductor chip, and kit

Blocked silicone dual cure resins for additive manufacturing

Photosensitive siloxane composition and pattern forming method usin...

Photosensitive resin composition, patterning process, method for fo...

Acetal-protected silanol group-containing polysiloxane composition

Adhesion promoter and photosensitive resin composition containing same

Composition, pattern-forming method, and compound-producing method

Patents Applicationslast 30 patents

METHOD FOR PRODUCING DISPLAY DEVICE, AND DISPLAY DEVICE

PHOTOSENSITIVE RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME

PATTERNED DARK MIRROR COATINGS FOR MULTI-FUNCTIONAL OPTICS

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...

Material For Forming Organic Film, Patterning Process, And Organic...

PRIMER FOR SEMICONDUCTOR SUBSTRATE AND METHOD FOR FORMING A PATTERN

SILOXANE RESIN COMPOSITION FOR FORMING CURED FILM, CURED FILM, AND...

STRUCTURE INCLUDING SILICON GERMANIUM OXIDE PHOTORESIST UNDERLAYER...

RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING...

Material For Forming Organic Film, Substrate For Manufacturing Semi...

STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-O...

Method For Forming Resist Underlayer Film And Patterning Process

HIGH REFRACTIVE INDEX PHOTORESIST COMPOSITION

ORGANOTIN PATTERNING MATERIALS WITH LIGANDS HAVING SILICON/GERMANIU...

A Lithographic Printing Plate Precursor

FILM-FORMING COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLY...

Optical Device and Method of Manufacture

Composition For Forming Silicon-Containing Resist Underlayer Film A...

FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION, UNDERLAYER FILM...

PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, AND SEMICONDUCTOR DEVICE

Material For Forming Adhesive Film, Patterning Process, And Method...

COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDU...

FLOW CELLS

PHOTOSENSITIVE COMPOSITION

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER

SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOS...

METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, AND COMPOSITION

PHOTOSENSITIVE COMPOSITION COMPRISING INORGANIC PARTICLE