simultaneous coating and exposure; using a belt mask

Industry

CPC
G03F7/2035

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/2035simultaneous coating and exposure; using a belt mask

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,899,366
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 11,112,697
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photolithography method and system based on high step slope
- Patent number 10,816,903
- Issue date Oct 27, 2020
- CSMC Technologies Fab1 Co., Ltd.
- Jiale Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, laminate comprising photomask, photomask preparation met...
- Patent number 10,732,500
- Issue date Aug 4, 2020
- LG Chem, Ltd.
- Yong Goo Son
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 10,474,033
- Issue date Nov 12, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for post exposure processing of photoresist wa...
- Patent number 10,203,604
- Issue date Feb 12, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method, exposure equipment and 3-D structure
- Patent number 10,001,707
- Issue date Jun 19, 2018
- Winbond Electronics Corp.
- Yu-Hsuan Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, actinic ray-sensitive or radiation-sensitiv...
- Patent number 9,952,509
- Issue date Apr 24, 2018
- FUJIFILM Corporation
- Keita Kato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithography method and system based on high step slope
- Patent number 9,939,724
- Issue date Apr 10, 2018
- CSMC TECHNOLOGIES FABI CO., LTD.
- Jiale Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, exposure apparatus and device manufacturing method
- Patent number 9,563,116
- Issue date Feb 7, 2017
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lock-release polymerization
- Patent number 9,512,278
- Issue date Dec 6, 2016
- Massachusetts Institute of Technology
- Ki Wan Bong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Nanopatterning method and apparatus
- Patent number 9,465,296
- Issue date Oct 11, 2016
- Rolith, Inc.
- Boris Kobrin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Coating and developing apparatus, method of operating the same and...
- Patent number 9,411,235
- Issue date Aug 9, 2016
- Tokyo Electron Limited
- Tomohiro Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Facility and method for treating substrate
- Patent number 9,405,194
- Issue date Aug 2, 2016
- Semes Co., Ltd.
- Soo Min Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing structures in optoelectronic components and de...
- Patent number 9,174,400
- Issue date Nov 3, 2015
- Osram Opto Semiconductors GmbH
- Karl Engl
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Photoimaging
- Patent number 9,134,614
- Issue date Sep 15, 2015
- Rainbow Technology Systems LTD
- Jonathan Kennett
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser induced thermal imaging mask, laser irradiation apparatus inc...
- Patent number 9,054,314
- Issue date Jun 9, 2015
- Samsung Display Co., Ltd.
- Jin-Won Sun
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Focus position adjusting apparatus, reticle, focus position adjusti...
- Patent number 8,910,096
- Issue date Dec 9, 2014
- Kabushiki Kaisha Toshiba
- Yuji Setta
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, exposure apparatus and device manufacturing method
- Patent number 8,609,301
- Issue date Dec 17, 2013
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated membrane lamination and UV exposure system and method of...
- Patent number 8,524,442
- Issue date Sep 3, 2013
- David A. Recchia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluidic channel system and method for fabricating fine structure
- Patent number 8,408,892
- Issue date Apr 2, 2013
- SNU R&DB Foundation
- Sunghoon Kwon
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Device for producing structured optical materials
- Patent number 8,382,463
- Issue date Feb 26, 2013
- Leibniz-Institut fuer Neue Materialien Gemeinnuetzige Gesellschaft mit beschr...
- Peter W. Oliveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Display element manufacturing method and manufacturing apparatus, t...
- Patent number 8,349,672
- Issue date Jan 8, 2013
- Nikon Corporation
- Kei Nara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabrication of nanostructured devices
- Patent number 8,318,386
- Issue date Nov 27, 2012
- Rolith Inc.
- Boris Kobrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transfer device
- Patent number 8,319,946
- Issue date Nov 27, 2012
- ORC Manufacturing Co., Ltd.
- Jin Sato
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Stop flow interference lithography system
- Patent number 8,252,517
- Issue date Aug 28, 2012
- Massachusetts Institute of Technology
- Edwin L. Thomas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for fabricating three-dimensional structures with...
- Patent number 8,071,277
- Issue date Dec 6, 2011
- 3M Innovative Properties Company
- Jerome C. Porque
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Transfer device
- Patent number 7,961,299
- Issue date Jun 14, 2011
- ORC Manufacturing Co., Ltd.
- Jin Sato
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Grant
Microstructure synthesis by flow lithography and polymerization
- Patent number 7,709,544
- Issue date May 4, 2010
- Massachusetts Institute of Technology
- Patrick S. Doyle
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Patterning apparatus and method for fabricating continuous pattern...
- Patent number 7,298,452
- Issue date Nov 20, 2007
- LG Electronics Inc.
- Suk-Ho Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20220004104
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING AND THINNING FOR THE FABRICATION OF LITHOGRAPHICALLY PATTER...
- Publication number 20210399708
- Publication date Dec 23, 2021
- University of Oregon
- Ignas Lekavicius
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20190187563
- Publication date Jun 20, 2019
- Applied Materials, Inc.
- Viachslav Babayan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND SYSTEM BASED ON HIGH STEP SLOPE
- Publication number 20180188652
- Publication date Jul 5, 2018
- CSMC TECHNOLOGIES FAB1 CO., LTD.
- Jiale Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20170363960
- Publication date Dec 21, 2017
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Lock-Release Polymerization
- Publication number 20170306103
- Publication date Oct 26, 2017
- Massachusetts Institute of Technology
- Ki Wan Bong
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
EXPOSURE METHOD, EXPOSURE EQUIPMENT AND 3-D STRUCTURE
- Publication number 20170293226
- Publication date Oct 12, 2017
- WINBOND ELECTRONICS CORP.
- Yu-Hsuan HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...
- Publication number 20170154797
- Publication date Jun 1, 2017
- Applied Materials, Inc.
- Viachslav Babayan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...
- Publication number 20160313645
- Publication date Oct 27, 2016
- FUJIFILM CORPORATION
- Keita KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PATTERNING PHOTOSENSITIVE RESIN LAYER
- Publication number 20160041469
- Publication date Feb 11, 2016
- Canon Kabushiki Kaisha
- Ken Ikegame
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY METHOD AND SYSTEM BASED ON HIGH STEP SLOPE
- Publication number 20150227048
- Publication date Aug 13, 2015
- CSMC TECHNOLOGIES FAB1 CO., LTD.
- Jiale Su
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COATING AND DEVELOPING APPARATUS, METHOD OF OPERATING THE SAME AND...
- Publication number 20150077727
- Publication date Mar 19, 2015
- TOKYO ELECTRON LIMITED
- Tomohiro Kaneko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY WITH REDUCED FEATURE PITCH USING ROTATING MASK TECHNIQUES
- Publication number 20140234780
- Publication date Aug 21, 2014
- Rolith, Inc.
- Boris Kobrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH ASPECT RATIO PATTERNING USING NEAR-FIELD OPTICAL LITHOGRAPHY W...
- Publication number 20140202986
- Publication date Jul 24, 2014
- Rolith, Inc.
- Alfred Renaldo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FACILITY AND METHOD FOR TREATING SUBSTRATE
- Publication number 20140152966
- Publication date Jun 5, 2014
- SEMES CO., LTD.
- Soo Min HWANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20130329209
- Publication date Dec 12, 2013
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOIMAGING
- Publication number 20130316152
- Publication date Nov 28, 2013
- Rainbow Technology Systems Ltd
- Charles Jonathan Kennett
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FLUDIC CHANNEL SYSTEM AND METHOD FOR FABRICATING FINE STRUCTURE
- Publication number 20130207315
- Publication date Aug 15, 2013
- SNU R&DB Foundation
- Sunghoon KWON
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
Integrated Membrane Lamination and UV Exposure System and Method of...
- Publication number 20130209939
- Publication date Aug 15, 2013
- David A. RECCHIA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NANOPATTERNING METHOD AND APPARATUS
- Publication number 20120274004
- Publication date Nov 1, 2012
- Rolith, Inc.
- Boris Kobrin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Lock-Release Polymerization
- Publication number 20120135235
- Publication date May 31, 2012
- Massachusetts Institute of Technology
- Ki Wan Bong
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
LASER INDUCED THERMAL IMAGING MASK, LASER IRRADIATION APPARATUS INC...
- Publication number 20120099615
- Publication date Apr 26, 2012
- Samsung Mobile Display Co., Ltd.
- Jin-Won Sun
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
TRANSFER DEVICE
- Publication number 20110204175
- Publication date Aug 25, 2011
- ORC MANUFACTURING CO., LTD.
- Jin Sato
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Display element manufacturing method and manufacturing apparatus, t...
- Publication number 20110151630
- Publication date Jun 23, 2011
- Kei NARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUIDIC CHANNEL SYSTEM AND METHOD FOR FABRICATING FINE STRUCTURE
- Publication number 20110006464
- Publication date Jan 13, 2011
- Sunghoon Kwon
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
TRANSFER METHOD AND TRANSFER APPARATUS
- Publication number 20100229790
- Publication date Sep 16, 2010
- TOSHIBA KIKAI KABUSHIKI KAISHA
- Mitsuaki Serizawa
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
MICROSTRUCTURE SYNTHESIS BY FLOW LITHOGRAPHY AND POLYMERIZATION
- Publication number 20100172898
- Publication date Jul 8, 2010
- Massachusetts Institute of Technology
- Patrick S. DOYLE
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
METHOD AND DEVICE FOR PRODUCING STRUCTURED OPTICAL MATERIALS
- Publication number 20100155974
- Publication date Jun 24, 2010
- Peter W. Oliveira
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stop Flow Interference Lithography System
- Publication number 20100099048
- Publication date Apr 22, 2010
- Massachusetts Institute of Technology
- Edwin L. Thomas
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Fabrication of nanostructured devices
- Publication number 20100035163
- Publication date Feb 11, 2010
- ROLITH, INC
- Boris Kobrin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

simultaneous coating and exposure; using a belt mask

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for post exposure processing of photoresist wa...

Method and apparatus for post exposure processing of photoresist wa...

Photolithography method and system based on high step slope

Photomask, laminate comprising photomask, photomask preparation met...

Method and apparatus for post exposure processing of photoresist wa...

Method and apparatus for post exposure processing of photoresist wa...

Exposure method, exposure equipment and 3-D structure

Pattern forming method, actinic ray-sensitive or radiation-sensitiv...

Photolithography method and system based on high step slope

Mask, exposure apparatus and device manufacturing method

Lock-release polymerization

Nanopatterning method and apparatus

Coating and developing apparatus, method of operating the same and...

Facility and method for treating substrate

Method for producing structures in optoelectronic components and de...

Photoimaging

Laser induced thermal imaging mask, laser irradiation apparatus inc...

Focus position adjusting apparatus, reticle, focus position adjusti...

Mask, exposure apparatus and device manufacturing method

Integrated membrane lamination and UV exposure system and method of...

Fluidic channel system and method for fabricating fine structure

Device for producing structured optical materials

Display element manufacturing method and manufacturing apparatus, t...

Fabrication of nanostructured devices

Transfer device

Stop flow interference lithography system

Method and system for fabricating three-dimensional structures with...

Transfer device

Microstructure synthesis by flow lithography and polymerization

Patterning apparatus and method for fabricating continuous pattern...

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

ETCHING AND THINNING FOR THE FABRICATION OF LITHOGRAPHICALLY PATTER...

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

PHOTOLITHOGRAPHY METHOD AND SYSTEM BASED ON HIGH STEP SLOPE

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

Lock-Release Polymerization

EXPOSURE METHOD, EXPOSURE EQUIPMENT AND 3-D STRUCTURE

METHOD AND APPARATUS FOR POST EXPOSURE PROCESSING OF PHOTORESIST WA...

PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIV...

METHOD FOR PATTERNING PHOTOSENSITIVE RESIN LAYER

PHOTOLITHOGRAPHY METHOD AND SYSTEM BASED ON HIGH STEP SLOPE

COATING AND DEVELOPING APPARATUS, METHOD OF OPERATING THE SAME AND...

LITHOGRAPHY WITH REDUCED FEATURE PITCH USING ROTATING MASK TECHNIQUES

HIGH ASPECT RATIO PATTERNING USING NEAR-FIELD OPTICAL LITHOGRAPHY W...

FACILITY AND METHOD FOR TREATING SUBSTRATE

MASK, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

PHOTOIMAGING

FLUDIC CHANNEL SYSTEM AND METHOD FOR FABRICATING FINE STRUCTURE

Integrated Membrane Lamination and UV Exposure System and Method of...

NANOPATTERNING METHOD AND APPARATUS

Lock-Release Polymerization

LASER INDUCED THERMAL IMAGING MASK, LASER IRRADIATION APPARATUS INC...

TRANSFER DEVICE

Display element manufacturing method and manufacturing apparatus, t...

FLUIDIC CHANNEL SYSTEM AND METHOD FOR FABRICATING FINE STRUCTURE

TRANSFER METHOD AND TRANSFER APPARATUS

MICROSTRUCTURE SYNTHESIS BY FLOW LITHOGRAPHY AND POLYMERIZATION

METHOD AND DEVICE FOR PRODUCING STRUCTURED OPTICAL MATERIALS

Stop Flow Interference Lithography System

Fabrication of nanostructured devices