Software, data control or modelling

Industry

CPC
H01J37/32926

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32926Software, data control or modelling

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Assessment of matching networks
- Patent number 12,272,533
- Issue date Apr 8, 2025
- Advanced Energy Industries, Inc.
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for using binning to increase power during a lo...
- Patent number 12,266,505
- Issue date Apr 1, 2025
- Lam Research Corporation
- Alexei Marakhtanov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-layer hardmask for defect reduction in EUV patterning
- Patent number 12,261,044
- Issue date Mar 25, 2025
- Lam Research Corporation
- Bhaskar Nagabhirava
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diagnostic method and system for measuring potential and electric f...
- Patent number 12,255,056
- Issue date Mar 18, 2025
- Southwest Jiaotong University
- Yuhong Xu
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Plasma measurement method
- Patent number 12,237,157
- Issue date Feb 25, 2025
- Tokyo Electron Limited
- Eiki Kamata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etch feedback for control of upstream process
- Patent number 12,237,158
- Issue date Feb 25, 2025
- Applied Materials, Inc.
- Priyadarshi Panda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensor data compression in a plasma tool
- Patent number 12,217,940
- Issue date Feb 4, 2025
- Lam Research Corporation
- John Valcore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Performing radio frequency matching control using a model-based dig...
- Patent number 12,211,670
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Tao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniformity control for plasma processing
- Patent number 12,211,677
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Radio frequency power generator having multiple output ports
- Patent number 12,205,796
- Issue date Jan 21, 2025
- Lam Research Corporation
- Sunil Kapoor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process control knob estimation
- Patent number 12,191,126
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Jeong Jin Hong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,546
- Issue date Dec 31, 2024
- ASM IP Holding B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Synchronization of bias supplies
- Patent number 12,176,184
- Issue date Dec 24, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition-condition output device, method for outputting depositio...
- Patent number 12,148,600
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Toshiyuki Fukumoto
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for measuring electron nonextensive parameter of plasma usin...
- Patent number 12,144,096
- Issue date Nov 12, 2024
- Nanchang University
- Huibin Qiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In situ real-time sensing and compensation of non-uniformities in s...
- Patent number 12,142,464
- Issue date Nov 12, 2024
- Lam Research Corporation
- Changyou Jing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus, temperature control method, and temper...
- Patent number 12,087,559
- Issue date Sep 10, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and prediction method of the condition...
- Patent number 12,080,529
- Issue date Sep 3, 2024
- HITACHI HIGH-TECH CORPORATION
- Yoshito Kamaji
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Model reference adaptive control with signum projection tensor oper...
- Patent number 12,080,530
- Issue date Sep 3, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Smart dynamic load simulator for RF power delivery control system
- Patent number 12,080,519
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,074,076
- Issue date Aug 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Soichiro Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Model-based scheduling for substrate processing systems
- Patent number 12,072,689
- Issue date Aug 27, 2024
- Lam Research Corporation
- Raymond Chau
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Programmable plasma ignition profiles
- Patent number 12,074,008
- Issue date Aug 27, 2024
- Advanced Energy Industries, Inc.
- Mike Armstrong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus, and temperature control method
- Patent number 12,063,717
- Issue date Aug 13, 2024
- Tokyo Electron Limited
- Shinsuke Oka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arcing protection method, processing tool and fabrication system
- Patent number 12,057,301
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wun-Kai Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Image-based digital control of plasma processing
- Patent number 12,027,426
- Issue date Jul 2, 2024
- Applied Materials, Inc.
- Vladimir Nagorny
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optimizing plasma resources for targeted film
- Patent number 12,020,914
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Shota Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing system
- Patent number 12,014,909
- Issue date Jun 18, 2024
- HITACHI HIGH-TECH CORPORATION
- Ryoji Asakura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting location of a wafer and a top plate...
- Patent number 12,014,910
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Hsiang Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system and plasma processing method
- Patent number 12,009,190
- Issue date Jun 11, 2024
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Hiroshi Shirouzu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS CONTROL KNOB ESTIMATION
- Publication number 20250104984
- Publication date Mar 27, 2025
- Applied Materials, Inc.
- Jeong Jin Hong
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MONITORING AND CONTROL OF PLASMA-BASED PROCESSES
- Publication number 20250104982
- Publication date Mar 27, 2025
- LAM RESEARCH CORPORATION
- Gordon Alex MacDonald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250095969
- Publication date Mar 20, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL REFERENCE ADAPTIVE CONTROL WITH SIGNUM PROJECTION TENSOR OPER...
- Publication number 20250087473
- Publication date Mar 13, 2025
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087460
- Publication date Mar 13, 2025
- ASM IP HOLDING B.V.
- KiChul Um
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN S...
- Publication number 20250069866
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Changyou JING
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND GAS EXHAUST METHOD
- Publication number 20250069867
- Publication date Feb 27, 2025
- Hitachi High-Tech Corporation
- Tzu Wei TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR MONITORING RADICAL SPECIES FLUX OF PLASMA
- Publication number 20250062107
- Publication date Feb 20, 2025
- Applied Materials, Inc.
- Martin Hilkene
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODEL-BASED SCHEDULING FOR SUBSTRATE PROCESSING SYSTEMS
- Publication number 20250044775
- Publication date Feb 6, 2025
- LAM RESEARCH CORPORATION
- Raymond CHAU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250014877
- Publication date Jan 9, 2025
- Panasonic Intellectual Property Management Co., Ltd.
- Hisao NAGAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20250006462
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Morihito INAGAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION EXTRACTION OPTICS HAVING NON UNIFORM GRID ASSEMBLY
- Publication number 20240412956
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Costel BILOIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM
- Publication number 20240404805
- Publication date Dec 5, 2024
- Tokyo Electron Limited
- Mikio SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DATA CALCULATION METHOD AND SUBSTRATE PROCESSING DEVICE
- Publication number 20240395517
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM
- Publication number 20240395505
- Publication date Nov 28, 2024
- Applied Materials, Inc.
- Jie Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Non-Intrusive Method for 2D/3D Mapping Plasma Parameters
- Publication number 20240377331
- Publication date Nov 14, 2024
- TOKYO ELECTRON LIMITED
- Qiang Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION QUALITY MONITORING USING MULTI-CHANNEL SENSOR DATA
- Publication number 20240371617
- Publication date Nov 7, 2024
- Applied Materials, Inc.
- Jeremy Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ARCING PROTECTION METHOD, PROCESSING TOOL AND FABRICATION SYSTEM
- Publication number 20240363318
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wun-Kai TSAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION BEAM ETCH SYSTEM AND METHOD
- Publication number 20240355597
- Publication date Oct 24, 2024
- LAM RESEARCH CORPORATION
- Chih-Yang CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Machine Learning a Detection of at Least One Irregularit...
- Publication number 20240355598
- Publication date Oct 24, 2024
- COMET AG
- Thomas Fink
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSTIC METHOD AND SYSTEM FOR MEASURING POTENTIAL AND ELECTRIC F...
- Publication number 20240355599
- Publication date Oct 24, 2024
- Southwest Jiaotong University
- Yuhong XU
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS DIAGNOSTIC APPARATUS, SEMICONDUCTOR MANUFACTURING APPARAT...
- Publication number 20240339308
- Publication date Oct 10, 2024
- Satoru Matsukura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDIRECT PLASMA HEALTH MONITORING
- Publication number 20240321564
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Tobin Kaufman-Osborn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Generating an RF Signal, Controller, RF Generator and Pl...
- Publication number 20240321553
- Publication date Sep 26, 2024
- COMET AG
- André Grede
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROVIDING RF POWER AND OPERATING METHOD THEREOF
- Publication number 20240304420
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Siyoung Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240297027
- Publication date Sep 5, 2024
- Hitachi High-Tech Corporation
- Soichiro ETO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDPENDENT DILUTION INJECT FOR REMOTE PLASMA OXIDATION
- Publication number 20240297022
- Publication date Sep 5, 2024
- Applied Materials, Inc.
- Hansel LO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR COMPENSATING FOR RF POWER LOSS
- Publication number 20240290579
- Publication date Aug 29, 2024
- LAM RESEARCH CORPORATION
- Mathew Dennis Evans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA MONITORING SYSTEM AND METHOD OF MONITORING PLASMA
- Publication number 20240274419
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Kwangho LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS SIMULATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTU...
- Publication number 20240274416
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Jaesik An
- H01 - BASIC ELECTRIC ELEMENTS

Software, data control or modelling

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Assessment of matching networks

Systems and methods for using binning to increase power during a lo...

Multi-layer hardmask for defect reduction in EUV patterning

Diagnostic method and system for measuring potential and electric f...

Plasma measurement method

Etch feedback for control of upstream process

Sensor data compression in a plasma tool

Performing radio frequency matching control using a model-based dig...

Uniformity control for plasma processing

Radio frequency power generator having multiple output ports

Process control knob estimation

Substrate processing apparatus

Synchronization of bias supplies

Deposition-condition output device, method for outputting depositio...

Method for measuring electron nonextensive parameter of plasma usin...

In situ real-time sensing and compensation of non-uniformities in s...

Plasma processing apparatus, temperature control method, and temper...

Plasma processing apparatus and prediction method of the condition...

Model reference adaptive control with signum projection tensor oper...

Smart dynamic load simulator for RF power delivery control system

Plasma processing apparatus and plasma processing method

Model-based scheduling for substrate processing systems

Programmable plasma ignition profiles

Plasma processing apparatus, and temperature control method

Arcing protection method, processing tool and fabrication system

Image-based digital control of plasma processing

Optimizing plasma resources for targeted film

Plasma processing apparatus and plasma processing system

Method and system for adjusting location of a wafer and a top plate...

Plasma processing system and plasma processing method

Patents Applicationslast 30 patents

PROCESS CONTROL KNOB ESTIMATION

MONITORING AND CONTROL OF PLASMA-BASED PROCESSES

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

MODEL REFERENCE ADAPTIVE CONTROL WITH SIGNUM PROJECTION TENSOR OPER...

SUBSTRATE PROCESSING APPARATUS

IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN S...

PLASMA PROCESSING APPARATUS AND GAS EXHAUST METHOD

METHOD AND SYSTEM FOR MONITORING RADICAL SPECIES FLUX OF PLASMA

MODEL-BASED SCHEDULING FOR SUBSTRATE PROCESSING SYSTEMS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

SUBSTRATE PROCESSING METHOD

ION EXTRACTION OPTICS HAVING NON UNIFORM GRID ASSEMBLY

PLASMA PROCESSING APPARATUS, CONTROL METHOD, AND STORING MEDIUM

DATA CALCULATION METHOD AND SUBSTRATE PROCESSING DEVICE

SMART DYNAMIC LOAD SIMULATOR FOR RF POWER DELIVERY CONTROL SYSTEM

Non-Intrusive Method for 2D/3D Mapping Plasma Parameters

PLASMA GENERATION QUALITY MONITORING USING MULTI-CHANNEL SENSOR DATA

ARCING PROTECTION METHOD, PROCESSING TOOL AND FABRICATION SYSTEM

ION BEAM ETCH SYSTEM AND METHOD

Method for Machine Learning a Detection of at Least One Irregularit...

DIAGNOSTIC METHOD AND SYSTEM FOR MEASURING POTENTIAL AND ELECTRIC F...

APPARATUS DIAGNOSTIC APPARATUS, SEMICONDUCTOR MANUFACTURING APPARAT...

INDIRECT PLASMA HEALTH MONITORING

Method for Generating an RF Signal, Controller, RF Generator and Pl...

APPARATUS FOR PROVIDING RF POWER AND OPERATING METHOD THEREOF

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

INDPENDENT DILUTION INJECT FOR REMOTE PLASMA OXIDATION

SYSTEMS AND METHODS FOR COMPENSATING FOR RF POWER LOSS

PLASMA MONITORING SYSTEM AND METHOD OF MONITORING PLASMA

PLASMA PROCESS SIMULATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTU...