Spatial variables

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H01J2237/24578

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HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/24578Spatial variables

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Plasma process monitoring apparatus using terahertz waves and monit...
- Patent number 12,198,893
- Issue date Jan 14, 2025
- IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
- Hak Sung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam device
- Patent number 12,148,593
- Issue date Nov 19, 2024
- HITACHI HIGH-TECH CORPORATION
- Shinichi Matsubara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam apparatus and image acquiring method
- Patent number 12,148,594
- Issue date Nov 19, 2024
- Jeol Ltd.
- Takeshi Otsuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing chambers configured for tunable substrate and edg...
- Patent number 12,142,469
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target and algorithm to measure overlay by modeling back scattering...
- Patent number 12,100,574
- Issue date Sep 24, 2024
- KLA Corporation
- Nadav Gutman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for operating a multi-beam particle beam microscope
- Patent number 12,094,683
- Issue date Sep 17, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for processing wafer
- Patent number 12,074,074
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Po-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,074,076
- Issue date Aug 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Soichiro Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam device
- Patent number 12,046,446
- Issue date Jul 23, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Chiba
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Diagnosis apparatus, plasma processing apparatus and diagnosis method
- Patent number 12,040,167
- Issue date Jul 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota Umeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Analyzing a sidewall of hole milled in a sample to determine thickn...
- Patent number 12,033,831
- Issue date Jul 9, 2024
- Applied Materials Israel Ltd.
- Ilya Blayvas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer de-chucking detection and arcing prevention
- Patent number 12,002,702
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Ganesh Balasubramanian
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measurement system, temperature measurement method, and...
- Patent number 11,972,921
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Non-contact angle measuring apparatus
- Patent number 11,903,755
- Issue date Feb 20, 2024
- Weng-Dah Ken
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam implantation method and semiconductor device
- Patent number 11,908,694
- Issue date Feb 20, 2024
- Infineon Technologies AG
- Moriz Jelinek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measuring method and plasma processing apparatus
- Patent number 11,854,767
- Issue date Dec 26, 2023
- Tokyo Electron Limited
- Masanori Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method with fiducials having offset layouts
- Patent number 11,835,460
- Issue date Dec 5, 2023
- Illumina, Inc.
- John S. Vieceli
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
System using pixelated faraday sensor
- Patent number 11,810,754
- Issue date Nov 7, 2023
- Applied Materials, Inc.
- Eric D. Hermanson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of determining aberrations of a charged particle beam, and...
- Patent number 11,810,753
- Issue date Nov 7, 2023
- ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Dominik Ehberger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System for deriving electrical characteristics and non-transitory c...
- Patent number 11,776,103
- Issue date Oct 3, 2023
- HITACHI HIGH-TECH CORPORATION
- Heita Kimizuka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Auto-calibration to a station of a process module that spins a wafer
- Patent number 11,742,229
- Issue date Aug 29, 2023
- Lam Research Corporation
- Jacob L. Hiester
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for measuring CD using scanning electron microscope
- Patent number 11,740,073
- Issue date Aug 29, 2023
- Samsung Electronics Co., Ltd.
- Jooho Kim
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for operating a multi-beam particle beam microscope
- Patent number 11,735,393
- Issue date Aug 22, 2023
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection tool and method of determining a distortion of an inspec...
- Patent number 11,728,129
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Peter Christianus Johannes Maria De Loijer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for charged particle detection
- Patent number 11,715,619
- Issue date Aug 1, 2023
- ASML Netherlands B.V.
- Yongxin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method of manufacturing s...
- Patent number 11,664,253
- Issue date May 30, 2023
- Kioxia Corporation
- Kazuya Yoshimori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for determining a position of an element on a...
- Patent number 11,650,495
- Issue date May 16, 2023
- Carl Zeiss SMT GmbH
- Michael Budach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for determining a beamlet position and method for determinin...
- Patent number RE49483
- Issue date Apr 4, 2023
- ASML Netherlands B.V.
- Paul IJmert Scheffers
Information Patent Grant
Optical height detection system
- Patent number 11,521,826
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Jian Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF DETERMINING A BEAM CONVERGENCE OF A CHARGED PARTICLE BEAM...
- Publication number 20250037965
- Publication date Jan 30, 2025
- ICT Integrated Circuit Testing Gesellschaft fur Halbleiterpruftechnik mbH
- Dominik Ehberger
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
- Publication number 20250037961
- Publication date Jan 30, 2025
- ASML NETHERLANDS B.V.
- Martin Frans, Pierre SMEETS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR SUBSTRATE, APPARATUS, AND METHOD
- Publication number 20250029811
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Arthur Eduard OVERLACK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...
- Publication number 20240339295
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Tzu-Chao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...
- Publication number 20240331968
- Publication date Oct 3, 2024
- ASML NETHERLANDS B.V.
- Yan REN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OPERATING A MULTI-BEAM PARTICLE BEAM MICROSCOPE
- Publication number 20240312759
- Publication date Sep 19, 2024
- Carl Zeiss MultiSEM GmbH
- Dirk Zeidler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESS MONITORING APPARATUS USING TERAHERTZ WAVES AND MONIT...
- Publication number 20240297014
- Publication date Sep 5, 2024
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Hak Sung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT METHOD AND MEASUREMENT SYSTEM
- Publication number 20240280383
- Publication date Aug 22, 2024
- TOKYO ELECTRON LIMITED
- Hikaru FUJIWARA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MACHINE LEARNING BASED YIELD PREDICTION
- Publication number 20240281958
- Publication date Aug 22, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Boris LEVANT
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SUBSTRATE POSITION MONITORING DEVICES
- Publication number 20240274401
- Publication date Aug 15, 2024
- KLA Corporation
- James Richard Bella
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS,...
- Publication number 20240258068
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...
- Publication number 20240258065
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Dirk Preikszas
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Alignment Free Ion Column
- Publication number 20240222067
- Publication date Jul 4, 2024
- FEI Company
- Radek Smolka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER STATE DETECTION
- Publication number 20240219165
- Publication date Jul 4, 2024
- LAM RESEARCH CORPORATION
- Noah Elliot Baker
- G01 - MEASURING TESTING
Information Patent Application
XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER
- Publication number 20240222070
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Stephen Krause
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Collision Judgment Apparatus, Recording Medium Recording Program, a...
- Publication number 20240212975
- Publication date Jun 27, 2024
- JEOL Ltd.
- Kohei Hayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING SYSTEM, APPARATUS, AND METHOD FOR DETERMINING MAINTENANC...
- Publication number 20240186126
- Publication date Jun 6, 2024
- Research & Business Foundation Sungkyunkwan University
- Geun Young YEOM
- G01 - MEASURING TESTING
Information Patent Application
CALCULATE WAFERS THICKNESS OUT OF WAFER MAPPING PROCESS
- Publication number 20240178022
- Publication date May 30, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Ofer Dudovitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
USING LASER BEAM FOR SEM BASE TOOLS, WORKING DISTANCE MEASUREMENT A...
- Publication number 20240177962
- Publication date May 30, 2024
- APPLIED MATERIALS ISRAEL LTD.
- Ofer Dudovitch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
- Publication number 20240153135
- Publication date May 9, 2024
- SEMES CO., LTD.
- Ho Hun LEE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ION BEAM IMPLANTATION METHOD AND SEMICONDUCTOR DEVICE
- Publication number 20240145247
- Publication date May 2, 2024
- INFINEON TECHNOLOGIES AG
- Moriz JELINEK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPONENT REPLACEMENT METHOD, COMPONENT REPLACEMENT DEVICE, AND COM...
- Publication number 20240128064
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Hiroki ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-PRECISION TIMING CLOCK METHOD AND APPARATUS
- Publication number 20240115222
- Publication date Apr 11, 2024
- Weng-Dah Ken
- G04 - HOROLOGY
Information Patent Application
SUBSTRATE ANALYSIS SYSTEM
- Publication number 20240112881
- Publication date Apr 4, 2024
- Samsung Electronics Co., Ltd.
- Jonghyeok PARK
- G01 - MEASURING TESTING
Information Patent Application
TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD
- Publication number 20240096601
- Publication date Mar 21, 2024
- KIOXIA Corporation
- Takeharu MOTOKAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...
- Publication number 20240096590
- Publication date Mar 21, 2024
- NuFlare Technology, Inc.
- Yasutaka SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...
- Publication number 20240087838
- Publication date Mar 14, 2024
- Carl Zeiss MultiSEM GmbH
- Stefan Schubert
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20240087843
- Publication date Mar 14, 2024
- PSK INC.
- JONG CHAN LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SAMPLE PIECE RELOCATING DEVICE
- Publication number 20240087841
- Publication date Mar 14, 2024
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Tatsuya ASAHATA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AUTO-FOCUS SENSOR IMPLEMENTATION FOR MULTI-COLUMN MICROSCOPES
- Publication number 20240079203
- Publication date Mar 7, 2024
- KLA Corporation
- Nicholas Petrone
- H01 - BASIC ELECTRIC ELEMENTS

Spatial variables

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma process monitoring apparatus using terahertz waves and monit...

Substrate processing apparatus and interlock method thereof

Ion beam device

Charged particle beam apparatus and image acquiring method

Plasma processing chambers configured for tunable substrate and edg...

Target and algorithm to measure overlay by modeling back scattering...

Method for operating a multi-beam particle beam microscope

Method and system for processing wafer

Plasma processing apparatus and plasma processing method

Charged particle beam device

Diagnosis apparatus, plasma processing apparatus and diagnosis method

Analyzing a sidewall of hole milled in a sample to determine thickn...

Wafer de-chucking detection and arcing prevention

Temperature measurement system, temperature measurement method, and...

Non-contact angle measuring apparatus

Ion beam implantation method and semiconductor device

Measuring method and plasma processing apparatus

System and method with fiducials having offset layouts

System using pixelated faraday sensor

Methods of determining aberrations of a charged particle beam, and...

System for deriving electrical characteristics and non-transitory c...

Auto-calibration to a station of a process module that spins a wafer

Method for measuring CD using scanning electron microscope

Method for operating a multi-beam particle beam microscope

Inspection tool and method of determining a distortion of an inspec...

Method and apparatus for charged particle detection

Semiconductor manufacturing apparatus and method of manufacturing s...

Apparatus and method for determining a position of an element on a...

Method for determining a beamlet position and method for determinin...

Optical height detection system

Patents Applicationslast 30 patents

METHOD OF DETERMINING A BEAM CONVERGENCE OF A CHARGED PARTICLE BEAM...

BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION

SENSOR SUBSTRATE, APPARATUS, AND METHOD

METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...

CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING...

METHOD FOR OPERATING A MULTI-BEAM PARTICLE BEAM MICROSCOPE

PLASMA PROCESS MONITORING APPARATUS USING TERAHERTZ WAVES AND MONIT...

MEASUREMENT METHOD AND MEASUREMENT SYSTEM

MACHINE LEARNING BASED YIELD PREDICTION

SUBSTRATE POSITION MONITORING DEVICES

METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS,...

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRO...

Method for Alignment Free Ion Column

WAFER STATE DETECTION

XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER

Collision Judgment Apparatus, Recording Medium Recording Program, a...

MONITORING SYSTEM, APPARATUS, AND METHOD FOR DETERMINING MAINTENANC...

CALCULATE WAFERS THICKNESS OUT OF WAFER MAPPING PROCESS

USING LASER BEAM FOR SEM BASE TOOLS, WORKING DISTANCE MEASUREMENT A...

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

ION BEAM IMPLANTATION METHOD AND SEMICONDUCTOR DEVICE

COMPONENT REPLACEMENT METHOD, COMPONENT REPLACEMENT DEVICE, AND COM...

ULTRA-PRECISION TIMING CLOCK METHOD AND APPARATUS

SUBSTRATE ANALYSIS SYSTEM

TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD

CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRIT...

MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSC...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

SAMPLE PIECE RELOCATING DEVICE

AUTO-FOCUS SENSOR IMPLEMENTATION FOR MULTI-COLUMN MICROSCOPES