specially adapted for use as photomask

Industry

CPC
C03C17/3665

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

CCHEMISTRY METALLURGY C03Glass mineral C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF FIBRES OR FILAMENTS FROM GLASS, MINERALS OR SLAGS JOINING GLASS TO GLASS OR OTHER MATERIALS C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating

Current Industry

C03C17/3665specially adapted for use as photomask

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,295,900
- Issue date May 21, 2019
- Hoya Corporation
- Toshihiko Orihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Blank for mold production and method for manufacturing mold
- Patent number 10,040,220
- Issue date Aug 7, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 10,001,699
- Issue date Jun 19, 2018
- Hoya Corporation
- Toshihiko Orihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask blank substrate, substrate with multilayer reflection film, tr...
- Patent number 9,494,851
- Issue date Nov 15, 2016
- Hoya Corporation
- Toshihiko Orihara
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask fabrication supporting method, mask blank providing method, an...
- Patent number 8,627,239
- Issue date Jan 7, 2014
- Hoya Corporation
- Hiroyuki Ishida
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Mask fabrication supporting method, mask blank providing method, an...
- Patent number 8,196,070
- Issue date Jun 5, 2012
- Hoya Corporation
- Hiroyuki Ishida
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Multilayer reflective film coated substrate, manufacturing method t...
- Patent number 8,081,384
- Issue date Dec 20, 2011
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Process for smoothing surface of glass substrate
- Patent number 7,901,843
- Issue date Mar 8, 2011
- Asahi Glass Company, Limited
- Takashi Sugiyama
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Multilayer reflective film coated substrate, manufacturing method t...
- Patent number 7,804,648
- Issue date Sep 28, 2010
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for adjusting dimensions of photomask features
- Patent number 7,749,663
- Issue date Jul 6, 2010
- Micron Technology, Inc.
- Robert T. Rasmussen
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method for smoothing a surface of a glass substrate for a reflectiv...
- Patent number 7,712,333
- Issue date May 11, 2010
- Asahi Glass Company, Limited
- Toshiyuki Uno
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Reflective mask blank, reflective mask, and method of manufacturing...
- Patent number 7,700,245
- Issue date Apr 20, 2010
- Hoya Corporation
- Morio Hosoya
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mask fabrication supporting method, mask blank providing method, an...
- Patent number 7,660,456
- Issue date Feb 9, 2010
- Hoya Corporation
- Hiroyuki Ishida
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Dual-layer EUV mask absorber with trenches having opposing sidewall...
- Patent number 7,410,733
- Issue date Aug 12, 2008
- Intel Corporation
- Pei-Yang Yan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Multilayer coatings for EUV mask substrates
- Patent number 7,326,502
- Issue date Feb 5, 2008
- Intel Corporation
- Peter J. Silverman
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective mask blank having a programmed defect and method of prod...
- Patent number 7,282,305
- Issue date Oct 16, 2007
- Hoya Corporation
- Tsutomo Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for adjusting dimensions of photomask features
- Patent number 7,186,480
- Issue date Mar 6, 2007
- Micron Technology, Inc.
- Robert T. Rasmussen
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Double-metal EUV mask absorber
- Patent number 6,913,706
- Issue date Jul 5, 2005
- Intel Corporation
- Pei-Yang Yan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Reflective-type mask blank for exposure, method of producing the sa...
- Patent number 6,797,368
- Issue date Sep 28, 2004
- Hoya Corporation
- Tsutomu Shoki
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Method of repairing a phase shifting mask
- Patent number 6,607,674
- Issue date Aug 19, 2003
- Macronix International Co, Ltd.
- Ching-Yu Chang
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Transparent optical device and fabrication method thereof
- Patent number 6,372,392
- Issue date Apr 16, 2002
- Fujitsu Limited
- Eiichi Hoshino
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Process for fabricating high reflectance-low stress Mo—Si m...
- Patent number 6,309,705
- Issue date Oct 30, 2001
- The Regents of the University of California
- Claude Montcalm
- G02 - OPTICS
Information Patent Grant
High reflectance-low stress Mo-Si multilayer reflective coatings
- Patent number 6,110,607
- Issue date Aug 29, 2000
- The Regents of the University of California
- Claude Montcalm
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...
- Publication number 20240069428
- Publication date Feb 29, 2024
- HOYA CORPORATION
- Yohei IKEBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTILAYERED-REFLECTIVE-FILM-PROVIDED SUBSTRATE, REFLECTIVE MASK BL...
- Publication number 20210096456
- Publication date Apr 1, 2021
- HOYA CORPORATION
- Kota SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...
- Publication number 20180275507
- Publication date Sep 27, 2018
- HOYA CORPORATION
- Toshihiko ORIHARA
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK FABRICATION SUPPORTING METHOD, MASK BLANK PROVIDING METHOD, AN...
- Publication number 20120260222
- Publication date Oct 11, 2012
- HOYA CORPORATION
- Hiroyuki Ishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FABRICATION SUPPORTING METHOD, MASK BLANK PROVIDING METHOD, AN...
- Publication number 20100178597
- Publication date Jul 15, 2010
- Hiroyuki ISHIDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for etching glass or metal substrates using negative photore...
- Publication number 20100126367
- Publication date May 27, 2010
- Ji-Su Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PROCESSING GLASS SUBSTRATE SURFACE
- Publication number 20100080961
- Publication date Apr 1, 2010
- ASAHI GLASS COMPANY, LIMITED
- Kenji OKAMURA
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
PROCESS FOR SMOOTHING SURFACE OF GLASS SUBSTRATE
- Publication number 20090286166
- Publication date Nov 19, 2009
- Asahi Glass Company, Limited
- Takashi SUGIYAMA
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multilayer Coatings For EUV Mask Substrates
- Publication number 20080113303
- Publication date May 15, 2008
- Intel Corporation
- Peter J. Silverman
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflective mask blank, reflective mask, and method of manufacturing...
- Publication number 20070275308
- Publication date Nov 29, 2007
- Hoya Corporation
- Morio Hosoya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for smoothing a surface of a glass substrate, and substrate...
- Publication number 20070240453
- Publication date Oct 18, 2007
- ASAHI GLASS COMPANY LIMITED
- Toshiyuki Uno
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask fabrication supporting method, mask blank providing method, an...
- Publication number 20070178387
- Publication date Aug 2, 2007
- HOYA CORPORATION
- Hiroyuki Ishida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomasks including multi-layered light-shielding and methods of m...
- Publication number 20070166630
- Publication date Jul 19, 2007
- Samsung Electronics Co. Ltd.
- Chang-Hwan Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayer reflective film coated substrate, manufacturing method t...
- Publication number 20070091420
- Publication date Apr 26, 2007
- Hoya Corporation
- Morio Hosoya
- G02 - OPTICS
Information Patent Application
Multilayer reflective film coated substrate, manufacturing method t...
- Publication number 20070091421
- Publication date Apr 26, 2007
- Hoya Corporation
- Mario Hosoya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for adjusting dimensions of photomask features
- Publication number 20070003844
- Publication date Jan 4, 2007
- Robert T. Rasmussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reflective-type mask blank for EUV lithography and method for produ...
- Publication number 20060251973
- Publication date Nov 9, 2006
- ASAHI GLASS COMPANY LIMITED
- Satoru Takaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask blank and process for producing and process for using the same...
- Publication number 20060240335
- Publication date Oct 26, 2006
- Soichiro Mitsui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate with a multilayer reflection film, reflection type mask b...
- Publication number 20050238922
- Publication date Oct 27, 2005
- Hoya Corporation
- Takeru Kinoshita
- B82 - NANO-TECHNOLOGY
Information Patent Application
Double-metal EUV mask absorber
- Publication number 20050227152
- Publication date Oct 13, 2005
- Pei-Yang Yan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Method for adjusting dimensions of photomask features
- Publication number 20050130046
- Publication date Jun 16, 2005
- Robert T. Rasmussen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayer coatings for EUV mask substrates
- Publication number 20050064298
- Publication date Mar 24, 2005
- Peter J. Silverman
- B82 - NANO-TECHNOLOGY
Information Patent Application
Reflective mask blank having a programmed defect and method of prod...
- Publication number 20040175633
- Publication date Sep 9, 2004
- Hoya Corporation
- Tsutomo Shoki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Double-metal EUV mask absorber
- Publication number 20040124174
- Publication date Jul 1, 2004
- Pei-Yang Yan
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Reflective-type mask blank for exposure, method of producing the sa...
- Publication number 20030162005
- Publication date Aug 28, 2003
- Hoya Corporation
- Tsutomu Shoki
- B32 - LAYERED PRODUCTS
Information Patent Application
Method of repairing a phase shifting mask
- Publication number 20020030034
- Publication date Mar 14, 2002
- Ching-Yu Chang
- C03 - GLASS MINERAL OR SLAG WOOL

specially adapted for use as photomask

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask blank substrate, substrate with multilayer reflection film, tr...

Blank for mold production and method for manufacturing mold

Mask blank substrate, substrate with multilayer reflection film, tr...

Mask blank substrate, substrate with multilayer reflection film, tr...

Mask fabrication supporting method, mask blank providing method, an...

Mask fabrication supporting method, mask blank providing method, an...

Multilayer reflective film coated substrate, manufacturing method t...

Process for smoothing surface of glass substrate

Multilayer reflective film coated substrate, manufacturing method t...

Method for adjusting dimensions of photomask features

Method for smoothing a surface of a glass substrate for a reflectiv...

Reflective mask blank, reflective mask, and method of manufacturing...

Mask fabrication supporting method, mask blank providing method, an...

Dual-layer EUV mask absorber with trenches having opposing sidewall...

Multilayer coatings for EUV mask substrates

Reflective mask blank having a programmed defect and method of prod...

Method for adjusting dimensions of photomask features

Double-metal EUV mask absorber

Reflective-type mask blank for exposure, method of producing the sa...

Method of repairing a phase shifting mask

Transparent optical device and fabrication method thereof

Process for fabricating high reflectance-low stress Mo&#x02014;Si m...

High reflectance-low stress Mo-Si multilayer reflective coatings

Patents Applicationslast 30 patents

REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURI...

MULTILAYERED-REFLECTIVE-FILM-PROVIDED SUBSTRATE, REFLECTIVE MASK BL...

MASK BLANK SUBSTRATE, SUBSTRATE WITH MULTILAYER REFLECTION FILM, TR...

MASK FABRICATION SUPPORTING METHOD, MASK BLANK PROVIDING METHOD, AN...

MASK FABRICATION SUPPORTING METHOD, MASK BLANK PROVIDING METHOD, AN...

Method for etching glass or metal substrates using negative photore...

METHOD OF PROCESSING GLASS SUBSTRATE SURFACE

PROCESS FOR SMOOTHING SURFACE OF GLASS SUBSTRATE

Multilayer Coatings For EUV Mask Substrates

Reflective mask blank, reflective mask, and method of manufacturing...

Method for smoothing a surface of a glass substrate, and substrate...

Mask fabrication supporting method, mask blank providing method, an...

Photomasks including multi-layered light-shielding and methods of m...

Multilayer reflective film coated substrate, manufacturing method t...

Multilayer reflective film coated substrate, manufacturing method t...

Method for adjusting dimensions of photomask features

Reflective-type mask blank for EUV lithography and method for produ...

Mask blank and process for producing and process for using the same...

Substrate with a multilayer reflection film, reflection type mask b...

Double-metal EUV mask absorber

Method for adjusting dimensions of photomask features

Multilayer coatings for EUV mask substrates

Reflective mask blank having a programmed defect and method of prod...

Double-metal EUV mask absorber

Reflective-type mask blank for exposure, method of producing the sa...

Method of repairing a phase shifting mask

Process for fabricating high reflectance-low stress Mo—Si m...