Speckle reduction

Industry

CPC
G03F7/70583

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70583Speckle reduction

Industries

Patents Grantslast 30 patents

Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,686,951
- Issue date Jun 27, 2023
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pulse stretcher and method
- Patent number 11,569,628
- Issue date Jan 31, 2023
- ASML Netherlands B.V.
- Herman Philip Godfried
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Speckle-reduced direct-retina holographic projector including multi...
- Patent number 11,480,789
- Issue date Oct 25, 2022
- GM Global Technology Operations LLC
- Thomas A. Seder
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Metrology sensor for position metrology
- Patent number 11,360,399
- Issue date Jun 14, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 11,054,665
- Issue date Jul 6, 2021
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light beam diffuser system and method
- Patent number 10,996,381
- Issue date May 4, 2021
- KULICKE & SOFFA LITEQ B.V.
- Adrianus Johannes Verneer
- G02 - OPTICS
Information Patent Grant
Method for handling mask and lithography apparatus
- Patent number 10,877,382
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ju-Wei Liao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system and method
- Patent number 10,845,712
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G02 - OPTICS
Information Patent Grant
Method of measuring, device manufacturing method, metrology apparat...
- Patent number 10,656,534
- Issue date May 19, 2020
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Method for determining a focus position of a lithography mask and m...
- Patent number 10,564,551
- Issue date Feb 18, 2020
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reducing speckle in an excimer light source
- Patent number 10,451,890
- Issue date Oct 22, 2019
- Cymer, LLC
- Wilhelmus Patrick Elisabeth Maria op 't Root
- G01 - MEASURING TESTING
Information Patent Grant
Optical system and method
- Patent number 10,444,637
- Issue date Oct 15, 2019
- ASML Netherlands B.V.
- Johannes Jacobus Matheus Baselmans
- G02 - OPTICS
Information Patent Grant
Method of measuring, device manufacturing method, metrology apparat...
- Patent number 10,310,389
- Issue date Jun 4, 2019
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Adjusting an amount of coherence of a light beam
- Patent number 10,267,687
- Issue date Apr 23, 2019
- Cymer, LLC
- Thomas Frederick Allen Bibby
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for processing a radiation beam with coherence
- Patent number 10,234,767
- Issue date Mar 19, 2019
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus having a multi-mirr...
- Patent number 10,146,135
- Issue date Dec 4, 2018
- Carl Zeiss SMT GmbH
- Michael Layh
- G02 - OPTICS
Information Patent Grant
Illumination unit and device for lithographic exposure
- Patent number 10,101,665
- Issue date Oct 16, 2018
- Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung E.V.
- Uwe Detlef Zeitner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus, exposure method, and device manufacturing method
- Patent number 9,915,878
- Issue date Mar 13, 2018
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Correction of non-uniform patterns using time-shifted exposures
- Patent number 9,823,573
- Issue date Nov 21, 2017
- Applied Materials, Inc.
- Joseph R. Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate handling apparatus and lithographic apparatus
- Patent number 9,696,633
- Issue date Jul 4, 2017
- ASML Netherlands B.V.
- Johannes Onvlee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for EUV projection lithography, and optic...
- Patent number 9,645,501
- Issue date May 9, 2017
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Programmable imaging assembly for manufacturing biotest post arrays
- Patent number 9,639,003
- Issue date May 2, 2017
- Nikon Corporation
- Steven Douglas Slonaker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Speckle reduction
- Patent number 9,235,060
- Issue date Jan 12, 2016
- HOGSKOLEN I BUSKERUD OG VESTFOLD
- Zhaomin Tong
- G02 - OPTICS
Information Patent Grant
Method and device for writing photomasks with reduced mura errors
- Patent number 9,164,373
- Issue date Oct 20, 2015
- Micronic Mydata AB
- Torbjorn Sandstrom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and device manufacturing method using original w...
- Patent number 9,164,370
- Issue date Oct 20, 2015
- Canon Kabushiki Kaisha
- Yasuhiro Kishikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ultraviolet light emitting diode array light source for photolithog...
- Patent number 9,128,387
- Issue date Sep 8, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jaw-Lih Shih
- G02 - OPTICS
Information Patent Grant
Projection exposure method, projection exposure apparatus, laser ra...
- Patent number 8,896,816
- Issue date Nov 25, 2014
- Carl Zeiss SMT GmbH
- Michael Patra
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 8,891,057
- Issue date Nov 18, 2014
- Carl Zeiss SMT GmbH
- Michael Layh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
1.5D SLM for lithography
- Patent number 8,767,175
- Issue date Jul 1, 2014
- Micronic Laser Systems AB
- Torbjorn Sandstrom
- G02 - OPTICS
Information Patent Grant
Criss-cross writing strategy
- Patent number 8,767,185
- Issue date Jul 1, 2014
- Micronic Laser Systems AB
- Torbjorn Sandstrom
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS
- Publication number 20240319610
- Publication date Sep 26, 2024
- Ushio Denki Kabushiki Kaisha
- Osamu OSAWA
- G02 - OPTICS
Information Patent Application
OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE
- Publication number 20240045341
- Publication date Feb 8, 2024
- ASML NETHERLANDS B.V.
- Willard Earl CONLEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOGRAPHY, AND METHOD FOR...
- Publication number 20230314959
- Publication date Oct 5, 2023
- Carl Zeiss SMT GMBH
- Conrad Wolke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL DELAY SYSTEM
- Publication number 20230015748
- Publication date Jan 19, 2023
- Nikon Corporation
- Daniel Gene SMITH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SENSOR FOR POSITION METROLOGY
- Publication number 20220035257
- Publication date Feb 3, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pulse Stretcher and Method
- Publication number 20210344157
- Publication date Nov 4, 2021
- ASML NETHERLANDS B.V.
- Herman Philip GODFRIED
- G02 - OPTICS
Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20210239998
- Publication date Aug 5, 2021
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- G01 - MEASURING TESTING
Information Patent Application
LIGHT BEAM DIFFUSER SYSTEM AND METHOD
- Publication number 20200150318
- Publication date May 14, 2020
- KULICKE & SOFFA LITEQ B.V.
- Adrianus Johannes Vermeer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR HANDLING MASK AND LITHOGRAPHY APPARATUS
- Publication number 20200057385
- Publication date Feb 20, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Ju-Wei LIAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD
- Publication number 20200012199
- Publication date Jan 9, 2020
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus Baselmans
- G02 - OPTICS
Information Patent Application
REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE
- Publication number 20190324286
- Publication date Oct 24, 2019
- CYMER, LLC
- Wilhelmus Patrick Elisabeth Maria op `t Root
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...
- Publication number 20190285993
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND METHOD
- Publication number 20180364587
- Publication date Dec 20, 2018
- ASML NETHERLANDS B.V.
- Johannes Jacobus Matheus Baselmans
- G02 - OPTICS
Information Patent Application
METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...
- Publication number 20180299794
- Publication date Oct 18, 2018
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
- Publication number 20180143539
- Publication date May 24, 2018
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
- Publication number 20160357116
- Publication date Dec 8, 2016
- Nikon Corporation
- Yuichi Shibazaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY, AND OPTIC...
- Publication number 20140368803
- Publication date Dec 18, 2014
- Michael Patra
- G02 - OPTICS
Information Patent Application
ULTRAVIOLET LIGHT EMITTING DIODE ARRAY LIGHT SOURCE FOR PHOTOLITHOG...
- Publication number 20140340665
- Publication date Nov 20, 2014
- Taiwan Semiconductor Manufacturing Co., LTD
- Jaw-Lih SHIH
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR WRITING PHOTOMASKS WITH REDUCED MURA ERRORS
- Publication number 20140272685
- Publication date Sep 18, 2014
- Micronic Mydata AB
- Torbjörn Sandström
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Publication number 20140211188
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Michael Layh
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20130250269
- Publication date Sep 26, 2013
- DAI NIPPON PRINTING CO., LTD.
- Kazutoshi Ishida
- G02 - OPTICS
Information Patent Application
SUBSTRATE HANDLING APPARATUS AND LITHOGRAPHIC APPARATUS
- Publication number 20130021593
- Publication date Jan 24, 2013
- ASML NETHERLANDS B.V.
- Johannes Onvlee
- B65 - CONVEYING PACKING STORING HANDLING THIN OR FILAMENTARY MATERIAL
Information Patent Application
CRISS-CROSS WRITING STRATEGY
- Publication number 20120307219
- Publication date Dec 6, 2012
- Micronic Mydata AB
- Torbjörn Sandström
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Coherency Reduction for Bandwidth Measurement
- Publication number 20120162657
- Publication date Jun 28, 2012
- Cymer, Inc.
- Robert J. Rafac
- G02 - OPTICS
Information Patent Application
Projection Exposure System, Beam Delivery System and Method of Gene...
- Publication number 20120013878
- Publication date Jan 19, 2012
- Carl Zeiss SMT GMBH
- Matthias Kuss
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION EXPOSURE METHOD, PROJECTION EXPOSURE APPARATUS, LASER RA...
- Publication number 20110304837
- Publication date Dec 15, 2011
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
Pulse Modifier with Adjustable Etendue
- Publication number 20110255173
- Publication date Oct 20, 2011
- ASML NETHERLANDS B.V.
- Adel JOOBEUR
- G02 - OPTICS
Information Patent Application
1.5D SLM FOR LITHOGRAPHY
- Publication number 20110242514
- Publication date Oct 6, 2011
- Micronic MyData Systems AB
- Torbjörn Sandström
- G02 - OPTICS
Information Patent Application
ILLUMINATION METHODS AND DEVICES FOR PARTIALLY COHERENT ILLUMINATION
- Publication number 20110216302
- Publication date Sep 8, 2011
- Micronic Laser Systems AB
- Jarek Luberek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPECKLE REDUCTION
- Publication number 20110216390
- Publication date Sep 8, 2011
- Vestfold University College
- Zhaomin Tong
- G02 - OPTICS

Speckle reduction

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Reducing speckle in an excimer light source

Pulse stretcher and method

Speckle-reduced direct-retina holographic projector including multi...

Metrology sensor for position metrology

Reducing speckle in an excimer light source

Light beam diffuser system and method

Method for handling mask and lithography apparatus

Optical system and method

Method of measuring, device manufacturing method, metrology apparat...

Method for determining a focus position of a lithography mask and m...

Reducing speckle in an excimer light source

Optical system and method

Method of measuring, device manufacturing method, metrology apparat...

Adjusting an amount of coherence of a light beam

Device and method for processing a radiation beam with coherence

Microlithographic projection exposure apparatus having a multi-mirr...

Illumination unit and device for lithographic exposure

Exposure apparatus, exposure method, and device manufacturing method

Correction of non-uniform patterns using time-shifted exposures

Substrate handling apparatus and lithographic apparatus

Illumination optical unit for EUV projection lithography, and optic...

Programmable imaging assembly for manufacturing biotest post arrays

Speckle reduction

Method and device for writing photomasks with reduced mura errors

Exposure apparatus and device manufacturing method using original w...

Ultraviolet light emitting diode array light source for photolithog...

Projection exposure method, projection exposure apparatus, laser ra...

Microlithographic projection exposure apparatus

1.5D SLM for lithography

Criss-cross writing strategy

Patents Applicationslast 30 patents

LIGHTING OPTICAL SYSTEM AND EXPOSURE APPARATUS

OPTIMIZATION OF LITHOGRAPHIC PROCESS BASED ON BANDWIDTH AND SPECKLE

OPTICAL SYSTEM, IN PARTICULAR FOR MICROLITHOGRAPHY, AND METHOD FOR...

OPTICAL DELAY SYSTEM

METROLOGY SENSOR FOR POSITION METROLOGY

Pulse Stretcher and Method

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

LIGHT BEAM DIFFUSER SYSTEM AND METHOD

METHOD FOR HANDLING MASK AND LITHOGRAPHY APPARATUS

OPTICAL SYSTEM AND METHOD

REDUCING SPECKLE IN AN EXCIMER LIGHT SOURCE

METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...

OPTICAL SYSTEM AND METHOD

METHOD OF MEASURING, DEVICE MANUFACTURING METHOD, METROLOGY APPARAT...

EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

ILLUMINATION OPTICAL UNIT FOR EUV PROJECTION LITHOGRAPHY, AND OPTIC...

ULTRAVIOLET LIGHT EMITTING DIODE ARRAY LIGHT SOURCE FOR PHOTOLITHOG...

METHOD AND DEVICE FOR WRITING PHOTOMASKS WITH REDUCED MURA ERRORS

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

EXPOSURE APPARATUS

SUBSTRATE HANDLING APPARATUS AND LITHOGRAPHIC APPARATUS

CRISS-CROSS WRITING STRATEGY

Coherency Reduction for Bandwidth Measurement

Projection Exposure System, Beam Delivery System and Method of Gene...

PROJECTION EXPOSURE METHOD, PROJECTION EXPOSURE APPARATUS, LASER RA...

Pulse Modifier with Adjustable Etendue

1.5D SLM FOR LITHOGRAPHY

ILLUMINATION METHODS AND DEVICES FOR PARTIALLY COHERENT ILLUMINATION

SPECKLE REDUCTION