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CPC
H01J2237/31767

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31767Step and repeat

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Patents Grantslast 30 patents

Information Patent Grant
Drawing apparatus, and method of manufacturing article
- Patent number 8,878,141
- Issue date Nov 4, 2014
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Mask, exposure method and production method of semiconductor device
- Patent number 7,517,618
- Issue date Apr 14, 2009
- Sony Corporation
- Shigeru Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam exposure method and apparatus
- Patent number 7,126,140
- Issue date Oct 24, 2006
- Hitachi, Ltd.
- Haruo Yoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electron beam exposure method and apparatus
- Patent number 7,067,830
- Issue date Jun 27, 2006
- Hitachi, Ltd.
- Haruo Yoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for rastering source redundancy
- Patent number 6,894,435
- Issue date May 17, 2005
- Applied Materials, Inc.
- David Aviel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection-exposure methods and apparatus exhibiting increased thro...
- Patent number 6,699,639
- Issue date Mar 2, 2004
- Nikon Corporation
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method and exposure apparatus
- Patent number 6,645,701
- Issue date Nov 11, 2003
- Nikon Corporation
- Kazuya Ota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Projection-exposure methods and apparatus exhibiting increased thro...
- Patent number 6,590,218
- Issue date Jul 8, 2003
- Nikon Corporation
- Kazuaki Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure apparatus
- Patent number 6,225,637
- Issue date May 1, 2001
- Canon Kabushiki Kaisha
- Shigeru Terashima
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Block mask and charged particle beam exposure method and apparatus...
- Patent number 6,175,121
- Issue date Jan 16, 2001
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic system and method for exposing a target utilizing uneq...
- Patent number 6,122,035
- Issue date Sep 19, 2000
- Micron Technology, Inc.
- J. Brett Rolson
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask data generating method and mask for an electron beam exposure...
- Patent number 5,897,978
- Issue date Apr 27, 1999
- NEC Corporation
- Ken Nakajima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged beam drawing method
- Patent number 5,894,057
- Issue date Apr 13, 1999
- Kabushiki Kaisha Toshiba
- Toshio Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Block mask and charged particle beam exposure method and apparatus...
- Patent number 5,849,436
- Issue date Dec 15, 1998
- Fujitsu Limited
- Akio Yamada
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic system and method for exposing a target utilizing uneq...
- Patent number 5,780,188
- Issue date Jul 14, 1998
- Micron Technology, Inc.
- J. Brett Rolson
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for correcting placement errors in a lithography system
- Patent number 5,773,836
- Issue date Jun 30, 1998
- International Business Machines Corporation
- John George Hartley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography system and method
- Patent number 5,334,282
- Issue date Aug 2, 1994
- Hitachi, Ltd.
- Yoshinori Nakayama
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photo reticle for fabricating a semiconductor device
- Patent number 5,250,983
- Issue date Oct 5, 1993
- NEC Corporation
- Ryuji Yamamura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam exposure method and apparatus
- Patent number 4,950,910
- Issue date Aug 21, 1990
- Fujitsu Limited
- Hiroshi Yasuda
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of electron beam exposure
- Patent number 4,625,121
- Issue date Nov 25, 1986
- Fujitsu Limited
- Shin-ichi Hamaguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Scanning electron beam exposure system
- Patent number 4,516,030
- Issue date May 7, 1985
- Fujitsu Limited
- Haruo Tsuchikawa
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion beam lithography process and apparatus using step-and-repeat ex...
- Patent number 4,310,743
- Issue date Jan 12, 1982
- Hughes Aircraft Company
- Robert L. Seliger
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
- Publication number 20130168569
- Publication date Jul 4, 2013
- Canon Kabushiki Kaisha
- Wataru YAMAGUCHI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-electron beam exposure method and apparatus
- Publication number 20060017021
- Publication date Jan 26, 2006
- Haruo Yoda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask, exposure method and production method of semiconductor device
- Publication number 20050170265
- Publication date Aug 4, 2005
- Sony Corporation
- Shigeru Moriya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Multi-electron beam exposure method and apparatus
- Publication number 20040143356
- Publication date Jul 22, 2004
- Haruo Yoda
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method and device for rastering source redundancy
- Publication number 20040085024
- Publication date May 6, 2004
- David Aviel
- B82 - NANO-TECHNOLOGY
Information Patent Application
Projection-exposure methods and apparatus exhibiting increased thro...
- Publication number 20030136922
- Publication date Jul 24, 2003
- NIKON CORPORATION
- Kazuaki Suzuki
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION-EXPOSURE METHODS AND APPARATUS EXHIBITING INCREASED THRO...
- Publication number 20010002301
- Publication date May 31, 2001
- KAZUAKI SUZUKI
- B82 - NANO-TECHNOLOGY

Step and repeat

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Drawing apparatus, and method of manufacturing article

Mask, exposure method and production method of semiconductor device

Multi-electron beam exposure method and apparatus

Multi-electron beam exposure method and apparatus

Method and device for rastering source redundancy

Projection-exposure methods and apparatus exhibiting increased thro...

Exposure method and exposure apparatus

Projection-exposure methods and apparatus exhibiting increased thro...

Electron beam exposure apparatus

Block mask and charged particle beam exposure method and apparatus...

Lithographic system and method for exposing a target utilizing uneq...

Mask data generating method and mask for an electron beam exposure...

Charged beam drawing method

Block mask and charged particle beam exposure method and apparatus...

Lithographic system and method for exposing a target utilizing uneq...

Method for correcting placement errors in a lithography system

Electron beam lithography system and method

Photo reticle for fabricating a semiconductor device

Electron beam exposure method and apparatus

Method of electron beam exposure

Scanning electron beam exposure system

Ion beam lithography process and apparatus using step-and-repeat ex...

Patents Applicationslast 30 patents

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

Multi-electron beam exposure method and apparatus

Mask, exposure method and production method of semiconductor device

Multi-electron beam exposure method and apparatus

Method and device for rastering source redundancy

Projection-exposure methods and apparatus exhibiting increased thro...

PROJECTION-EXPOSURE METHODS AND APPARATUS EXHIBITING INCREASED THRO...