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CPC
G03F9/7046

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7046Strategy

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 12,140,878
- Issue date Nov 12, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Overlay measurement system using lock-in amplifier technique
- Patent number 12,124,177
- Issue date Oct 22, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of determining set of sample shot regions, method of obtaini...
- Patent number 12,025,924
- Issue date Jul 2, 2024
- Canon Kabushiki Kaisha
- Shinichi Egashira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and lithographic apparatuses
- Patent number 12,025,925
- Issue date Jul 2, 2024
- ASML Netherlands B.V.
- Filippo Alpeggiani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement device, lithography system and exposure apparatus, and...
- Patent number 12,007,702
- Issue date Jun 11, 2024
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Grant
Determining a mark layout across a patterning device or substrate
- Patent number 12,007,701
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Pavel Smal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,007,698
- Issue date Jun 11, 2024
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Control method of movable body, exposure method, device manufacturi...
- Patent number 11,994,811
- Issue date May 28, 2024
- Nikon Corporation
- Akihiro Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,977,339
- Issue date May 7, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic overlay correction and lithographic process
- Patent number 11,966,170
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Ai-Jen Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement apparatus and a method for determining a substrate grid
- Patent number 11,966,166
- Issue date Apr 23, 2024
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,966,171
- Issue date Apr 23, 2024
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Invariable magnification multilevel optical device with telecentric...
- Patent number 11,960,216
- Issue date Apr 16, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for controlling a manufacturing process and associated appar...
- Patent number 11,947,266
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Nicolaas Petrus Marcus Brantjes
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing system and substrate processing method, and de...
- Patent number 11,921,436
- Issue date Mar 5, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of sensing alignment marks
- Patent number 11,899,380
- Issue date Feb 13, 2024
- ASML Holding N.V.
- Krishanu Shome
- G01 - MEASURING TESTING
Information Patent Grant
Method for calibrating alignment of wafer and lithography system
- Patent number 11,854,854
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of sensing alignment marks
- Patent number 11,841,628
- Issue date Dec 12, 2023
- ASML Holding N.V.
- Krishanu Shome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring device and measuring method
- Patent number 11,835,867
- Issue date Dec 5, 2023
- Kioxia Corporation
- Masakazu Hamasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 11,829,676
- Issue date Nov 28, 2023
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for enhancing alignment performance of lithograph...
- Patent number 11,796,927
- Issue date Oct 24, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Zhao Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of obtaining measurements, apparatus for performing a proces...
- Patent number 11,774,862
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Hakki Ergün Cekli
- G01 - MEASURING TESTING
Information Patent Grant
Processing system, processing method, measurement apparatus, substr...
- Patent number 11,726,412
- Issue date Aug 15, 2023
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement apparatus, lithography apparatus and article manufactur...
- Patent number 11,693,328
- Issue date Jul 4, 2023
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Selecting a set of locations associated with a measurement or featu...
- Patent number 11,681,231
- Issue date Jun 20, 2023
- ASML Netherlands B.V.
- Pierluigi Frisco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Template, template manufacturing method, and semiconductor device m...
- Patent number 11,669,011
- Issue date Jun 6, 2023
- Kioxia Corporation
- Jun Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for measuring a position of a mark
- Patent number 11,650,513
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of pattern alignment for field stitching
- Patent number 11,640,118
- Issue date May 2, 2023
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for producing overlay results with absolute reference for se...
- Patent number 11,630,397
- Issue date Apr 18, 2023
- Tokyo Electron Limited
- Anton J. deVilliers
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Alignment mark evaluation method and alignment mark evaluation system
- Patent number 11,586,118
- Issue date Feb 21, 2023
- GHANGXIN MEMORY TECHNOLOGIES, INC.
- Liyuan Hu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
- Publication number 20240377767
- Publication date Nov 14, 2024
- Canon Kabushiki Kaisha
- MIZUKI ISHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...
- Publication number 20240339295
- Publication date Oct 10, 2024
- ASML NETHERLANDS B.V.
- Tzu-Chao CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...
- Publication number 20240302758
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Ingyun CHUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND STORAGE MEDIUM
- Publication number 20240288845
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- TOMOHIRO MASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD
- Publication number 20240288780
- Publication date Aug 29, 2024
- Canon Kabushiki Kaisha
- Takahiro Takiguchi
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK
- Publication number 20240263941
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Rui CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
- Publication number 20240264537
- Publication date Aug 8, 2024
- ASML NETHERLANDS B.V.
- Gijs TEN HAAF
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20240231247
- Publication date Jul 11, 2024
- ASML NETHERLANDS B.V.
- Arjan Johannes Anton BEUKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20240210844
- Publication date Jun 27, 2024
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...
- Publication number 20240210843
- Publication date Jun 27, 2024
- Canon Kabushiki Kaisha
- Nozomu Hayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask handling assembly for atmospheric pressure plasma chamber
- Publication number 20240201580
- Publication date Jun 20, 2024
- Nolan Layne ZIMMERMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT DEVICE, LITHOGRAPHY SYSTEM AND EXPOSURE APPARATUS, AND...
- Publication number 20240134294
- Publication date Apr 25, 2024
- Nikon Corporation
- Yuichi Shibazaki
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...
- Publication number 20240134295
- Publication date Apr 25, 2024
- Nikon Corporation
- Yuichi Shibazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES
- Publication number 20240118631
- Publication date Apr 11, 2024
- Nick Franciscus Wilhelmus THISSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALIGNMENT-OVERLAY MARK AND METHOD USING THE SAME
- Publication number 20240096813
- Publication date Mar 21, 2024
- Micron Technology, Inc.
- KAZUKO YAMASHITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH OVERLAY MARK, METHOD OF MANUFACTURING...
- Publication number 20240071842
- Publication date Feb 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Tsai-Wei LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH OVERLAY MARK AND SYSTEM FOR MANUFACTUR...
- Publication number 20240071843
- Publication date Feb 29, 2024
- NANYA TECHNOLOGY CORPORATION
- Tsai-Wei LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...
- Publication number 20240053688
- Publication date Feb 15, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD
- Publication number 20240053941
- Publication date Feb 15, 2024
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF
- Publication number 20240036485
- Publication date Feb 1, 2024
- ASML Netheriands B. V.
- Arjan Johannes Anton BEUKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM
- Publication number 20240027918
- Publication date Jan 25, 2024
- ASML NETHERLANDS B.V.
- Simon Gijsbert Josephus MATHIJSSEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20240012342
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20230418168
- Publication date Dec 28, 2023
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING METHOD, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND A...
- Publication number 20230408249
- Publication date Dec 21, 2023
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AUTOMATED METROLOGY METHOD FOR LARGE DEVICES
- Publication number 20230408928
- Publication date Dec 21, 2023
- Applied Materials, Inc.
- Yongan XU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-CHIP DIE ALIGNMENT
- Publication number 20230378081
- Publication date Nov 23, 2023
- International Business Machines Corporation
- Effendi Leobandung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...
- Publication number 20230359134
- Publication date Nov 9, 2023
- Canon Kabushiki Kaisha
- Shinichi Egashira
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MANAGING MULTI-OBJECTIVE ALIGNMENTS FOR IMPRINTING
- Publication number 20230296993
- Publication date Sep 21, 2023
- Magic Leap, Inc.
- Jeremy Lee SEVIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASURING DEVICE AND MEASURING METHOD
- Publication number 20230296991
- Publication date Sep 21, 2023
- KIOXIA Corporation
- Masakazu HAMASAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTUR...
- Publication number 20230288823
- Publication date Sep 14, 2023
- Canon Kabushiki Kaisha
- Wataru Yamaguchi
- G06 - COMPUTING CALCULATING COUNTING

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Processing system, processing method, measurement apparatus, substr...

Overlay measurement system using lock-in amplifier technique

Method of determining set of sample shot regions, method of obtaini...

Metrology method and lithographic apparatuses

Measurement device, lithography system and exposure apparatus, and...

Determining a mark layout across a patterning device or substrate

Information processing apparatus and information processing method

Control method of movable body, exposure method, device manufacturi...

Substrate processing system and substrate processing method, and de...

Lithographic overlay correction and lithographic process

Measurement apparatus and a method for determining a substrate grid

Method for producing overlay results with absolute reference for se...

Invariable magnification multilevel optical device with telecentric...

Method for controlling a manufacturing process and associated appar...

Substrate processing system and substrate processing method, and de...

Apparatus for and method of sensing alignment marks

Method for calibrating alignment of wafer and lithography system

Apparatus for and method of sensing alignment marks

Measuring device and measuring method

Information processing apparatus and information processing method

Method and device for enhancing alignment performance of lithograph...

Method of obtaining measurements, apparatus for performing a proces...

Processing system, processing method, measurement apparatus, substr...

Measurement apparatus, lithography apparatus and article manufactur...

Selecting a set of locations associated with a measurement or featu...

Template, template manufacturing method, and semiconductor device m...

Apparatus and method for measuring a position of a mark

Method of pattern alignment for field stitching

Method for producing overlay results with absolute reference for se...

Alignment mark evaluation method and alignment mark evaluation system

Patents Applicationslast 30 patents

IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

METHOD OF GENERATING A SAMPLE MAP, COMPUTER PROGRAM PRODUCT, CHARGE...

PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...

INFORMATION PROCESSING APPARATUS AND STORAGE MEDIUM

INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD

INTENSITY IMBALANCE CALIBRATION ON AN OVERFILLED BIDIRECTIONAL MARK

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...

METROLOGY METHOD AND APPARATUS

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING...

Photomask handling assembly for atmospheric pressure plasma chamber

MEASUREMENT DEVICE, LITHOGRAPHY SYSTEM AND EXPOSURE APPARATUS, AND...

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD, AND DE...

ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES

ALIGNMENT-OVERLAY MARK AND METHOD USING THE SAME

SEMICONDUCTOR STRUCTURE WITH OVERLAY MARK, METHOD OF MANUFACTURING...

SEMICONDUCTOR STRUCTURE WITH OVERLAY MARK AND SYSTEM FOR MANUFACTUR...

INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...

INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD

LITHOGRAPHIC APPARATUS, METROLOGY SYSTEMS, AND METHODS THEREOF

METROLOGY METHOD AND APPARATUS AND COMPUTER PROGRAM

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

METROLOGY SYSTEM AND LITHOGRAPHIC SYSTEM

MEASURING METHOD, MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND A...

AUTOMATED METROLOGY METHOD FOR LARGE DEVICES

MULTI-CHIP DIE ALIGNMENT

PROCESSING SYSTEM, PROCESSING METHOD, MEASUREMENT APPARATUS, SUBSTR...

MANAGING MULTI-OBJECTIVE ALIGNMENTS FOR IMPRINTING

MEASURING DEVICE AND MEASURING METHOD

MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTUR...