Systems for imaging mask onto workpiece

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CPC
G03F7/70216

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70216Systems for imaging mask onto workpiece

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mask structure for deposition device, deposition device, and operat...
- Patent number 12,123,087
- Issue date Oct 22, 2024
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling a position of a first object relative to a se...
- Patent number 11,774,865
- Issue date Oct 3, 2023
- ASML Netherlands B.V.
- Thijs Adriaan Cornelis Van Keulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,675,277
- Issue date Jun 13, 2023
- KLA Corporation
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of and apparatus for in-situ repair of reflective optic
- Patent number 11,474,440
- Issue date Oct 18, 2022
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for nanoscale data recording
- Patent number 11,269,258
- Issue date Mar 8, 2022
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Mask structure for deposition device, deposition device, and operat...
- Patent number 11,255,011
- Issue date Feb 22, 2022
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,231,654
- Issue date Jan 25, 2022
- GLOBALFOUNDRIES U.S. Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element and optical system for EUV lithography h...
- Patent number 11,073,766
- Issue date Jul 27, 2021
- Carl Zeiss SMT GmbH
- Christoph Nottbohm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Exposure apparatus and article manufacturing method
- Patent number 11,061,337
- Issue date Jul 13, 2021
- Canon Kabushiki Kaisha
- Koji Mikami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for producing an optical mask for surface microte...
- Patent number 10,969,679
- Issue date Apr 6, 2021
- H.E.F.
- Maxime Bichotte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate and preparation method therefor, and display panel
- Patent number 10,824,026
- Issue date Nov 3, 2020
- Beijing Boe Display Technology Co., Ltd.
- Jie Xue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 10,705,435
- Issue date Jul 7, 2020
- GLOBALFOUNDRIES Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Overlay mark structures
- Patent number 10,627,720
- Issue date Apr 21, 2020
- GLOBALFOUNDRIES Inc.
- Lei Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Evaluation method, exposure method, and method for manufacturing an...
- Patent number 10,545,413
- Issue date Jan 28, 2020
- Canon Kabushiki Kaisha
- Bunsuke Takeshita
- G02 - OPTICS
Information Patent Grant
Detection apparatus, pattern forming apparatus, obtaining method, d...
- Patent number 10,545,415
- Issue date Jan 28, 2020
- Canon Kabushiki Kaisha
- Hironobu Fujishima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
UV mask device and method for using the same
- Patent number 10,261,420
- Issue date Apr 16, 2019
- BOE Technology Group Co., Ltd.
- Jaehong Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Energy controller for excimer-laser silicon crystallization
- Patent number 10,234,765
- Issue date Mar 19, 2019
- Coherent Lasersystems GmbH & Co. KG
- Igor Bragin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,222,703
- Issue date Mar 5, 2019
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method of fabricating display device using the mask
- Patent number 10,191,331
- Issue date Jan 29, 2019
- Samsung Display Co., Ltd.
- Inho Park
- G02 - OPTICS
Information Patent Grant
Substrate with multilayer reflective film, mask blank, transfer mas...
- Patent number 10,175,394
- Issue date Jan 8, 2019
- Hoya Corporation
- Kazuhiro Hamamoto
- G02 - OPTICS
Information Patent Grant
Chromatically corrected objective with specifically structured and...
- Patent number 10,101,668
- Issue date Oct 16, 2018
- Carl Zeiss SMT GmbH
- Alexander Epple
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photostructured chemical devices and methods for making same
- Patent number 10,099,918
- Issue date Oct 16, 2018
- The Aerospace Corporation
- Henry Helvajian
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Mask and method of fabricating display device using the mask
- Patent number 10,042,210
- Issue date Aug 7, 2018
- Samsung Display Co., Ltd.
- Inho Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting a projection objective
- Patent number 10,018,918
- Issue date Jul 10, 2018
- Carl Zeiss SMT GmbH
- Wolfgang Emer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Data tuning for fast computation and polygonal manipulation simplif...
- Patent number 9,818,168
- Issue date Nov 14, 2017
- Applied Materials, Inc.
- Thomas L. Laidig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflective film, mask blank, transfer mas...
- Patent number 9,798,050
- Issue date Oct 24, 2017
- Hoya Corporation
- Kazuhiro Hamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 9,778,575
- Issue date Oct 3, 2017
- ASML Netherlands B.V.
- Heine Melle Mulder
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for adjusting a projection objective
- Patent number 9,715,177
- Issue date Jul 25, 2017
- Carl Zeiss SMT GmbH
- Wolfgang Emer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror arrangement for an EUV projection exposure apparatus, method...
- Patent number 9,709,770
- Issue date Jul 18, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for evaluating and improving pupil luminance distribution, i...
- Patent number 9,581,811
- Issue date Feb 28, 2017
- Nikon Corporation
- Naonori Kita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
STRUCTURE, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD
- Publication number 20240393704
- Publication date Nov 28, 2024
- Canon Kabushiki Kaisha
- Norihiro SAKURAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK STRUCTURE FOR DEPOSITION DEVICE, DEPOSITION DEVICE, AND OPERAT...
- Publication number 20240392427
- Publication date Nov 28, 2024
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TWO-DIMENSIONAL (2D) PATTERNS USING MULTIPLE EXPOSURES OF ONE-DIMEN...
- Publication number 20240192606
- Publication date Jun 13, 2024
- Google LLC
- Lu Tian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING MOIRÉ PATTERNS
- Publication number 20230152715
- Publication date May 18, 2023
- Samsung Electronics Co., Ltd.
- Woohyeok Jeong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20220334502
- Publication date Oct 20, 2022
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING A POSITION OF A FIRST OBJECT RELATIVE TO A SE...
- Publication number 20220299889
- Publication date Sep 22, 2022
- ASML NETHERLANDS B.V.
- Thijs Adriaan Cornelis VAN KEULEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING
- Publication number 20220197150
- Publication date Jun 23, 2022
- Franklin Mark Schellenberg
- B82 - NANO-TECHNOLOGY
Information Patent Application
MASK STRUCTURE FOR DEPOSITION DEVICE, DEPOSITION DEVICE, AND OPERAT...
- Publication number 20220136094
- Publication date May 5, 2022
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK STRUCTURE FOR DEPOSITION DEVICE, DEPOSITION DEVICE, AND OPERAT...
- Publication number 20220081755
- Publication date Mar 17, 2022
- United Semiconductor Japan Co., Ltd.
- Satoshi Inagaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF AND APPARATUS FOR IN-SITU REPAIR OF REFLECTIVE OPTIC
- Publication number 20210055665
- Publication date Feb 25, 2021
- ASML NETHERLANDS B.V.
- Alexander I. ERSHOV
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD
- Publication number 20200292945
- Publication date Sep 17, 2020
- Canon Kabushiki Kaisha
- Koji Mikami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20200241429
- Publication date Jul 30, 2020
- GLOBALFOUNDRIES INC.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRATING STRUCTURE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
- Publication number 20200142108
- Publication date May 7, 2020
- BOE TECHNOLOGY GROUP CO., LTD.
- Wusheng LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20190219930
- Publication date Jul 18, 2019
- GLOBALFOUNDRIES INC.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR PRODUCING AN OPTICAL MASK FOR SURFACE MICROTE...
- Publication number 20190187567
- Publication date Jun 20, 2019
- H.E.F.
- Maxime BICHOTTE
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE AND PREPARATION METHOD THEREFOR, AND DISPLAY PANEL
- Publication number 20190146259
- Publication date May 16, 2019
- BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Jie XUE
- G02 - OPTICS
Information Patent Application
OVERLAY MARK STRUCTURES
- Publication number 20190056671
- Publication date Feb 21, 2019
- GLOBALFOUNDRIES INC.
- Lei Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method For Adjusting A Projection Objective
- Publication number 20190056670
- Publication date Feb 21, 2019
- Carl Zeiss SMT GMBH
- Wolfgang EMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL SYSTEM
- Publication number 20190025710
- Publication date Jan 24, 2019
- Hans-Juergen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENERGY CONTROLLER FOR EXCIMER-LASER SILICON CRYSTALLIZATION
- Publication number 20180348644
- Publication date Dec 6, 2018
- COHERENT LASERSYSTEMS GMBH & CO. KG
- Igor BRAGIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK AND METHOD OF FABRICATING DISPLAY DEVICE USING THE MASK
- Publication number 20180307104
- Publication date Oct 25, 2018
- INHO PARK
- G02 - OPTICS
Information Patent Application
DETECTION APPARATUS, PATTERN FORMING APPARATUS, OBTAINING METHOD, D...
- Publication number 20180275535
- Publication date Sep 27, 2018
- Canon Kabushiki Kaisha
- Hironobu Fujishima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UV MASK DEVICE AND METHOD FOR USING THE SAME
- Publication number 20180210344
- Publication date Jul 26, 2018
- BOE TECHNOLOGY GROUP CO., LTD.
- Jaehong Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, MASK BLANK, TRANSFER MAS...
- Publication number 20180067238
- Publication date Mar 8, 2018
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- G02 - OPTICS
Information Patent Application
Method For Adjusting A Projection Objective
- Publication number 20180024440
- Publication date Jan 25, 2018
- Carl Zeiss SMT GMBH
- Wolfgang EMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20170315450
- Publication date Nov 2, 2017
- ASML NETHERLANDS B.V.
- Heine Melle MULDER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK AND METHOD OF FABRICATING DISPLAY DEVICE USING THE MASK
- Publication number 20160377928
- Publication date Dec 29, 2016
- SAMSUNG DISPLAY CO., LTD.
- Inho PARK
- G02 - OPTICS
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, MASK BLANK, TRANSFER MAS...
- Publication number 20160377769
- Publication date Dec 29, 2016
- HOYA CORPORATION
- Kazuhiro HAMAMOTO
- G02 - OPTICS
Information Patent Application
Photostructured Chemical Devices and Methods For Making Same
- Publication number 20160297098
- Publication date Oct 13, 2016
- The Aerospace Corporation
- Henry Helvajian
- B33 - ADDITIVE MANUFACTURING TECHNOLOGY
Information Patent Application
METHOD FOR EVALUATING AND IMPROVING PUPIL LUMINANCE DISTRIBUTION, I...
- Publication number 20150323786
- Publication date Nov 12, 2015
- Nikon Corporation
- Naonori Kita
- G02 - OPTICS

Systems for imaging mask onto workpiece

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mask structure for deposition device, deposition device, and operat...

Method of controlling a position of a first object relative to a se...

Self-referencing and self-calibrating interference pattern overlay...

Method of and apparatus for in-situ repair of reflective optic

Method and system for nanoscale data recording

Mask structure for deposition device, deposition device, and operat...

Self-referencing and self-calibrating interference pattern overlay...

Reflective optical element and optical system for EUV lithography h...

Exposure apparatus and article manufacturing method

System and method for producing an optical mask for surface microte...

Substrate and preparation method therefor, and display panel

Self-referencing and self-calibrating interference pattern overlay...

Overlay mark structures

Evaluation method, exposure method, and method for manufacturing an...

Detection apparatus, pattern forming apparatus, obtaining method, d...

UV mask device and method for using the same

Energy controller for excimer-laser silicon crystallization

Lithographic apparatus and method

Mask and method of fabricating display device using the mask

Substrate with multilayer reflective film, mask blank, transfer mas...

Chromatically corrected objective with specifically structured and...

Photostructured chemical devices and methods for making same

Mask and method of fabricating display device using the mask

Method for adjusting a projection objective

Data tuning for fast computation and polygonal manipulation simplif...

Substrate with multilayer reflective film, mask blank, transfer mas...

Lithographic apparatus and method

Method for adjusting a projection objective

Mirror arrangement for an EUV projection exposure apparatus, method...

Method for evaluating and improving pupil luminance distribution, i...

Patents Applicationslast 30 patents

STRUCTURE, EXPOSURE APPARATUS, AND ARTICLE MANUFACTURING METHOD

MASK STRUCTURE FOR DEPOSITION DEVICE, DEPOSITION DEVICE, AND OPERAT...

TWO-DIMENSIONAL (2D) PATTERNS USING MULTIPLE EXPOSURES OF ONE-DIMEN...

METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICES USING MOIRÉ PATTERNS

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

METHOD OF CONTROLLING A POSITION OF A FIRST OBJECT RELATIVE TO A SE...

METHOD AND SYSTEM FOR NANOSCALE DATA RECORDING

MASK STRUCTURE FOR DEPOSITION DEVICE, DEPOSITION DEVICE, AND OPERAT...

MASK STRUCTURE FOR DEPOSITION DEVICE, DEPOSITION DEVICE, AND OPERAT...

METHOD OF AND APPARATUS FOR IN-SITU REPAIR OF REFLECTIVE OPTIC

EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

GRATING STRUCTURE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

SYSTEM AND METHOD FOR PRODUCING AN OPTICAL MASK FOR SURFACE MICROTE...

SUBSTRATE AND PREPARATION METHOD THEREFOR, AND DISPLAY PANEL

OVERLAY MARK STRUCTURES

Method For Adjusting A Projection Objective

IMAGING OPTICAL SYSTEM

ENERGY CONTROLLER FOR EXCIMER-LASER SILICON CRYSTALLIZATION

MASK AND METHOD OF FABRICATING DISPLAY DEVICE USING THE MASK

DETECTION APPARATUS, PATTERN FORMING APPARATUS, OBTAINING METHOD, D...

UV MASK DEVICE AND METHOD FOR USING THE SAME

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, MASK BLANK, TRANSFER MAS...

Method For Adjusting A Projection Objective

LITHOGRAPHIC APPARATUS AND METHOD

MASK AND METHOD OF FABRICATING DISPLAY DEVICE USING THE MASK

SUBSTRATE WITH MULTILAYER REFLECTIVE FILM, MASK BLANK, TRANSFER MAS...

Photostructured Chemical Devices and Methods For Making Same

METHOD FOR EVALUATING AND IMPROVING PUPIL LUMINANCE DISTRIBUTION, I...