Target-material dispenser

Industry

CPC
H01J37/3432

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3432Target-material dispenser

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Sputtering target, method of bonding target material and backing pl...
- Patent number 12,051,577
- Issue date Jul 30, 2024
- Sumitomo Chemical Company, Limited
- Masahiro Fujita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for focused deposition of atomic vapors
- Patent number 11,515,131
- Issue date Nov 29, 2022
- The Charles Stark Draper Laboratory Inc.
- Isaac Ehrenberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insertable target holder for solid dopant materials
- Patent number 11,404,254
- Issue date Aug 2, 2022
- Varian Semiconductor Equipment Associates, Inc.
- Shreyansh Patel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profiled sputtering target and method of making the same
- Patent number 11,244,815
- Issue date Feb 8, 2022
- Honeywell International Inc.
- Shih-Yao Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering apparatus including cathode with rotatable targets, and...
- Patent number 11,094,513
- Issue date Aug 17, 2021
- Guardian Europe S.à r.l.
- Marcel Schloremberg
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insertable target holder for improved stability and performance for...
- Patent number 10,957,509
- Issue date Mar 23, 2021
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molten target sputtering (MTS) deposition for enhanced kinetic ener...
- Patent number 10,947,639
- Issue date Mar 16, 2021
- UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF NASA.
- Hyun Jung Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus including cathode with rotatable targets, and...
- Patent number 10,586,689
- Issue date Mar 10, 2020
- Guardian Europe S.a.r.l.
- Marcel Schloremberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 10,233,535
- Issue date Mar 19, 2019
- Tokyo Electron Limited
- Yoshihide Kihara
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition tile arrangement and physical vapor depos...
- Patent number 9,328,410
- Issue date May 3, 2016
- First Solar, Inc
- Bernd Teichert
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and device for continuous cold plasma deposition of metal co...
- Patent number 7,156,960
- Issue date Jan 2, 2007
- Cold Plasma Applications, CPA, SPRL
- Pierre Vanden Brande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron sputtering method and apparatus for compound thin films
- Patent number 5,405,517
- Issue date Apr 11, 1995
- Lampkin; Curtis M.
- Curtis M. Lampkin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PROFILED SPUTTERING TARGET AND METHOD OF MAKING THE SAME
- Publication number 20220139685
- Publication date May 5, 2022
- Honeywell International Inc.
- Shih-Yao Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM FOR FOCUSED DEPOSITION OF ATOMIC VAPORS
- Publication number 20210175056
- Publication date Jun 10, 2021
- The Charles Stark Draper Laboratory Inc.
- Isaac Ehrenberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS INCLUDING CATHODE WITH ROTATABLE TARGETS, AND...
- Publication number 20200185205
- Publication date Jun 11, 2020
- GUARDIAN EUROPE S.À R.L.
- Marcel SCHLOREMBERG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Insertable Target Holder For Solid Dopant Materials
- Publication number 20200090916
- Publication date Mar 19, 2020
- Varian Semiconductor Equipment Associates, Inc.
- Shreyansh Patel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION VIA LINEAR SCAN...
- Publication number 20190276929
- Publication date Sep 12, 2019
- Applied Materials, Inc.
- Bencherki Mebarki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROFILED SPUTTERING TARGET AND METHOD OF MAKING THE SAME
- Publication number 20180308671
- Publication date Oct 25, 2018
- HONEYWELL INTERNATIONAL INC.
- Shih-Yao Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CYLINDRICAL EVAPORATION SOURCE
- Publication number 20140238852
- Publication date Aug 28, 2014
- SULZER METAPLAS GMBH
- Joerg VETTER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering apparatus including cathode with rotatable targets, and...
- Publication number 20110024284
- Publication date Feb 3, 2011
- Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A. (C.R.V...
- Marcel Schloremberg
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING TARGET
- Publication number 20100126854
- Publication date May 27, 2010
- Applied Materials, Inc.
- Daniel O. Clark
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and device for continuous cold plasma deposition of metal co...
- Publication number 20040026234
- Publication date Feb 12, 2004
- Pierre Vanden Brande
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Target-material dispenser

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Sputtering target, method of bonding target material and backing pl...

System for focused deposition of atomic vapors

Insertable target holder for solid dopant materials

Profiled sputtering target and method of making the same

Sputtering apparatus including cathode with rotatable targets, and...

Insertable target holder for improved stability and performance for...

Molten target sputtering (MTS) deposition for enhanced kinetic ener...

Sputtering apparatus including cathode with rotatable targets, and...

Plasma processing apparatus and plasma processing method

Physical vapor deposition tile arrangement and physical vapor depos...

Method and device for continuous cold plasma deposition of metal co...

Magnetron sputtering method and apparatus for compound thin films

Patents Applicationslast 30 patents

PROFILED SPUTTERING TARGET AND METHOD OF MAKING THE SAME

SYSTEM FOR FOCUSED DEPOSITION OF ATOMIC VAPORS

SPUTTERING APPARATUS INCLUDING CATHODE WITH ROTATABLE TARGETS, AND...

Insertable Target Holder For Solid Dopant Materials

METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION VIA LINEAR SCAN...

PROFILED SPUTTERING TARGET AND METHOD OF MAKING THE SAME

CYLINDRICAL EVAPORATION SOURCE

Sputtering apparatus including cathode with rotatable targets, and...

SPUTTERING TARGET

Method and device for continuous cold plasma deposition of metal co...