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H01J37/3414

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/3414Targets

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Anti-stiction process for MEMS device
- Patent number 12,157,667
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Chun Weng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Physical vapor deposition apparatus and method thereof
- Patent number 12,094,698
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and apparatus
- Patent number 12,027,353
- Issue date Jul 2, 2024
- Tokyo Electron Limited
- Shota Ishibashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target structure and film forming apparatus
- Patent number 11,823,880
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Einstein Noel Abarra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and method for manufacturing the same
- Patent number 11,735,403
- Issue date Aug 22, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition apparatus and method thereof
- Patent number 11,688,591
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Isolator ring clamp and physical vapor deposition chamber incorpora...
- Patent number 11,670,493
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Ilya Lavitsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for an improved magnetron electromagnetic assembly
- Patent number 11,615,947
- Issue date Mar 28, 2023
- OEM Group, LLC
- Marc-Andre Lariviere
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for and method of fabricating semiconductor device
- Patent number 11,600,776
- Issue date Mar 7, 2023
- Samsung Electronics Co., Ltd.
- Jaeho Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering target
- Patent number 11,532,468
- Issue date Dec 20, 2022
- Sumitomo Chemical Company, Limited
- Mikio Takigawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition apparatus and method thereof
- Patent number 11,462,394
- Issue date Oct 4, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Hsi Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multifocal magnetron design for physical vapor deposition processin...
- Patent number 11,456,162
- Issue date Sep 27, 2022
- HIA, Inc.
- Samuel D. Harkness
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering device
- Patent number 11,414,747
- Issue date Aug 16, 2022
- Tokyo Electron Limited
- Junichi Takei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for uniform target erosion magnetic assemblies
- Patent number 11,390,520
- Issue date Jul 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Fang Chung
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Anti-stiction process for MEMS device
- Patent number 11,305,980
- Issue date Apr 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Chun Weng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Sputtering apparatus
- Patent number 11,149,342
- Issue date Oct 19, 2021
- Tokyo Electron Limited
- Junichi Takei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target
- Patent number 11,142,819
- Issue date Oct 12, 2021
- Sumitomo Chemical Company, Limited
- Hiroyuki Tsukada
- B24 - GRINDING POLISHING
Information Patent Grant
Pulsed power module with pulse and ion flux control for magnetron s...
- Patent number 11,069,515
- Issue date Jul 20, 2021
- Starfire Industries LLC
- David N. Ruzic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputtering target for magnetic recording media
- Patent number 10,971,181
- Issue date Apr 6, 2021
- Tanaka Kikinzoku Kogyo K.K.
- Kim Kong Tham
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter trap having multimodal particle size distribution
- Patent number 10,968,510
- Issue date Apr 6, 2021
- Honeywell International Inc.
- Jaeyeon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molten target sputtering (MTS) deposition for enhanced kinetic ener...
- Patent number 10,947,639
- Issue date Mar 16, 2021
- UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF NASA.
- Hyun Jung Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Smart chamber and smart chamber components
- Patent number 10,930,479
- Issue date Feb 23, 2021
- Applied Materials, Inc.
- Simon Nicholas Binns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of fabricating semiconductor devices
- Patent number 10,818,839
- Issue date Oct 27, 2020
- Samsung Electronics Co., Ltd.
- Jaeho Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sputter trap having multimodal particle size distribution
- Patent number 10,655,212
- Issue date May 19, 2020
- Honeywell Internatonal Inc
- Jaeyeon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter target and sputtering methods
- Patent number 10,615,011
- Issue date Apr 7, 2020
- View, Inc.
- Ronald M. Parker
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anti-stiction process for MEMS device
- Patent number 10,513,432
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Chun Weng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Sputtering target
- Patent number 10,480,061
- Issue date Nov 19, 2019
- Tsinghua University
- Da-Ming Zhuang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and sputtering method using the same
- Patent number 10,480,062
- Issue date Nov 19, 2019
- Samsung Display Co., Ltd.
- Seungho Choi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus and target changing device thereof
- Patent number 10,465,279
- Issue date Nov 5, 2019
- BOE Technology Group Co., Ltd.
- Jianhua Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputter device with moving target
- Patent number 10,424,468
- Issue date Sep 24, 2019
- Soleras Advanced Coatings BVBA
- Wilmert De Bosscher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) SYSTEM AND METHOD OF PROCESSING TARGET
- Publication number 20240376592
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- Sheng-Ying WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
THIN FILM FORMING APPARATUS AND METHOD
- Publication number 20240112897
- Publication date Apr 4, 2024
- SEMES CO., LTD.
- Sun Il KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20230307218
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PREPARATION METHOD OF HYDROGENATED COMPOSITE FILM AND OPTICAL FILTER
- Publication number 20230178347
- Publication date Jun 8, 2023
- ZHEJIANG CRYSTAL-OPTECH CO., LTD.
- Yanzhi WANG
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
MULTIFOCAL MAGNETRON DESIGN FOR PHYSICAL VAPOR DEPOSITION PROCESSIN...
- Publication number 20220406582
- Publication date Dec 22, 2022
- HIA, Inc.
- Samuel D. Harkness
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING MATERIAL ON A SUBSTRATE
- Publication number 20220403499
- Publication date Dec 22, 2022
- Dyson Technology Limited
- Michael Edward RENDALL
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20220367161
- Publication date Nov 17, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING LAYER
- Publication number 20220344133
- Publication date Oct 27, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- HSIN-LIANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220310364
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Halbert CHONG
- B08 - CLEANING
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220310363
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Halbert CHONG
- B08 - CLEANING
Information Patent Application
ANTI-STICTION PROCESS FOR MEMS DEVICE
- Publication number 20220242724
- Publication date Aug 4, 2022
- Taiwan Semiconductor Manufacturing Co.,Ltd
- Jui-Chun WENG
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
SYSTEMS AND METHODS FOR AN IMPROVED MAGNETRON ELECTROMAGNETIC ASSEMBLY
- Publication number 20220068620
- Publication date Mar 3, 2022
- OEM Group, LLC
- Marc-Andre Lariviere
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PULSED POWER MODULE WITH PULSE AND ION FLUX CONTROL FOR MAGNETRON S...
- Publication number 20210343513
- Publication date Nov 4, 2021
- Starfire Industries LLC
- David N. Ruzic
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210319989
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Halbert CHONG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND APPARATUS
- Publication number 20210305032
- Publication date Sep 30, 2021
- TOKYO ELECTRON LIMITED
- Shota ISHIBASHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20210222289
- Publication date Jul 22, 2021
- ULVAC, Inc.
- Yutaka KOKAZE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TARGET STRUCTURE AND FILM FORMING APPARATUS
- Publication number 20210020419
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Einstein Noel ABARRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20210013410
- Publication date Jan 14, 2021
- Samsung Electronics Co., Ltd.
- Jaeho JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20200255935
- Publication date Aug 13, 2020
- TOKYO ELECTRON LIMITED
- Junichi Takei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER TRAP HAVING MULTIMODAL PARTICLE SIZE DISTRIBUTION
- Publication number 20200240004
- Publication date Jul 30, 2020
- HONEYWELL INTERNATIONAL INC.
- Jaeyeon Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR PHYSICAL VAPOR DEPOSITION AND METHOD FOR FORMING A LAYER
- Publication number 20200161100
- Publication date May 21, 2020
- Taiwan Semiconductor Manufacturing company Ltd.
- HSIN-LIANG CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTI-STICTION PROCESS FOR MEMS DEVICE
- Publication number 20200123003
- Publication date Apr 23, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Jui-Chun Weng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF
- Publication number 20200105511
- Publication date Apr 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Hsi WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTERING DEVICE
- Publication number 20190390325
- Publication date Dec 26, 2019
- TOKYO ELECTRON LIMITED
- Junichi TAKEI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SHUTTER MECHANISM FOR TARGET, AND FILM-FORMING DEVICE PROVIDED WITH...
- Publication number 20190341237
- Publication date Nov 7, 2019
- Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
- Naoki OHBA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYNTHESIS OF HIGH-PURITY BULK COPPER INDIUM GALLIUM SELENIDE MATERIALS
- Publication number 20190311889
- Publication date Oct 10, 2019
- The Goverment of the United States of America, as represented by the Secretar...
- Vinh Q. Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS FOR AND METHOD OF FABRICATING SEMICONDUCTOR DEVICES
- Publication number 20190288203
- Publication date Sep 19, 2019
- Samsung Electronics Co., Ltd.
- Jaeho JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR REDUCED-ARC SPUTTERING
- Publication number 20190284683
- Publication date Sep 19, 2019
- Corning Incorporated
- Xu Ouyang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MULTIFOCAL MAGNETRON DESIGN FOR PHYSICAL VAPOR DEPOSITION PROCESSIN...
- Publication number 20190180991
- Publication date Jun 13, 2019
- HIA, Inc.
- Samuel D. Harkness
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Device For Sputtering A Material Onto A Surface Of A Substrate Whil...
- Publication number 20190144990
- Publication date May 16, 2019
- Oliver James Groves
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Anti-stiction process for MEMS device

Physical vapor deposition apparatus and method thereof

Substrate processing method and apparatus

Target structure and film forming apparatus

Sputtering target and method for manufacturing the same

Physical vapor deposition apparatus and method thereof

Isolator ring clamp and physical vapor deposition chamber incorpora...

Systems and methods for an improved magnetron electromagnetic assembly

Apparatus for and method of fabricating semiconductor device

Sputtering target

Physical vapor deposition apparatus and method thereof

Multifocal magnetron design for physical vapor deposition processin...

Sputtering device

Systems and methods for uniform target erosion magnetic assemblies

Anti-stiction process for MEMS device

Sputtering apparatus

Sputtering target

Pulsed power module with pulse and ion flux control for magnetron s...

Sputtering target for magnetic recording media

Sputter trap having multimodal particle size distribution

Molten target sputtering (MTS) deposition for enhanced kinetic ener...

Smart chamber and smart chamber components

Apparatus for and method of fabricating semiconductor devices

Sputter trap having multimodal particle size distribution

Sputter target and sputtering methods

Anti-stiction process for MEMS device

Sputtering target

Sputtering apparatus and sputtering method using the same

Sputtering apparatus and target changing device thereof

Sputter device with moving target

Patents Applicationslast 30 patents

PHYSICAL VAPOR DEPOSITION (PVD) SYSTEM AND METHOD OF PROCESSING TARGET

THIN FILM FORMING APPARATUS AND METHOD

PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF

PREPARATION METHOD OF HYDROGENATED COMPOSITE FILM AND OPTICAL FILTER

MULTIFOCAL MAGNETRON DESIGN FOR PHYSICAL VAPOR DEPOSITION PROCESSIN...

METHOD OF DEPOSITING MATERIAL ON A SUBSTRATE

PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF

METHOD FOR FORMING LAYER

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

ANTI-STICTION PROCESS FOR MEMS DEVICE

SYSTEMS AND METHODS FOR AN IMPROVED MAGNETRON ELECTROMAGNETIC ASSEMBLY

PULSED POWER MODULE WITH PULSE AND ION FLUX CONTROL FOR MAGNETRON S...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

SUBSTRATE PROCESSING METHOD AND APPARATUS

SPUTTERING APPARATUS

TARGET STRUCTURE AND FILM FORMING APPARATUS

APPARATUS FOR AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE

SPUTTERING APPARATUS

SPUTTER TRAP HAVING MULTIMODAL PARTICLE SIZE DISTRIBUTION

APPARATUS FOR PHYSICAL VAPOR DEPOSITION AND METHOD FOR FORMING A LAYER

ANTI-STICTION PROCESS FOR MEMS DEVICE

PHYSICAL VAPOR DEPOSITION APPARATUS AND METHOD THEREOF

SPUTTERING DEVICE

SHUTTER MECHANISM FOR TARGET, AND FILM-FORMING DEVICE PROVIDED WITH...

SYNTHESIS OF HIGH-PURITY BULK COPPER INDIUM GALLIUM SELENIDE MATERIALS

APPARATUS FOR AND METHOD OF FABRICATING SEMICONDUCTOR DEVICES

APPARATUS AND METHODS FOR REDUCED-ARC SPUTTERING

MULTIFOCAL MAGNETRON DESIGN FOR PHYSICAL VAPOR DEPOSITION PROCESSIN...

Device For Sputtering A Material Onto A Surface Of A Substrate Whil...