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CPC
G03F9/7049

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Current Industry

G03F9/7049Technique

Industries

Patents Grantslast 30 patents

Information Patent Grant
Invariable magnification multilevel optical device with telecentric...
- Patent number 11,960,216
- Issue date Apr 16, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus
- Patent number 11,914,308
- Issue date Feb 27, 2024
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of sensing alignment marks
- Patent number 11,899,380
- Issue date Feb 13, 2024
- ASML Holding N.V.
- Krishanu Shome
- G01 - MEASURING TESTING
Information Patent Grant
Bonding alignment marks at bonding interface
- Patent number 11,876,049
- Issue date Jan 16, 2024
- Yangtze Memory Technologies Co., Ltd.
- Meng Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for calibrating alignment of wafer and lithography system
- Patent number 11,854,854
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chang-Jen Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for and method of sensing alignment marks
- Patent number 11,841,628
- Issue date Dec 12, 2023
- ASML Holding N.V.
- Krishanu Shome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination apparatus, measurement apparatus, substrate processing...
- Patent number 11,841,623
- Issue date Dec 12, 2023
- Canon Kabushiki Kaisha
- Yuki Isaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase modulators in alignment to decrease mark size
- Patent number 11,803,130
- Issue date Oct 31, 2023
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,675,277
- Issue date Jun 13, 2023
- KLA Corporation
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for measuring a position of a mark
- Patent number 11,650,513
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for lateral shearing interferometry in an inspect...
- Patent number 11,609,506
- Issue date Mar 21, 2023
- KLA Corporation
- Markus Mengel
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus
- Patent number 11,609,503
- Issue date Mar 21, 2023
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compact alignment sensor arrangements
- Patent number 11,531,280
- Issue date Dec 20, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed Elazhary
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensor apparatus and method for lithographic measurements
- Patent number 11,526,091
- Issue date Dec 13, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed Elazhary
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Noise correction for alignment signal
- Patent number 11,493,852
- Issue date Nov 8, 2022
- ASML Holdings N.V.
- Zahrasadat Dastouri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Height sensor, lithographic apparatus and method for manufacturing...
- Patent number 11,467,505
- Issue date Oct 11, 2022
- ASML Netherlands B.V.
- Hans Butler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position sensor
- Patent number 11,333,985
- Issue date May 17, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sensor apparatus and method for lithographic measurements
- Patent number 11,300,892
- Issue date Apr 12, 2022
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G01 - MEASURING TESTING
Information Patent Grant
Bonding alignment marks at bonding in interface
- Patent number 11,289,422
- Issue date Mar 29, 2022
- Yangtze Memory Technologies Co., Ltd.
- Meng Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithography apparatus, determination method, and method of manufact...
- Patent number 11,275,319
- Issue date Mar 15, 2022
- Canon Kabushiki Kaisha
- Koshiro Arahara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic mask, method for determining edge positions of th...
- Patent number 11,256,178
- Issue date Feb 22, 2022
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-referencing and self-calibrating interference pattern overlay...
- Patent number 11,231,654
- Issue date Jan 25, 2022
- GLOBALFOUNDRIES U.S. Inc.
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molding apparatus for molding composition on substrate with mold, a...
- Patent number 11,194,249
- Issue date Dec 7, 2021
- Canon Kabushiki Kaisha
- Atsushi Kimura
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Movable body apparatus, exposure apparatus, manufacturing method of...
- Patent number 11,169,448
- Issue date Nov 9, 2021
- Nikon Corporation
- Akinori Shirato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark for two-dimensional alignment in an alignment system
- Patent number 11,156,928
- Issue date Oct 26, 2021
- ASML Holding N.V.
- Gerrit Johannes Nijmeijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology sensor, lithographic apparatus and method for manufacturi...
- Patent number 11,086,240
- Issue date Aug 10, 2021
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High-resolution position encoder with image sensor and encoded targ...
- Patent number 11,061,338
- Issue date Jul 13, 2021
- NIKON CORPORATION
- Jonathan Kyle Wells
- G01 - MEASURING TESTING
Information Patent Grant
Position detection apparatus, position detection method, imprint ap...
- Patent number 10,989,527
- Issue date Apr 27, 2021
- Canon Kabushiki Kaisha
- Hiroshi Sato
- G01 - MEASURING TESTING
Information Patent Grant
Lithographic apparatus
- Patent number 10,976,675
- Issue date Apr 13, 2021
- ASML Netherlands B.V.
- Hans Butler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adaptive filter for in-line correction
- Patent number 10,928,738
- Issue date Feb 23, 2021
- ASML Holding N.V.
- Eric Brian Catey
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD
- Publication number 20240377767
- Publication date Nov 14, 2024
- Canon Kabushiki Kaisha
- MIZUKI ISHIMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20240329549
- Publication date Oct 3, 2024
- Ushio Denki Kabushiki Kaisha
- Naoya SOHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...
- Publication number 20240302758
- Publication date Sep 12, 2024
- Samsung Electronics Co., Ltd.
- Ingyun CHUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240241454
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT
- Publication number 20240168397
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Joshua ADAMS
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...
- Publication number 20240061349
- Publication date Feb 22, 2024
- Canon Kabushiki Kaisha
- Yuki Isaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...
- Publication number 20240053688
- Publication date Feb 15, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20230266678
- Publication date Aug 24, 2023
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING M...
- Publication number 20230213871
- Publication date Jul 6, 2023
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G01 - MEASURING TESTING
Information Patent Application
DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...
- Publication number 20230185188
- Publication date Jun 15, 2023
- KIOXIA Corporation
- Yoshinori KAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTOR...
- Publication number 20230176494
- Publication date Jun 8, 2023
- ASML Holding N.V.
- Zahrasadat DASTOURI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...
- Publication number 20230131615
- Publication date Apr 27, 2023
- Canon Kabushiki Kaisha
- Yuki Isaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF SENSING ALIGNMENT MARKS
- Publication number 20230116318
- Publication date Apr 13, 2023
- ASML Holding N.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE
- Publication number 20220397833
- Publication date Dec 15, 2022
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION AIDED TWO-STAGE PHASE UNWRAPPING ON PATTERN WAFER GEOMETR...
- Publication number 20220390862
- Publication date Dec 8, 2022
- KLA Corporation
- Helen Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR LATERAL SHEARING INTERFEROMETRY IN AN INSPECT...
- Publication number 20220342325
- Publication date Oct 27, 2022
- KLA Corporation
- Markus Mengel
- G01 - MEASURING TESTING
Information Patent Application
SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...
- Publication number 20220334502
- Publication date Oct 20, 2022
- Dongyue Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF SENSING ALIGNMENT MARKS
- Publication number 20220291598
- Publication date Sep 15, 2022
- ASML Holding N.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-REFERENCING INTERFEROMETER AND DUAL SELF-REFERENCING INTERFERO...
- Publication number 20220221802
- Publication date Jul 14, 2022
- ASML Holding N.V.
- Douglas C. CAPPELLI
- G01 - MEASURING TESTING
Information Patent Application
SENSOR APPARATUS AND METHOD FOR LITHOGRAPHIC MEASUREMENTS
- Publication number 20220179331
- Publication date Jun 9, 2022
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BONDING ALIGNMENT MARKS AT BONDING INTERFACE
- Publication number 20220173038
- Publication date Jun 2, 2022
- Yangtze Memory Technologies Co., Ltd.
- Meng Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOISE CORRECTION FOR ALIGNMENT SIGNAL
- Publication number 20220066334
- Publication date Mar 3, 2022
- Zahrasadat DASTOURI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR MEASURING A POSITION OF A MARK
- Publication number 20210382403
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPACT ALIGNMENT SENSOR ARRANGEMENTS
- Publication number 20210318627
- Publication date Oct 14, 2021
- ASML Holding N.V.
- Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Sensor Apparatus and Method for Lithographic Measurements
- Publication number 20210271178
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20210223703
- Publication date Jul 22, 2021
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20210149309
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITION SENSOR
- Publication number 20210124276
- Publication date Apr 29, 2021
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BONDING ALIGNMENT MARKS AT BONDING INTERFACE
- Publication number 20210072653
- Publication date Mar 11, 2021
- YANGTZE MEMORY TECHNOLOGIES CO., LTD.
- Meng Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20200326637
- Publication date Oct 15, 2020
- ASML NETHERLANDS B.V.
- Bram VAN HOOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Invariable magnification multilevel optical device with telecentric...

Lithographic apparatus

Apparatus for and method of sensing alignment marks

Bonding alignment marks at bonding interface

Method for calibrating alignment of wafer and lithography system

Apparatus for and method of sensing alignment marks

Illumination apparatus, measurement apparatus, substrate processing...

Phase modulators in alignment to decrease mark size

Self-referencing and self-calibrating interference pattern overlay...

Apparatus and method for measuring a position of a mark

System and method for lateral shearing interferometry in an inspect...

Lithographic apparatus

Compact alignment sensor arrangements

Sensor apparatus and method for lithographic measurements

Noise correction for alignment signal

Height sensor, lithographic apparatus and method for manufacturing...

Position sensor

Sensor apparatus and method for lithographic measurements

Bonding alignment marks at bonding in interface

Lithography apparatus, determination method, and method of manufact...

Microlithographic mask, method for determining edge positions of th...

Self-referencing and self-calibrating interference pattern overlay...

Molding apparatus for molding composition on substrate with mold, a...

Movable body apparatus, exposure apparatus, manufacturing method of...

Alignment mark for two-dimensional alignment in an alignment system

Metrology sensor, lithographic apparatus and method for manufacturi...

High-resolution position encoder with image sensor and encoded targ...

Position detection apparatus, position detection method, imprint ap...

Lithographic apparatus

Adaptive filter for in-line correction

Patents Applicationslast 30 patents

IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD

EXPOSURE APPARATUS

PATTERN CORRECTION DEVICE, PATTERN CORRECTION METHOD, AND PATTERN F...

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT

ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...

INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...

LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING M...

DRAWING METHOD, MASTER PLATE MANUFACTURING METHOD, AND DRAWING APPA...

GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTOR...

ILLUMINATION APPARATUS, MEASUREMENT APPARATUS, SUBSTRATE PROCESSING...

APPARATUS FOR AND METHOD OF SENSING ALIGNMENT MARKS

PHASE MODULATORS IN ALIGNMENT TO DECREASE MARK SIZE

DETECTION AIDED TWO-STAGE PHASE UNWRAPPING ON PATTERN WAFER GEOMETR...

SYSTEM AND METHOD FOR LATERAL SHEARING INTERFEROMETRY IN AN INSPECT...

SELF-REFERENCING AND SELF-CALIBRATING INTERFERENCE PATTERN OVERLAY...

APPARATUS FOR AND METHOD OF SENSING ALIGNMENT MARKS

SELF-REFERENCING INTERFEROMETER AND DUAL SELF-REFERENCING INTERFERO...

SENSOR APPARATUS AND METHOD FOR LITHOGRAPHIC MEASUREMENTS

BONDING ALIGNMENT MARKS AT BONDING INTERFACE

NOISE CORRECTION FOR ALIGNMENT SIGNAL

APPARATUS AND METHOD FOR MEASURING A POSITION OF A MARK

COMPACT ALIGNMENT SENSOR ARRANGEMENTS

Sensor Apparatus and Method for Lithographic Measurements

LITHOGRAPHIC APPARATUS

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

POSITION SENSOR

BONDING ALIGNMENT MARKS AT BONDING INTERFACE

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD