Temperature

Industry

CPC
H01J37/32724

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32724Temperature

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Wafer placement table
- Patent number 12,266,557
- Issue date Apr 1, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for adjusting the gap between a wafer and a top p...
- Patent number 12,266,579
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chan Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for venting a processing cha...
- Patent number 12,266,508
- Issue date Apr 1, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate temperature correction...
- Patent number 12,266,514
- Issue date Apr 1, 2025
- Tokyo Electron Limited
- Rei Ibuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,266,515
- Issue date Apr 1, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly for plasma processing apparatus
- Patent number 12,261,073
- Issue date Mar 25, 2025
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,261,028
- Issue date Mar 25, 2025
- Tokyo Electron Limited
- Shuichi Takahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems for depositing a layer
- Patent number 12,255,053
- Issue date Mar 18, 2025
- ASM IP Holding B.V.
- Daniele Piumi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor wafer with wafer chuck havin...
- Patent number 12,249,493
- Issue date Mar 11, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Sheng-Chun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Susceptor manufacturing method and the manufactured susceptor using...
- Patent number 12,249,501
- Issue date Mar 11, 2025
- ASM IP Holding B.V.
- Hoyoun Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical device improvement
- Patent number 12,249,489
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Yue Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature RF connection with integral thermal choke
- Patent number 12,243,725
- Issue date Mar 4, 2025
- Lam Research Corporation
- Timothy S. Thomas
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Member for semiconductor manufacturing apparatus and method for man...
- Patent number 12,243,729
- Issue date Mar 4, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing system including temperature controller
- Patent number 12,237,183
- Issue date Feb 25, 2025
- Samsung Electronics Co., Ltd.
- Kyoungsik Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,237,156
- Issue date Feb 25, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Electrostatic chucks with coolant gas zones and corresponding groov...
- Patent number 12,237,201
- Issue date Feb 25, 2025
- Lam Research Corporation
- Alexander Matyushkin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,230,484
- Issue date Feb 18, 2025
- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
- Atsushi Harikai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature manifold assembly for substrate processing systems
- Patent number 12,224,161
- Issue date Feb 11, 2025
- Lam Research Corporation
- Gabriel De Jesus Soto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,217,942
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and electrostatic chuck
- Patent number 12,217,943
- Issue date Feb 4, 2025
- Tokyo Electron Limited
- Kohei Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pedestal thermal profile tuning using multiple heated zones and the...
- Patent number 12,215,420
- Issue date Feb 4, 2025
- Lam Research Corporation
- Gary B. Lind
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High power cable for heated components in RF environment
- Patent number 12,217,944
- Issue date Feb 4, 2025
- Lam Research Corporation
- Seyed Jafar Jafarian-Tehrani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET device and method of forming same
- Patent number 12,218,222
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Wei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shutter disc for a semiconductor processing tool
- Patent number 12,215,414
- Issue date Feb 4, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yi-Lin Wang
- B08 - CLEANING
Information Patent Grant
RF tuning systems including tuning circuits having impedances for s...
- Patent number 12,217,939
- Issue date Feb 4, 2025
- Lam Research Corporation
- David French
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Electrostatic chuck design with improved chucking and arcing perfor...
- Patent number 12,211,728
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,211,671
- Issue date Jan 28, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recipe updating method
- Patent number 12,211,678
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 12,211,672
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...
- Publication number 20250112031
- Publication date Apr 3, 2025
- TOKYO ELECTRON LIMITED
- Takashi ARAMAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL BONDED ESC WITH OUTER CERAMIC VACUUM ISOLATION RING FOR CRYOG...
- Publication number 20250112075
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Alexander SULYMAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROC...
- Publication number 20250112076
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250105043
- Publication date Mar 27, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, PLASMA PROCESSING METHOD, AND PLASMA PROCESSIN...
- Publication number 20250105044
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Yong Jun BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK
- Publication number 20250105045
- Publication date Mar 27, 2025
- TOTO LTD.
- Tetsuro ITOYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING T...
- Publication number 20250105052
- Publication date Mar 27, 2025
- SEMES CO., LTD.
- Yong Jun BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME
- Publication number 20250095972
- Publication date Mar 20, 2025
- PSK INC.
- Yong Soo YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...
- Publication number 20250087465
- Publication date Mar 13, 2025
- Samsung Electronics Co., Ltd.
- Hyungsik KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20250087470
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Takari YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT ASSEMBLY WITH IMPROVED THERMAL UNIFORMITY
- Publication number 20250087468
- Publication date Mar 13, 2025
- Applied Materials, Inc.
- Vijay D. Parkhe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK
- Publication number 20250087469
- Publication date Mar 13, 2025
- TOKYO ELECTRON LIMITED
- Kohei OTSUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH
- Publication number 20250087456
- Publication date Mar 13, 2025
- LAM RESEARCH CORPORATION
- Sriharsha Jayanti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME
- Publication number 20250079230
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Ikuhisa MORIOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20250079229
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT TABLE AND RF ROD
- Publication number 20250079235
- Publication date Mar 6, 2025
- NGK Insulators, Ltd.
- Tomohiro HARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUSCEPTOR HEAT TRANSFER
- Publication number 20250069864
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Arvinder ManmohanSingh Chadha
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN S...
- Publication number 20250069866
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Changyou JING
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE
- Publication number 20250069860
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lun KE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...
- Publication number 20250069871
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jonghwa LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TE...
- Publication number 20250069895
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Anatoli Chlenov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS
- Publication number 20250069865
- Publication date Feb 27, 2025
- NGK Insulators, Ltd.
- Tatsuya KUNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...
- Publication number 20250069935
- Publication date Feb 27, 2025
- KIOXIA Corporation
- Wu LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...
- Publication number 20250062133
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATED PEDESTAL WITH LOW IMPEDANCE RF ROD
- Publication number 20250062104
- Publication date Feb 20, 2025
- Sudhir R. GONDHALEKAR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCKS WITH SELF-SEALING GAS CONDUITS AND/OR REDUCED...
- Publication number 20250062149
- Publication date Feb 20, 2025
- LAM RESEARCH CORPORATION
- Kadthala R. NARENDRNATH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrostatic Chuck with High Cooling Efficiency
- Publication number 20250054737
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Karthik ELUMALAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR SUBSTRATE SUPPORT LEVELING APPARATUS
- Publication number 20250054797
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Katherine Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...
- Publication number 20250054778
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Anthony DE LA LLERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS
- Publication number 20250054738
- Publication date Feb 13, 2025
- LAM RESEARCH CORPORATION
- Dan MAROHL
- H01 - BASIC ELECTRIC ELEMENTS

Temperature

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer placement table

Method and system for adjusting the gap between a wafer and a top p...

Plasma processing apparatus and method for venting a processing cha...

Substrate processing apparatus and substrate temperature correction...

Wafer placement table

Electrostatic chuck assembly for plasma processing apparatus

Plasma processing apparatus

Methods and systems for depositing a layer

Method for manufacturing semiconductor wafer with wafer chuck havin...

Susceptor manufacturing method and the manufactured susceptor using...

Optical device improvement

High temperature RF connection with integral thermal choke

Member for semiconductor manufacturing apparatus and method for man...

Semiconductor processing system including temperature controller

Wafer placement table

Electrostatic chucks with coolant gas zones and corresponding groov...

Plasma processing apparatus and plasma processing method

Low temperature manifold assembly for substrate processing systems

Plasma processing apparatus

Substrate processing apparatus and electrostatic chuck

Pedestal thermal profile tuning using multiple heated zones and the...

High power cable for heated components in RF environment

FinFET device and method of forming same

Shutter disc for a semiconductor processing tool

RF tuning systems including tuning circuits having impedances for s...

Systems and methods for metastable activated radical selective stri...

Electrostatic chuck design with improved chucking and arcing perfor...

Wafer placement table

Recipe updating method

Apparatus and method for plasma etching

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CL...

METAL BONDED ESC WITH OUTER CERAMIC VACUUM ISOLATION RING FOR CRYOG...

GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROC...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

ELECTROSTATIC CHUCK, PLASMA PROCESSING METHOD, AND PLASMA PROCESSIN...

ELECTROSTATIC CHUCK

SUBSTRATE SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING T...

SUPPORT UNIT AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME

RING ASSEMBLY FOR SEMICONDUCTOR PROCESS, SUBSTRATE PROCESSING APPAR...

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE SUPPORT ASSEMBLY WITH IMPROVED THERMAL UNIFORMITY

SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK

HIGH SELECTIVITY AND UNIFORM DIELECTRIC ETCH

WAFER PLACEMENT TABLE AND METHOD OF USING THE SAME

WAFER PLACEMENT TABLE

WAFER SUPPORT TABLE AND RF ROD

SUSCEPTOR HEAT TRANSFER

IN SITU REAL-TIME SENSING AND COMPENSATION OF NON-UNIFORMITIES IN S...

PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, A...

METHODS OF ETCHING SILICON-AND-OXYGEN-CONTAINING FEATURES AT LOW TE...

MEMBER FOR SEMICONDUCTOR MANUFACTURING APPARATUS

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING...

Atomic Layer Etch Process Using Plasma In Conjunction With A Rapid...

HEATED PEDESTAL WITH LOW IMPEDANCE RF ROD

ELECTROSTATIC CHUCKS WITH SELF-SEALING GAS CONDUITS AND/OR REDUCED...

Electrostatic Chuck with High Cooling Efficiency

SEMICONDUCTOR SUBSTRATE SUPPORT LEVELING APPARATUS

IMPROVED THERMAL AND ELECTRICAL INTERFACE BETWEEN PARTS IN AN ETCH...

TUNABLE ESC FOR RAPID ALTERNATING PROCESS APPLICATIONS