Temperature

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CPC
H01J37/32724

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32724Temperature

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for metastable activated radical selective stri...
- Patent number 12,211,709
- Issue date Jan 28, 2025
- Lam Research Corporation
- Dengliang Yang
- B08 - CLEANING
Information Patent Grant
Electrostatic chuck design with improved chucking and arcing perfor...
- Patent number 12,211,728
- Issue date Jan 28, 2025
- Applied Materials, Inc.
- Abdul Aziz Khaja
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,211,671
- Issue date Jan 28, 2025
- NGK Insulators, Ltd.
- Tatsuya Kuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Recipe updating method
- Patent number 12,211,678
- Issue date Jan 28, 2025
- Tokyo Electron Limited
- Masafumi Urakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for plasma etching
- Patent number 12,211,672
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Jongwoo Sun
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage, film-forming apparatus, and film-processing apparatus
- Patent number 12,211,710
- Issue date Jan 28, 2025
- NHK Spring Co., Ltd.
- Toshihiko Hanamachi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Member for semiconductor manufacturing apparatus
- Patent number 12,211,726
- Issue date Jan 28, 2025
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck assembly
- Patent number 12,211,725
- Issue date Jan 28, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ground electrode formed in an electrostatic chuck for a plasma proc...
- Patent number 12,205,843
- Issue date Jan 21, 2025
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing film and film deposition system
- Patent number 12,205,817
- Issue date Jan 21, 2025
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Support unit, substrate treating apparatus including the same and t...
- Patent number 12,207,362
- Issue date Jan 21, 2025
- Semes Co., Ltd.
- Chung Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and method of fabricating same
- Patent number 12,205,802
- Issue date Jan 21, 2025
- Semes Co., Ltd.
- Dong Mok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sample holder
- Patent number 12,205,839
- Issue date Jan 21, 2025
- Kyocera Corporation
- Yoshinori Narazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for electrically decoupled, homogeneous temperature control...
- Patent number 12,198,907
- Issue date Jan 14, 2025
- Meyer Burger (Germany) GmbH
- Christian Böhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method
- Patent number 12,198,938
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Takatoshi Orui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetically coupled RF filter for substrate processing chambers
- Patent number 12,198,908
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,191,121
- Issue date Jan 7, 2025
- HITACHI HIGH-TECH CORPORATION
- Kazuyuki Ikenaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck with spatially tunable RF coupling to a wafer
- Patent number 12,191,122
- Issue date Jan 7, 2025
- Lam Research Corporation
- John Drewery
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,191,123
- Issue date Jan 7, 2025
- NGK Insulators, Ltd.
- Hiroshi Takebayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,183,552
- Issue date Dec 31, 2024
- KELK Ltd.
- Atsushi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,183,558
- Issue date Dec 31, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer placement table
- Patent number 12,176,186
- Issue date Dec 24, 2024
- NGK Insulators, Ltd.
- Seiya Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor manufacturing apparatus and method for manufacturing...
- Patent number 12,176,236
- Issue date Dec 24, 2024
- Kioxia Corporation
- Wu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer support table and RF rod
- Patent number 12,170,190
- Issue date Dec 17, 2024
- NGK Insulators, Ltd.
- Yutaka Unno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate supporting apparatus and substrate treating apparatus inc...
- Patent number 12,170,191
- Issue date Dec 17, 2024
- Semes Co., Ltd.
- Jong Gun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method for manufacturing semiconductor structure
- Patent number 12,165,851
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lun Ke
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic heater
- Patent number 12,165,855
- Issue date Dec 10, 2024
- NGK Insulators, Ltd.
- Hideaki Takasaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch process using plasma in conjunction with a rapid...
- Patent number 12,159,789
- Issue date Dec 3, 2024
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrostatic chuck sidewall gas curtain
- Patent number 12,154,813
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ian Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support
- Patent number 12,148,636
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Masanori Takahashi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20250022724
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Masanori TAKAHASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE FIXING DEVICE
- Publication number 20250022741
- Publication date Jan 16, 2025
- Shinko Electric Industries Co., Ltd.
- Yuma Terashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE
- Publication number 20250022738
- Publication date Jan 16, 2025
- Shinko Electric Industries Co., Ltd.
- Masahiro Sunohara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...
- Publication number 20250022694
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Pranav Vijay Gadre
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING T...
- Publication number 20250022693
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Iksu BYUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND TE...
- Publication number 20250022695
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Kazuki HOSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...
- Publication number 20250022745
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20250014875
- Publication date Jan 9, 2025
- NGK Insulators, Ltd.
- Seiya INOUE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...
- Publication number 20250003536
- Publication date Jan 2, 2025
- SEMES CO., LTD.
- Joon Hee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Etching Method and Apparatus
- Publication number 20250006537
- Publication date Jan 2, 2025
- SPTS TECHNOLOGIES LIMITED
- Adam S. BEACHEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS
- Publication number 20250006516
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Noriiki MASUDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME
- Publication number 20250006538
- Publication date Jan 2, 2025
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING APPARATUS
- Publication number 20250006541
- Publication date Jan 2, 2025
- TOKYO ELECTRON LIMITED
- Riichiro ENDO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER SUPPORT DEVICE
- Publication number 20240429032
- Publication date Dec 26, 2024
- Sumitomo Osaka Cement Co., Ltd.
- Masaki HIRAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION PART COATING CHAMBER
- Publication number 20240420926
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT
- Publication number 20240420932
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Yogananda Sarode Vishwanath
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES
- Publication number 20240420921
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Kenneth S. Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...
- Publication number 20240420933
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Amir H. Tavakoli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240414919
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Sung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...
- Publication number 20240412957
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Gautam PISHARODY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...
- Publication number 20240412989
- Publication date Dec 12, 2024
- SEMES CO., LTD.
- Young Eun JEON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR CLAMPING A SUBSTRATE ON A MONO-POLAR ELECTROSTATIC CH...
- Publication number 20240404861
- Publication date Dec 5, 2024
- Applied Materials, Inc.
- SUSHIM KOSHTI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIG...
- Publication number 20240404798
- Publication date Dec 5, 2024
- LAM RESEARCH CORPORATION
- Alexander MATYUSHKIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUSCEPTOR MANUFACTURING METHOD AND THE MANUFACTURED SUSCEPTOR USING...
- Publication number 20240404779
- Publication date Dec 5, 2024
- ASM IP HOLDING B.V.
- Hoyoun Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240404802
- Publication date Dec 5, 2024
- Kokusai Electric Corporation
- Atsushi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240404799
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Shota EZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER PLACEMENT TABLE
- Publication number 20240395511
- Publication date Nov 28, 2024
- NGK Insulators, Ltd.
- Taro USAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING
- Publication number 20240395509
- Publication date Nov 28, 2024
- TOKYO ELECTRON LIMITED
- Chishio KOSHIMIZU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING SYSTEM FOR PROCESSING CHAMBER
- Publication number 20240393018
- Publication date Nov 28, 2024
- LAM RESEARCH CORPORATION
- Kevin FLYNN
- H01 - BASIC ELECTRIC ELEMENTS

Temperature

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Systems and methods for metastable activated radical selective stri...

Electrostatic chuck design with improved chucking and arcing perfor...

Wafer placement table

Recipe updating method

Apparatus and method for plasma etching

Stage, film-forming apparatus, and film-processing apparatus

Member for semiconductor manufacturing apparatus

Electrostatic chuck assembly

Ground electrode formed in an electrostatic chuck for a plasma proc...

Method for depositing film and film deposition system

Support unit, substrate treating apparatus including the same and t...

Substrate processing apparatus and method of fabricating same

Sample holder

System for electrically decoupled, homogeneous temperature control...

Etching method

Magnetically coupled RF filter for substrate processing chambers

Plasma processing apparatus

Electrostatic chuck with spatially tunable RF coupling to a wafer

Wafer placement table

Substrate processing apparatus

Workpiece processing apparatus with thermal processing systems

Wafer placement table

Semiconductor manufacturing apparatus and method for manufacturing...

Wafer support table and RF rod

Substrate supporting apparatus and substrate treating apparatus inc...

Plasma processing method for manufacturing semiconductor structure

Ceramic heater

Atomic layer etch process using plasma in conjunction with a rapid...

Electrostatic chuck sidewall gas curtain

Substrate support

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT

SUBSTRATE FIXING DEVICE

ELECTROSTATIC CHUCK AND SUBSTRATE FIXING DEVICE

HEATER PLATES WITH DISTRIBUTED PURGE CHANNELS, RF MESHES AND GROUND...

ELECTROSTATIC CHUCKS AND SUBSTRATE PROCESSING APPARATUS INCLUDING T...

PLASMA PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND TE...

Rotating Biasable Pedestal and Electrostatic Chuck in Semiconductor...

WAFER PLACEMENT TABLE

SEALING MEMBER, FLUID SUPPLYING DEVICE INCLUDING SEALING MEMBER, AN...

Plasma Etching Method and Apparatus

SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS

CRYOGENIC ELECTROSTATIC CHUCK SYSTEM AND METHOD FOR CONTROLLING SAME

SUBSTRATE-PROCESSING APPARATUS

WAFER SUPPORT DEVICE

ATOMIC LAYER DEPOSITION PART COATING CHAMBER

SUBSTRATE SUPPORT

IMMERSED PLASMA SOURCE AND PROCESS CHAMBER FOR LARGE AREA SUBSTRATES

RESISTIVITY-CONTROLLED DIELECTRIC MATERIALS FOR SUBSTRATE SUPPORTS...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...

THERMAL PROCESSING APPARATUS, THERMAL PROCESSING METHOD, AND SUBSTR...

APPARATUS FOR CLAMPING A SUBSTRATE ON A MONO-POLAR ELECTROSTATIC CH...

HIGH POWER ELECTROSTATIC CHUCK WITH FEATURES PREVENTING HE HOLE LIG...

SUSCEPTOR MANUFACTURING METHOD AND THE MANUFACTURED SUSCEPTOR USING...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

PLASMA PROCESSING APPARATUS

Workpiece Processing Apparatus and Methods for the Treatment of Wor...

WAFER PLACEMENT TABLE

APPARATUS FOR PLASMA PROCESSING AND METHOD OF ETCHING

COOLING SYSTEM FOR PROCESSING CHAMBER