Temperature

Industry

CPC
H01J37/32522

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32522Temperature

Industries

Patents Grantslast 30 patents

Information Patent Grant
Rapid tuning of critical dimension non-uniformity by modulating tem...
- Patent number 12,308,264
- Issue date May 20, 2025
- Lam Research Corporation
- Ravi Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertically adjustable plasma source
- Patent number 12,288,677
- Issue date Apr 29, 2025
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for filtering radio frequencies from a signal o...
- Patent number 12,283,451
- Issue date Apr 22, 2025
- Lam Research Corporation
- Vince Burkhart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reaction device
- Patent number 12,283,464
- Issue date Apr 22, 2025
- New Power Plasma Co., Ltd.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 12,278,094
- Issue date Apr 15, 2025
- Applied Materials, Inc.
- Fernando Silveira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shield cooling assembly, reaction chamber and semiconductor process...
- Patent number 12,278,096
- Issue date Apr 15, 2025
- BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Qing Chang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plenum assemblies for cooling transformer coupled plasma windows
- Patent number 12,261,018
- Issue date Mar 25, 2025
- Lam Research Corporation
- Hanry Issavi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and etching apparatus
- Patent number 12,249,515
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Shigeru Tahara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generating device and process executing apparatus including...
- Patent number 12,243,721
- Issue date Mar 4, 2025
- NP HOLDINGS CO., LTD.
- Dai Kyu Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature manifold assembly for substrate processing systems
- Patent number 12,224,161
- Issue date Feb 11, 2025
- Lam Research Corporation
- Gabriel De Jesus Soto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,224,158
- Issue date Feb 11, 2025
- HITACHI HIGH-TECH CORPORATION
- Yoshinori Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
To an inductively coupled plasma source
- Patent number 12,217,938
- Issue date Feb 4, 2025
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sorption chamber walls for semiconductor equipment
- Patent number 12,217,945
- Issue date Feb 4, 2025
- Lam Research Corporation
- Hossein Sadeghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for increasing the surface roughness of a metal layer
- Patent number 12,215,430
- Issue date Feb 4, 2025
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Nicolas Posseme
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System for electrically decoupled, homogeneous temperature control...
- Patent number 12,198,907
- Issue date Jan 14, 2025
- Meyer Burger (Germany) GmbH
- Christian Böhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing graphene
- Patent number 12,194,566
- Issue date Jan 14, 2025
- ASUSTeK COMPUTER Inc.
- Yun-Wei Tsai
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of manufacturing semiconductor device and film forming appar...
- Patent number 12,191,193
- Issue date Jan 7, 2025
- Tokyo Electron Limited
- Tatsuya Yamaguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber and methods of treating a substrate after exposure to radia...
- Patent number 12,181,801
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Remote source pulsing with advanced pulse control
- Patent number 12,183,583
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ semiconductor processing chamber temperature apparatus
- Patent number 12,183,605
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Andrew Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for temperature control in a substrate processing chamber
- Patent number 12,183,559
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Vishwas Kumar Pandey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for processing substrate using plasma
- Patent number 12,176,185
- Issue date Dec 24, 2024
- Semes Co., Ltd.
- Min Sung Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and interlock method thereof
- Patent number 12,170,188
- Issue date Dec 17, 2024
- Jusung Engineering Co., Ltd.
- Sang Kyo Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for plasma generation
- Patent number 12,159,765
- Issue date Dec 3, 2024
- MKS Instruments, Inc.
- Ron Collins
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooled shield for ICP source
- Patent number 12,159,770
- Issue date Dec 3, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,154,765
- Issue date Nov 26, 2024
- HITACHI HIGH-TECH CORPORATION
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source having different modes of operation
- Patent number 12,154,766
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Graham Wright
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 12,148,598
- Issue date Nov 19, 2024
- Tokyo Electron Limited
- Lifu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-assembled monolayer deposition from low vapor pressure organic...
- Patent number 12,142,467
- Issue date Nov 12, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
RF pulsing assisted low-k film deposition with high mechanical stre...
- Patent number 12,125,675
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Ruitong Xiong
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF CONTROLLING PHY...
- Publication number 20250149317
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yunha Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250149389
- Publication date May 8, 2025
- SEMES CO., LTD.
- Il Young KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...
- Publication number 20250149299
- Publication date May 8, 2025
- TOKYO ELECTRON LIMITED
- Takayuki KATSUNUMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY ASSEMBLY AND SEMICONDUCTOR WAFER PROCESSING APPARATUS US...
- Publication number 20250132134
- Publication date Apr 24, 2025
- Samsung Electronics Co., Ltd.
- Taeil Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING EUV RESIST UNDERLAYER
- Publication number 20250130500
- Publication date Apr 24, 2025
- Applied Materials, Inc.
- Sudha RATHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20250125132
- Publication date Apr 17, 2025
- TOKYO ELECTRON LIMITED
- Naoki KUBOTA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS TO IMPROVE OXIDE SIDEWALL QUALITY
- Publication number 20250125145
- Publication date Apr 17, 2025
- Applied Materials, Inc.
- Tianyang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND HEATING APPARATUS
- Publication number 20250118537
- Publication date Apr 10, 2025
- Hitachi High-Tech Corporation
- Hitoshi Tamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF
- Publication number 20250112028
- Publication date Apr 3, 2025
- JUSUNG ENGINEERING CO., LTD.
- Sang Kyo KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPRESSING HEATING OF A PLASMA PROCESSING CHAMBER LID
- Publication number 20250112029
- Publication date Apr 3, 2025
- Applied Materials, Inc.
- Alvaro Garcia de Gorordo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20250095969
- Publication date Mar 20, 2025
- Kokusai Electric Corporation
- Takeshi Yasui
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20250095991
- Publication date Mar 20, 2025
- TOKYO ELECTRON LIMITED
- Koki MUKAIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING CHAMBER LID COOLING
- Publication number 20250095970
- Publication date Mar 20, 2025
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20250079139
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Takeshi Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
- Publication number 20250079178
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Peter Lowell George Ventzek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS
- Publication number 20250069921
- Publication date Feb 27, 2025
- Applied Materials, Inc.
- Andrew NGUYEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Cooled Shield for ICP Source
- Publication number 20250062103
- Publication date Feb 20, 2025
- Mattson Technology, Inc.
- Maolin Long
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
- Publication number 20250054748
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Guangyan Zhong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELF-ASSEMBLED MONOLAYER DEPOSITION FROM LOW VAPOR PRESSURE ORGANIC...
- Publication number 20250054739
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20250046580
- Publication date Feb 6, 2025
- HITACHI HIGH-TECH CORPORATION
- Nanako Tamari
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED EPITAXY AND PRECLEAN SYSTEM
- Publication number 20250046596
- Publication date Feb 6, 2025
- Applied Materials, Inc.
- Lara HAWRYLCHAK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION
- Publication number 20250037974
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Actively Controlled gas inject FOR PROCESS Temperature CONTROL
- Publication number 20250037975
- Publication date Jan 30, 2025
- Applied Materials, Inc.
- Zhepeng CONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HEATED METAL LID FOR SELECTIVE PECVD
- Publication number 20250029816
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Douglas Long
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS
- Publication number 20250022704
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Qiang Ma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANIFOLD FOR SUPPLYING COOLANT TO COMPONENTS OF SUBSTRATE PROCESSIN...
- Publication number 20250006469
- Publication date Jan 2, 2025
- LAM RESEARCH CORPORATION
- Miguel Benjamin VASQUEZ
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ATOMIC LAYER DEPOSITION PART COATING CHAMBER
- Publication number 20240420926
- Publication date Dec 19, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBERS HAVING MULTIPLE COOLING PLATES
- Publication number 20240412954
- Publication date Dec 12, 2024
- Dinkesh HUDERI SOMANNA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TEMPERATURE ADJUSTING SYSTEM, TEMPERATURE ADJUSTING METHOD, SUBSTRA...
- Publication number 20240412955
- Publication date Dec 12, 2024
- TOKYO ELECTRON LIMITED
- Masahiko YOKOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus and Methods for the Treatment of Wor...
- Publication number 20240404797
- Publication date Dec 5, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS

Temperature

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Rapid tuning of critical dimension non-uniformity by modulating tem...

Vertically adjustable plasma source

Systems and methods for filtering radio frequencies from a signal o...

Plasma reaction device

Methods and apparatus for processing a substrate

Shield cooling assembly, reaction chamber and semiconductor process...

Plenum assemblies for cooling transformer coupled plasma windows

Etching method and etching apparatus

Plasma generating device and process executing apparatus including...

Low temperature manifold assembly for substrate processing systems

Plasma processing apparatus

To an inductively coupled plasma source

Sorption chamber walls for semiconductor equipment

Method for increasing the surface roughness of a metal layer

System for electrically decoupled, homogeneous temperature control...

Method for producing graphene

Method of manufacturing semiconductor device and film forming appar...

Chamber and methods of treating a substrate after exposure to radia...

Remote source pulsing with advanced pulse control

In-situ semiconductor processing chamber temperature apparatus

Apparatus for temperature control in a substrate processing chamber

Apparatus and method for processing substrate using plasma

Substrate processing apparatus and interlock method thereof

Method and apparatus for plasma generation

Cooled shield for ICP source

Plasma processing apparatus and plasma processing method

Ion source having different modes of operation

Plasma processing apparatus

Self-assembled monolayer deposition from low vapor pressure organic...

RF pulsing assisted low-k film deposition with high mechanical stre...

Patents Applicationslast 30 patents

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF CONTROLLING PHY...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND...

GAS SUPPLY ASSEMBLY AND SEMICONDUCTOR WAFER PROCESSING APPARATUS US...

METHODS FOR FORMING EUV RESIST UNDERLAYER

Substrate Processing Apparatus

METHODS TO IMPROVE OXIDE SIDEWALL QUALITY

PLASMA PROCESSING APPARATUS AND HEATING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND INTERLOCK METHOD THEREOF

SUPPRESSING HEATING OF A PLASMA PROCESSING CHAMBER LID

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

ETCHING METHOD AND PLASMA PROCESSING APPARATUS

PLASMA PROCESSING CHAMBER LID COOLING

IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS

REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL

IN-SITU SEMICONDUCTOR PROCESSING CHAMBER TEMPERATURE APPARATUS

Cooled Shield for ICP Source

ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS

SELF-ASSEMBLED MONOLAYER DEPOSITION FROM LOW VAPOR PRESSURE ORGANIC...

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

INTEGRATED EPITAXY AND PRECLEAN SYSTEM

CHAMBER FOR SUBSTRATE BACKSIDE AND BEVEL DEPOSITION

Actively Controlled gas inject FOR PROCESS Temperature CONTROL

HEATED METAL LID FOR SELECTIVE PECVD

DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS

MANIFOLD FOR SUPPLYING COOLANT TO COMPONENTS OF SUBSTRATE PROCESSIN...

ATOMIC LAYER DEPOSITION PART COATING CHAMBER

PROCESS CHAMBERS HAVING MULTIPLE COOLING PLATES

TEMPERATURE ADJUSTING SYSTEM, TEMPERATURE ADJUSTING METHOD, SUBSTRA...

Workpiece Processing Apparatus and Methods for the Treatment of Wor...