Testing optical components

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CPC
G03F7/70591

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70591Testing optical components

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Radiation source testing
- Patent number 12,169,363
- Issue date Dec 17, 2024
- Cymer, LLC
- Russell Allen Burdt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Protective coating for nonlinear optical crystal
- Patent number 12,072,606
- Issue date Aug 27, 2024
- KLA Corporation
- John Fielden
- G01 - MEASURING TESTING
Information Patent Grant
Dual vacuum seal
- Patent number 12,044,313
- Issue date Jul 23, 2024
- KLA Corporation
- Francis Chilese
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Particle beam apparatus, defect repair method, lithographic exposur...
- Patent number 11,996,267
- Issue date May 28, 2024
- ASML Netherlands B.V.
- Ruben Cornelis Maas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle defect inspection method and system
- Patent number 11,988,575
- Issue date May 21, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Lihua Hou
- G01 - MEASURING TESTING
Information Patent Grant
Device and method for characterizing the surface shape of a test ob...
- Patent number 11,879,720
- Issue date Jan 23, 2024
- Carl Zeiss SMT GmbH
- Jochen Hetzler
- G01 - MEASURING TESTING
Information Patent Grant
Method and lithograph apparatus for measuring a radiation beam
- Patent number 11,796,921
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Arend Johannes Donkerbroek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Active reticle carrier for in situ stage correction
- Patent number 11,774,866
- Issue date Oct 3, 2023
- KLA Corporation
- Avner Safrani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system, lithographic apparatus, and calibration method
- Patent number 11,740,561
- Issue date Aug 29, 2023
- ASML Netherlands B.V.
- Nikhil Mehta
- G01 - MEASURING TESTING
Information Patent Grant
Reticle backside inspection method
- Patent number 11,657,492
- Issue date May 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zi-Wen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Control apparatus, exposure apparatus, and method of manufacturing...
- Patent number 11,630,398
- Issue date Apr 18, 2023
- Canon Kabushiki Kaisha
- Takashi Kurihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting flare degree of lens of exposure machine
- Patent number 11,604,417
- Issue date Mar 14, 2023
- Shanghai Huali Microelectronics Corporation
- Haisheng Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection system for extreme ultraviolet (EUV) light source
- Patent number 11,567,415
- Issue date Jan 31, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Chiao-Hua Cheng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pupil stop for an illumination optical unit of a metrology system
- Patent number 11,531,272
- Issue date Dec 20, 2022
- Carl Zeiss SMT GmbH
- Matthias Roesch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal controlling method in lithography system
- Patent number 11,506,986
- Issue date Nov 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi Yang
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Metrology sensor, illumination system and method of generating meas...
- Patent number 11,474,435
- Issue date Oct 18, 2022
- ASML Netherlands B.V.
- Sebastianus Adrianus Goorden
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist spectral sensitivity matching radiometer for trace/spac...
- Patent number 11,441,942
- Issue date Sep 13, 2022
- Hutchinson Technology Incorporated
- Matthew S. Lang
- G02 - OPTICS
Information Patent Grant
Movable body apparatus, moving method, exposure apparatus, exposure...
- Patent number 11,402,762
- Issue date Aug 2, 2022
- Nikon Corporation
- Yasuo Aoki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for characterizing the surface shape of an optica...
- Patent number 11,326,872
- Issue date May 10, 2022
- Carl Zeiss SMT GmbH
- Steffen Siegler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,281,093
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for monitoring reflectivity of the collector f...
- Patent number 11,204,556
- Issue date Dec 21, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Chih Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test of operational status of a digital scanner during lithographic...
- Patent number 11,099,007
- Issue date Aug 24, 2021
- Nikon Corporation
- Eric Peter Goodwin
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,061,322
- Issue date Jul 13, 2021
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle backside inspection method
- Patent number 10,997,706
- Issue date May 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zi-Wen Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Stochastic reticle defect dispositioning
- Patent number 10,990,019
- Issue date Apr 27, 2021
- KLA Corporation
- Moshe E. Preil
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of aligning a diffractive optical system and diffracting be...
- Patent number 10,983,361
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Sander Bas Roobol
- G02 - OPTICS
Information Patent Grant
Control apparatus, exposure apparatus, and method of manufacturing...
- Patent number 10,969,698
- Issue date Apr 6, 2021
- Canon Kabushiki Kaisha
- Takashi Kurihara
- G05 - CONTROLLING REGULATING
Information Patent Grant
Exposure system, exposure device and exposure method
- Patent number 10,942,458
- Issue date Mar 9, 2021
- SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
- Ke Lan
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Metrology method and apparatus with increased bandwidth
- Patent number 10,901,323
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Movable body apparatus, moving method, exposure apparatus, exposure...
- Patent number 10,852,647
- Issue date Dec 1, 2020
- Nikon Corporation
- Yasuo Aoki
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
LITHOGRAPHY SYSTEM AND METHODS
- Publication number 20240402623
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chen-Pin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, TEST DEVICE, LITHOGRAPHY APPARATUS, ARRANGEMENT AND...
- Publication number 20240302754
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G01 - MEASURING TESTING
Information Patent Application
MONITORING SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE AND MONITO...
- Publication number 20240272559
- Publication date Aug 15, 2024
- Samsung Electronics Co., LTD
- Dong-Hyub LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT APPARATUS, METHOD FOR OPERATING A MASK-METROLOGY MEASUR...
- Publication number 20240255857
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Jan Reisloehner
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IMAGING OPTICAL UNIT
- Publication number 20240103382
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Hans-Jürgen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, MEASURING DEVICE, MEASURING METHOD, AND DEVICE...
- Publication number 20240027917
- Publication date Jan 25, 2024
- Nikon Corporation
- Yoji WATANABE
- G01 - MEASURING TESTING
Information Patent Application
DETECTION METHOD OF EUV PELLICLE STATUS
- Publication number 20230393489
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Hao LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PREDICTIVE CALIBRATION SCHEDULING APPARATUS AND METHOD
- Publication number 20230266168
- Publication date Aug 24, 2023
- CYMER, LLC
- Mohammad Taghi Mohebbi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION SYSTEM FOR EXTREME ULTRAVIOLET (EUV) LIGHT SOURCE
- Publication number 20230142835
- Publication date May 11, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chiao-Hua Cheng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INSPECTION METHOD AND INSPECTION PLATFORM FOR LITHOGRAPHY
- Publication number 20230131662
- Publication date Apr 27, 2023
- Industrial Technology Research Institute
- Cheng-Hsien CHEN
- G01 - MEASURING TESTING
Information Patent Application
EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD
- Publication number 20230108698
- Publication date Apr 6, 2023
- Samsung Electronics Co., Ltd.
- Jongbin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTIVE COATING FOR NONLINEAR OPTICAL CRYSTAL
- Publication number 20230034635
- Publication date Feb 2, 2023
- John Fielden
- G02 - OPTICS
Information Patent Application
PREDICTIVE APPARATUS IN A GAS DISCHARGE LIGHT SOURCE
- Publication number 20230020555
- Publication date Jan 19, 2023
- CYMER, LLC
- Matthew Minakais
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY FOR IMPROVING DUV LASER ALIGNMENT
- Publication number 20230009554
- Publication date Jan 12, 2023
- CYMER, LLC
- Zhong Quan Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION SOURCE TESTING
- Publication number 20220404717
- Publication date Dec 22, 2022
- CYMER, LLC
- Russell Allen Burdt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PUPIL STOP FOR AN ILLUMINATION OPTICAL UNIT OF A METROLOGY SYSTEM
- Publication number 20220342317
- Publication date Oct 27, 2022
- Carl Zeiss SMT GMBH
- Matthias Roesch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION SYSTEM FOR EXTREME ULTRAVIOLET (EUV) LIGHT SOURCE
- Publication number 20220326624
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chiao-Hua Cheng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD TO DETECT A DEFECT ON A LITHOGRAPHIC SAMPLE AND METROLOGY SY...
- Publication number 20220283513
- Publication date Sep 8, 2022
- Carl Zeiss SMT GMBH
- Toufic Jabbour
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Dual Vacuum Seal
- Publication number 20220260156
- Publication date Aug 18, 2022
- KLA Corporation
- Francis Chilese
- B08 - CLEANING
Information Patent Application
METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND CALIBRATION METHOD
- Publication number 20220197151
- Publication date Jun 23, 2022
- ASML NETHERLANDS B.V.
- Nikhil MEHTA
- G01 - MEASURING TESTING
Information Patent Application
PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER
- Publication number 20220158401
- Publication date May 19, 2022
- CYMER, LLC
- Eric Anders Mason
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and Method for Detecting Flare Degree of Lens of Exposure...
- Publication number 20220121108
- Publication date Apr 21, 2022
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Haisheng Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND LITHOGRAPH APPARATUS FOR MEASURING A RADIATION BEAM
- Publication number 20220100102
- Publication date Mar 31, 2022
- ASML NETHERLANDS B.V.
- Arend Johannes DONKERBROEK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE RETICLE CARRIER FOR IN SITU STAGE CORRECTION
- Publication number 20220066333
- Publication date Mar 3, 2022
- KLA Corporation
- Avner Safrani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SENSOR, ILLUMINATION SYSTEM AND METHOD OF GENERATING MEAS...
- Publication number 20220057718
- Publication date Feb 24, 2022
- ASML NETHERLANDS B.V.
- Sebastianus Adrianus GOORDEN
- G02 - OPTICS
Information Patent Application
RETICLE DEFECT INSPECTION METHOD AND SYSTEM
- Publication number 20220026307
- Publication date Jan 27, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Lihua Hou
- G01 - MEASURING TESTING
Information Patent Application
DEVICE AND METHOD FOR CHARACTERIZING THE SURFACE SHAPE OF A TEST OB...
- Publication number 20210372781
- Publication date Dec 2, 2021
- Carl Zeiss SMT GMBH
- Jochen HETZLER
- G01 - MEASURING TESTING
Information Patent Application
PARTICLE BEAM APPARATUS, DEFECT REPAIR METHOD, LITHOGRAPHIC EXPOSUR...
- Publication number 20210327678
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Ruben Cornelis MAAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CONTROLLING METHOD IN LITHOGRAPHY SYSTEM
- Publication number 20210318625
- Publication date Oct 14, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH...
- Publication number 20210302828
- Publication date Sep 30, 2021
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Testing optical components

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Radiation source testing

Protective coating for nonlinear optical crystal

Dual vacuum seal

Particle beam apparatus, defect repair method, lithographic exposur...

Reticle defect inspection method and system

Device and method for characterizing the surface shape of a test ob...

Method and lithograph apparatus for measuring a radiation beam

Active reticle carrier for in situ stage correction

Metrology system, lithographic apparatus, and calibration method

Reticle backside inspection method

Control apparatus, exposure apparatus, and method of manufacturing...

Method for detecting flare degree of lens of exposure machine

Inspection system for extreme ultraviolet (EUV) light source

Pupil stop for an illumination optical unit of a metrology system

Thermal controlling method in lithography system

Metrology sensor, illumination system and method of generating meas...

Photoresist spectral sensitivity matching radiometer for trace/spac...

Movable body apparatus, moving method, exposure apparatus, exposure...

Method and device for characterizing the surface shape of an optica...

Systems and methods using mask pattern measurements performed with...

Apparatus and method for monitoring reflectivity of the collector f...

Test of operational status of a digital scanner during lithographic...

Systems and methods using mask pattern measurements performed with...

Reticle backside inspection method

Stochastic reticle defect dispositioning

Methods of aligning a diffractive optical system and diffracting be...

Control apparatus, exposure apparatus, and method of manufacturing...

Exposure system, exposure device and exposure method

Metrology method and apparatus with increased bandwidth

Movable body apparatus, moving method, exposure apparatus, exposure...

Patents Applicationslast 30 patents

LITHOGRAPHY SYSTEM AND METHODS

OPTICAL SYSTEM, TEST DEVICE, LITHOGRAPHY APPARATUS, ARRANGEMENT AND...

MONITORING SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE AND MONITO...

MEASUREMENT APPARATUS, METHOD FOR OPERATING A MASK-METROLOGY MEASUR...

IMAGING OPTICAL UNIT

EXPOSURE APPARATUS, MEASURING DEVICE, MEASURING METHOD, AND DEVICE...

DETECTION METHOD OF EUV PELLICLE STATUS

PREDICTIVE CALIBRATION SCHEDULING APPARATUS AND METHOD

INSPECTION SYSTEM FOR EXTREME ULTRAVIOLET (EUV) LIGHT SOURCE

INSPECTION METHOD AND INSPECTION PLATFORM FOR LITHOGRAPHY

EUV COLLECTOR INSPECTION APPARATUS AND INSPECTION METHOD

PROTECTIVE COATING FOR NONLINEAR OPTICAL CRYSTAL

PREDICTIVE APPARATUS IN A GAS DISCHARGE LIGHT SOURCE

METROLOGY FOR IMPROVING DUV LASER ALIGNMENT

RADIATION SOURCE TESTING

PUPIL STOP FOR AN ILLUMINATION OPTICAL UNIT OF A METROLOGY SYSTEM

INSPECTION SYSTEM FOR EXTREME ULTRAVIOLET (EUV) LIGHT SOURCE

METHOD TO DETECT A DEFECT ON A LITHOGRAPHIC SAMPLE AND METROLOGY SY...

Dual Vacuum Seal

METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND CALIBRATION METHOD

PRESSURE-CONTROLLED SPECTRAL FEATURE ADJUSTER

Photomask and Method for Detecting Flare Degree of Lens of Exposure...

METHOD AND LITHOGRAPH APPARATUS FOR MEASURING A RADIATION BEAM

ACTIVE RETICLE CARRIER FOR IN SITU STAGE CORRECTION

METROLOGY SENSOR, ILLUMINATION SYSTEM AND METHOD OF GENERATING MEAS...

RETICLE DEFECT INSPECTION METHOD AND SYSTEM

DEVICE AND METHOD FOR CHARACTERIZING THE SURFACE SHAPE OF A TEST OB...

PARTICLE BEAM APPARATUS, DEFECT REPAIR METHOD, LITHOGRAPHIC EXPOSUR...

THERMAL CONTROLLING METHOD IN LITHOGRAPHY SYSTEM

SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH...