the compound being a silazane

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H01L21/02222

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

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H01L21/02222the compound being a silazane

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Mechanism for finFET well doping
- Patent number 12,112,975
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 12,087,598
- Issue date Sep 10, 2024
- Kokusai Electric Corporation
- Hideto Tateno
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Functionalized cyclosilazanes as precursors for high growth rate si...
- Patent number 12,057,310
- Issue date Aug 6, 2024
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compositions and methods using same for deposition of silicon-conta...
- Patent number 12,049,695
- Issue date Jul 30, 2024
- VERSUM MATERIALS US, LLC
- Raymond Nicholas Vrtis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming material within openings extending into a semico...
- Patent number 12,020,979
- Issue date Jun 25, 2024
- Micron Technology, Inc.
- Gurtej S. Sandhu
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Conformal deposition of silicon carbide films
- Patent number 11,894,227
- Issue date Feb 6, 2024
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing method and non...
- Patent number 11,869,764
- Issue date Jan 9, 2024
- Kokusai Electric Corporation
- Akinori Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming insulating film, apparatus for processing substr...
- Patent number 11,823,897
- Issue date Nov 21, 2023
- Tokyo Electron Limited
- Makoto Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 11,820,654
- Issue date Nov 21, 2023
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Jean-Marc Girard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mechanism for FinFET well doping
- Patent number 11,742,237
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Films of desired composition and film properties
- Patent number 11,732,350
- Issue date Aug 22, 2023
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing a conformal metal or metalloid silicon nitri...
- Patent number 11,732,351
- Issue date Aug 22, 2023
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Films of desired composition and film properties
- Patent number 11,708,634
- Issue date Jul 25, 2023
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
N-alkyl substituted cyclic and oligomeric perhydridosilazanes, meth...
- Patent number 11,702,434
- Issue date Jul 18, 2023
- Gelest, Inc.
- Barry C. Arkles
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 11,699,584
- Issue date Jul 11, 2023
- L'Air Liquide, Société Anonyme pour l'Edute ed l'Exploitation des Procédés Ge...
- Jean-Marc Girard
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Films of desired composition and film properties
- Patent number 11,680,314
- Issue date Jun 20, 2023
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Films of desired composition and film properties
- Patent number 11,680,315
- Issue date Jun 20, 2023
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,476,112
- Issue date Oct 18, 2022
- Kokusai Electric Corporation
- Akinori Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicous film forming composition comprising block copolymer and me...
- Patent number 11,401,384
- Issue date Aug 2, 2022
- Merck Patent GmbH
- Takashi Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming insulating film, apparatus for processing substr...
- Patent number 11,315,784
- Issue date Apr 26, 2022
- Tokyo Electron Limited
- Makoto Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Isolation in integrated circuit devices
- Patent number 11,270,995
- Issue date Mar 8, 2022
- Intel Corporation
- Sang-Won Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal deposition of silicon carbide films
- Patent number 11,264,234
- Issue date Mar 1, 2022
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
N—H free and Si-rich per-hydridopolysilzane compositions, their syn...
- Patent number 11,203,528
- Issue date Dec 21, 2021
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Antonio Sanchez
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Functionalized cyclosilazanes as precursors for high growth rate si...
- Patent number 11,177,127
- Issue date Nov 16, 2021
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and recording medium
- Patent number 11,168,396
- Issue date Nov 9, 2021
- Kokusai Electric Corporation
- Toru Kakuda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Si-containing film forming precursors and methods of using the same
- Patent number 11,124,876
- Issue date Sep 21, 2021
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Jean-Marc Girard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing a conformal metal or metalloid silicon nitri...
- Patent number 11,104,990
- Issue date Aug 31, 2021
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,094,532
- Issue date Aug 17, 2021
- Kokusai Electric Corporation
- Atsushi Sano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mechanism for FinFET well doping
- Patent number 11,075,108
- Issue date Jul 27, 2021
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and metal member
- Patent number 11,035,037
- Issue date Jun 15, 2021
- Kokusai Electric Corporation
- Tetsuaki Inada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...
- Publication number 20240395541
- Publication date Nov 28, 2024
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods of Forming Material Within Openings Extending into a Semico...
- Publication number 20240297068
- Publication date Sep 5, 2024
- Micron Technology, Inc.
- Gurtej S. Sandhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF SILICON DIELECTRIC FILM
- Publication number 20240170283
- Publication date May 23, 2024
- VERSUM MATERIALS US, LLC
- HARIPIN CHANDRA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS
- Publication number 20240145234
- Publication date May 2, 2024
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL
- Publication number 20240120193
- Publication date Apr 11, 2024
- Applied Materials, Inc.
- Shankar Venkataraman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF INSULATION FILM
- Publication number 20240112906
- Publication date Apr 4, 2024
- ABIT TECHNOLOGIES CO., LTD
- Kiyokazu NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF SELF-ASSEMBLED MONOLAYER FOR SELECTIVE ETCHING PROCESS
- Publication number 20240105462
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Hsiu CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITO...
- Publication number 20240096615
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Akinori TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SILICON NITROGENEOUS FILM
- Publication number 20230420244
- Publication date Dec 28, 2023
- Merck Patent GmbH
- Atsuhiko SATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRE-TREATMENT APPARATUS
- Publication number 20230386828
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Hsiang WANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mechanism for FinFET Well Doping
- Publication number 20230343634
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER D...
- Publication number 20230335392
- Publication date Oct 19, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20230298885
- Publication date Sep 21, 2023
- ASM IP HOLDING, B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METH...
- Publication number 20230279031
- Publication date Sep 7, 2023
- Gelest, Inc.
- Barry C. ARKLES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS USING HETEROGENEOUS P...
- Publication number 20230203646
- Publication date Jun 29, 2023
- LAM RESEARCH CORPORATION
- Matthew Scott WEIMER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON...
- Publication number 20230077197
- Publication date Mar 9, 2023
- Kokusai Electric Corporation
- Akinori TANAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REACTOR TO FORM FILMS ON SIDEWALLS OF MEMORY CELLS
- Publication number 20220263023
- Publication date Aug 18, 2022
- Micron Technology, Inc.
- Santanu Sarkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES
- Publication number 20220220609
- Publication date Jul 14, 2022
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES
- Publication number 20220220608
- Publication date Jul 14, 2022
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES
- Publication number 20220220611
- Publication date Jul 14, 2022
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES
- Publication number 20220220610
- Publication date Jul 14, 2022
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING INSULATING FILM, APPARATUS FOR PROCESSING SUBSTR...
- Publication number 20220208547
- Publication date Jun 30, 2022
- TOKYO ELECTRON LIMITED
- Makoto Muramatsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS
- Publication number 20220148875
- Publication date May 12, 2022
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ISOLATION IN INTEGRATED CIRCUIT DEVICES
- Publication number 20220139913
- Publication date May 5, 2022
- Intel Corporation
- Sang-Won Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20220122841
- Publication date Apr 21, 2022
- ASM IP HOLDING B.V.
- Timothee Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES
- Publication number 20220098727
- Publication date Mar 31, 2022
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRECURSORS AND PROCESSES FOR DEPOSITION OF SI-CONTAINING FILMS USIN...
- Publication number 20220076947
- Publication date Mar 10, 2022
- L'Air Liquide, Societe Anonyme pour I'Etude et I'Exploitation des procedes Ge...
- Noato NODA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...
- Publication number 20220044929
- Publication date Feb 10, 2022
- VERSUM PATENTS US, LLC
- MANCHAO XIAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICOUS FILM FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND ME...
- Publication number 20220041814
- Publication date Feb 10, 2022
- Merck Patent GmbH
- Takashi FUJIWARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SI-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
- Publication number 20210395890
- Publication date Dec 23, 2021
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Jean-Marc GIRARD
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the compound being a silazane

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Mechanism for finFET well doping

Substrate processing apparatus

Functionalized cyclosilazanes as precursors for high growth rate si...

Compositions and methods using same for deposition of silicon-conta...

Methods of forming material within openings extending into a semico...

Conformal deposition of silicon carbide films

Substrate processing apparatus, substrate processing method and non...

Method for forming insulating film, apparatus for processing substr...

Si-containing film forming precursors and methods of using the same

Mechanism for FinFET well doping

Films of desired composition and film properties

Methods for depositing a conformal metal or metalloid silicon nitri...

Films of desired composition and film properties

N-alkyl substituted cyclic and oligomeric perhydridosilazanes, meth...

Si-containing film forming precursors and methods of using the same

Films of desired composition and film properties

Films of desired composition and film properties

Substrate processing apparatus

Silicous film forming composition comprising block copolymer and me...

Method for forming insulating film, apparatus for processing substr...

Isolation in integrated circuit devices

Conformal deposition of silicon carbide films

N—H free and Si-rich per-hydridopolysilzane compositions, their syn...

Functionalized cyclosilazanes as precursors for high growth rate si...

Method of manufacturing semiconductor device and recording medium

Si-containing film forming precursors and methods of using the same

Methods for depositing a conformal metal or metalloid silicon nitri...

Method of manufacturing semiconductor device, substrate processing...

Mechanism for FinFET well doping

Substrate processing apparatus and metal member

Patents Applicationslast 30 patents

FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...

Methods of Forming Material Within Openings Extending into a Semico...

SELECTIVE DEPOSITION OF SILICON DIELECTRIC FILM

CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS

CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL

MANUFACTURING METHOD OF INSULATION FILM

FORMATION OF SELF-ASSEMBLED MONOLAYER FOR SELECTIVE ETCHING PROCESS

SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITO...

METHOD OF MANUFACTURING SILICON NITROGENEOUS FILM

PRE-TREATMENT APPARATUS

Mechanism for FinFET Well Doping

DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER D...

METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...

N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METH...

CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS USING HETEROGENEOUS P...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON...

REACTOR TO FORM FILMS ON SIDEWALLS OF MEMORY CELLS

FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES

FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES

FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES

FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES

METHOD FOR FORMING INSULATING FILM, APPARATUS FOR PROCESSING SUBSTR...

CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS

ISOLATION IN INTEGRATED CIRCUIT DEVICES

METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...

FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES

PRECURSORS AND PROCESSES FOR DEPOSITION OF SI-CONTAINING FILMS USIN...

FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...

SILICOUS FILM FORMING COMPOSITION COMPRISING BLOCK COPOLYMER AND ME...

SI-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME