the layer being characterised by the precursor material for deposition

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02205the layer being characterised by the precursor material for deposition

Industries

Patents Grantslast 30 patents

Information Patent Grant
Pre-deposition treatment for FET technology and devices formed thereby
- Patent number 12,142,531
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Yen Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
PEALD nitride films
- Patent number 12,119,221
- Issue date Oct 15, 2024
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for filling a gap feature on a substrate surface and relate...
- Patent number 12,119,220
- Issue date Oct 15, 2024
- ASM IP Holding B.V.
- Leo Salmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method and an apparatus for depositing a silicon-contain...
- Patent number 12,107,005
- Issue date Oct 1, 2024
- ASM IP Holding B.V.
- Zecheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective blocking of metal surfaces using bifunctional self-assemb...
- Patent number 12,094,766
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Michael L. McSwiney
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for sealing a seam, semiconductor structure, and method for...
- Patent number 12,094,768
- Issue date Sep 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a metal silicate film on a substrate in a react...
- Patent number 12,094,936
- Issue date Sep 17, 2024
- ASM IP Holding B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tin oxide films in semiconductor device manufacturing
- Patent number 12,094,711
- Issue date Sep 17, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect system with improved low-K dielectrics
- Patent number 12,080,547
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Joung-Wei Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming a nitrogen-containing carbon film and system for...
- Patent number 12,068,154
- Issue date Aug 20, 2024
- ASM IP Holding B.V.
- Hirotsugu Sugiura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate spacer structure and method of forming same
- Patent number 12,062,709
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Ting Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 12,062,719
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,051,586
- Issue date Jul 30, 2024
- Samsung Electronics Co., Ltd.
- Seung-Min Ryu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an electrode on a substrate and a semiconductor d...
- Patent number 12,020,938
- Issue date Jun 25, 2024
- ASM IP Holding B.V.
- Moataz Bellah Mousa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-doped carbon hardmasks
- Patent number 12,014,925
- Issue date Jun 18, 2024
- Applied Materials, Inc.
- Eswaranand Venkatasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Area selective carbon-based film deposition
- Patent number 11,972,940
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sequential infiltration synthesis apparatus
- Patent number 11,970,766
- Issue date Apr 30, 2024
- ASM IP Holding B.V.
- Ivo Johannes Raaijmakers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursor solution for thin film deposition and thin film forming m...
- Patent number 11,972,941
- Issue date Apr 30, 2024
- SK TRICHEM
- Chang Sung Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Self-assembled monolayer for selective deposition
- Patent number 11,967,523
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Xiangjin Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for depositing low-k dielectric films
- Patent number 11,967,498
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Bo Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure having high breakdown voltage etch-stop layer
- Patent number 11,961,803
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Joung-Wei Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of metal films with tungsten liner
- Patent number 11,948,836
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Yu Lei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 11,942,546
- Issue date Mar 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing silicon-free carbon-containing film as gap-fi...
- Patent number 11,923,190
- Issue date Mar 5, 2024
- ASM IP Holding B.V.
- Timothee Julien Vincent Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing an oxide film on a substrate by a cyclical d...
- Patent number 11,923,192
- Issue date Mar 5, 2024
- ASM IP Holding B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Quantum dots and production method thereof
- Patent number 11,901,178
- Issue date Feb 13, 2024
- Samsung Electronics Co., Ltd.
- Tae Gon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Molybdenum thin films by oxidation-reduction
- Patent number 11,891,690
- Issue date Feb 6, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and precursors for selective deposition of metal films
- Patent number 11,887,847
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Kurt Fredrickson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scandium precursor for SC2O3 or SC2S3 atomic layer deposition
- Patent number 11,866,453
- Issue date Jan 9, 2024
- Intel Corporation
- Patricio E. Romero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gate structure, fin field-effect transistor, and method of manufact...
- Patent number 11,855,083
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ji-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Device and Method of Forming the Same
- Publication number 20240387686
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Hua Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING CRYSTALLINE SEMICOND...
- Publication number 20240387169
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Chieh Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20240387255
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...
- Publication number 20240387187
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Chun Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE HAVING SEAM SEALED
- Publication number 20240379419
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Lien HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTERCONNECT SYSTEM WITH IMPROVED LOW-K DIELECTRICS
- Publication number 20240363336
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Joung-Wei Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
C-AXIS ORIENTED IZO MATERIAL FILM AND MANUFACTURING METHOD THEREFOR
- Publication number 20240360550
- Publication date Oct 31, 2024
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Jin Seong PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
- Publication number 20240355926
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DEPOSITING AMORPHOUS CARBON FILM
- Publication number 20240347335
- Publication date Oct 17, 2024
- TES CO., LTD.
- Kwang-Ki Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEGMENTED FORMATION OF GATE INTERFACE
- Publication number 20240339318
- Publication date Oct 10, 2024
- Applied Materials, Inc.
- Steven C. H. HUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
- Publication number 20240290611
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Bo Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL-ACTIVATED CARBON FILM DEPOSITION
- Publication number 20240282570
- Publication date Aug 22, 2024
- LAM RESEARCH CORPORATION
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION OF METAL OXIDE
- Publication number 20240282572
- Publication date Aug 22, 2024
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Semiconductor Structure Having High Breakdown Voltage Etch-Stop Layer
- Publication number 20240266292
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Joung-Wei Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AREA SELECTIVE CARBON-BASED FILM DEPOSITION
- Publication number 20240234127
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Xinke Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUSES FOR CARBON DEPOSITION
- Publication number 20240222107
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Varun Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR SELECTIVELY FORMING A DIELECTRIC LAYER ON A METALLIC SU...
- Publication number 20240222111
- Publication date Jul 4, 2024
- ASM IP HOLDING B.V.
- Viraj Madhiwala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE THIN FILM PRECURSOR, METHOD OF FABRICATING METAL OXIDE...
- Publication number 20240199670
- Publication date Jun 20, 2024
- University-Industry Cooperation Group of Kyung Hee University
- Jongwook PARK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING AN OXIDE FILM ON A SUBSTRATE BY A CYCLICAL D...
- Publication number 20240186138
- Publication date Jun 6, 2024
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING AN ORGANIC POLYMER COMPRISING POLYIMIDE
- Publication number 20240177992
- Publication date May 30, 2024
- ASM IP HOLDING B.V.
- Andrea Illiberi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER FOR THE CVD GROWTH OF UNIFORM GRAPHENE AND METHOD OF MANUFACT...
- Publication number 20240153762
- Publication date May 9, 2024
- Paragraf Limited
- Sebastian DIXON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING GATE STRUCTURE AND METHOD OF MANUFACTURING...
- Publication number 20240096883
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ji-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCANDIUM PRECURSOR FOR SC2O3 OR SC2S3 ATOMIC LAYER DEPOSITION
- Publication number 20240092804
- Publication date Mar 21, 2024
- Intel Corporation
- Patricio E. ROMERO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GATE STRUCTURE, FIN FIELD-EFFECT TRANSISTOR, AND METHOD OF MANUFACT...
- Publication number 20240088144
- Publication date Mar 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ji-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE INCLUDING WORK FUNCTION LAYER AND METHOD FOR F...
- Publication number 20240079229
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- CHIA CHAN FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
YTTRIUM COMPOUND, SOURCE MATERIAL FOR FORMING YTTRIUM-CONTAINING FI...
- Publication number 20240067663
- Publication date Feb 29, 2024
- ADEKA CORPORATION
- Hyunwoo KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PRESSURE-BASED SENSOR SYSTEM FOR PRECURSOR LEVEL MEASUREMENT AND ME...
- Publication number 20240044689
- Publication date Feb 8, 2024
- ASM IP HOLDING, B.V.
- Giuseppe Alessio Verni
- G01 - MEASURING TESTING
Information Patent Application
DEPOSITION METHOD OF METAL OXIDE AND MANUFACTURING METHOD OF MEMORY...
- Publication number 20240038529
- Publication date Feb 1, 2024
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LAYER DEPOSITION METHOD AND LAYER DEPOSITION APPARATUS
- Publication number 20240030024
- Publication date Jan 25, 2024
- Samsung Electronics Co., Ltd.
- Intak Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING A TRANSITION METAL NIOBIUM NITRIDE FILM ON A SU...
- Publication number 20240030035
- Publication date Jan 25, 2024
- ASM IP HOLDING B.V.
- Jerry Peijun Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the layer being characterised by the precursor material for deposition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Pre-deposition treatment for FET technology and devices formed thereby

PEALD nitride films

Methods for filling a gap feature on a substrate surface and relate...

Deposition method and an apparatus for depositing a silicon-contain...

Selective blocking of metal surfaces using bifunctional self-assemb...

Method for sealing a seam, semiconductor structure, and method for...

Methods for forming a metal silicate film on a substrate in a react...

Tin oxide films in semiconductor device manufacturing

Interconnect system with improved low-K dielectrics

Method of forming a nitrogen-containing carbon film and system for...

Gate spacer structure and method of forming same

Semiconductor device and method for forming the same

Method of manufacturing semiconductor device

Method of forming an electrode on a substrate and a semiconductor d...

Metal-doped carbon hardmasks

Area selective carbon-based film deposition

Sequential infiltration synthesis apparatus

Precursor solution for thin film deposition and thin film forming m...

Self-assembled monolayer for selective deposition

Systems and methods for depositing low-k dielectric films

Semiconductor structure having high breakdown voltage etch-stop layer

Deposition of metal films with tungsten liner

Semiconductor device and method for forming the same

Method for depositing silicon-free carbon-containing film as gap-fi...

Methods for depositing an oxide film on a substrate by a cyclical d...

Quantum dots and production method thereof

Molybdenum thin films by oxidation-reduction

Methods and precursors for selective deposition of metal films

Scandium precursor for SC2O3 or SC2S3 atomic layer deposition

Gate structure, fin field-effect transistor, and method of manufact...

Patents Applicationslast 30 patents

Semiconductor Device and Method of Forming the Same

METHOD FOR FORMING SEMICONDUCTOR DEVICE HAVING CRYSTALLINE SEMICOND...

DEVICE AND METHOD OF FORMING THE SAME

METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...

SEMICONDUCTOR STRUCTURE HAVING SEAM SEALED

INTERCONNECT SYSTEM WITH IMPROVED LOW-K DIELECTRICS

C-AXIS ORIENTED IZO MATERIAL FILM AND MANUFACTURING METHOD THEREFOR

SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

METHOD FOR DEPOSITING AMORPHOUS CARBON FILM

SEGMENTED FORMATION OF GATE INTERFACE

SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS

RADICAL-ACTIVATED CARBON FILM DEPOSITION

SELECTIVE DEPOSITION OF METAL OXIDE

Semiconductor Structure Having High Breakdown Voltage Etch-Stop Layer

AREA SELECTIVE CARBON-BASED FILM DEPOSITION

METHODS AND APPARATUSES FOR CARBON DEPOSITION

METHODS FOR SELECTIVELY FORMING A DIELECTRIC LAYER ON A METALLIC SU...

METAL OXIDE THIN FILM PRECURSOR, METHOD OF FABRICATING METAL OXIDE...

METHODS FOR DEPOSITING AN OXIDE FILM ON A SUBSTRATE BY A CYCLICAL D...

METHOD OF FORMING AN ORGANIC POLYMER COMPRISING POLYIMIDE

WAFER FOR THE CVD GROWTH OF UNIFORM GRAPHENE AND METHOD OF MANUFACT...

METHOD OF MANUFACTURING GATE STRUCTURE AND METHOD OF MANUFACTURING...

SCANDIUM PRECURSOR FOR SC2O3 OR SC2S3 ATOMIC LAYER DEPOSITION

GATE STRUCTURE, FIN FIELD-EFFECT TRANSISTOR, AND METHOD OF MANUFACT...

SEMICONDUCTOR DEVICE INCLUDING WORK FUNCTION LAYER AND METHOD FOR F...

YTTRIUM COMPOUND, SOURCE MATERIAL FOR FORMING YTTRIUM-CONTAINING FI...

PRESSURE-BASED SENSOR SYSTEM FOR PRECURSOR LEVEL MEASUREMENT AND ME...

DEPOSITION METHOD OF METAL OXIDE AND MANUFACTURING METHOD OF MEMORY...

LAYER DEPOSITION METHOD AND LAYER DEPOSITION APPARATUS

METHODS FOR FORMING A TRANSITION METAL NIOBIUM NITRIDE FILM ON A SU...