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the macromolecular compound being present in a chemically amplified negative photoresist composition
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the macromolecular compound being present in a chemically amplified negative photoresist composition
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Resist composition and method of forming resist pattern
Patent number
11,977,330
Issue date
May 7, 2024
Tokyo Ohka Kogyo Co., Ltd.
Takaaki Kaiho
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Semiconductor devices and methods of manufacturing
Patent number
11,977,333
Issue date
May 7, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Hung-Jui Kuo
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Photoresist developer and method of developing photoresist
Patent number
11,971,657
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
An-Ren Zi
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Photoresist composition and method of forming photoresist pattern
Patent number
11,971,659
Issue date
Apr 30, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Chun-Chih Ho
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Photoresist composition and method of manufacturing a semiconductor...
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11,966,162
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Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Tzu-Yang Lin
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Photosensitive element, resin composition for forming barrier layer...
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11,960,208
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Apr 16, 2024
Resonac Corporation
Masakazu Kume
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Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...
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11,951,476
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Apr 9, 2024
Rutgers, The State University of New Jersey
Umer Hassan
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Resist composition and method of forming resist pattern
Patent number
11,934,099
Issue date
Mar 19, 2024
Tokyo Ohka Kogyo Co., Ltd.
Yoichi Hori
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Sulfonium salt, photoacid generator, curable composition, and resis...
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11,926,581
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Mar 12, 2024
SAN-APRO LIMITED
Takuto Nakao
C07 - ORGANIC CHEMISTRY
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Photoresist imaging and development for enhanced nozzle plate adhesion
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11,926,157
Issue date
Mar 12, 2024
Funai Electric Co., Ltd.
Sean T. Weaver
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Photosensitive resin composition, dry film using same, printed wiri...
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11,921,424
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Mar 5, 2024
Hitachi Chemical Company, Ltd. (FIPAS)
Nobuhito Komuro
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Resist composition and patterning process
Patent number
11,914,291
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
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Binder resin, negative-type photosensitive resin composition, and d...
Patent number
11,892,772
Issue date
Feb 6, 2024
LG Chem, Ltd.
Junhyun An
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Multiple patterning with organometallic photopatternable layers wit...
Patent number
11,886,116
Issue date
Jan 30, 2024
Inpria Corporation
Peter de Schepper
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Resist composition and patterning process
Patent number
11,880,136
Issue date
Jan 23, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Resist composition, method of forming resist pattern, compound, and...
Patent number
11,874,601
Issue date
Jan 16, 2024
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin Nguyen
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Photosensitive resin composition, resin sheet, cured film, organic...
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11,852,973
Issue date
Dec 26, 2023
Toray Industries, Inc.
Yusuke Komori
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Material for lithography, production method therefor, composition f...
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11,852,970
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Dec 26, 2023
Mitsubishi Gas Chemical Company, Inc.
Hiroto Kudo
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Imprint method, imprint apparatus, and film formation apparatus
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11,852,985
Issue date
Dec 26, 2023
Kioxia Corporation
Takeshi Higuchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Semiconductor devices and methods of manufacturing
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11,842,896
Issue date
Dec 12, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Hung-Jui Kuo
H01 - BASIC ELECTRIC ELEMENTS
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Resist composition and patterning process
Patent number
11,835,859
Issue date
Dec 5, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and patterning process
Patent number
11,829,067
Issue date
Nov 28, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Photoresist with polar-acid-labile-group
Patent number
11,822,251
Issue date
Nov 21, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
An-Ren Zi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and method of forming resist pattern
Patent number
11,822,240
Issue date
Nov 21, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yasuhiro Yoshii
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and pattern forming process
Patent number
11,822,245
Issue date
Nov 21, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and patterning process
Patent number
11,822,239
Issue date
Nov 21, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Iodized aromatic carboxylic acid type pendant-containing polymer, r...
Patent number
11,815,814
Issue date
Nov 14, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Photosensitive resin composition, polyimide production method, and...
Patent number
11,809,079
Issue date
Nov 7, 2023
Asahi Kasei Kabushiki Kaisha
Tomohiro Yorisue
H01 - BASIC ELECTRIC ELEMENTS
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Organic light-emitting display device and manufacturing method thereof
Patent number
11,796,913
Issue date
Oct 24, 2023
Chengdu BOE Optoelectronics Technology Co., Ltd.
Benlian Wang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and patterning process
Patent number
11,782,343
Issue date
Oct 10, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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last 30 patents
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RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...
Publication number
20240139686
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May 2, 2024
FUJIFILM CORPORATION
Hiroyuki YONEZAWA
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PHOTORESIST COMP...
Publication number
20240126170
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Apr 18, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chun-Chih HO
H01 - BASIC ELECTRIC ELEMENTS
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HOLLOW STRUCTURE, ELECTRONIC COMPONENT USING SAME, AND NEGATIVE PHO...
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20240126171
Publication date
Apr 18, 2024
TORAY INDUSTRIES, INC.
Yutaro KOYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING RESIST P...
Publication number
20240118612
Publication date
Apr 11, 2024
JSR Corporation
Keiichi SATOU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
Publication number
20240118614
Publication date
Apr 11, 2024
INPRIA CORPORATION
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Polymer, Resist Composition, And Patterning Process
Publication number
20240118617
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118610
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118615
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240111212
Publication date
Apr 4, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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POLYIMIDE PRECURSOR RESIN COMPOSITION AND METHOD FOR MANUFACTURING...
Publication number
20240101761
Publication date
Mar 28, 2024
Asahi Kasei Kabushiki Kaisha
Kohei MURAKAMI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Onium Salt, Acid Diffusion Inhibitor, Resist Composition, And Patte...
Publication number
20240103367
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST UNDERLAYER FILM FORMATION COMPOSITION
Publication number
20240103369
Publication date
Mar 28, 2024
NISSAN CHEMICAL CORPORATION
Masahisa ENDO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
Publication number
20240079235
Publication date
Mar 7, 2024
Taiwan Semiconductor Manufacturing Co., Ltd.
Hung-Jui Kuo
H01 - BASIC ELECTRIC ELEMENTS
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Onium Salt, Resist Composition, And Patterning Process
Publication number
20240036466
Publication date
Feb 1, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
C07 - ORGANIC CHEMISTRY
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CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20240027902
Publication date
Jan 25, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist Material And Patterning Process
Publication number
20240027903
Publication date
Jan 25, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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DISPERSION RESIN, PREPARATION METHOD THEREFOR AND PHOTORESIST COMPO...
Publication number
20240019781
Publication date
Jan 18, 2024
ShenZhen Brthrborder Semiconductor Materials Co., Ltd.
Meidi ZHONG
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE, POLY...
Publication number
20230416451
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Dec 28, 2023
JSR Corporation
Shuhei YAMADA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Dec 21, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Chien-Chih CHEN
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
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20230393463
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Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
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20230393466
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Shin-Etsu Chemical Co., Ltd.
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CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN...
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Shin-Etsu Chemical Co., Ltd.
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTORESIST WITH POLAR-ACID-LABILE-GROUP
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20230384683
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Nov 30, 2023
Taiwan Semiconductor Manufacturing Co., LTD
An-Ren Zi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PR...
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20230384677
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Nov 30, 2023
Shin-Etsu Chemical Co., Ltd.
Tomomi Watanabe
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Sulfonium-Salt-Type Polymerizable Monomer, Polymer Photoacid Genera...
Publication number
20230375928
Publication date
Nov 23, 2023
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS
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20230375761
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Nov 23, 2023
MATERION CORPORATION
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTORESIST COMPOSITION INCLUDING A CHRYSENE COMPOUND, METHOD OF FO...
Publication number
20230357123
Publication date
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Seoul National University R&DB Foundation
Jonghoon KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM USING SAME, PRINTED WIRI...
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20230350292
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Resonac Corporation
Nobuhito KOMURO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Publication number
20230350296
Publication date
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Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY