the macromolecular compound having a backbone with alicyclic moieties

Industry

CPC
G03F7/0395

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0395the macromolecular compound having a backbone with alicyclic moieties

Industries

Patents Grantslast 30 patents

Information Patent Grant
Positive resist composition and patterning process
- Patent number 11,860,540
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material for lithography, production method therefor, composition f...
- Patent number 11,852,970
- Issue date Dec 26, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Hiroto Kudo
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive resin composition
- Patent number 11,739,215
- Issue date Aug 29, 2023
- Zeon Corporation
- Takaaki Sakurai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,604,411
- Issue date Mar 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet photoresist and method
- Patent number 11,378,884
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chen-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for resist underlayer film formation, resist underlayer...
- Patent number 11,243,468
- Issue date Feb 8, 2022
- JSR Corporation
- Naoya Nosaka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for forming resist pattern
- Patent number 11,204,551
- Issue date Dec 21, 2021
- Tokyo Ohka Kogyo Co., Ltd.
- Masahito Yahagi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and resist patterning process
- Patent number 11,131,926
- Issue date Sep 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takahiro Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sulfonium compound, positive resist composition, and resist pattern...
- Patent number 11,124,477
- Issue date Sep 21, 2021
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive tone photosensitive compositions containing amic acid as l...
- Patent number 11,061,328
- Issue date Jul 13, 2021
- PROMERUS, LLC
- Pramod Kandanarachchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Permanent dielectric compositions containing photoacid generator an...
- Patent number 11,048,168
- Issue date Jun 29, 2021
- PROMERUS, LLC
- Pramod Kandanarachchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Onium salt, chemically amplified positive resist composition, and r...
- Patent number 11,036,136
- Issue date Jun 15, 2021
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist polymers, methods of forming patterns and methods of ma...
- Patent number 11,003,081
- Issue date May 11, 2021
- Samsung Electronics Co., Ltd.
- Jin Park
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions, color filter and microlens derived the...
- Patent number 10,915,019
- Issue date Feb 9, 2021
- PROMERUS, LLC
- Pramod F Kandanarachch
- G02 - OPTICS
Information Patent Grant
Resist composition and patterning process
- Patent number 10,871,711
- Issue date Dec 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin film, coloring photosensitive composition, resin film product...
- Patent number 10,761,251
- Issue date Sep 1, 2020
- Fujifilm Corporation
- Hisamitsu Tomeba
- G02 - OPTICS
Information Patent Grant
Photoimageable polyolefin compositions containing photobase generators
- Patent number 10,634,998
- Issue date Apr 28, 2020
- Promerus, LLC
- Pramod Kandanarachchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,620,533
- Issue date Apr 14, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Nadic anhydride polymers and photosensitive compositions derived th...
- Patent number 10,591,818
- Issue date Mar 17, 2020
- Promerus, LLC
- Brian Knapp
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 10,520,809
- Issue date Dec 31, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern forming method, photo mask manufacturing method, and electr...
- Patent number 10,488,755
- Issue date Nov 26, 2019
- FUJIFILM Corporation
- Hidehiro Mochizuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,474,030
- Issue date Nov 12, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Permanent dielectric compositions containing photoacid generator an...
- Patent number 10,429,734
- Issue date Oct 1, 2019
- Promerus, LLC
- Pramod Kandanarachchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Active-light-sensitive or radiation-sensitive resin composition, ac...
- Patent number 10,423,068
- Issue date Sep 24, 2019
- FUJIFILM Corporation
- Shuji Hirano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition, resist pattern forming process, and ph...
- Patent number 10,416,558
- Issue date Sep 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoimageable polyolefin compositions containing photobase generators
- Patent number 10,409,160
- Issue date Sep 10, 2019
- Promerus, LLC
- Pramod Kandanarachchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 10,323,113
- Issue date Jun 18, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine free photopatternable phenol functional group containing p...
- Patent number 10,303,057
- Issue date May 28, 2019
- Promerus, LLC
- Edmund Elce
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern forming method and resist composition
- Patent number 10,126,653
- Issue date Nov 13, 2018
- FUJIFILM Corporation
- Kaoru Iwato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Self-assembled structures, method of manufacture thereof and articl...
- Patent number 10,078,261
- Issue date Sep 18, 2018
- Rohm and Haas Electronic Materials LLC
- Sangho Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MICRO PATTERN MANUFACTURING METHOD USING PHOTOSENSITIVE RESIN COMPOUND
- Publication number 20240345482
- Publication date Oct 17, 2024
- Canon Kabushiki Kaisha
- YOHEI HAMADE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING PROTECTED BAS...
- Publication number 20240184204
- Publication date Jun 6, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroyuki WAKAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240118615
- Publication date Apr 11, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMATION COMPOSITION
- Publication number 20240103369
- Publication date Mar 28, 2024
- NISSAN CHEMICAL CORPORATION
- Masahisa ENDO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240094635
- Publication date Mar 21, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bismaleimide Compound, Composition Containing Same, Polybenzoxazole...
- Publication number 20230305400
- Publication date Sep 28, 2023
- Nippon Kayaku Kabushiki-Kaisha
- Naoki Kawamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, CO...
- Publication number 20230296982
- Publication date Sep 21, 2023
- Mitsubishi Gas Chemical Company, Inc.
- Junya HORIUCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PROD...
- Publication number 20230259028
- Publication date Aug 17, 2023
- NISSAN CHEMICAL CORPORATION
- Ryuta MIZUOCHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...
- Publication number 20230244144
- Publication date Aug 3, 2023
- ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
- Jung-Hwa LEE
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CU...
- Publication number 20230236508
- Publication date Jul 27, 2023
- Showa Denko Materials Co., Ltd.
- Yu AOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20230185192
- Publication date Jun 15, 2023
- FUJIFILM CORPORATION
- Akiyoshi GOTO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...
- Publication number 20230123180
- Publication date Apr 20, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tomomi Watanabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLA...
- Publication number 20230096077
- Publication date Mar 30, 2023
- SAMSUNG DISPLAY CO., LTD.
- Jun Young KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20220342307
- Publication date Oct 27, 2022
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210364921
- Publication date Nov 25, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20210048746
- Publication date Feb 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TONE PHOTOSENSITIVE COMPOSITIONS CONTAINING AMIC ACID AS L...
- Publication number 20200363722
- Publication date Nov 19, 2020
- PROMERUS, LLC
- PRAMOD KANDANARACHCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Extreme Ultraviolet Photoresist and Method
- Publication number 20200133124
- Publication date Apr 30, 2020
- Taiwan Semiconductor Manufacturing Co., LTD
- Chen-Yu Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN...
- Publication number 20200071268
- Publication date Mar 5, 2020
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...
- Publication number 20200012193
- Publication date Jan 9, 2020
- JSR Corporation
- Naoya NOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20200004143
- Publication date Jan 2, 2020
- Tokyo Ohka Kogyo Co., Ltd.
- Junichi TSUCHIYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOIMAGEABLE POLYOLEFIN COMPOSITIONS CONTAINING PHOTOBASE GENERATORS
- Publication number 20190369492
- Publication date Dec 5, 2019
- PROMERUS, LLC
- PRAMOD KANDANARACHCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20190361350
- Publication date Nov 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Naoya Inoue
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PERMANENT DIELECTRIC COMPOSITIONS CONTAINING PHOTOACID GENERATOR AN...
- Publication number 20190339617
- Publication date Nov 7, 2019
- PROMERUS, LLC
- PRAMOD KANDANARACHCHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20190094690
- Publication date Mar 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR MANUFACTURING MEMS DEVICES USING MULTIPLE PHOTOACID GENE...
- Publication number 20190056659
- Publication date Feb 21, 2019
- Funai Electric Co., Ltd.
- Christopher A. CRAFT
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
PHOTORESIST POLYMERS, METHODS OF FORMING PATTERNS AND METHODS OF MA...
- Publication number 20190040171
- Publication date Feb 7, 2019
- Samsung Electronics Co., Ltd.
- Jin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING P...
- Publication number 20180329299
- Publication date Nov 15, 2018
- PROMERUS, LLC
- EDMUND ELCE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOIMAGEABLE POLYOLEFIN COMPOSITIONS CONTAINING PHOTOBASE GENERATORS
- Publication number 20180203349
- Publication date Jul 19, 2018
- PROMERUS, LLC
- PRAMOD KANDANARACHCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20170369616
- Publication date Dec 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

the macromolecular compound having a backbone with alicyclic moieties

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Positive resist composition and patterning process

Material for lithography, production method therefor, composition f...

Photosensitive resin composition

Resist composition and patterning process

Extreme ultraviolet photoresist and method

Composition for resist underlayer film formation, resist underlayer...

Resist composition and method for forming resist pattern

Resist composition and resist patterning process

Sulfonium compound, positive resist composition, and resist pattern...

Positive tone photosensitive compositions containing amic acid as l...

Permanent dielectric compositions containing photoacid generator an...

Onium salt, chemically amplified positive resist composition, and r...

Photoresist polymers, methods of forming patterns and methods of ma...

Photosensitive compositions, color filter and microlens derived the...

Resist composition and patterning process

Resin film, coloring photosensitive composition, resin film product...

Photoimageable polyolefin compositions containing photobase generators

Resist composition and patterning process

Nadic anhydride polymers and photosensitive compositions derived th...

Resist composition and patterning process

Pattern forming method, photo mask manufacturing method, and electr...

Resist composition and patterning process

Permanent dielectric compositions containing photoacid generator an...

Active-light-sensitive or radiation-sensitive resin composition, ac...

Positive resist composition, resist pattern forming process, and ph...

Photoimageable polyolefin compositions containing photobase generators

Resist composition and patterning process

Fluorine free photopatternable phenol functional group containing p...

Pattern forming method and resist composition

Self-assembled structures, method of manufacture thereof and articl...

Patents Applicationslast 30 patents

MICRO PATTERN MANUFACTURING METHOD USING PHOTOSENSITIVE RESIN COMPOUND

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING PROTECTED BAS...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST UNDERLAYER FILM FORMATION COMPOSITION

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

Bismaleimide Compound, Composition Containing Same, Polybenzoxazole...

POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, CO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING REACTION PROD...

POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPA...

PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CU...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND P...

PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF DISPLA...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

POSITIVE TONE PHOTOSENSITIVE COMPOSITIONS CONTAINING AMIC ACID AS L...

Extreme Ultraviolet Photoresist and Method

SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER...

RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN

PHOTOIMAGEABLE POLYOLEFIN COMPOSITIONS CONTAINING PHOTOBASE GENERATORS

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

PERMANENT DIELECTRIC COMPOSITIONS CONTAINING PHOTOACID GENERATOR AN...

RESIST COMPOSITION AND PATTERNING PROCESS

METHOD FOR MANUFACTURING MEMS DEVICES USING MULTIPLE PHOTOACID GENE...

PHOTORESIST POLYMERS, METHODS OF FORMING PATTERNS AND METHODS OF MA...

FLUORINE FREE PHOTOPATTERNABLE PHENOL FUNCTIONAL GROUP CONTAINING P...

PHOTOIMAGEABLE POLYOLEFIN COMPOSITIONS CONTAINING PHOTOBASE GENERATORS

RESIST COMPOSITION AND PATTERNING PROCESS