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CPC
G03F1/106
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Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
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G03F1/106
the masking means
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Information
Patent Grant
Conductive alignment layer, manufacture method of the conductive al...
Patent number
10,048,540
Issue date
Aug 14, 2018
BOE Technology Group Co., Ltd.
Wenbo Li
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents