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the masking pattern being obtained by modification of the polymeric pattern by energetic means
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CPC
G03F1/103
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Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F1/00
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof
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G03F1/103
the masking pattern being obtained by modification of the polymeric pattern by energetic means
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Patents Grants
last 30 patents
Information
Patent Grant
Ablatable direct write imaging medium
Patent number
6,828,067
Issue date
Dec 7, 2004
Precision Coatings, Inc.
Norman Sweet
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Patents Applications
last 30 patents
Information
Patent Application
Ablatable direct write imaging medium
Publication number
20020164495
Publication date
Nov 7, 2002
Norman Sweet
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC