TREA

the masking pattern being obtained by modification of the polymeric pattern by energetic means

Follow

Industry

  • CPC
  • G03F1/103
This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/103the masking pattern being obtained by modification of the polymeric pattern by energetic means
Industries