the material being a silicon carbide not containing oxygen

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CPC
H01L21/02167

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Parent Industries

HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02167the material being a silicon carbide not containing oxygen

Industries

Patents Grantslast 30 patents

Information Patent Grant
Connection between source/drain and gate
- Patent number 11,980,016
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chuan Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with inner spacer layer and method f...
- Patent number 11,973,129
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Han-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for depositing low-k dielectric films
- Patent number 11,967,498
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Bo Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method
- Patent number 11,948,798
- Issue date Apr 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ching-Yu Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device of dielectric layer
- Patent number 11,935,752
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure having air gaps and method for manufacturin...
- Patent number 11,923,243
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Yen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacture
- Patent number 11,916,132
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor isolation structures
- Patent number 11,908,921
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal deposition of silicon carbide films
- Patent number 11,894,227
- Issue date Feb 6, 2024
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure with an air gap
- Patent number 11,848,253
- Issue date Dec 19, 2023
- United Microelectronics Corp.
- Ching-Pin Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device with multi-layer etch stop...
- Patent number 11,848,231
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Cheng Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Doped or undoped silicon carbide deposition and remote hydrogen pla...
- Patent number 11,848,199
- Issue date Dec 19, 2023
- Lam Research Corporation
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal-Insulator-Metal structure
- Patent number 11,842,959
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yuan-Yang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation features and methods of fabricating the same
- Patent number 11,843,028
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- I-Wen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, method of processing...
- Patent number 11,823,886
- Issue date Nov 21, 2023
- Kokusai Electric Corporation
- Kazuhiro Harada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nano multilayer carbon-rich low-k spacer
- Patent number 11,791,398
- Issue date Oct 17, 2023
- International Business Machines Corporation
- Donald Canaperi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 11,784,044
- Issue date Oct 10, 2023
- Kokusai Electric Corporation
- Takeo Hanashima
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device
- Patent number 11,770,922
- Issue date Sep 26, 2023
- Semiconductor Manufacturing International (Shanghai) Corporation
- Fei Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition method to form air gaps
- Patent number 11,749,562
- Issue date Sep 5, 2023
- ASM IP Holding B.V.
- Chiyu Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for depositing silicon-containing thin film containing...
- Patent number 11,749,522
- Issue date Sep 5, 2023
- DNF Co., Ltd.
- Sung Gi Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming substrate surfaces with exposed cr...
- Patent number 11,735,432
- Issue date Aug 22, 2023
- Exogenesis Corporation
- Sean R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Films of desired composition and film properties
- Patent number 11,732,350
- Issue date Aug 22, 2023
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing a conformal metal or metalloid silicon nitri...
- Patent number 11,732,351
- Issue date Aug 22, 2023
- VERSUM MATERIALS US, LLC
- Xinjian Lei
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursors and flowable CVD methods for making low-k films to fill...
- Patent number 11,735,413
- Issue date Aug 22, 2023
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spin on carbon composition and method of manufacturing a semiconduc...
- Patent number 11,728,161
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jing Hong Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Films of desired composition and film properties
- Patent number 11,708,634
- Issue date Jul 25, 2023
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Films of desired composition and film properties
- Patent number 11,680,314
- Issue date Jun 20, 2023
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing an electronic device
- Patent number 11,682,553
- Issue date Jun 20, 2023
- Commissariat a l'Energie Atomique et Aux Energies Alternatives
- Hasan Naser
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Catalytic thermal deposition of carbon-containing materials
- Patent number 11,682,554
- Issue date Jun 20, 2023
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Films of desired composition and film properties
- Patent number 11,680,315
- Issue date Jun 20, 2023
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...
- Publication number 20240145233
- Publication date May 2, 2024
- Kokusai Electric Corporation
- Daigo YAMAGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS
- Publication number 20240145234
- Publication date May 2, 2024
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
AIR GAP SPACER FORMATION FOR NANO-SCALE SEMICONDUCTOR DEVICES
- Publication number 20240079266
- Publication date Mar 7, 2024
- TESSERA LLC
- Kangguo Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20240071748
- Publication date Feb 29, 2024
- ASM IP HOLDING B.V.
- SangHeon Yong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION IMPLANTATION FOR INCREASED ADHESION WITH RESIST MATERIAL
- Publication number 20240071773
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Lei Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DOPED OR UNDOPED SILICON CARBIDE DEPOSITION AND REMOTE HYDROGEN PLA...
- Publication number 20240063015
- Publication date Feb 22, 2024
- LAM RESEARCH CORPORATION
- Guangbi Yuan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING TREATED SILICON-CARBON MATERIAL
- Publication number 20240047198
- Publication date Feb 8, 2024
- ASM IP HOLDING B.V.
- Hirotsugu Sugiura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Structure and Method for Deep Trench Capacitor with Reduced Deforma...
- Publication number 20240047552
- Publication date Feb 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Fu-Chiang Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
- Publication number 20240014032
- Publication date Jan 11, 2024
- Kokusai Electric Corporation
- Kazuhiro HARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...
- Publication number 20240006322
- Publication date Jan 4, 2024
- Intel Corporation
- Atul MADHAVAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING ATOMIC LAYER AND METHOD OF MANUFACTURING SEMIC...
- Publication number 20230420248
- Publication date Dec 28, 2023
- Samsung Electronics Co., Ltd.
- Hyunjun AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A SUBSTRATE FOR THE EPITAXIAL GROWTH OF A LAYE...
- Publication number 20230411151
- Publication date Dec 21, 2023
- SOITEC
- Eric Guiot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230411149
- Publication date Dec 21, 2023
- Kokusai Electric Corporation
- Takeo HANASHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING SiOCN LAYER
- Publication number 20230407465
- Publication date Dec 21, 2023
- ASM IP HOLDING B.V.
- Takashi Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20230395370
- Publication date Dec 7, 2023
- ASM IP HOLDING B.V.
- SeungHyun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20230369155
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- XIN ZHI WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION METHOD TO FORM AIR GAPS
- Publication number 20230360964
- Publication date Nov 9, 2023
- ASM IP HOLDING B.V.
- Chiyu Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPIN ON CARBON COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUC...
- Publication number 20230343582
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jing Hong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD
- Publication number 20230335394
- Publication date Oct 19, 2023
- TOKYO ELECTRON LIMITED
- Kiwamu ITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER D...
- Publication number 20230335392
- Publication date Oct 19, 2023
- ASM IP HOLDING B.V.
- Shinya Yoshimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230307229
- Publication date Sep 28, 2023
- Kokusai Electric Corporation
- Masaya NISHIDA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING Si-SiC-BASED COMPOSITE STRUCTURE
- Publication number 20230298882
- Publication date Sep 21, 2023
- NGK Insulators, Ltd.
- Sora GOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process Method for Improving Reliability of Metal Gate High-Voltage...
- Publication number 20230274931
- Publication date Aug 31, 2023
- Shanghai Huali Integrated Circuit Corporation
- Yaoyu Zhan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING GAS MIXTURE AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT...
- Publication number 20230274943
- Publication date Aug 31, 2023
- Samsung Electronics Co., Ltd.
- Changgil SON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUMMY FIN STRUCTURES AND METHODS OF FORMING SAME
- Publication number 20230268426
- Publication date Aug 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERNING METHODS FOR SEMICONDUCTOR DEVICES
- Publication number 20230260829
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Ren Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20230253474
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ADJUSTING THERMAL FIELD OF SILICON CARBIDE SINGLE CRYSTA...
- Publication number 20230227998
- Publication date Jul 20, 2023
- NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
- HSUEH-I CHEN
- C30 - CRYSTAL GROWTH
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230215724
- Publication date Jul 6, 2023
- Kokusai Electric Corporation
- Keigo NISHIDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230207310
- Publication date Jun 29, 2023
- Kokusai Electric Corporation
- Takeo HANASHIMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the material being a silicon carbide not containing oxygen

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Connection between source/drain and gate

Semiconductor device structure with inner spacer layer and method f...

Systems and methods for depositing low-k dielectric films

Semiconductor device and method

Device of dielectric layer

Semiconductor structure having air gaps and method for manufacturin...

Semiconductor device and method of manufacture

Transistor isolation structures

Conformal deposition of silicon carbide films

Semiconductor structure with an air gap

Method for forming semiconductor device with multi-layer etch stop...

Doped or undoped silicon carbide deposition and remote hydrogen pla...

Metal-Insulator-Metal structure

Isolation features and methods of fabricating the same

Method of manufacturing semiconductor device, method of processing...

Nano multilayer carbon-rich low-k spacer

Method of processing substrate, method of manufacturing semiconduct...

Semiconductor device

Selective deposition method to form air gaps

Composition for depositing silicon-containing thin film containing...

Method and apparatus for forming substrate surfaces with exposed cr...

Films of desired composition and film properties

Methods for depositing a conformal metal or metalloid silicon nitri...

Precursors and flowable CVD methods for making low-k films to fill...

Spin on carbon composition and method of manufacturing a semiconduc...

Films of desired composition and film properties

Films of desired composition and film properties

Method of manufacturing an electronic device

Catalytic thermal deposition of carbon-containing materials

Films of desired composition and film properties

Patents Applicationslast 30 patents

PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...

CONFORMAL DEPOSITION OF SILICON CARBIDE FILMS

AIR GAP SPACER FORMATION FOR NANO-SCALE SEMICONDUCTOR DEVICES

SUBSTRATE PROCESSING METHOD

ION IMPLANTATION FOR INCREASED ADHESION WITH RESIST MATERIAL

DOPED OR UNDOPED SILICON CARBIDE DEPOSITION AND REMOTE HYDROGEN PLA...

METHOD OF FORMING TREATED SILICON-CARBON MATERIAL

Structure and Method for Deep Trench Capacitor with Reduced Deforma...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...

CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...

METHOD OF DEPOSITING ATOMIC LAYER AND METHOD OF MANUFACTURING SEMIC...

METHOD FOR PRODUCING A SUBSTRATE FOR THE EPITAXIAL GROWTH OF A LAYE...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF FORMING SiOCN LAYER

SUBSTRATE PROCESSING METHOD

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

SELECTIVE DEPOSITION METHOD TO FORM AIR GAPS

SPIN ON CARBON COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUC...

FILM FORMING METHOD

DEPOSITION OF FLOWABLE SICN FILMS BY PLASMA ENHANCED ATOMIC LAYER D...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF MANUFACTURING Si-SiC-BASED COMPOSITE STRUCTURE

Process Method for Improving Reliability of Metal Gate High-Voltage...

ETCHING GAS MIXTURE AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT...

DUMMY FIN STRUCTURES AND METHODS OF FORMING SAME

PATTERNING METHODS FOR SEMICONDUCTOR DEVICES

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

METHOD FOR ADJUSTING THERMAL FIELD OF SILICON CARBIDE SINGLE CRYSTA...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...