the material containing at least one rare earth element

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H01L21/02156

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02156the material containing at least one rare earth element

Industries

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device having cut gate dielectric
- Patent number 11,901,237
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Yun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced deposition processes for controlled formation of me...
- Patent number 11,501,965
- Issue date Nov 15, 2022
- ASM IP Holding B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor device
- Patent number 11,437,278
- Issue date Sep 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Yun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compound semiconductor and manufacturing method thereof
- Patent number 11,001,504
- Issue date May 11, 2021
- LG Chem, Ltd.
- Jae-Ki Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor device and semiconductor device
- Patent number 10,879,074
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shu-Uei Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a metal gate and formation method thereof
- Patent number 10,741,450
- Issue date Aug 11, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chang-Yun Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming semiconductor structure and semiconductor device
- Patent number 10,672,613
- Issue date Jun 2, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shu-Uei Jang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of growing oxide thin films
- Patent number 9,514,956
- Issue date Dec 6, 2016
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and manufacturing method for the same
- Patent number 9,496,365
- Issue date Nov 15, 2016
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode for low-leakage devices
- Patent number 9,245,941
- Issue date Jan 26, 2016
- Intermolecular, Inc.
- Sergey Barabash
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonvolatile semiconductor memory device with high-K insulating film
- Patent number 8,482,053
- Issue date Jul 9, 2013
- Kabushiki Kaisha Toshiba
- Akira Takashima
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having a high-dielectric-constant gate insulat...
- Patent number 8,143,676
- Issue date Mar 27, 2012
- Kabushiki Kaisha Toshiba
- Seiji Inumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Erbium-doped silicon nanocrystalline embedded silicon oxide waveguide
- Patent number 7,916,986
- Issue date Mar 29, 2011
- Sharp Laboratories of America, Inc.
- Hao Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating a high dielectric constant transistor gate us...
- Patent number 7,837,838
- Issue date Nov 23, 2010
- Applied Materials, Inc.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of growing oxide thin films
- Patent number 7,824,492
- Issue date Nov 2, 2010
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic-layer-chemical-vapor-deposition of films that contain silico...
- Patent number 7,771,533
- Issue date Aug 10, 2010
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of growing oxide thin films
- Patent number 7,771,534
- Issue date Aug 10, 2010
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for forming a gate insulating film
- Patent number 7,727,911
- Issue date Jun 1, 2010
- Panasonic Corporation
- Kenji Yoneda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insulating film and electronic device
- Patent number 7,635,900
- Issue date Dec 22, 2009
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 7,514,316
- Issue date Apr 7, 2009
- Fujitsu Microelectronics Limited
- Yoshihiro Sugita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon lanthanide oxynitride films
- Patent number 7,432,548
- Issue date Oct 7, 2008
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Insulating film and electronic device
- Patent number 7,400,019
- Issue date Jul 15, 2008
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating film and electronic device
- Patent number 7,268,411
- Issue date Sep 11, 2007
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating film and electronic device
- Patent number 7,208,802
- Issue date Apr 24, 2007
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Insulating film and electronic device
- Patent number 7,026,693
- Issue date Apr 11, 2006
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE HAVING CUT GATE DIELECTRIC
- Publication number 20220359302
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Yun CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND ITS FORMATION METHOD
- Publication number 20220084818
- Publication date Mar 17, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Jiang CHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK AND MANUFACTURING METHOD THEREFOR
- Publication number 20210249260
- Publication date Aug 12, 2021
- KSM COMPONENT CO., LTD
- Yun Ho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE FORMATION
- Publication number 20210013318
- Publication date Jan 14, 2021
- Micron Technology, Inc.
- An-Jen B. Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING SEMICONDUCTOR DEVICE
- Publication number 20200365465
- Publication date Nov 19, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Yun CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
- Publication number 20200294804
- Publication date Sep 17, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu-Uei JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND FORMATION METHOD THEREOF
- Publication number 20190164838
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chang-Yun CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR DEVICE
- Publication number 20190157090
- Publication date May 23, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu-Uei JANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...
- Publication number 20180350587
- Publication date Dec 6, 2018
- ASM IP HOLDING B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOUND SEMICONDUCTOR AND MANUFACTURING METHOD THEREOF
- Publication number 20170217783
- Publication date Aug 3, 2017
- LG CHEM, LTD.
- Jae-Ki LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPLEMENTING ATOMIC LAYER DEPOSITION FOR GATE DIELECTRICS
- Publication number 20170110313
- Publication date Apr 20, 2017
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Electrode for Low-Leakage Devices
- Publication number 20140273427
- Publication date Sep 18, 2014
- Intermolecular, Inc.
- Sergey Barabash
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Deposition of Anisotropic Dielectric Layers Orientationally Matched...
- Publication number 20140264747
- Publication date Sep 18, 2014
- Intermolecular, Inc.
- Sergey Barabash
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURIN...
- Publication number 20120025297
- Publication date Feb 2, 2012
- Akira TAKASHIMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF GROWING OXIDE THIN FILMS
- Publication number 20110104906
- Publication date May 5, 2011
- ASM INTERNATIONAL N.V.
- Eva Tois
- C30 - CRYSTAL GROWTH
Information Patent Application
Erbium-Doped Silicon Nanocrystalline Embedded Silicon Oxide Waveguide
- Publication number 20090232449
- Publication date Sep 17, 2009
- Hao Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING A GATE INSULATING FILM
- Publication number 20090181549
- Publication date Jul 16, 2009
- Kenji Yoneda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20090114996
- Publication date May 7, 2009
- Seiji Inumiya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSULATING FILM AND ELECTRONIC DEVICE
- Publication number 20090020835
- Publication date Jan 22, 2009
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
INSULATING FILM AND ELECTRONIC DEVICE
- Publication number 20090014817
- Publication date Jan 15, 2009
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
INSULATING FILM AND ELECTRONIC DEVICE
- Publication number 20080272365
- Publication date Nov 6, 2008
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
INSULATING FILM AND ELECTRONIC DEVICE
- Publication number 20080272364
- Publication date Nov 6, 2008
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
SILICON LANTHANIDE OXYNITRIDE FILMS
- Publication number 20080087945
- Publication date Apr 17, 2008
- Micron Technology, Inc.
- Leonard Forbes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FABRICATING A HIGH DIELECTRIC CONSTANT TRANSISTOR GATE US...
- Publication number 20070218623
- Publication date Sep 20, 2007
- APPLIED MATERIALS, INC.
- Thai Cheng Chua
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF GROWING OXIDE THIN FILMS
- Publication number 20070163488
- Publication date Jul 19, 2007
- Eva Tois
- C30 - CRYSTAL GROWTH
Information Patent Application
Insulating film and electronic device
- Publication number 20060138508
- Publication date Jun 29, 2006
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Insulating film and electronic device
- Publication number 20060131674
- Publication date Jun 22, 2006
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Insulating film and electronic device
- Publication number 20060131673
- Publication date Jun 22, 2006
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- B82 - NANO-TECHNOLOGY
Information Patent Application
Semiconductor device and method of manufacturing the same
- Publication number 20050208719
- Publication date Sep 22, 2005
- FUJITSU LIMITED
- Yoshihiro Sugita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Insulating film and electronic device
- Publication number 20050040481
- Publication date Feb 24, 2005
- Kabushiki Kaisha Toshiba
- Tatsuo Shimizu
- B82 - NANO-TECHNOLOGY

the material containing at least one rare earth element

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device having cut gate dielectric

Plasma enhanced deposition processes for controlled formation of me...

Method for forming semiconductor device

Compound semiconductor and manufacturing method thereof

Method of forming semiconductor device and semiconductor device

Semiconductor device having a metal gate and formation method thereof

Method of forming semiconductor structure and semiconductor device

Method of growing oxide thin films

Semiconductor device and manufacturing method for the same

Electrode for low-leakage devices

Nonvolatile semiconductor memory device with high-K insulating film

Semiconductor device having a high-dielectric-constant gate insulat...

Erbium-doped silicon nanocrystalline embedded silicon oxide waveguide

Method of fabricating a high dielectric constant transistor gate us...

Method of growing oxide thin films

Atomic-layer-chemical-vapor-deposition of films that contain silico...

Method of growing oxide thin films

Method for forming a gate insulating film

Insulating film and electronic device

Semiconductor device and method of manufacturing the same

Silicon lanthanide oxynitride films

Insulating film and electronic device

Insulating film and electronic device

Insulating film and electronic device

Insulating film and electronic device

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE HAVING CUT GATE DIELECTRIC

SEMICONDUCTOR STRUCTURE AND ITS FORMATION METHOD

ELECTROSTATIC CHUCK AND MANUFACTURING METHOD THEREFOR

ELECTRODE FORMATION

METHOD FOR FORMING SEMICONDUCTOR DEVICE

METHOD OF FORMING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND FORMATION METHOD THEREOF

METHOD OF FORMING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR DEVICE

PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...

COMPOUND SEMICONDUCTOR AND MANUFACTURING METHOD THEREOF

IMPLEMENTING ATOMIC LAYER DEPOSITION FOR GATE DIELECTRICS

Electrode for Low-Leakage Devices

Deposition of Anisotropic Dielectric Layers Orientationally Matched...

NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURIN...

METHOD OF GROWING OXIDE THIN FILMS

Erbium-Doped Silicon Nanocrystalline Embedded Silicon Oxide Waveguide

METHOD FOR FORMING A GATE INSULATING FILM

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

INSULATING FILM AND ELECTRONIC DEVICE

INSULATING FILM AND ELECTRONIC DEVICE

INSULATING FILM AND ELECTRONIC DEVICE

INSULATING FILM AND ELECTRONIC DEVICE

SILICON LANTHANIDE OXYNITRIDE FILMS

METHOD OF FABRICATING A HIGH DIELECTRIC CONSTANT TRANSISTOR GATE US...

METHOD OF GROWING OXIDE THIN FILMS

Insulating film and electronic device

Insulating film and electronic device

Insulating film and electronic device

Semiconductor device and method of manufacturing the same

Insulating film and electronic device