the material containing more than one metal element

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H01L21/02194

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02194the material containing more than one metal element

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Patents Grantslast 30 patents

Information Patent Grant
Capacitor structure and forming method thereof
- Patent number 12,205,981
- Issue date Jan 21, 2025
- Semiconductor Manufacturing International (Shanghai) Corporation
- Changzhou Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial oxide materials, structures, and devices
- Patent number 12,206,048
- Issue date Jan 21, 2025
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing a semiconductor de...
- Patent number 12,176,421
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Cheng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cerium-doped ferroelectric materials and related devices and methods
- Patent number 12,166,098
- Issue date Dec 10, 2024
- The Board of Trustees of the Leland Stanford Junior University
- Paul C. McIntyre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial oxide materials, structures, and devices
- Patent number 12,155,009
- Issue date Nov 26, 2024
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and epitaxial oxide device with impact ionization
- Patent number 12,125,946
- Issue date Oct 22, 2024
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial oxide device with impact ionization
- Patent number 12,095,006
- Issue date Sep 17, 2024
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial oxide materials, structures, and devices
- Patent number 12,087,880
- Issue date Sep 10, 2024
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electrode formation
- Patent number 12,046,658
- Issue date Jul 23, 2024
- Micron Technology, Inc.
- An-Jen B. Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Soft ashing process for forming protective layer on conductive cap...
- Patent number 12,033,860
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Guan-Xuan Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device of dielectric layer
- Patent number 12,034,075
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursor solution for thin film deposition and thin film forming m...
- Patent number 11,972,941
- Issue date Apr 30, 2024
- SK TRICHEM
- Chang Sung Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Negative capacitance transistor with external ferroelectric structure
- Patent number 11,961,897
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative capacitance transistor having a multilayer ferroelectric s...
- Patent number 11,784,235
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing a hafnium lanthanum oxide film on a substrat...
- Patent number 11,769,664
- Issue date Sep 26, 2023
- ASM IP Holding B.V.
- Tatiana Ivanova
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,764,279
- Issue date Sep 19, 2023
- Samsung Electronics Co., Ltd.
- Nakjin Son
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing a semiconductor de...
- Patent number 11,757,023
- Issue date Sep 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Cheng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device and semiconductor device
- Patent number 11,737,276
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Sara Otsuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and formation method of semiconductor device with fin str...
- Patent number 11,688,645
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kun-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-thin dielectric films using photo up-conversion for applicati...
- Patent number 11,670,504
- Issue date Jun 6, 2023
- Intel Corporation
- Jeremy D. Ecton
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor memory device and method of fabricating the same
- Patent number 11,600,621
- Issue date Mar 7, 2023
- Samsung Electronics Co., Ltd.
- Kyooho Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,563,102
- Issue date Jan 24, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chieh Lu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing a semiconductor de...
- Patent number 11,538,926
- Issue date Dec 27, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Cheng Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epitaxial oxide integrated circuit
- Patent number 11,522,087
- Issue date Dec 6, 2022
- SILANNA UV TECHNOLOGIES PTE LTD
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film structure including dielectric material layer and electro...
- Patent number 11,456,351
- Issue date Sep 27, 2022
- Samsung Electronics Co., Ltd.
- Taehwan Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric layer and a semiconductor memory device including the di...
- Patent number 11,417,516
- Issue date Aug 16, 2022
- Korea Institute of Science and Technology
- Seong Keun Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative capacitance transistor having a multilayer ferroelectric s...
- Patent number 11,349,008
- Issue date May 31, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,289,580
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Georgios Vellianitis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing same
- Patent number 11,239,337
- Issue date Feb 1, 2022
- Renesas Electronics Corporation
- Tetsuya Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
NbMC layers
- Patent number 11,233,133
- Issue date Jan 25, 2022
- ASM IP Holding B.V.
- Chiyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES
- Publication number 20240372035
- Publication date Nov 7, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED DIPOLE REGION FOR TRANSISTOR
- Publication number 20240332008
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20240332419
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOFT ASHING PROCESS FOR FORMING PROTECTIVE LAYER ON CONDUCTIVE CAP...
- Publication number 20240321582
- Publication date Sep 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Guan-Xuan CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE CAPACITANCE TRANSISTOR WITH EXTERNAL FERROELECTRIC STRUCTURE
- Publication number 20240266417
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL OXIDE TRANSISTOR
- Publication number 20240266469
- Publication date Aug 8, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAME
- Publication number 20240266418
- Publication date Aug 8, 2024
- Samsung Electronics Co., Ltd.
- Sanghyun JO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL OXIDE TRANSISTOR
- Publication number 20240258460
- Publication date Aug 1, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL OXIDE TRANSISTOR
- Publication number 20240170612
- Publication date May 23, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSERTING INHIBITION LAYER FOR INDUCING ANTIFERROELECTRICITY TO FER...
- Publication number 20240145571
- Publication date May 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Ting Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING A FERROELECTRIC DEVICE
- Publication number 20240128308
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Dina Triyoso
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL TREATMENT FOR METAL GATE STACK
- Publication number 20240087899
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Zhihui Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES
- Publication number 20240072205
- Publication date Feb 29, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEMS FOR FORMING DEVICE STRUCTURES INCLUDING HIGH-K D...
- Publication number 20240072104
- Publication date Feb 29, 2024
- ASM IP HOLDING B.V.
- Fu Tang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES
- Publication number 20240055560
- Publication date Feb 15, 2024
- Silanna UV Technologies Pte Ltd
- Petar Atanackovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRANSPARENT AND HIGH-K THIN FILM PREPARED BY PULSED LASER DEPOSITION
- Publication number 20230420247
- Publication date Dec 28, 2023
- The University of Hong Kong
- Dong HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR FORMING MEMORY DEVICES AND COMPONENTS THEREOF
- Publication number 20230377877
- Publication date Nov 23, 2023
- ASM IP HOLDING, B.V.
- Alessandra Leonhardt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DE...
- Publication number 20230369464
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Cheng SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20230352297
- Publication date Nov 2, 2023
- Samsung Electronics Co., Ltd.
- Yurim KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A FERROELECTRIC LAYER OR AN ANTIFERROELECTRIC...
- Publication number 20230326747
- Publication date Oct 12, 2023
- Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
- Konrad SEIDEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH FIN STRUCTURES
- Publication number 20230282521
- Publication date Sep 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kun-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SAME
- Publication number 20230207658
- Publication date Jun 29, 2023
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Yutong SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ATOMIC LAYER DEPOSITION OF TERNARY GALLIUM OXIDE THIN FILMS
- Publication number 20230167548
- Publication date Jun 1, 2023
- Illinois Institute of Technology
- Adam Hock
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERIUM-DOPED FERROELECTRIC MATERIALS AND RELATED DEVICES AND METHODS
- Publication number 20230163190
- Publication date May 25, 2023
- The Board of Trustees of the Leland Stanford Junior University
- Paul C. McIntyre
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20230154998
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh LU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT DEVICE
- Publication number 20230146530
- Publication date May 11, 2023
- Samsung Electronics Co., Ltd.
- Jangeun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DE...
- Publication number 20230132175
- Publication date Apr 27, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Cheng SHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING METAL FLUORIDE-CONTAINING ORGANIC POLYMER...
- Publication number 20230089206
- Publication date Mar 23, 2023
- KIOXIA Corporation
- Norikatsu SASAO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EPITAXIAL GALLIUM NITRIDE ALLOY FERROELECTRONICS
- Publication number 20230070465
- Publication date Mar 9, 2023
- The Regents of the University of Michigan
- Zetian Mi
- C30 - CRYSTAL GROWTH
Information Patent Application
TWO-DIMENSIONAL ELECTRON GAS AT INTERFACE BETWEEN BASNO3 AND LAINO3
- Publication number 20230045518
- Publication date Feb 9, 2023
- Seoul National University R&DB Foundation
- Kook Rin CHAR
- H01 - BASIC ELECTRIC ELEMENTS

the material containing more than one metal element

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Capacitor structure and forming method thereof

Epitaxial oxide materials, structures, and devices

Semiconductor device and method of manufacturing a semiconductor de...

Cerium-doped ferroelectric materials and related devices and methods

Epitaxial oxide materials, structures, and devices

Method and epitaxial oxide device with impact ionization

Epitaxial oxide device with impact ionization

Epitaxial oxide materials, structures, and devices

Electrode formation

Soft ashing process for forming protective layer on conductive cap...

Device of dielectric layer

Precursor solution for thin film deposition and thin film forming m...

Negative capacitance transistor with external ferroelectric structure

Negative capacitance transistor having a multilayer ferroelectric s...

Methods for depositing a hafnium lanthanum oxide film on a substrat...

Semiconductor device and method for manufacturing the same

Semiconductor device and method of manufacturing a semiconductor de...

Method of manufacturing semiconductor device and semiconductor device

Structure and formation method of semiconductor device with fin str...

Ultra-thin dielectric films using photo up-conversion for applicati...

Semiconductor memory device and method of fabricating the same

Semiconductor device and manufacturing method thereof

Semiconductor device and method of manufacturing a semiconductor de...

Epitaxial oxide integrated circuit

Thin film structure including dielectric material layer and electro...

Dielectric layer and a semiconductor memory device including the di...

Negative capacitance transistor having a multilayer ferroelectric s...

Semiconductor device

Semiconductor device and method of manufacturing same

NbMC layers

Patents Applicationslast 30 patents

EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES

INTEGRATED DIPOLE REGION FOR TRANSISTOR

DEVICE OF DIELECTRIC LAYER

SOFT ASHING PROCESS FOR FORMING PROTECTIVE LAYER ON CONDUCTIVE CAP...

NEGATIVE CAPACITANCE TRANSISTOR WITH EXTERNAL FERROELECTRIC STRUCTURE

EPITAXIAL OXIDE TRANSISTOR

THIN FILM STRUCTURE AND ELECTRONIC DEVICE INCLUDING THE SAME

EPITAXIAL OXIDE TRANSISTOR

EPITAXIAL OXIDE TRANSISTOR

INSERTING INHIBITION LAYER FOR INDUCING ANTIFERROELECTRICITY TO FER...

METHOD FOR FABRICATING A FERROELECTRIC DEVICE

RADICAL TREATMENT FOR METAL GATE STACK

EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES

METHOD AND SYSTEMS FOR FORMING DEVICE STRUCTURES INCLUDING HIGH-K D...

EPITAXIAL OXIDE MATERIALS, STRUCTURES, AND DEVICES

TRANSPARENT AND HIGH-K THIN FILM PREPARED BY PULSED LASER DEPOSITION

METHODS AND SYSTEMS FOR FORMING MEMORY DEVICES AND COMPONENTS THEREOF

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DE...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD FOR PRODUCING A FERROELECTRIC LAYER OR AN ANTIFERROELECTRIC...

SEMICONDUCTOR DEVICE WITH FIN STRUCTURES

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING SAME

THERMAL ATOMIC LAYER DEPOSITION OF TERNARY GALLIUM OXIDE THIN FILMS

CERIUM-DOPED FERROELECTRIC MATERIALS AND RELATED DEVICES AND METHODS

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

INTEGRATED CIRCUIT DEVICE

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DE...

METHOD FOR MANUFACTURING METAL FLUORIDE-CONTAINING ORGANIC POLYMER...

EPITAXIAL GALLIUM NITRIDE ALLOY FERROELECTRONICS

TWO-DIMENSIONAL ELECTRON GAS AT INTERFACE BETWEEN BASNO3 AND LAINO3