the material containing zirconium

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CPC
H01L21/02189

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02189the material containing zirconium

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 12,362,224
- Issue date Jul 15, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuo-Cheng Ching
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, and...
- Patent number 12,354,887
- Issue date Jul 8, 2025
- Kokusai Electric Corporation
- Gen Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing metal-insulator-metal (MIM) capacitors with...
- Patent number 12,356,641
- Issue date Jul 8, 2025
- ASM IP Holding B.V.
- Alessandra Leonhardt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for semiconductor device
- Patent number 12,349,434
- Issue date Jul 1, 2025
- Tokyo Electron Limited
- Koji Akiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with fin structures
- Patent number 12,342,605
- Issue date Jun 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kun-Yu Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,315,864
- Issue date May 27, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Chi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High resistivity silicon-on-insulator substrate comprising an isola...
- Patent number 12,300,535
- Issue date May 13, 2025
- GlobalWafers Co., Ltd.
- Igor Peidous
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ferroelectric thin-film structure and electronic device including t...
- Patent number 12,283,629
- Issue date Apr 22, 2025
- Samsung Electronics Co., Ltd.
- Yunseong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated circuit device
- Patent number 12,237,324
- Issue date Feb 25, 2025
- Samsung Electronics Co., Ltd.
- Jangeun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insulator-metal structure
- Patent number 12,230,566
- Issue date Feb 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yuan-Yang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Source/drain feature separation structure
- Patent number 12,178,032
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Chun Keng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal oxide composite as etch stop layer
- Patent number 12,176,247
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kai-Fang Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective passivation and selective deposition
- Patent number 12,170,197
- Issue date Dec 17, 2024
- ASM IP Holding B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of oxide thin films
- Patent number 12,154,785
- Issue date Nov 26, 2024
- ASM IP Holding B.V.
- Suvi P. Haukka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective processing with etch residue-based inhibitors
- Patent number 12,131,909
- Issue date Oct 29, 2024
- Lam Research Corporation
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device
- Patent number 12,125,872
- Issue date Oct 22, 2024
- Samsung Electronics Co., Ltd.
- Han Jin Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for filling a gap feature on a substrate surface and relate...
- Patent number 12,119,220
- Issue date Oct 15, 2024
- ASM IP Holding B.V.
- Leo Salmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic device including ferroelectric layer
- Patent number 12,094,971
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Yunseong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective in-situ cleaning of high-k films from processing chamber...
- Patent number 12,076,763
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Yujia Zhai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor memory devices and methods of fabricating the same
- Patent number 12,082,395
- Issue date Sep 3, 2024
- Samsung Electronics Co., Ltd.
- Kyooho Jung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition using hydrophobic precursors
- Patent number 12,080,548
- Issue date Sep 3, 2024
- ASM IP Holding B.V.
- Elina Färm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for forming the same
- Patent number 12,062,719
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuan-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming a laminate film by cyclical plasma-enhanced dep...
- Patent number 12,040,177
- Issue date Jul 16, 2024
- ASM IP Holding B.V.
- Yoshio Susa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device of dielectric layer
- Patent number 12,034,075
- Issue date Jul 9, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,020,943
- Issue date Jun 25, 2024
- Tokyo Electron Limited
- Atsushi Yamashita
- B08 - CLEANING
Information Patent Grant
Semiconductor Fin cutting process and structures formed thereby
- Patent number 11,990,375
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cuprous oxide devices and formation methods
- Patent number 11,984,315
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Marcus Johannes Henricus van Dal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vaporizer, substrate processing apparatus and method for manufactur...
- Patent number 11,970,771
- Issue date Apr 30, 2024
- Kokusai Electric Corporation
- Atsushi Morikawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursor solution for thin film deposition and thin film forming m...
- Patent number 11,972,941
- Issue date Apr 30, 2024
- SK TRICHEM
- Chang Sung Hong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Negative capacitance transistor with external ferroelectric structure
- Patent number 11,961,897
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chi-Hsing Hsu
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ISOTROPIC THERMAL ATOMIC LAYER ETCH OF ZIRCONIUM AND HAFNIUM OXIDES
- Publication number 20250226213
- Publication date Jul 10, 2025
- Merck Patent GmbH
- Martin E. McBRIARTY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM MODIFICATION COMPOSITION, METHOD OF FORMING THIN FILM USI...
- Publication number 20250218767
- Publication date Jul 3, 2025
- Soulbrain Co., LTD
- Seung Hyun LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR WET ATOMIC LAYER ETCHING OF TRANSITION METAL OXIDE DIEL...
- Publication number 20250201572
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Kate Abel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING THIN FILM
- Publication number 20250188607
- Publication date Jun 12, 2025
- Samsung Electronics Co., Ltd.
- Jungmin Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metal-Insulator-Metal Structure
- Publication number 20250192026
- Publication date Jun 12, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yuan-Yang Hsiao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL OXIDE COMPOSITE AS ETCH STOP LAYER
- Publication number 20250132197
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kai-Feng Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SOURCE/DRAIN FEATURE SEPARATION STRUCTURE
- Publication number 20250133716
- Publication date Apr 24, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Chun Keng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM DEPOSITING COMPOSITION INCLUDING GROUP 4 METAL ELEMENT-CONTAIN...
- Publication number 20250109496
- Publication date Apr 3, 2025
- UP CHEMICAL CO., LTD.
- Byung Kwan KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL-INSULATOR-METAL (MIM) CAPACITORS WITH IMPROVED RELIABILITY
- Publication number 20250089277
- Publication date Mar 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Yueh Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE
- Publication number 20250079176
- Publication date Mar 6, 2025
- Sumitomo Electric Industries, Ltd.
- Akihiro HAYASAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20250079158
- Publication date Mar 6, 2025
- Sumitomo Electric Industries, Ltd.
- Takahide HIRASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND...
- Publication number 20250079157
- Publication date Mar 6, 2025
- Entegris, Inc.
- Rong Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM MANUFACTURING METHOD AND THIN FILM
- Publication number 20250069886
- Publication date Feb 27, 2025
- Jusung Engineering Co., Ltd.
- Duck Ho KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION
- Publication number 20250069885
- Publication date Feb 27, 2025
- ASM IP HOLDING B.V.
- Eva E. Tois
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS
- Publication number 20250054748
- Publication date Feb 13, 2025
- Applied Materials, Inc.
- Guangyan Zhong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL-INSULATOR-METAL DEVICE WITH HIGH-K LAYER CAPPING STRUCTURE
- Publication number 20250056820
- Publication date Feb 13, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Liang-Shiuan Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF OXIDE THIN FILMS
- Publication number 20250037995
- Publication date Jan 30, 2025
- ASM IP HOLDING B.V.
- Suvi P. Haukka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING METHOD AND FILM-FORMING APPARATUS
- Publication number 20250019815
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Shimon OTSUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS
- Publication number 20250014904
- Publication date Jan 9, 2025
- LAM RESEARCH CORPORATION
- Kashish Sharma
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SILICON CARBIDE DEVICE
- Publication number 20250006814
- Publication date Jan 2, 2025
- INFINEON TECHNOLOGIES AG
- Wolfgang LEHNERT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...
- Publication number 20250006490
- Publication date Jan 2, 2025
- Kokusai Electric Corporation
- Yoshimasa NAGATOMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CARBON-FREE LAMINATED HAFNIUM OXIDE/ZIRCONIUM OXIDE FILMS FOR FERRO...
- Publication number 20240395895
- Publication date Nov 28, 2024
- Entegris, Inc.
- Jun-Fei Zheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME
- Publication number 20240373620
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- KYOOHO JUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
- Publication number 20240355926
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuan-Ting Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING COMPONENTS FOR SEMICONDUCTOR PROCESSING WITH FLUORINE-CONTA...
- Publication number 20240347336
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Nitin Deepak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED DIPOLE REGION FOR TRANSISTOR
- Publication number 20240332008
- Publication date Oct 3, 2024
- Applied Materials, Inc.
- Geetika Bajaj
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20240332419
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240304439
- Publication date Sep 12, 2024
- TOKYO ELECTRON LIMITED
- Koji AKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CUPROUS OXIDE DEVICES AND FORMATION METHODS
- Publication number 20240297037
- Publication date Sep 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Marcus Johannes Henricus van Dal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Layered Substrate with Ruthenium Layer and Method for Producing
- Publication number 20240282709
- Publication date Aug 22, 2024
- Zhaoxuan WANG
- H01 - BASIC ELECTRIC ELEMENTS

the material containing zirconium

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor device and manufacturing method thereof

Cleaning method, method of manufacturing semiconductor device, and...

Method of manufacturing metal-insulator-metal (MIM) capacitors with...

Manufacturing method for semiconductor device

Semiconductor device with fin structures

Method of manufacturing a semiconductor device and a semiconductor...

High resistivity silicon-on-insulator substrate comprising an isola...

Ferroelectric thin-film structure and electronic device including t...

Integrated circuit device

Metal-insulator-metal structure

Source/drain feature separation structure

Metal oxide composite as etch stop layer

Selective passivation and selective deposition

Deposition of oxide thin films

Selective processing with etch residue-based inhibitors

Semiconductor device

Methods for filling a gap feature on a substrate surface and relate...

Electronic device including ferroelectric layer

Selective in-situ cleaning of high-k films from processing chamber...

Semiconductor memory devices and methods of fabricating the same

Selective deposition using hydrophobic precursors

Semiconductor device and method for forming the same

Methods for forming a laminate film by cyclical plasma-enhanced dep...

Device of dielectric layer

Substrate processing method and substrate processing apparatus

Semiconductor Fin cutting process and structures formed thereby

Cuprous oxide devices and formation methods

Vaporizer, substrate processing apparatus and method for manufactur...

Precursor solution for thin film deposition and thin film forming m...

Negative capacitance transistor with external ferroelectric structure

Patents Applicationslast 30 patents

ISOTROPIC THERMAL ATOMIC LAYER ETCH OF ZIRCONIUM AND HAFNIUM OXIDES

THIN FILM MODIFICATION COMPOSITION, METHOD OF FORMING THIN FILM USI...

METHODS FOR WET ATOMIC LAYER ETCHING OF TRANSITION METAL OXIDE DIEL...

METHOD OF MANUFACTURING THIN FILM

Metal-Insulator-Metal Structure

METAL OXIDE COMPOSITE AS ETCH STOP LAYER

SOURCE/DRAIN FEATURE SEPARATION STRUCTURE

FILM DEPOSITING COMPOSITION INCLUDING GROUP 4 METAL ELEMENT-CONTAIN...

METAL-INSULATOR-METAL (MIM) CAPACITORS WITH IMPROVED RELIABILITY

SEMICONDUCTOR DEVICE AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

METHODS OF IMPROVING METAL OXIDE DEPOSITION WITH NITROGEN OXIDE AND...

THIN FILM MANUFACTURING METHOD AND THIN FILM

SELECTIVE PASSIVATION AND SELECTIVE DEPOSITION

ADHESION IMPROVEMENTS IN METAL-CONTAINING HARDMASKS

METAL-INSULATOR-METAL DEVICE WITH HIGH-K LAYER CAPPING STRUCTURE

DEPOSITION OF OXIDE THIN FILMS

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

SELECTIVE PROCESSING WITH ETCH RESIDUE-BASED INHIBITORS

SILICON CARBIDE DEVICE

SUBSTRATE PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR...

CARBON-FREE LAMINATED HAFNIUM OXIDE/ZIRCONIUM OXIDE FILMS FOR FERRO...

SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME

SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

COATING COMPONENTS FOR SEMICONDUCTOR PROCESSING WITH FLUORINE-CONTA...

INTEGRATED DIPOLE REGION FOR TRANSISTOR

DEVICE OF DIELECTRIC LAYER

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

CUPROUS OXIDE DEVICES AND FORMATION METHODS

Layered Substrate with Ruthenium Layer and Method for Producing