the material containing zirconium

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CPC
H01L21/02159

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02159the material containing zirconium

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor Fin cutting process and structures formed thereby
- Patent number 11,990,375
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure and its formation method
- Patent number 11,978,624
- Issue date May 7, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Jiang Chu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced deposition processes for controlled formation of me...
- Patent number 11,501,965
- Issue date Nov 15, 2022
- ASM IP Holding B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fin cutting process and structures formed thereby
- Patent number 11,380,593
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor Fin cutting process and structures formed thereby
- Patent number 10,777,466
- Issue date Sep 15, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interface engineering for high capacitance capacitor for liquid cry...
- Patent number 10,381,454
- Issue date Aug 13, 2019
- PATTERSON + SHERIDAN LLP
- Xuena Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming dielectric films, new precursors and their use in...
- Patent number 10,217,629
- Issue date Feb 26, 2019
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vertical metal insulator metal capacitor having a high-k dielectric...
- Patent number 9,911,732
- Issue date Mar 6, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chewn-Pu Jou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming dielectric films, new precursors and their use i...
- Patent number 9,911,590
- Issue date Mar 6, 2018
- L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Geo...
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Vapor deposition of metal oxides, silicates and phosphates, and sil...
- Patent number 9,905,414
- Issue date Feb 27, 2018
- President and Fellows of Harvard College
- Roy Gerald Gordon
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 9,893,142
- Issue date Feb 13, 2018
- Samsung Electronics Co., Ltd.
- Se-Hyoung Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical metal insulator metal capacitor having a high-K dielectric...
- Patent number 9,793,264
- Issue date Oct 17, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chewn-Pu Jou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of growing oxide thin films
- Patent number 9,514,956
- Issue date Dec 6, 2016
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming material over a substrate and methods of forming...
- Patent number 9,499,907
- Issue date Nov 22, 2016
- Micron Technology, Inc.
- Zhe Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for forming zirconium and/or hafnium-containing...
- Patent number 9,184,061
- Issue date Nov 10, 2015
- Micron Technology, Inc.
- Brian A. Vaartstra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nitridation of atomic layer deposited high-k dielectrics using tris...
- Patent number 9,064,694
- Issue date Jun 23, 2015
- Tokyo Electron Limited
- Steven P Consiglio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 9,058,984
- Issue date Jun 16, 2015
- SK Hynix Inc.
- Kee-Jeung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitor dielectric comprising silicon-doped zirconium oxide and c...
- Patent number 8,760,845
- Issue date Jun 24, 2014
- Nanya Technology Corp.
- Noel Rocklein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 8,716,842
- Issue date May 6, 2014
- SK Hynix Inc.
- Kee-Jeung Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for manufacturing dielectric films
- Patent number 8,524,617
- Issue date Sep 3, 2013
- Canon Anelva Corporation
- Takashi Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming material over a substrate and methods of forming...
- Patent number 8,501,268
- Issue date Aug 6, 2013
- Micron Technology, Inc.
- Zhe Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing a metal-containing dielectric film
- Patent number 8,470,402
- Issue date Jun 25, 2013
- L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GE...
- Christian Dussarrat
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Crosslinked hybrid gate dielectric materials and electronic devices...
- Patent number 8,471,253
- Issue date Jun 25, 2013
- Northwestern University
- Tobin J. Marks
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Film formation method and film formation apparatus
- Patent number 8,389,421
- Issue date Mar 5, 2013
- Tokyo Electron Limited
- Katsushige Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vapor deposition of metal oxides, silicates and phosphates, and sil...
- Patent number 8,334,016
- Issue date Dec 18, 2012
- President and Fellows of Harvard College
- Roy G. Gordon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of forming a metal silicate layer and methods of fabricatin...
- Patent number 8,258,064
- Issue date Sep 4, 2012
- Samsung Electronics Co., Ltd.
- Jong-cheol Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 8,115,261
- Issue date Feb 14, 2012
- Kabushiki Kaisha Toshiba
- Tsunehiro Ino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of growing oxide thin films
- Patent number 7,824,492
- Issue date Nov 2, 2010
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Atomic-layer-chemical-vapor-deposition of films that contain silico...
- Patent number 7,771,533
- Issue date Aug 10, 2010
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of growing oxide thin films
- Patent number 7,771,534
- Issue date Aug 10, 2010
- ASM International N.V.
- Eva Tois
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Semiconductor Fin Cutting Process and Structures Formed Thereby
- Publication number 20240282638
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Fin Cutting Process and Structures Formed Thereby
- Publication number 20220328360
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND ITS FORMATION METHOD
- Publication number 20220084818
- Publication date Mar 17, 2022
- CHANGXIN MEMORY TECHNOLOGIES, INC
- Jiang CHU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Fin Cutting Process and Structures Formed Thereby
- Publication number 20200411386
- Publication date Dec 31, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Wen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE CUTTING PROCESS AND STRUCTURES FORMED THEREBY
- Publication number 20190164844
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Wen HUANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...
- Publication number 20180350587
- Publication date Dec 6, 2018
- ASM IP HOLDING B.V.
- Lingyun Jia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE IN...
- Publication number 20180151354
- Publication date May 31, 2018
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Christian DUSSARRAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Vertical Metal Insulator Metal Capacitor Having a High-K Dielectric...
- Publication number 20170373056
- Publication date Dec 28, 2017
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chewn-Pu JOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-K DIELECTRIC MATERIALS UTILIZED IN DISPLAY DEVICES
- Publication number 20170229554
- Publication date Aug 10, 2017
- Applied Materials, Inc.
- Soo Young CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE I...
- Publication number 20170125242
- Publication date May 4, 2017
- L'air Liquide, Societe Anonyme Pour L'Etude et L'Exploitation Des Procedes Ge...
- Christian DUSSARRAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SIL...
- Publication number 20160268121
- Publication date Sep 15, 2016
- President and Fellows of Harvard College
- Roy Gerald GORDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SIL...
- Publication number 20160111276
- Publication date Apr 21, 2016
- President and Fellows of Harvard College
- Roy Gerald GORDON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Conformal Treatment of Dielectric Films Us...
- Publication number 20140302686
- Publication date Oct 9, 2014
- Heng Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FORMING A LAYER
- Publication number 20140287592
- Publication date Sep 25, 2014
- Sukjin CHUNG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20140242772
- Publication date Aug 28, 2014
- SK HYNIX INC.
- Kee-Jeung LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20140182515
- Publication date Jul 3, 2014
- Hitachi Kokusai Electric Inc.
- Hirohisa YAMAZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NITRIDATION OF ATOMIC LAYER DEPOSITED HIGH-K DIELECTRICS USING TRIS...
- Publication number 20140017907
- Publication date Jan 16, 2014
- Steven P. Consiglio
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods Of Forming Material Over A Substrate And Methods Of Forming...
- Publication number 20130280426
- Publication date Oct 24, 2013
- Zhe Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITOR DIELECTRIC COMPRISING SILICON-DOPED ZIRCONIUM OXIDE AND C...
- Publication number 20130208403
- Publication date Aug 15, 2013
- Noel Rocklein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SIL...
- Publication number 20130122328
- Publication date May 16, 2013
- President and Fellows of Harvard College
- Roy Gerald GORDON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20120146196
- Publication date Jun 14, 2012
- Kee-Jeung LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20120108078
- Publication date May 3, 2012
- Kabushiki Kalsha Toshiba
- Tsunehiro INO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...
- Publication number 20120071002
- Publication date Mar 22, 2012
- Hitachi Kokusai Electric Inc.
- Masanori NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SIL...
- Publication number 20120028478
- Publication date Feb 2, 2012
- President and Fellows of Harvard College
- Roy G. Gordon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR MANUFACTURING DIELECTRIC FILMS
- Publication number 20120021612
- Publication date Jan 26, 2012
- Canon ANELVA Corporation
- Takashi Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMATION METHOD AND FILM FORMATION APPARATUS
- Publication number 20110300719
- Publication date Dec 8, 2011
- TOKYO ELECTRON LIMITED
- Katsushige HARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Crosslinked Hybrid Gate Dielectric Materials and Electronic Devices...
- Publication number 20110284849
- Publication date Nov 24, 2011
- Tobin J. Marks
- B82 - NANO-TECHNOLOGY
Information Patent Application
Methods Of Forming Material Over A Substrate And Methods Of Forming...
- Publication number 20110223320
- Publication date Sep 15, 2011
- Zhe Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE IN...
- Publication number 20110207337
- Publication date Aug 25, 2011
- L'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Ge...
- Christian DUSSARRAT
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF GROWING OXIDE THIN FILMS
- Publication number 20110104906
- Publication date May 5, 2011
- ASM INTERNATIONAL N.V.
- Eva Tois
- C30 - CRYSTAL GROWTH

the material containing zirconium

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor Fin cutting process and structures formed thereby

Semiconductor structure and its formation method

Plasma enhanced deposition processes for controlled formation of me...

Semiconductor fin cutting process and structures formed thereby

Semiconductor Fin cutting process and structures formed thereby

Interface engineering for high capacitance capacitor for liquid cry...

Method of forming dielectric films, new precursors and their use in...

Vertical metal insulator metal capacitor having a high-k dielectric...

Methods of forming dielectric films, new precursors and their use i...

Vapor deposition of metal oxides, silicates and phosphates, and sil...

Method for manufacturing semiconductor device

Vertical metal insulator metal capacitor having a high-K dielectric...

Method of growing oxide thin films

Methods of forming material over a substrate and methods of forming...

Systems and methods for forming zirconium and/or hafnium-containing...

Nitridation of atomic layer deposited high-k dielectrics using tris...

Method for fabricating semiconductor device

Capacitor dielectric comprising silicon-doped zirconium oxide and c...

Method for fabricating semiconductor device

Methods for manufacturing dielectric films

Methods of forming material over a substrate and methods of forming...

Method of depositing a metal-containing dielectric film

Crosslinked hybrid gate dielectric materials and electronic devices...

Film formation method and film formation apparatus

Vapor deposition of metal oxides, silicates and phosphates, and sil...

Methods of forming a metal silicate layer and methods of fabricatin...

Semiconductor device and method for manufacturing the same

Method of growing oxide thin films

Atomic-layer-chemical-vapor-deposition of films that contain silico...

Method of growing oxide thin films

Patents Applicationslast 30 patents

Semiconductor Fin Cutting Process and Structures Formed Thereby

Semiconductor Fin Cutting Process and Structures Formed Thereby

SEMICONDUCTOR STRUCTURE AND ITS FORMATION METHOD

Semiconductor Fin Cutting Process and Structures Formed Thereby

SEMICONDUCTOR STRUCTURE CUTTING PROCESS AND STRUCTURES FORMED THEREBY

PLASMA ENHANCED DEPOSITION PROCESSES FOR CONTROLLED FORMATION OF ME...

METHOD OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE IN...

Vertical Metal Insulator Metal Capacitor Having a High-K Dielectric...

HIGH-K DIELECTRIC MATERIALS UTILIZED IN DISPLAY DEVICES

METHODS OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE I...

VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SIL...

VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SIL...

Apparatus and Method for Conformal Treatment of Dielectric Films Us...

METHODS OF FORMING A LAYER

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCT...

NITRIDATION OF ATOMIC LAYER DEPOSITED HIGH-K DIELECTRICS USING TRIS...

Methods Of Forming Material Over A Substrate And Methods Of Forming...

CAPACITOR DIELECTRIC COMPRISING SILICON-DOPED ZIRCONIUM OXIDE AND C...

VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SIL...

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSI...

VAPOR DEPOSITION OF METAL OXIDES, SILICATES AND PHOSPHATES, AND SIL...

METHODS FOR MANUFACTURING DIELECTRIC FILMS

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

Crosslinked Hybrid Gate Dielectric Materials and Electronic Devices...

Methods Of Forming Material Over A Substrate And Methods Of Forming...

METHOD OF FORMING DIELECTRIC FILMS, NEW PRECURSORS AND THEIR USE IN...

METHOD OF GROWING OXIDE THIN FILMS