the precursor containing a compound comprising Si

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H01L21/02208

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02208the precursor containing a compound comprising Si

Industries

Patents Grantslast 30 patents

Information Patent Grant
Gate structures in transistor devices and methods of forming same
- Patent number 11,967,504
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,967,500
- Issue date Apr 23, 2024
- Kokusai Electric Corporation
- Arito Ogawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming silicon nitride films using microwave plasma
- Patent number 11,955,331
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Hanhong Chen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,955,333
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Jethro Tannos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device of dielectric layer
- Patent number 11,935,752
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transistor isolation structures
- Patent number 11,908,921
- Issue date Feb 20, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selective deposition of silicon nitride layer and struct...
- Patent number 11,901,175
- Issue date Feb 13, 2024
- ASM IP Holding B.V.
- Eric James Shero
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating a semiconductor device
- Patent number 11,881,508
- Issue date Jan 23, 2024
- Samsung Electronics Co., Ltd.
- Kyungin Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device structure with gate spacer
- Patent number 11,854,796
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Guan-Yao Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layer forming method and apparatus
- Patent number 11,830,730
- Issue date Nov 28, 2023
- ASM IP Holding B.V.
- Arjen Klaver
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming low-stress silicon nitride layer through hydrogen treatment
- Patent number 11,830,727
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Che Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thin film forming method
- Patent number 11,823,866
- Issue date Nov 21, 2023
- ASM IP Holding B.V.
- SungKyu Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
- Patent number 11,817,314
- Issue date Nov 14, 2023
- Kokusai Electric Corporation
- Katsuyoshi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of SiN thin films
- Patent number 11,784,043
- Issue date Oct 10, 2023
- ASM IP Holding, B.V.
- Toshiya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma enhanced deposition processes for controlled formation of ox...
- Patent number 11,776,807
- Issue date Oct 3, 2023
- ASM IP Holding, B.V.
- Lingyun Jia
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Forming high carbon content flowable dielectric film with low proce...
- Patent number 11,756,786
- Issue date Sep 12, 2023
- International Business Machines Corporation
- Benjamin D. Briggs
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition for depositing silicon-containing thin film containing...
- Patent number 11,749,522
- Issue date Sep 5, 2023
- DNF Co., Ltd.
- Sung Gi Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and methods using same for carbon doped silicon contain...
- Patent number 11,742,200
- Issue date Aug 29, 2023
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing III-alloys on substrates and compositions th...
- Patent number 11,721,550
- Issue date Aug 8, 2023
- United States Department of Energy
- Emily Lowell Warren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-k feature formation processes and structures formed thereby
- Patent number 11,705,327
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for fabricating semiconductor device
- Patent number 11,699,661
- Issue date Jul 11, 2023
- NANYA TECHNOLOGY CORPORATION
- Tse-Yao Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and manufacture of low-dimensional materials supporting bot...
- Patent number 11,651,957
- Issue date May 16, 2023
- SemiNuclear, Inc.
- Patrick Curran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compositions and methods for making silicon containing films
- Patent number 11,626,279
- Issue date Apr 11, 2023
- VERSUM MATERIALS US, LLC
- Anupama Mallikarjunan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Systems and methods for forming UV-cured low-κ dielectric films
- Patent number 11,621,162
- Issue date Apr 4, 2023
- Applied Materials, Inc.
- Bo Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device
- Patent number 11,574,871
- Issue date Feb 7, 2023
- Samsung Electronics Co., Ltd.
- Jun-Kwan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Formation of SiOC thin films
- Patent number 11,562,900
- Issue date Jan 24, 2023
- ASM IP Holding B.V.
- Toshiya Suzuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure
- Patent number 11,562,930
- Issue date Jan 24, 2023
- Semiconductor Manufacturing International (Shanghai) Corporation
- Fei Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and method for making picocrystalline artificial borane...
- Patent number 11,521,853
- Issue date Dec 6, 2022
- SemiNuclear, Inc.
- Patrick Curran
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
In-situ film annealing with spatial atomic layer deposition
- Patent number 11,515,144
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Keiichi Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of flowable silicon-containing films
- Patent number 11,515,149
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR CLEANING USING PLASMA-FREE PRECURSORS
- Publication number 20240145230
- Publication date May 2, 2024
- Applied Materials, Inc.
- Abhishek Mandal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
- Publication number 20240087880
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Shruba Gangopadhyay
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
- Publication number 20240087881
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Michael Haverty
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240038530
- Publication date Feb 1, 2024
- Kokusai Electric Corporation
- Katsuyoshi HARADA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DEPOSITING ATOMIC LAYER AND METHOD OF MANUFACTURING SEMIC...
- Publication number 20230420248
- Publication date Dec 28, 2023
- Samsung Electronics Co., Ltd.
- Hyunjun AHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment
- Publication number 20230386826
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Che Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...
- Publication number 20230377874
- Publication date Nov 23, 2023
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BACK-CONTACT SOLAR CELL, AND PRODUCTION THEREOF
- Publication number 20230335663
- Publication date Oct 19, 2023
- EnPV GmbH
- Erik HOFFMANN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low-k Feature Formation Processes and Structures Formed Thereby
- Publication number 20230326746
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING A LAYER ON ONLY CERTAIN SURFACES OF A STRUCTURE
- Publication number 20230326745
- Publication date Oct 12, 2023
- COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES AL TERNATIVES
- Marceline BONVALOT
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRICAL IMPROVEMENTS FOR 3D NAND
- Publication number 20230309300
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Dimitrios Pavlopoulos
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ACTIVATING AN EXPOSED LAYER
- Publication number 20230207311
- Publication date Jun 29, 2023
- Commissariat A L'Energie Atomique et Aux Energies Alternatives
- Pierre BRIANCEAU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF SILICON NITRIDE WITH ENHANCED SELECTIVITY
- Publication number 20230187202
- Publication date Jun 15, 2023
- Entegris, Inc.
- Han Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FILLING RECESSES ON SUBSTRATE SURFACES AND FORMING VOIDS...
- Publication number 20230170209
- Publication date Jun 1, 2023
- ASM IP HOLDING B.V.
- Jungtak Seo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FORMATION OF SiOC THIN FILMS
- Publication number 20230132743
- Publication date May 4, 2023
- ASM IP HOLDING B.V.
- Toshiya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TOPOLOGY-SELECTIVE NITRIDE DEPOSITION METHOD AND STRUCTURE FORMED U...
- Publication number 20230084552
- Publication date Mar 16, 2023
- ASM IP HOLDING B.V.
- Timothee Blanquart
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEAM-FREE GAPFILL DEPOSITION
- Publication number 20230051200
- Publication date Feb 16, 2023
- Applied Materials, Inc.
- Qinghua Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS
- Publication number 20230031720
- Publication date Feb 2, 2023
- ASM INTERNATIONAL N.V.
- Noboru Takamure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NOVEL OXIDANTS AND STRAINED-RING PRECURSORS
- Publication number 20220406595
- Publication date Dec 22, 2022
- Applied Materials, Inc.
- Chandan Kr Barik
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GATE STRUCTURES IN TRANSISTOR DEVICES AND METHODS OF FORMING SAME
- Publication number 20220406598
- Publication date Dec 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yi Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stress Modulation for Dielectric Layers
- Publication number 20220384649
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chung-Ting Ko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Flowable CVD Film Defect Reduction
- Publication number 20220375747
- Publication date Nov 24, 2022
- Applied Materials, Inc.
- Wenhui Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment
- Publication number 20220336202
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing CO.,LTD.
- Wei-Che Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE WITH GATE SPACER
- Publication number 20220328306
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Guan-Yao TU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...
- Publication number 20220301853
- Publication date Sep 22, 2022
- LAM RESEARCH CORPORATION
- Wenchi LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20220301867
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Jethro TANNOS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING EFFLUENT BUILD-UP IN A PUMPING EXH...
- Publication number 20220259725
- Publication date Aug 18, 2022
- LAM RESEARCH CORPORATION
- Antonio Xavier
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Low-k Feature Formation Processes and Structures Formed Thereby
- Publication number 20220230871
- Publication date Jul 21, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR MANUFACTURING A THIN FILM AND A METHOD THEREFOR
- Publication number 20220181143
- Publication date Jun 9, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsai-Fu HSIAO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING...
- Publication number 20220139704
- Publication date May 5, 2022
- DNF CO., LTD.
- Sung Gi KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

the precursor containing a compound comprising Si

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Gate structures in transistor devices and methods of forming same

Method of manufacturing semiconductor device, substrate processing...

Method of forming silicon nitride films using microwave plasma

Methods and apparatus for processing a substrate

Device of dielectric layer

Transistor isolation structures

Method for selective deposition of silicon nitride layer and struct...

Method of fabricating a semiconductor device

Semiconductor device structure with gate spacer

Layer forming method and apparatus

Forming low-stress silicon nitride layer through hydrogen treatment

Thin film forming method

Method of processing substrate, method of manufacturing semiconduct...

Formation of SiN thin films

Plasma enhanced deposition processes for controlled formation of ox...

Forming high carbon content flowable dielectric film with low proce...

Composition for depositing silicon-containing thin film containing...

Composition and methods using same for carbon doped silicon contain...

Methods for depositing III-alloys on substrates and compositions th...

Low-k feature formation processes and structures formed thereby

Method for fabricating semiconductor device

Process and manufacture of low-dimensional materials supporting bot...

Compositions and methods for making silicon containing films

Systems and methods for forming UV-cured low-κ dielectric films

Semiconductor device

Formation of SiOC thin films

Semiconductor structure

Composition and method for making picocrystalline artificial borane...

In-situ film annealing with spatial atomic layer deposition

Deposition of flowable silicon-containing films

Patents Applicationslast 30 patents

SEMICONDUCTOR CLEANING USING PLASMA-FREE PRECURSORS

SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS

SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

METHOD OF DEPOSITING ATOMIC LAYER AND METHOD OF MANUFACTURING SEMIC...

Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment

COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...

BACK-CONTACT SOLAR CELL, AND PRODUCTION THEREOF

Low-k Feature Formation Processes and Structures Formed Thereby

METHOD FOR PRODUCING A LAYER ON ONLY CERTAIN SURFACES OF A STRUCTURE

ELECTRICAL IMPROVEMENTS FOR 3D NAND

METHOD FOR ACTIVATING AN EXPOSED LAYER

DEPOSITION OF SILICON NITRIDE WITH ENHANCED SELECTIVITY

METHODS OF FILLING RECESSES ON SUBSTRATE SURFACES AND FORMING VOIDS...

FORMATION OF SiOC THIN FILMS

TOPOLOGY-SELECTIVE NITRIDE DEPOSITION METHOD AND STRUCTURE FORMED U...

SEAM-FREE GAPFILL DEPOSITION

METHODS FOR FORMING DOPED SILICON OXIDE THIN FILMS

NOVEL OXIDANTS AND STRAINED-RING PRECURSORS

GATE STRUCTURES IN TRANSISTOR DEVICES AND METHODS OF FORMING SAME

Stress Modulation for Dielectric Layers

Flowable CVD Film Defect Reduction

Forming Low-Stress Silicon Nitride Layer Through Hydrogen Treatment

SEMICONDUCTOR DEVICE STRUCTURE WITH GATE SPACER

METHOD FOR ETCHING FEATURES USING A TARGETED DEPOSITION FOR SELECTI...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

SYSTEMS AND METHODS FOR REDUCING EFFLUENT BUILD-UP IN A PUMPING EXH...

Low-k Feature Formation Processes and Structures Formed Thereby

APPARATUS FOR MANUFACTURING A THIN FILM AND A METHOD THEREFOR

COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING...