the radio frequency energy being inductively coupled to the plasma

Industry

CPC
H01J37/321

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/321the radio frequency energy being inductively coupled to the plasma

Industries

Patents Grantslast 30 patents

Information Patent Grant
Substrate pedestal for improved substrate processing
- Patent number 11,984,305
- Issue date May 14, 2024
- Applied Materials, Inc.
- Viren Kalsekar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma chamber and chamber component cleaning methods
- Patent number 11,984,306
- Issue date May 14, 2024
- Applied Materials, Inc.
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma control device and plasma processing system
- Patent number 11,984,297
- Issue date May 14, 2024
- Samsung Electronics Co., Ltd.
- Sejin Oh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance transformation in radio-frequency-assisted plasma generation
- Patent number 11,984,298
- Issue date May 14, 2024
- Lam Research Corporation
- Eller Y. Juco
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Atomic layer etch and deposition processing systems including a len...
- Patent number 11,984,330
- Issue date May 14, 2024
- Lam Research Corporation
- Dong Woo Paeng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 11,978,612
- Issue date May 7, 2024
- HITACHI HIGH-TECH CORPORATION
- Isao Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming metal nitride films
- Patent number 11,978,625
- Issue date May 7, 2024
- Applied Materials, Inc.
- Joseph AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus with switches to produce a waveform
- Patent number 11,978,611
- Issue date May 7, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Transition control in a bias supply
- Patent number 11,978,613
- Issue date May 7, 2024
- Advanced Energy Industries, Inc.
- Hien Minh Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,972,925
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Bong seong Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for plasma processing arc suppression
- Patent number 11,972,928
- Issue date Apr 30, 2024
- COMET Technologies USA, Inc.
- Anthony Oliveti
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic control-setpoint modification
- Patent number 11,972,926
- Issue date Apr 30, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for depositing dielectric material
- Patent number 11,972,943
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Bhargav S. Citla
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing a gap-fill layer by plasma-assisted deposition
- Patent number 11,972,944
- Issue date Apr 30, 2024
- ASM IP Holding B.V.
- Timothee Julien Vincent Blanquart
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Frequency tuning for modulated plasma systems
- Patent number 11,972,927
- Issue date Apr 30, 2024
- Advanced Energy Industries, Inc.
- Gideon van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition method and deposition apparatus
- Patent number 11,972,932
- Issue date Apr 30, 2024
- Ulvac, Inc.
- Toshihiko Nakahata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organic polymer film and manufacturing method thereof
- Patent number 11,969,752
- Issue date Apr 30, 2024
- Feng Chia University
- Ping-Yen Hsieh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Plasma excitation with ion energy control
- Patent number 11,967,483
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Yang Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for parts cleaning
- Patent number 11,967,491
- Issue date Apr 23, 2024
- Semes Co., Ltd.
- Soon-Cheon Cho
- B08 - CLEANING
Information Patent Grant
Substrate processing system including dual ion filter for downstrea...
- Patent number 11,967,486
- Issue date Apr 23, 2024
- Lam Research Corporation
- Andrew Stratton Bravo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Voltage waveform generator for plasma processing apparatuses
- Patent number 11,968,771
- Issue date Apr 23, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Antonius Wilhelmus Hendricus Johannes Driessen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion current droop compensation
- Patent number 11,967,484
- Issue date Apr 23, 2024
- Eagle Harbor Technologies, Inc.
- Christopher Bowman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shunt door for magnets in plasma process chamber
- Patent number 11,959,174
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Kallol Bera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Radio frequency match network and generator
- Patent number 11,961,711
- Issue date Apr 16, 2024
- COMET Technologies USA, Inc.
- Alexandre De Chambrier
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support and substrate processing apparatus
- Patent number 11,961,755
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Shinya Ishikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,961,710
- Issue date Apr 16, 2024
- Canon Anelva Corporation
- Tadashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Combining the determination of single and mutual, preset preserving...
- Patent number 11,961,712
- Issue date Apr 16, 2024
- Advanced Energy Industries, Inc.
- Frederick Winter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Device for detecting plasma of ultra fast with multi channel
- Patent number 11,961,720
- Issue date Apr 16, 2024
- T.O.S Co., Ltd.
- Yong Kyu Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 11,955,315
- Issue date Apr 9, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...
- Publication number 20240162004
- Publication date May 16, 2024
- EN2CORE technology, Inc
- Sae Hoon Uhm
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20240162008
- Publication date May 16, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PERFORMING RADIO FREQUENCY MATCHING CONTROL USING A MODEL-BASED DIG...
- Publication number 20240162009
- Publication date May 16, 2024
- Applied Materials, Inc.
- Tao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...
- Publication number 20240162005
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Juline Shoeb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE DIELECTRIC CONSTANT CERAMIC WINDOW
- Publication number 20240162010
- Publication date May 16, 2024
- LAM RESEARCH CORPORATION
- Chin-Yi Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...
- Publication number 20240158917
- Publication date May 16, 2024
- Kokusai Electric Corporation
- Teruo YOSHINO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS SYSTEM FOR MULTI-STATION
- Publication number 20240162006
- Publication date May 16, 2024
- EN2CORE technology, Inc
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING
- Publication number 20240162007
- Publication date May 16, 2024
- Applied Materials, Inc.
- Deyang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS
- Publication number 20240154594
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Yohei YAMAZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TU...
- Publication number 20240153741
- Publication date May 9, 2024
- Applied Materials, Inc.
- Linying CUI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH INTEGRATED OPTICAL SENSORS
- Publication number 20240153795
- Publication date May 9, 2024
- Applied Materials, Inc.
- Adam Fischbach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240153742
- Publication date May 9, 2024
- TOKYO ELECTRON LIMITED
- Gen TAMAMUSHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INPUT IMPEDANCE NETWORKS WITH POWER RECOVERY
- Publication number 20240154541
- Publication date May 9, 2024
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLEETWIDE IMPEDANCE TUNING PERFORMANCE OPTIMIZATION
- Publication number 20240153743
- Publication date May 9, 2024
- Applied Materials, Inc.
- David Coumou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PULSED VOLTAGE PLASMA PROCESSING APPARATUS AND METHOD
- Publication number 20240145215
- Publication date May 2, 2024
- Applied Materials, Inc.
- Shreeram Jyoti DASH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power Supply and Method of Supplying Power To Load
- Publication number 20240146211
- Publication date May 2, 2024
- EN2CORE technology, Inc
- Yeong-Hoon SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20240145218
- Publication date May 2, 2024
- TOKYO ELECTRON LIMITED
- Koichi Nagami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REPEATABLE STEPPER MOTOR HOMING
- Publication number 20240146219
- Publication date May 2, 2024
- COMET TECHNOLOGIES USA, INC.
- ANTHONY OLIVETI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF IMPEDANCE MATCHING WITH CONTINUOUS WAVE AND PULSING SOURCES
- Publication number 20240145216
- Publication date May 2, 2024
- ASM IP HOLDING, B.V.
- Imran Ahmed BHUTTA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVE BROAD-BAND SENSORS FOR ELECTROMAGNETIC WAVES
- Publication number 20240145221
- Publication date May 2, 2024
- COMET TECHNOLOGIES USA, INC.
- STEPHEN E. SAVAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NANOSECOND PULSER ADC SYSTEM
- Publication number 20240136152
- Publication date Apr 25, 2024
- Eagle Harbor Technologies, Inc.
- Kenneth Miller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESONANT ANTENNA FOR PHYSICAL VAPOR DEPOSITION APPLICATIONS
- Publication number 20240136151
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Barton LANE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS
- Publication number 20240136154
- Publication date Apr 25, 2024
- TOKYO ELECTRON LIMITED
- Kazushi KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF
- Publication number 20240136153
- Publication date Apr 25, 2024
- LAM RESEARCH CORPORATION
- Matthew Scott Weimer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...
- Publication number 20240136160
- Publication date Apr 25, 2024
- Applied Materials, Inc.
- Zheng John YE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD
- Publication number 20240136155
- Publication date Apr 25, 2024
- Samsung Electronics Co., Ltd.
- Changho KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-CHANNEL PULSE RF POWER SUPPLY APPARATUS
- Publication number 20240128053
- Publication date Apr 18, 2024
- AS ENG CO.
- HYUK SOO LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND METHOD USING THE SAME
- Publication number 20240128054
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD
- Publication number 20240128052
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Costel Biloiu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR PROCESSING PLASMA AND METHOD OF PROCESSING PLASMA AND...
- Publication number 20240128055
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Hyunbae Kim
- H01 - BASIC ELECTRIC ELEMENTS

the radio frequency energy being inductively coupled to the plasma

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Substrate pedestal for improved substrate processing

Plasma chamber and chamber component cleaning methods

Plasma control device and plasma processing system

Impedance transformation in radio-frequency-assisted plasma generation

Atomic layer etch and deposition processing systems including a len...

Plasma processing apparatus

Methods of forming metal nitride films

Apparatus with switches to produce a waveform

Transition control in a bias supply

Cylindrical cavity with impedance shifting by irises in a power-sup...

Plasma processing apparatus and plasma processing method

Method and system for plasma processing arc suppression

Dynamic control-setpoint modification

Methods and apparatus for depositing dielectric material

Method for depositing a gap-fill layer by plasma-assisted deposition

Frequency tuning for modulated plasma systems

Deposition method and deposition apparatus

Organic polymer film and manufacturing method thereof

Plasma excitation with ion energy control

Method and apparatus for parts cleaning

Substrate processing system including dual ion filter for downstrea...

Voltage waveform generator for plasma processing apparatuses

Ion current droop compensation

Shunt door for magnets in plasma process chamber

Radio frequency match network and generator

Substrate support and substrate processing apparatus

Plasma processing apparatus

Combining the determination of single and mutual, preset preserving...

Device for detecting plasma of ultra fast with multi channel

Workpiece processing apparatus with plasma and thermal processing s...

Patents Applicationslast 30 patents

INDUCTIVE COIL STRUCTURE AND INDUCTIVELY COUPLED PLASMA GENERATION...

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

PERFORMING RADIO FREQUENCY MATCHING CONTROL USING A MODEL-BASED DIG...

SYSTEMS AND METHODS FOR ACHIEVING PEAK ION ENERGY ENHANCEMENT WITH...

ADJUSTABLE DIELECTRIC CONSTANT CERAMIC WINDOW

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, MET...

PLASMA PROCESS SYSTEM FOR MULTI-STATION

REDUCING ASPECT RATIO DEPENDENT ETCH WITH DIRECT CURRENT BIAS PULSING

FILTER CIRCUIT AND PLASMA PROCESSING APPARATUS

MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TU...

MODULAR MICROWAVE SOURCE WITH INTEGRATED OPTICAL SENSORS

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

INPUT IMPEDANCE NETWORKS WITH POWER RECOVERY

FLEETWIDE IMPEDANCE TUNING PERFORMANCE OPTIMIZATION

PULSED VOLTAGE PLASMA PROCESSING APPARATUS AND METHOD

Power Supply and Method of Supplying Power To Load

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

METHOD FOR REPEATABLE STEPPER MOTOR HOMING

RF IMPEDANCE MATCHING WITH CONTINUOUS WAVE AND PULSING SOURCES

INDUCTIVE BROAD-BAND SENSORS FOR ELECTROMAGNETIC WAVES

NANOSECOND PULSER ADC SYSTEM

RESONANT ANTENNA FOR PHYSICAL VAPOR DEPOSITION APPLICATIONS

FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS

DEPOSITING A CARBON HARDMASK BY HIGH POWER PULSED LOW FREQUENCY RF

IMPEDANCE CONTROL OF LOCAL AREAS OF A SUBSTRATE DURING PLASMA DEPOS...

PLASMA CONTROL DEVICE AND PLASMA CONTROL METHOD

MULTI-CHANNEL PULSE RF POWER SUPPLY APPARATUS

PLASMA CONTROL APPARATUS AND METHOD USING THE SAME

INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD

APPARATUS FOR PROCESSING PLASMA AND METHOD OF PROCESSING PLASMA AND...