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SUBSTRATE PROCESSING APPARATUS
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Publication number 20250029817
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Publication date Jan 23, 2025
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JUSUNG ENGINEERING CO., LTD.
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WOONG KYO OH
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SUBSTRATE PROCESSING METHOD
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Publication date Jan 2, 2025
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TOKYO ELECTRON LIMITED
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WAFER HOLDER ASSEMBLY
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Publication date Jan 2, 2025
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Taiwan Semiconductor Manufacturing company Ltd.
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CHENG-YOU TAI
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Reaction Chamber and Reaction Device
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Publication date Jan 2, 2025
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SHENZHEN NASO TECH CO., LTD.
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ROTATING SUBSTRATE SUPPORT
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Publication date Dec 19, 2024
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ASM IP HOLDING B.V.
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Yukihiro Mori
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H01 - BASIC ELECTRIC ELEMENTS
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COATING METHOD
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Publication date Dec 19, 2024
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Jiangsu Favored Nanotechnology Co., Ltd.
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Jian ZONG
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H01 - BASIC ELECTRIC ELEMENTS
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METHOD AND APPARATUS FOR PRODUCING NITROGEN COMPOUND
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Publication date Dec 12, 2024
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NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
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Xuelun WANG
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EPITAXIAL REACTION DEVICE
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Publication number 20240309550
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Publication date Sep 19, 2024
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Shenzhen Naso Tech Co Ltd
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Yunzhang XIAO
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...