Thickness uniformity of coated layers or desired profile of target erosion

Industry

CPC
H01J37/347

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/347Thickness uniformity of coated layers or desired profile of target erosion

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Two-dimensional electronic component and method of manufacturing same
- Patent number 12,237,152
- Issue date Feb 25, 2025
- National Central University
- Ching-Yuan Su
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for producing uniform films on moving substrates...
- Patent number 12,217,947
- Issue date Feb 4, 2025
- Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E.V.
- Michael Vergöhl
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Profiled sputtering target and method of making the same
- Patent number 12,217,951
- Issue date Feb 4, 2025
- Honeywell International Inc.
- Shih-Yao Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition system and method
- Patent number 12,211,756
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus, film formation method, and method for manufac...
- Patent number 12,205,805
- Issue date Jan 21, 2025
- Canon Kabushiki Kaisha
- Kazuya Demura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Cover with a sensor system for a configurable measuring system for...
- Patent number 12,183,561
- Issue date Dec 31, 2024
- SOLERAS ADVANCED COATINGS BV
- Ivan Van De Putte
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming position misalignment correction method and film formi...
- Patent number 12,180,580
- Issue date Dec 31, 2024
- Tokyo Electron Limited
- Atsushi Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for residual gas analysis
- Patent number 12,176,193
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING
Information Patent Grant
Physical vapor deposition process apparatus and method of optimizin...
- Patent number 12,165,935
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chen-Hung Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Anti-stiction process for MEMS device
- Patent number 12,157,667
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Chun Weng
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Deposition method for tuning magnetic field distribution of deposit...
- Patent number 12,129,541
- Issue date Oct 29, 2024
- SKY TECH INC.
- Jing-Cheng Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for improving deposition process
- Patent number 12,112,930
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jung-Tang Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dual reverse pulse sputtering system
- Patent number 12,112,931
- Issue date Oct 8, 2024
- Advanced Energy Industries, Inc.
- Doug Pelleymounter
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method, film forming apparatus, and program
- Patent number 12,094,700
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Toshiharu Hirata
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,087,563
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Liang Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Physical vapor deposition apparatus
- Patent number 12,077,850
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Kuo-Lung Hou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Movement systems for sputter coating of non-flat substrates
- Patent number 12,080,527
- Issue date Sep 3, 2024
- SOLERAS ADVANCED COATINGS BV
- Wilmert De Bosscher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for adjustable coating using magnetron sputtering...
- Patent number 12,062,531
- Issue date Aug 13, 2024
- Interpane Entwicklungs-und Beratungsgesellschaft mbH
- Dominik Wagner
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Niobium sputtering target
- Patent number 12,020,916
- Issue date Jun 25, 2024
- JX Metals Corpo tion
- Yuki Yamada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Real-time detection of particulate matter during deposition chamber...
- Patent number 12,002,665
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering apparatus
- Patent number 11,978,615
- Issue date May 7, 2024
- Samsung Display Co., Ltd.
- Hyun-Woo Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for detecting abnormality of thin-film deposition...
- Patent number 11,965,237
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wen-Hao Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for controlling stress variation in a material...
- Patent number 11,961,722
- Issue date Apr 16, 2024
- SPTS Technologies Limited
- Anthony Wilby
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Film forming apparatus and film forming method
- Patent number 11,894,222
- Issue date Feb 6, 2024
- Tokyo Electron Limited
- Atsushi Takeuchi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for depositing variable interference filters
- Patent number 11,891,686
- Issue date Feb 6, 2024
- Shigeng Song
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Feedback system
- Patent number 11,875,979
- Issue date Jan 16, 2024
- SOLERAS ADVANCED COATINGS BV
- Wilmert De Bosscher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device, method and use for the coating of lenses
- Patent number 11,842,889
- Issue date Dec 12, 2023
- Schneider GmbH & Co. KG
- Gunter Schneider
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for processing substrate, processing apparatus, and processi...
- Patent number 11,832,524
- Issue date Nov 28, 2023
- Tokyo Electron Limited
- Takuya Kubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system and method
- Patent number 11,823,964
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Wen-Hao Cheng
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for residual gas analysis
- Patent number 11,791,141
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yen-Liang Chen
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20250079142
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- B08 - CLEANING
Information Patent Application
METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS
- Publication number 20250062165
- Publication date Feb 20, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chen-Hung LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE
- Publication number 20250014878
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Andreas SCHMID
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING
- Publication number 20240429036
- Publication date Dec 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Hsi Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION SYSTEM AND METHOD
- Publication number 20240387156
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Hao CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Improving Deposition Process
- Publication number 20240387155
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jung-Tang Wu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHYSICAL VAPOR DEPOSITION APPARATUS
- Publication number 20240360545
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Lung Huo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA BASED FILM MODIFICATION FOR SEMICONDUCTOR DEVICES
- Publication number 20240352575
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Timothy J. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240347327
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang LIN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...
- Publication number 20240304430
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Mehdi Vaez-Iravani
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA PROCESS SIMULATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTU...
- Publication number 20240274416
- Publication date Aug 15, 2024
- Samsung Electronics Co., Ltd.
- Jaesik An
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20240258088
- Publication date Aug 1, 2024
- SAMSUNG DISPLAY CO., LTD.
- HYUN-WOO KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Etching with Metal Sputtering
- Publication number 20240249927
- Publication date Jul 25, 2024
- TOKYO ELECTRON LIMITED
- Minjoon Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER
- Publication number 20240229228
- Publication date Jul 11, 2024
- SOLERAS ADVANCED COATINGS BV
- Wilmert DE BOSSCHER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Power Compensation in PVD Chambers
- Publication number 20240213007
- Publication date Jun 27, 2024
- Junjie PAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCT...
- Publication number 20240191340
- Publication date Jun 13, 2024
- Beijing NAURA Microelectronics Equipment Co., Ltd.
- Yujie GENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE
- Publication number 20240170269
- Publication date May 23, 2024
- Applied Materials, Inc.
- Harish PENMETHSA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER
- Publication number 20240133025
- Publication date Apr 25, 2024
- SOLERAS ADVANCED COATINGS BV
- Wilmert DE BOSSCHER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THIN FILM FORMING APPARATUS AND METHOD
- Publication number 20240112897
- Publication date Apr 4, 2024
- SEMES CO., LTD.
- Sun Il KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION
- Publication number 20240096609
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-Liang LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPUTTERING APPARATUS
- Publication number 20240063003
- Publication date Feb 22, 2024
- Canon ANELVA Corporation
- Susumu KARINO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EROSION RATE MONITORING FOR WAFER FABRICATION EQUIPMENT
- Publication number 20240030006
- Publication date Jan 25, 2024
- Micron Technology, Inc.
- Synn Nee Chow
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and a Method of Controlling Thickness Variation in a Mate...
- Publication number 20240014018
- Publication date Jan 11, 2024
- SPTS TECHNOLOGIES LIMITED
- Tony WILBY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386807
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION SYSTEM AND METHOD
- Publication number 20230386942
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen-Hao CHENG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS
- Publication number 20230386808
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yen-Liang CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR TOOL FOR COPPER DEPOSITION
- Publication number 20230386809
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Hung TSAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FABRICATION OF ELECTROCHROMIC DEVICES
- Publication number 20230324754
- Publication date Oct 12, 2023
- VIEW, INC.
- Robert Tad Rozbicki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FABRICATION OF ELECTROCHROMIC DEVICES
- Publication number 20230314892
- Publication date Oct 5, 2023
- VIEW, INC.
- Robert Tad Rozbicki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR TOOL FOR COPPER DEPOSITION
- Publication number 20230260770
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Company Limited
- Chia-Hung TSAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Thickness uniformity of coated layers or desired profile of target erosion

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Two-dimensional electronic component and method of manufacturing same

Method and device for producing uniform films on moving substrates...

Profiled sputtering target and method of making the same

Deposition system and method

Sputtering apparatus, film formation method, and method for manufac...

Cover with a sensor system for a configurable measuring system for...

Film forming position misalignment correction method and film formi...

System and method for residual gas analysis

Physical vapor deposition process apparatus and method of optimizin...

Anti-stiction process for MEMS device

Deposition method for tuning magnetic field distribution of deposit...

Method for improving deposition process

Dual reverse pulse sputtering system

Film forming method, film forming apparatus, and program

Semiconductor processing tool and methods of operation

Physical vapor deposition apparatus

Movement systems for sputter coating of non-flat substrates

Method and system for adjustable coating using magnetron sputtering...

Niobium sputtering target

Real-time detection of particulate matter during deposition chamber...

Sputtering apparatus

System and method for detecting abnormality of thin-film deposition...

Method and apparatus for controlling stress variation in a material...

Film forming apparatus and film forming method

Apparatus and methods for depositing variable interference filters

Feedback system

Device, method and use for the coating of lenses

Method for processing substrate, processing apparatus, and processi...

Deposition system and method

System and method for residual gas analysis

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS

WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE

PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING

DEPOSITION SYSTEM AND METHOD

Method for Improving Deposition Process

PHYSICAL VAPOR DEPOSITION APPARATUS

PLASMA BASED FILM MODIFICATION FOR SEMICONDUCTOR DEVICES

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...

PLASMA PROCESS SIMULATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTU...

SPUTTERING APPARATUS

Plasma Etching with Metal Sputtering

DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

Power Compensation in PVD Chambers

BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCT...

SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE

DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

THIN FILM FORMING APPARATUS AND METHOD

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

SPUTTERING APPARATUS

EROSION RATE MONITORING FOR WAFER FABRICATION EQUIPMENT

Apparatus and a Method of Controlling Thickness Variation in a Mate...

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

DEPOSITION SYSTEM AND METHOD

SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

FABRICATION OF ELECTROCHROMIC DEVICES

FABRICATION OF ELECTROCHROMIC DEVICES

SEMICONDUCTOR TOOL FOR COPPER DEPOSITION