Thickness uniformity of coated layers or desired profile of target erosion

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Patents Applicationslast 30 patents

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    WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE

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    • Applied Materials, Inc.
    • H01 - BASIC ELECTRIC ELEMENTS
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    PHYSICAL VAPOR DEPOSITION (PVD) WITH TARGET EROSION PROFILE MONITORING

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    • Publication date Dec 26, 2024
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Chia-Hsi Wang
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    DEPOSITION SYSTEM AND METHOD

    • Publication number 20240387156
    • Publication date Nov 21, 2024
    • Taiwan Semiconductor Manufacturing Co., Ltd.
    • Wen-Hao CHENG
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    Method for Improving Deposition Process

    • Publication number 20240387155
    • Publication date Nov 21, 2024
    • Taiwan Semiconductor Manufacturing Co., Ltd.
    • Jung-Tang Wu
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    PHYSICAL VAPOR DEPOSITION APPARATUS

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    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Kuo-Lung Huo
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    PLASMA BASED FILM MODIFICATION FOR SEMICONDUCTOR DEVICES

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    • Publication date Oct 24, 2024
    • Applied Materials, Inc.
    • Timothy J. Miller
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    SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

    • Publication number 20240347327
    • Publication date Oct 17, 2024
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Yen-Liang LIN
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    REAL-TIME DETECTION OF PARTICULATE MATTER DURING DEPOSITION CHAMBER...

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    • Publication date Sep 12, 2024
    • Applied Materials, Inc.
    • Mehdi Vaez-Iravani
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    PLASMA PROCESS SIMULATION METHOD AND SEMICONDUCTOR DEVICE MANUFACTU...

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    • Samsung Electronics Co., Ltd.
    • Jaesik An
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    SPUTTERING APPARATUS

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    • SAMSUNG DISPLAY CO., LTD.
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    Plasma Etching with Metal Sputtering

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    • Publication date Jul 25, 2024
    • TOKYO ELECTRON LIMITED
    • Minjoon Park
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    DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

    • Publication number 20240229228
    • Publication date Jul 11, 2024
    • SOLERAS ADVANCED COATINGS BV
    • Wilmert DE BOSSCHER
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    Power Compensation in PVD Chambers

    • Publication number 20240213007
    • Publication date Jun 27, 2024
    • Junjie PAN
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    BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCT...

    • Publication number 20240191340
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    • Beijing NAURA Microelectronics Equipment Co., Ltd.
    • Yujie GENG
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    SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE

    • Publication number 20240170269
    • Publication date May 23, 2024
    • Applied Materials, Inc.
    • Harish PENMETHSA
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    DEPOSITION OF NON-STOICHIOMETRIC METAL COMPOUND LAYER

    • Publication number 20240133025
    • Publication date Apr 25, 2024
    • SOLERAS ADVANCED COATINGS BV
    • Wilmert DE BOSSCHER
    • H01 - BASIC ELECTRIC ELEMENTS
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    THIN FILM FORMING APPARATUS AND METHOD

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    • SEMES CO., LTD.
    • Sun Il KIM
    • H01 - BASIC ELECTRIC ELEMENTS
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    SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

    • Publication number 20240096609
    • Publication date Mar 21, 2024
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Yen-Liang LIN
    • H01 - BASIC ELECTRIC ELEMENTS
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    SPUTTERING APPARATUS

    • Publication number 20240063003
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    • Canon ANELVA Corporation
    • Susumu KARINO
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    EROSION RATE MONITORING FOR WAFER FABRICATION EQUIPMENT

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    • Publication date Jan 25, 2024
    • Micron Technology, Inc.
    • Synn Nee Chow
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    Apparatus and a Method of Controlling Thickness Variation in a Mate...

    • Publication number 20240014018
    • Publication date Jan 11, 2024
    • SPTS TECHNOLOGIES LIMITED
    • Tony WILBY
    • H01 - BASIC ELECTRIC ELEMENTS
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    SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

    • Publication number 20230386807
    • Publication date Nov 30, 2023
    • Taiwan Semiconductor Manufacturing Co., Ltd.
    • Yen-Liang CHEN
    • H01 - BASIC ELECTRIC ELEMENTS
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    DEPOSITION SYSTEM AND METHOD

    • Publication number 20230386942
    • Publication date Nov 30, 2023
    • Taiwan Semiconductor Manufacturing Co., Ltd.
    • Wen-Hao CHENG
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    SYSTEM AND METHOD FOR RESIDUAL GAS ANALYSIS

    • Publication number 20230386808
    • Publication date Nov 30, 2023
    • Taiwan Semiconductor Manufacturing Co., Ltd.
    • Yen-Liang CHEN
    • H01 - BASIC ELECTRIC ELEMENTS
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    SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

    • Publication number 20230386809
    • Publication date Nov 30, 2023
    • Taiwan Semiconductor Manufacturing Company, Ltd.
    • Chia-Hung TSAI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    FABRICATION OF ELECTROCHROMIC DEVICES

    • Publication number 20230324754
    • Publication date Oct 12, 2023
    • VIEW, INC.
    • Robert Tad Rozbicki
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    FABRICATION OF ELECTROCHROMIC DEVICES

    • Publication number 20230314892
    • Publication date Oct 5, 2023
    • VIEW, INC.
    • Robert Tad Rozbicki
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SEMICONDUCTOR TOOL FOR COPPER DEPOSITION

    • Publication number 20230260770
    • Publication date Aug 17, 2023
    • Taiwan Semiconductor Manufacturing Company Limited
    • Chia-Hung TSAI
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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    ELECTROCHROMIC DEVICES

    • Publication number 20230144179
    • Publication date May 11, 2023
    • VIEW, INC.
    • Zhongchun Wang
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    OVERHANG REDUCTION USING PULSED BIAS

    • Publication number 20230113961
    • Publication date Apr 13, 2023
    • Applied Materials, Inc.
    • Bencherki Mebarki
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