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CPC
H01J2237/31788

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/31788through mask

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Focused ion beam processing apparatus
- Patent number 11,721,517
- Issue date Aug 8, 2023
- Hitachi High-Tech Science Corporation
- Hiroshi Oba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam lithography method based on ion beam lithography system
- Patent number 11,538,653
- Issue date Dec 27, 2022
- Beijing Normal University
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,930,469
- Issue date Feb 23, 2021
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam writing apparatus and charged particle beam w...
- Patent number 10,553,396
- Issue date Feb 4, 2020
- NuFlare Technology, Inc.
- Takahito Nakayama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged-particle beam exposure method and charged-particle beam cor...
- Patent number 10,056,229
- Issue date Aug 21, 2018
- Samsung Electronics Co., Ltd.
- Sukjong Bae
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Apparatus and methods for aberration correction in electron beam ba...
- Patent number 9,607,802
- Issue date Mar 28, 2017
- KLA-Tencor Corporation
- Christopher F. Bevis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modeling and correcting short-range and long-range effects in E-bea...
- Patent number 9,484,186
- Issue date Nov 1, 2016
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for aberration correction in electron beam ba...
- Patent number 8,933,425
- Issue date Jan 13, 2015
- KLA-Tencor Corporation
- Christopher F. Bevis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method of electron beam writing
- Patent number 8,525,135
- Issue date Sep 3, 2013
- Cadence Design Systems, Inc.
- Dmitri Lanpanik
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Installation and method of nanofabrication
- Patent number 8,101,925
- Issue date Jan 24, 2012
- Centre National de la Recherche Scientifique CNRS
- Jacques Gierak
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Transfer mask for exposure and pattern exchanging method of the same
- Patent number 7,862,959
- Issue date Jan 4, 2011
- Octec Inc.
- Katsuya Okumura
- B82 - NANO-TECHNOLOGY
Information Patent Grant
System and method of electron beam writing
- Patent number 7,777,204
- Issue date Aug 17, 2010
- Cadence Design Systems, Inc.
- Dmitri Lapanik
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for manufacturing a semiconductor device, stencil mask and m...
- Patent number 7,745,073
- Issue date Jun 29, 2010
- Kabushiki Kaisha Toshiba
- Kyoichi Suguro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged-particle exposure apparatus
- Patent number 7,737,422
- Issue date Jun 15, 2010
- IMS Nanofabrication AG
- Elmar Platzgummer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method for membrane member
- Patent number 7,641,806
- Issue date Jan 5, 2010
- Tokyo Electron Limited
- Katsuya Okumura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Lithography systems and methods for operating the same
- Patent number 7,576,341
- Issue date Aug 18, 2009
- Samsung Electronics Co., Ltd.
- Dong-Wook Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask, exposure method and production method of semiconductor device
- Patent number 7,517,618
- Issue date Apr 14, 2009
- Sony Corporation
- Shigeru Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device, stencil mask and m...
- Patent number 7,459,246
- Issue date Dec 2, 2008
- Kabushiki Kaisha Toshiba
- Kyoichi Suguro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Large area electron emission system for application in mask-based l...
- Patent number 7,456,491
- Issue date Nov 25, 2008
- Subrahmanyam V. S. Pilla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Exposure method using complementary divided mask, exposure apparatu...
- Patent number 7,369,213
- Issue date May 6, 2008
- Sony Corporation
- Shinichiro Noudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nonlithographic method of defining geometries for plasma and/or ion...
- Patent number 7,288,008
- Issue date Oct 30, 2007
- STMicroelectronics S.r.l.
- Simone Alba
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a semiconductor device, stencil mask and m...
- Patent number 7,179,569
- Issue date Feb 20, 2007
- Kabushiki Kaisha Toshiba
- Kyoichi Suguro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Exposure method using complementary divided mask, exposure apparatu...
- Patent number 7,160,655
- Issue date Jan 9, 2007
- Sony Corporation
- Shinichiro Noudo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion printer
- Patent number 7,139,009
- Issue date Nov 21, 2006
- Boris Aronovich Gurovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Charged particle beam exposure method and method for producing char...
- Patent number 7,102,147
- Issue date Sep 5, 2006
- Kabushiki Kaisha Toshiba
- Ryoichi Inanami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for detecting and compensating for positional displacements...
- Patent number 7,087,910
- Issue date Aug 8, 2006
- Infineon Technologies AG
- Jens Schneider
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for passing particles on selected areas on a wafer
- Patent number 7,071,478
- Issue date Jul 4, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wen Chin Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for single ion implantation
- Patent number 7,002,166
- Issue date Feb 21, 2006
- Qucor Pty Ltd
- David Norman Jamieson
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Exposure system and exposure method
- Patent number 6,974,960
- Issue date Dec 13, 2005
- Sony Corporation
- Shinichi Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam exposure mask and electron beam exposure method using...
- Patent number 6,972,165
- Issue date Dec 6, 2005
- Sony Corporation
- Ichiro Kagami
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
FOCUSED ION BEAM PROCESSING APPARATUS
- Publication number 20210296080
- Publication date Sep 23, 2021
- HITACHI HIGH-TECH SCIENCE CORPORATION
- Hiroshi OBA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM LITHOGRAPHY METHOD BASED ON ION BEAM LITHOGRAPHY SYSTEM
- Publication number 20210183616
- Publication date Jun 17, 2021
- BEIJING NORMAL UNIVERSITY
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190122858
- Publication date Apr 25, 2019
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...
- Publication number 20190122859
- Publication date Apr 25, 2019
- NuFlare Technology, Inc.
- Takahito NAKAYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...
- Publication number 20180012730
- Publication date Jan 11, 2018
- Samsung Electronics Co., Ltd.
- SUKJONG BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK COVER, CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PAR...
- Publication number 20140319372
- Publication date Oct 30, 2014
- NUFLARE TECHNOLOGY, INC.
- Yu ASAMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...
- Publication number 20140114634
- Publication date Apr 24, 2014
- Synopsys, Inc.
- Hua Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD OF ELECTRON BEAM WRITING
- Publication number 20110192994
- Publication date Aug 11, 2011
- Cadence Design Systems, Inc.
- Dmitri LANPANIK
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
FOCUSSING MASK
- Publication number 20090206271
- Publication date Aug 20, 2009
- NFAB LIMITED
- Derek Anthony Eastham
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for manufacturing a semiconductor device, stencil mask and m...
- Publication number 20090139449
- Publication date Jun 4, 2009
- Kabushiki Kaisha Toshiba
- Kyoichi Suguro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INSTALLATION AND METHOD OF NANOFABRICATION
- Publication number 20090095923
- Publication date Apr 16, 2009
- CENTRE NATIONAL DE LA RECHERCHESECIENTIFQUE-CNRS
- Jacques Gierak
- G01 - MEASURING TESTING
Information Patent Application
Charged-Particle Exposure Apparatus
- Publication number 20080258084
- Publication date Oct 23, 2008
- IMS Nanofabrication AG
- Elmar Platzgummer
- B82 - NANO-TECHNOLOGY
Information Patent Application
SOI substrate, mask blank for charged particle beam exposure, and m...
- Publication number 20070200174
- Publication date Aug 30, 2007
- DAI NIPPON PRINTING CO. , LTD.
- Kenichi Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electron-beam exposure system
- Publication number 20070181829
- Publication date Aug 9, 2007
- Hitoshi Tanaka
- B82 - NANO-TECHNOLOGY
Information Patent Application
System and method pf electron beam writing
- Publication number 20070125967
- Publication date Jun 7, 2007
- Cadence Design Systems, Inc.
- Dmitri Lapanik
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Exposure method using complementary divided mask, exposure apparatu...
- Publication number 20070111116
- Publication date May 17, 2007
- Sony Corporation
- Shinichiro Noudo
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for manufacturing a semiconductor device, stencil mask and m...
- Publication number 20070111114
- Publication date May 17, 2007
- Kabushiki Kaisha Toshiba
- Kyoichi Suguro
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Lithography systems and methods for operating the same
- Publication number 20060118735
- Publication date Jun 8, 2006
- Dong-Wook Kim
- B82 - NANO-TECHNOLOGY
Information Patent Application
Large area electron emission system for application in mask-based l...
- Publication number 20060017049
- Publication date Jan 26, 2006
- Subrahmanyam V.S. Pilla
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nonlithographic method of defining geometries for plasma and/or ion...
- Publication number 20050239291
- Publication date Oct 27, 2005
- STMicroelectronics S.r.l.
- Simone Alba
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for passing particles on selected areas on a wafer
- Publication number 20050218346
- Publication date Oct 6, 2005
- Wen Chin Lin
- B82 - NANO-TECHNOLOGY
Information Patent Application
Exposure method using complementary divided mask, exposure apparatu...
- Publication number 20050208395
- Publication date Sep 22, 2005
- Sony Corporation
- Shinichiro Noudo
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask, exposure method and production method of semiconductor device
- Publication number 20050170265
- Publication date Aug 4, 2005
- Sony Corporation
- Shigeru Moriya
- B82 - NANO-TECHNOLOGY
Information Patent Application
Mask, method of production of same, and method of production of sem...
- Publication number 20050142462
- Publication date Jun 30, 2005
- Sony Corporation
- Shinji Omori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Transfer mask for exposure and pattern exchanging method of the same
- Publication number 20050118516
- Publication date Jun 2, 2005
- Octec Inc.
- Katsuya Okumura
- B82 - NANO-TECHNOLOGY
Information Patent Application
Exposure system and exposure method
- Publication number 20050116185
- Publication date Jun 2, 2005
- Shinichi Mizuno
- B82 - NANO-TECHNOLOGY
Information Patent Application
Ion printer
- Publication number 20050104014
- Publication date May 19, 2005
- Boris Aronovich Gurovich
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
Stencil mask, production method thereof, exposure apparatus, exposu...
- Publication number 20050069786
- Publication date Mar 31, 2005
- Sony Corporation
- Shoji Nohama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stencil mask, charged particle irradiation apparatus and the method
- Publication number 20050058913
- Publication date Mar 17, 2005
- Tomoyuki Osada
- B82 - NANO-TECHNOLOGY
Information Patent Application
Manufacturing method for membrane member
- Publication number 20040251229
- Publication date Dec 16, 2004
- Katsuya Okumura
- B81 - MICRO-STRUCTURAL TECHNOLOGY

through mask

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Focused ion beam processing apparatus

Ion beam lithography method based on ion beam lithography system

Charged particle beam writing apparatus and charged particle beam w...

Charged particle beam writing apparatus and charged particle beam w...

Charged-particle beam exposure method and charged-particle beam cor...

Apparatus and methods for aberration correction in electron beam ba...

Modeling and correcting short-range and long-range effects in E-bea...

Apparatus and methods for aberration correction in electron beam ba...

System and method of electron beam writing

Installation and method of nanofabrication

Transfer mask for exposure and pattern exchanging method of the same

System and method of electron beam writing

Method for manufacturing a semiconductor device, stencil mask and m...

Charged-particle exposure apparatus

Manufacturing method for membrane member

Lithography systems and methods for operating the same

Mask, exposure method and production method of semiconductor device

Method for manufacturing a semiconductor device, stencil mask and m...

Large area electron emission system for application in mask-based l...

Exposure method using complementary divided mask, exposure apparatu...

Nonlithographic method of defining geometries for plasma and/or ion...

Method for manufacturing a semiconductor device, stencil mask and m...

Exposure method using complementary divided mask, exposure apparatu...

Ion printer

Charged particle beam exposure method and method for producing char...

Method for detecting and compensating for positional displacements...

System and method for passing particles on selected areas on a wafer

Method and system for single ion implantation

Exposure system and exposure method

Electron beam exposure mask and electron beam exposure method using...

Patents Applicationslast 30 patents

FOCUSED ION BEAM PROCESSING APPARATUS

ION BEAM LITHOGRAPHY METHOD BASED ON ION BEAM LITHOGRAPHY SYSTEM

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM W...

CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...

MASK COVER, CHARGED PARTICLE BEAM DRAWING APPARATUS AND CHARGED PAR...

MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...

SYSTEM AND METHOD OF ELECTRON BEAM WRITING

FOCUSSING MASK

Method for manufacturing a semiconductor device, stencil mask and m...

INSTALLATION AND METHOD OF NANOFABRICATION

Charged-Particle Exposure Apparatus

SOI substrate, mask blank for charged particle beam exposure, and m...

Electron-beam exposure system

System and method pf electron beam writing

Exposure method using complementary divided mask, exposure apparatu...

Method for manufacturing a semiconductor device, stencil mask and m...

Lithography systems and methods for operating the same

Large area electron emission system for application in mask-based l...

Nonlithographic method of defining geometries for plasma and/or ion...

System and method for passing particles on selected areas on a wafer

Exposure method using complementary divided mask, exposure apparatu...

Mask, exposure method and production method of semiconductor device

Mask, method of production of same, and method of production of sem...

Transfer mask for exposure and pattern exchanging method of the same

Exposure system and exposure method

Ion printer

Stencil mask, production method thereof, exposure apparatus, exposu...

Stencil mask, charged particle irradiation apparatus and the method

Manufacturing method for membrane member