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Scanning ion beam etch
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Patent number 11,646,171
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Issue date May 9, 2023
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Plasma-Therm NES LLC
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Sarpangala Hariharakeshava Hegde
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H01 - BASIC ELECTRIC ELEMENTS
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Plasma processing apparatus
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Patent number 11,495,439
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Issue date Nov 8, 2022
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Tokyo Electron Limited
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Kohei Mizota
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H01 - BASIC ELECTRIC ELEMENTS
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Focused ion beam apparatus
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Patent number 11,482,398
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Issue date Oct 25, 2022
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Hitachi High-Tech Science Corporation
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Haruyuki Ishii
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H01 - BASIC ELECTRIC ELEMENTS
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Ion beam etching system
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Patent number 11,373,842
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Issue date Jun 28, 2022
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JIANGSU LEUVEN INSTRUMENTS CO. LTD
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Na Li
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H01 - BASIC ELECTRIC ELEMENTS
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Scanning ion beam etch
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Patent number 11,227,741
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Issue date Jan 18, 2022
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Plasma-Therm NES LLC
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Sarpangala Hariharakeshava Hegde
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H01 - BASIC ELECTRIC ELEMENTS
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Electron microscope
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Patent number 11,164,717
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Issue date Nov 2, 2021
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HITACHI HIGH-TECH CORPORATION
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Hideki Kikuchi
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H01 - BASIC ELECTRIC ELEMENTS
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Focused ion beam apparatus
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Patent number 11,133,149
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Issue date Sep 28, 2021
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Hitachi High-Tech Science Corporation
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Toshihiro Mochizuki
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H01 - BASIC ELECTRIC ELEMENTS
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Ion milling device
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Patent number 11,133,153
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Issue date Sep 28, 2021
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HITACHI HIGH-TECH CORPORATION
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Toru Iwaya
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H01 - BASIC ELECTRIC ELEMENTS