Treating effluent gases

Industry

CPC
H01J37/32844

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32844Treating effluent gases

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma abatement system utilizing water vapor and oxygen reagent
- Patent number 12,170,192
- Issue date Dec 17, 2024
- Applied Materials, Inc.
- Colin John Dickinson
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Controlling exhaust gas pressure of a plasma reactor for plasma sta...
- Patent number 12,159,768
- Issue date Dec 3, 2024
- Recarbon, Inc.
- George Stephen Leonard
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Process stop loss reduction system through rapid replacement of app...
- Patent number 12,139,789
- Issue date Nov 12, 2024
- MILAEBO CO., LTD.
- Yeon Ju Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat exchanger with multistaged cooling
- Patent number 12,111,110
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Manoj A. Gajendra
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Plasma processing apparatus
- Patent number 12,094,697
- Issue date Sep 17, 2024
- Tokyo Electron Limited
- Toshimasa Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Actively cooled foreline trap to reduce throttle valve drift
- Patent number 12,060,637
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- Gaosheng Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor for inductively coupled plasma and method of assembl...
- Patent number 12,062,528
- Issue date Aug 13, 2024
- LOT CES CO., LTD.
- Jin Ho Bae
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 12,014,900
- Issue date Jun 18, 2024
- Recarbon, Inc.
- Curtis Peter Tom
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Scrubber system and wet cleaning method using the same
- Patent number 11,931,683
- Issue date Mar 19, 2024
- Samsung Electronics Co., Ltd.
- Young Seok Roh
- B08 - CLEANING
Information Patent Grant
Waste gas abatement technology for semiconductor processing
- Patent number 11,931,682
- Issue date Mar 19, 2024
- Edwards Vacuum LLC
- Imad Mahawili
- B08 - CLEANING
Information Patent Grant
Optical absorption sensor for semiconductor processing
- Patent number 11,848,178
- Issue date Dec 19, 2023
- Applied Materials, Inc.
- Fang Ruan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment apparatus
- Patent number 11,786,745
- Issue date Oct 17, 2023
- FEAGLE CO., LTD
- Hyunyoung Lee
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Powder removing apparatus using screw cylinder for gas processing f...
- Patent number 11,759,832
- Issue date Sep 19, 2023
- Global Standard Technology Co., Ltd
- Jong Min Park
- B08 - CLEANING
Information Patent Grant
Plasma processing apparatus
- Patent number 11,756,774
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Toshimasa Kobayashi
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Methods and apparatus for passivating a target
- Patent number 11,661,651
- Issue date May 30, 2023
- Applied Materials, Inc.
- Chao Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduction of Br2 and Cl2 in semiconductor processes
- Patent number 11,551,917
- Issue date Jan 10, 2023
- Applied Materials, Inc.
- Joseph A. Van Gompel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for passivating a target
- Patent number 11,512,387
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Chao Du
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Optical system for monitoring plasma reactions and reactors
- Patent number 11,469,078
- Issue date Oct 11, 2022
- Recarbon, Inc.
- Curtis Peter Tom
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method and apparatus for deposition cleaning in a pumping line
- Patent number 11,367,598
- Issue date Jun 21, 2022
- MKS Instruments, Inc.
- Gordon Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,232,932
- Issue date Jan 25, 2022
- HITACHI HIGH-TECH CORPORATION
- Masatoshi Kawakami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus with multistaged cooling
- Patent number 11,221,182
- Issue date Jan 11, 2022
- Applied Materials, Inc.
- Manoj A. Gajendra
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Abatement and strip process chamber in a dual loadlock configuration
- Patent number 11,177,136
- Issue date Nov 16, 2021
- APPLIED MATERIALS, INC.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Abatement and strip process chamber in a dual load lock configuration
- Patent number 11,171,008
- Issue date Nov 9, 2021
- Applied Materials, Inc.
- Jared Ahmad Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for exhaust cooling
- Patent number 11,114,285
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Michael S. Cox
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,081,321
- Issue date Aug 3, 2021
- Tokyo Electron Limited
- Syuji Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for deposition cleaning in a pumping line
- Patent number 11,024,489
- Issue date Jun 1, 2021
- MKS Instruments, Inc.
- Gordon Hill
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum evacuation system
- Patent number 10,978,315
- Issue date Apr 13, 2021
- Ebara Corporation
- Atsushi Shiokawa
- G05 - CONTROLLING REGULATING
Information Patent Grant
Plasma foreline thermal reactor system
- Patent number 10,920,315
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Colin John Dickinson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for collection and subsequent reaction of liquid and soli...
- Patent number 10,861,681
- Issue date Dec 8, 2020
- Applied Materials, Inc.
- James L'Heureux
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Plasma reactors having recuperators
- Patent number 10,854,429
- Issue date Dec 1, 2020
- Recarbon, Inc.
- George Stephen Leonard
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBL...
- Publication number 20240363316
- Publication date Oct 31, 2024
- LOT CES CO., LTD.
- Jin Ho BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR ORGANIC EFFLUENT ABATEMENT
- Publication number 20240347324
- Publication date Oct 17, 2024
- Applied Materials, Inc.
- Ryan T. DOWNEY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EXHAUST GAS PROCESSING APPARATUS HAVING PLASMA SOURCE AND SUBSTRATE...
- Publication number 20240249925
- Publication date Jul 25, 2024
- Samsung Electronics Co., Ltd.
- JAEHYUN KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CIRCUIT, FAN SYSTEM, AND TRANSFORMER FOR POWER CONVERSION
- Publication number 20240223088
- Publication date Jul 4, 2024
- Infineon Technologies Austria AG
- Kuiwei XU
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
SCRUBBER SYSTEM AND WET CLEANING METHOD USING THE SAME
- Publication number 20240181380
- Publication date Jun 6, 2024
- Samsung Electronics Co., Ltd.
- Young Seok ROH
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR MANUFACTURING FACILITY AND METHOD OF OPERATING THE SAME
- Publication number 20240128065
- Publication date Apr 18, 2024
- LOT CES CO., LTD.
- Jin Ho BAE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FLUORINE-DOPED SILICON-CONTAINING MATERIALS
- Publication number 20240087882
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Siyu Zhu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL ABSORPTION SENSOR FOR SEMICONDUCTOR PROCESSING
- Publication number 20240079220
- Publication date Mar 7, 2024
- Applied Materials, Inc.
- Fang Ruan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATION APPARATUS
- Publication number 20240071735
- Publication date Feb 29, 2024
- FEAGLE CO., LTD
- Hyunyoung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA TREATMENT APPARATUS
- Publication number 20230414958
- Publication date Dec 28, 2023
- FEAGLE CO., LTD
- Hyunyoung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS ABATEMENT BY PLASMA
- Publication number 20230402260
- Publication date Dec 14, 2023
- Edwards Limited
- Simone Magni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230386804
- Publication date Nov 30, 2023
- TOKYO ELECTRON LIMITED
- Toshimasa KOBAYASHI
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
TRAP DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20230360895
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
LOW TEMPERATURE CARBON GAPFILL
- Publication number 20230360924
- Publication date Nov 9, 2023
- Applied Materials, Inc.
- Supriya Ghosh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA GENERATING DEVICE
- Publication number 20230136018
- Publication date May 4, 2023
- EN2CORE TECHNOLOGY INC.
- Sae Hoon UHM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBL...
- Publication number 20230134862
- Publication date May 4, 2023
- LOT CES CO., LTD.
- Jin Ho BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS
- Publication number 20230110414
- Publication date Apr 13, 2023
- RECARBON, INC.
- Curtis Peter Tom
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
REDUCTION OF BR2 AND CL2 IN SEMICONDUCTOR PROCESSES
- Publication number 20230100659
- Publication date Mar 30, 2023
- Applied Materials, Inc.
- Joseph Van GOMPEL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD OF TRAPPING AN EXHAUST MATERIAL FROM A SUBSTRA...
- Publication number 20230068823
- Publication date Mar 2, 2023
- Samsung Electronics Co., Ltd.
- Uihyoung LEE
- B04 - CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL...
Information Patent Application
PLASMA-GENERATING NOZZLE AND PLASMA DEVICE INCLUDING SAME
- Publication number 20230040683
- Publication date Feb 9, 2023
- PlasmaDent Inc.
- Letian ZHANG
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
APPARATUS AND METHOD FOR TREATING SUBSTRATE
- Publication number 20230005715
- Publication date Jan 5, 2023
- SEMES CO., LTD.
- Jin Woo CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, EXHAUST DEVICE AND METHOD OF MANUFA...
- Publication number 20220403511
- Publication date Dec 22, 2022
- Kokusai Electric Corporation
- Hirohisa YAMAZAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR PASSIVATING A TARGET
- Publication number 20220307126
- Publication date Sep 29, 2022
- Applied Materials, Inc.
- Chao DU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER
- Publication number 20220293400
- Publication date Sep 15, 2022
- RECARBON, INC.
- George Stephen Leonard
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, GAS RE...
- Publication number 20220285141
- Publication date Sep 8, 2022
- KIOXIA Corporation
- Horoyuki Mizuno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH EFFICIENCY TRAP FOR PARTICLE COLLECTION IN A VACUUM FORELINE
- Publication number 20220199380
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- James L'HEUREUX
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD AND APPARATUS FOR TREATING DISCHARGE GAS CONTAINING TARGET G...
- Publication number 20210394117
- Publication date Dec 23, 2021
- PLASNIX
- Kwang Hyun PAEK
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
SYSTEMS AND PROCESSES FOR PRODUCING FIXED-NITROGEN COMPOUNDS
- Publication number 20210331135
- Publication date Oct 28, 2021
- Nitricity Inc.
- Joshua Michael MCENANEY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PASSIVATING A TARGET
- Publication number 20210317568
- Publication date Oct 14, 2021
- Applied Materials, Inc.
- Chao DU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OPTICAL ABSORPTION SENSOR FOR SEMICONDUCTOR PROCESSING
- Publication number 20210134568
- Publication date May 6, 2021
- Applied Materials, Inc.
- Fang Ruan
- H01 - BASIC ELECTRIC ELEMENTS

Treating effluent gases

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma abatement system utilizing water vapor and oxygen reagent

Controlling exhaust gas pressure of a plasma reactor for plasma sta...

Process stop loss reduction system through rapid replacement of app...

Heat exchanger with multistaged cooling

Plasma processing apparatus

Actively cooled foreline trap to reduce throttle valve drift

Plasma reactor for inductively coupled plasma and method of assembl...

Optical system for monitoring plasma reactions and reactors

Scrubber system and wet cleaning method using the same

Waste gas abatement technology for semiconductor processing

Optical absorption sensor for semiconductor processing

Plasma treatment apparatus

Powder removing apparatus using screw cylinder for gas processing f...

Plasma processing apparatus

Methods and apparatus for passivating a target

Reduction of Br2 and Cl2 in semiconductor processes

Methods and apparatus for passivating a target

Optical system for monitoring plasma reactions and reactors

Method and apparatus for deposition cleaning in a pumping line

Plasma processing apparatus and plasma processing method

Apparatus with multistaged cooling

Abatement and strip process chamber in a dual loadlock configuration

Abatement and strip process chamber in a dual load lock configuration

Apparatus for exhaust cooling

Substrate processing apparatus

Method and apparatus for deposition cleaning in a pumping line

Vacuum evacuation system

Plasma foreline thermal reactor system

Apparatus for collection and subsequent reaction of liquid and soli...

Plasma reactors having recuperators

Patents Applicationslast 30 patents

PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBL...

METHOD FOR ORGANIC EFFLUENT ABATEMENT

EXHAUST GAS PROCESSING APPARATUS HAVING PLASMA SOURCE AND SUBSTRATE...

CIRCUIT, FAN SYSTEM, AND TRANSFORMER FOR POWER CONVERSION

SCRUBBER SYSTEM AND WET CLEANING METHOD USING THE SAME

SEMICONDUCTOR MANUFACTURING FACILITY AND METHOD OF OPERATING THE SAME

FLUORINE-DOPED SILICON-CONTAINING MATERIALS

OPTICAL ABSORPTION SENSOR FOR SEMICONDUCTOR PROCESSING

PLASMA GENERATION APPARATUS

PLASMA TREATMENT APPARATUS

GAS ABATEMENT BY PLASMA

PLASMA PROCESSING APPARATUS

TRAP DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE

LOW TEMPERATURE CARBON GAPFILL

PLASMA GENERATING DEVICE

PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBL...

OPTICAL SYSTEM FOR MONITORING PLASMA REACTIONS AND REACTORS

REDUCTION OF BR2 AND CL2 IN SEMICONDUCTOR PROCESSES

APPARATUS AND METHOD OF TRAPPING AN EXHAUST MATERIAL FROM A SUBSTRA...

PLASMA-GENERATING NOZZLE AND PLASMA DEVICE INCLUDING SAME

APPARATUS AND METHOD FOR TREATING SUBSTRATE

SUBSTRATE PROCESSING APPARATUS, EXHAUST DEVICE AND METHOD OF MANUFA...

METHODS AND APPARATUS FOR PASSIVATING A TARGET

PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, GAS RE...

HIGH EFFICIENCY TRAP FOR PARTICLE COLLECTION IN A VACUUM FORELINE

METHOD AND APPARATUS FOR TREATING DISCHARGE GAS CONTAINING TARGET G...

SYSTEMS AND PROCESSES FOR PRODUCING FIXED-NITROGEN COMPOUNDS

METHODS AND APPARATUS FOR PASSIVATING A TARGET

OPTICAL ABSORPTION SENSOR FOR SEMICONDUCTOR PROCESSING